JP6530316B2 - 光カチオン硬化性塗料組成物及び塗膜形成方法、その塗装物品 - Google Patents
光カチオン硬化性塗料組成物及び塗膜形成方法、その塗装物品 Download PDFInfo
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- JP6530316B2 JP6530316B2 JP2015541654A JP2015541654A JP6530316B2 JP 6530316 B2 JP6530316 B2 JP 6530316B2 JP 2015541654 A JP2015541654 A JP 2015541654A JP 2015541654 A JP2015541654 A JP 2015541654A JP 6530316 B2 JP6530316 B2 JP 6530316B2
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- 125000001972 isopentyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])C([H])([H])* 0.000 description 1
- 125000000555 isopropenyl group Chemical group [H]\C([H])=C(\*)C([H])([H])[H] 0.000 description 1
- 125000005928 isopropyloxycarbonyl group Chemical group [H]C([H])([H])C([H])(OC(*)=O)C([H])([H])[H] 0.000 description 1
- 125000005956 isoquinolyl group Chemical group 0.000 description 1
- 239000005453 ketone based solvent Substances 0.000 description 1
- PBOSTUDLECTMNL-UHFFFAOYSA-N lauryl acrylate Chemical compound CCCCCCCCCCCCOC(=O)C=C PBOSTUDLECTMNL-UHFFFAOYSA-N 0.000 description 1
- 150000007517 lewis acids Chemical class 0.000 description 1
- 239000004611 light stabiliser Substances 0.000 description 1
- VZCYOOQTPOCHFL-UPHRSURJSA-N maleic acid Chemical compound OC(=O)\C=C/C(O)=O VZCYOOQTPOCHFL-UPHRSURJSA-N 0.000 description 1
- 239000011976 maleic acid Substances 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 230000007246 mechanism Effects 0.000 description 1
- 229910001507 metal halide Inorganic materials 0.000 description 1
- 150000005309 metal halides Chemical class 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- FQPSGWSUVKBHSU-UHFFFAOYSA-N methacrylamide Chemical compound CC(=C)C(N)=O FQPSGWSUVKBHSU-UHFFFAOYSA-N 0.000 description 1
- 239000000113 methacrylic resin Substances 0.000 description 1
- HRDXJKGNWSUIBT-UHFFFAOYSA-N methoxybenzene Chemical group [CH2]OC1=CC=CC=C1 HRDXJKGNWSUIBT-UHFFFAOYSA-N 0.000 description 1
- 125000001160 methoxycarbonyl group Chemical group [H]C([H])([H])OC(*)=O 0.000 description 1
- YSGBMDFJWFIEDF-UHFFFAOYSA-N methyl 2-hydroxy-3-methylbutanoate Chemical compound COC(=O)C(O)C(C)C YSGBMDFJWFIEDF-UHFFFAOYSA-N 0.000 description 1
- BDJSOPWXYLFTNW-UHFFFAOYSA-N methyl 3-methoxypropanoate Chemical compound COCCC(=O)OC BDJSOPWXYLFTNW-UHFFFAOYSA-N 0.000 description 1
- 229940095102 methyl benzoate Drugs 0.000 description 1
- 229940057867 methyl lactate Drugs 0.000 description 1
- 229940017219 methyl propionate Drugs 0.000 description 1
- CWKLZLBVOJRSOM-UHFFFAOYSA-N methyl pyruvate Chemical compound COC(=O)C(C)=O CWKLZLBVOJRSOM-UHFFFAOYSA-N 0.000 description 1
- LVHBHZANLOWSRM-UHFFFAOYSA-N methylenebutanedioic acid Natural products OC(=O)CC(=C)C(O)=O LVHBHZANLOWSRM-UHFFFAOYSA-N 0.000 description 1
- 125000006216 methylsulfinyl group Chemical group [H]C([H])([H])S(*)=O 0.000 description 1
- 125000004170 methylsulfonyl group Chemical group [H]C([H])([H])S(*)(=O)=O 0.000 description 1
- BFXIKLCIZHOAAZ-UHFFFAOYSA-N methyltrimethoxysilane Chemical compound CO[Si](C)(OC)OC BFXIKLCIZHOAAZ-UHFFFAOYSA-N 0.000 description 1
- 239000012046 mixed solvent Substances 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 125000002950 monocyclic group Chemical group 0.000 description 1
- 125000002911 monocyclic heterocycle group Chemical group 0.000 description 1
- OMNKZBIFPJNNIO-UHFFFAOYSA-N n-(2-methyl-4-oxopentan-2-yl)prop-2-enamide Chemical compound CC(=O)CC(C)(C)NC(=O)C=C OMNKZBIFPJNNIO-UHFFFAOYSA-N 0.000 description 1
- UTSYWKJYFPPRAP-UHFFFAOYSA-N n-(butoxymethyl)prop-2-enamide Chemical compound CCCCOCNC(=O)C=C UTSYWKJYFPPRAP-UHFFFAOYSA-N 0.000 description 1
- DNTMQTKDNSEIFO-UHFFFAOYSA-N n-(hydroxymethyl)-2-methylprop-2-enamide Chemical compound CC(=C)C(=O)NCO DNTMQTKDNSEIFO-UHFFFAOYSA-N 0.000 description 1
- ULYOZOPEFCQZHH-UHFFFAOYSA-N n-(methoxymethyl)prop-2-enamide Chemical compound COCNC(=O)C=C ULYOZOPEFCQZHH-UHFFFAOYSA-N 0.000 description 1
- ZIWDVJPPVMGJGR-UHFFFAOYSA-N n-ethyl-2-methylprop-2-enamide Chemical compound CCNC(=O)C(C)=C ZIWDVJPPVMGJGR-UHFFFAOYSA-N 0.000 description 1
- 125000001298 n-hexoxy group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])O* 0.000 description 1
- YPHQUSNPXDGUHL-UHFFFAOYSA-N n-methylprop-2-enamide Chemical compound CNC(=O)C=C YPHQUSNPXDGUHL-UHFFFAOYSA-N 0.000 description 1
- 125000003935 n-pentoxy group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])O* 0.000 description 1
- KKFHAJHLJHVUDM-UHFFFAOYSA-N n-vinylcarbazole Chemical compound C1=CC=C2N(C=C)C3=CC=CC=C3C2=C1 KKFHAJHLJHVUDM-UHFFFAOYSA-N 0.000 description 1
- 150000002791 naphthoquinones Chemical class 0.000 description 1
- 125000005186 naphthyloxy group Chemical group C1(=CC=CC2=CC=CC=C12)O* 0.000 description 1
- 125000005146 naphthylsulfonyl group Chemical group C1(=CC=CC2=CC=CC=C12)S(=O)(=O)* 0.000 description 1
- 125000001971 neopentyl group Chemical group [H]C([*])([H])C(C([H])([H])[H])(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 229920003986 novolac Polymers 0.000 description 1
- 125000002801 octanoyl group Chemical group C(CCCCCCC)(=O)* 0.000 description 1
- NZIDBRBFGPQCRY-UHFFFAOYSA-N octyl 2-methylprop-2-enoate Chemical compound CCCCCCCCOC(=O)C(C)=C NZIDBRBFGPQCRY-UHFFFAOYSA-N 0.000 description 1
- 229940065472 octyl acrylate Drugs 0.000 description 1
- 125000002347 octyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- ANISOHQJBAQUQP-UHFFFAOYSA-N octyl prop-2-enoate Chemical compound CCCCCCCCOC(=O)C=C ANISOHQJBAQUQP-UHFFFAOYSA-N 0.000 description 1
- 125000002971 oxazolyl group Chemical group 0.000 description 1
- 150000002921 oxetanes Chemical class 0.000 description 1
- 125000001820 oxy group Chemical group [*:1]O[*:2] 0.000 description 1
- 125000004430 oxygen atom Chemical group O* 0.000 description 1
- 125000000913 palmityl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 125000001147 pentyl group Chemical group C(CCCC)* 0.000 description 1
- PNJWIWWMYCMZRO-UHFFFAOYSA-N pent‐4‐en‐2‐one Natural products CC(=O)CC=C PNJWIWWMYCMZRO-UHFFFAOYSA-N 0.000 description 1
- 125000001792 phenanthrenyl group Chemical group C1(=CC=CC=2C3=CC=CC=C3C=CC12)* 0.000 description 1
- 125000001791 phenazinyl group Chemical group C1(=CC=CC2=NC3=CC=CC=C3N=C12)* 0.000 description 1
- 125000001484 phenothiazinyl group Chemical group C1(=CC=CC=2SC3=CC=CC=C3NC12)* 0.000 description 1
- 125000001644 phenoxazinyl group Chemical group C1(=CC=CC=2OC3=CC=CC=C3NC12)* 0.000 description 1
- KTNLYTNKBOKXRW-UHFFFAOYSA-N phenyliodanium Chemical compound [IH+]C1=CC=CC=C1 KTNLYTNKBOKXRW-UHFFFAOYSA-N 0.000 description 1
- 125000003170 phenylsulfonyl group Chemical group C1(=CC=CC=C1)S(=O)(=O)* 0.000 description 1
- 238000000016 photochemical curing Methods 0.000 description 1
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- 229920003229 poly(methyl methacrylate) Polymers 0.000 description 1
- 229920002857 polybutadiene Polymers 0.000 description 1
- 125000003367 polycyclic group Chemical group 0.000 description 1
- 229920001225 polyester resin Polymers 0.000 description 1
- 239000004645 polyester resin Substances 0.000 description 1
- 229920000570 polyether Polymers 0.000 description 1
- 229920001228 polyisocyanate Polymers 0.000 description 1
- 239000005056 polyisocyanate Substances 0.000 description 1
- 239000004926 polymethyl methacrylate Substances 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 125000002924 primary amino group Chemical group [H]N([H])* 0.000 description 1
- 230000008569 process Effects 0.000 description 1
- HJWLCRVIBGQPNF-UHFFFAOYSA-N prop-2-enylbenzene Chemical compound C=CCC1=CC=CC=C1 HJWLCRVIBGQPNF-UHFFFAOYSA-N 0.000 description 1
- RUOJZAUFBMNUDX-UHFFFAOYSA-N propylene carbonate Chemical compound CC1COC(=O)O1 RUOJZAUFBMNUDX-UHFFFAOYSA-N 0.000 description 1
- LLHKCFNBLRBOGN-UHFFFAOYSA-N propylene glycol methyl ether acetate Chemical compound COCC(C)OC(C)=O LLHKCFNBLRBOGN-UHFFFAOYSA-N 0.000 description 1
- 125000004805 propylene group Chemical group [H]C([H])([H])C([H])([*:1])C([H])([H])[*:2] 0.000 description 1
- 125000004742 propyloxycarbonyl group Chemical group 0.000 description 1
- 238000000746 purification Methods 0.000 description 1
- 125000003373 pyrazinyl group Chemical group 0.000 description 1
- 125000001725 pyrenyl group Chemical group 0.000 description 1
- 125000004076 pyridyl group Chemical group 0.000 description 1
- 125000000714 pyrimidinyl group Chemical group 0.000 description 1
- 125000000168 pyrrolyl group Chemical group 0.000 description 1
- 125000002294 quinazolinyl group Chemical group N1=C(N=CC2=CC=CC=C12)* 0.000 description 1
- 125000005493 quinolyl group Chemical group 0.000 description 1
- 125000001567 quinoxalinyl group Chemical group N1=C(C=NC2=CC=CC=C12)* 0.000 description 1
- 239000007870 radical polymerization initiator Substances 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 238000010992 reflux Methods 0.000 description 1
- 239000011342 resin composition Substances 0.000 description 1
- 231100000241 scar Toxicity 0.000 description 1
- 125000005930 sec-butyloxycarbonyl group Chemical group [H]C([H])([H])C([H])([H])C([H])(OC(*)=O)C([H])([H])[H] 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 238000004904 shortening Methods 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 239000000600 sorbitol Substances 0.000 description 1
- 238000001179 sorption measurement Methods 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 238000012916 structural analysis Methods 0.000 description 1
- 125000005504 styryl group Chemical group 0.000 description 1
- 229910052717 sulfur Inorganic materials 0.000 description 1
- 239000011593 sulfur Substances 0.000 description 1
- 238000010557 suspension polymerization reaction Methods 0.000 description 1
- 230000002194 synthesizing effect Effects 0.000 description 1
- 229910052714 tellurium Inorganic materials 0.000 description 1
- PORWMNRCUJJQNO-UHFFFAOYSA-N tellurium atom Chemical compound [Te] PORWMNRCUJJQNO-UHFFFAOYSA-N 0.000 description 1
- SJMYWORNLPSJQO-UHFFFAOYSA-N tert-butyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OC(C)(C)C SJMYWORNLPSJQO-UHFFFAOYSA-N 0.000 description 1
- ISXSCDLOGDJUNJ-UHFFFAOYSA-N tert-butyl prop-2-enoate Chemical compound CC(C)(C)OC(=O)C=C ISXSCDLOGDJUNJ-UHFFFAOYSA-N 0.000 description 1
- 125000005931 tert-butyloxycarbonyl group Chemical group [H]C([H])([H])C(OC(*)=O)(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- 125000001973 tert-pentyl group Chemical group [H]C([H])([H])C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- 125000001935 tetracenyl group Chemical group C1(=CC=CC2=CC3=CC4=CC=CC=C4C=C3C=C12)* 0.000 description 1
- 229940073455 tetraethylammonium hydroxide Drugs 0.000 description 1
- LRGJRHZIDJQFCL-UHFFFAOYSA-M tetraethylazanium;hydroxide Chemical compound [OH-].CC[N+](CC)(CC)CC LRGJRHZIDJQFCL-UHFFFAOYSA-M 0.000 description 1
- CZDYPVPMEAXLPK-UHFFFAOYSA-N tetramethylsilane Chemical compound C[Si](C)(C)C CZDYPVPMEAXLPK-UHFFFAOYSA-N 0.000 description 1
- 229920002803 thermoplastic polyurethane Polymers 0.000 description 1
- 125000000335 thiazolyl group Chemical group 0.000 description 1
- 210000003813 thumb Anatomy 0.000 description 1
- 125000003944 tolyl group Chemical group 0.000 description 1
- 125000002088 tosyl group Chemical group [H]C1=C([H])C(=C([H])C([H])=C1C([H])([H])[H])S(*)(=O)=O 0.000 description 1
- 231100000701 toxic element Toxicity 0.000 description 1
- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 description 1
- LDHQCZJRKDOVOX-UHFFFAOYSA-N trans-crotonic acid Natural products CC=CC(O)=O LDHQCZJRKDOVOX-UHFFFAOYSA-N 0.000 description 1
- ZOYFEXPFPVDYIS-UHFFFAOYSA-N trichloro(ethyl)silane Chemical compound CC[Si](Cl)(Cl)Cl ZOYFEXPFPVDYIS-UHFFFAOYSA-N 0.000 description 1
- DENFJSAFJTVPJR-UHFFFAOYSA-N triethoxy(ethyl)silane Chemical compound CCO[Si](CC)(OCC)OCC DENFJSAFJTVPJR-UHFFFAOYSA-N 0.000 description 1
- CPUDPFPXCZDNGI-UHFFFAOYSA-N triethoxy(methyl)silane Chemical compound CCO[Si](C)(OCC)OCC CPUDPFPXCZDNGI-UHFFFAOYSA-N 0.000 description 1
- UDUKMRHNZZLJRB-UHFFFAOYSA-N triethoxy-[2-(7-oxabicyclo[4.1.0]heptan-4-yl)ethyl]silane Chemical compound C1C(CC[Si](OCC)(OCC)OCC)CCC2OC21 UDUKMRHNZZLJRB-UHFFFAOYSA-N 0.000 description 1
- JXUKBNICSRJFAP-UHFFFAOYSA-N triethoxy-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CCO[Si](OCC)(OCC)CCCOCC1CO1 JXUKBNICSRJFAP-UHFFFAOYSA-N 0.000 description 1
- BPSIOYPQMFLKFR-UHFFFAOYSA-N trimethoxy-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CO[Si](OC)(OC)CCCOCC1CO1 BPSIOYPQMFLKFR-UHFFFAOYSA-N 0.000 description 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 239000010937 tungsten Substances 0.000 description 1
- 238000009281 ultraviolet germicidal irradiation Methods 0.000 description 1
- 239000006097 ultraviolet radiation absorber Substances 0.000 description 1
- 150000003673 urethanes Chemical class 0.000 description 1
- 230000000007 visual effect Effects 0.000 description 1
- 239000002023 wood Substances 0.000 description 1
- 229910052724 xenon Inorganic materials 0.000 description 1
- FHNFHKCVQCLJFQ-UHFFFAOYSA-N xenon atom Chemical compound [Xe] FHNFHKCVQCLJFQ-UHFFFAOYSA-N 0.000 description 1
- 125000006839 xylylene group Chemical group 0.000 description 1
Classifications
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- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D183/00—Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Coating compositions based on derivatives of such polymers
- C09D183/04—Polysiloxanes
- C09D183/06—Polysiloxanes containing silicon bound to oxygen-containing groups
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- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
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- C08G65/00—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule
- C08G65/02—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from cyclic ethers by opening of the heterocyclic ring
- C08G65/04—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from cyclic ethers by opening of the heterocyclic ring from cyclic ethers only
- C08G65/06—Cyclic ethers having no atoms other than carbon and hydrogen outside the ring
- C08G65/08—Saturated oxiranes
- C08G65/10—Saturated oxiranes characterised by the catalysts used
- C08G65/105—Onium compounds
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- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G65/00—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule
- C08G65/02—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from cyclic ethers by opening of the heterocyclic ring
- C08G65/04—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from cyclic ethers by opening of the heterocyclic ring from cyclic ethers only
- C08G65/22—Cyclic ethers having at least one atom other than carbon and hydrogen outside the ring
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- C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
- C08G77/04—Polysiloxanes
- C08G77/14—Polysiloxanes containing silicon bound to oxygen-containing groups
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- C09D183/00—Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Coating compositions based on derivatives of such polymers
- C09D183/04—Polysiloxanes
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- C09D5/00—Coating compositions, e.g. paints, varnishes or lacquers, characterised by their physical nature or the effects produced; Filling pastes
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- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L2312/00—Crosslinking
- C08L2312/06—Crosslinking by radiation
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Description
本出願は、2013年10月11日に出願された、日本国特許出願第2013−213328号明細書(その開示全体が参照により本明細書中に援用される)に基づく優先権を主張する。
項1.少なくとも1つ以上の光カチオン重合性基を含有するシルセスキオキサン化合物(a)と、ヨードニウム塩系光酸発生剤(b)と、を含む光カチオン硬化性塗料組成物であって、
該光カチオン重合性基含有シルセスキオキサン化合物(a)が、
式(I)で表される加水分解性シラン化合物及び/又は式(II)で表される加水分解性シラン化合物を加水分解縮合して得られたものであり、式(I)と式(II)で表される加水分解性シラン化合物との総量を基準に、
式(I)で表される加水分解性シラン化合物が55〜100モル%、
式(II)で表される加水分解性シラン化合物が0〜45モル%である、光カチオン硬化性塗料組成物。
R2SiX3 (II)
[式(II)は、式(I)以外の化合物であって、R2は、置換されていても良い炭素数1〜18の1価の有機基を示す。Xはハロゲン元素又は炭素数1〜6のアルコキシ基であり、3つのXはそれぞれ同一でも又は異なっていてもよい。]
項2.前記光酸発生剤(b)が、下記式(III)で表されるヨードニウム塩系光酸発生剤であることを特徴とする項1に記載の光カチオン硬化性塗料組成物。
項3.さらに、その他の光カチオン重合性基含有化合物(c)をシルセスキオキサン化合物(a)100質量部に対して、50質量部以下含有するものである項1又は2に記載の光カチオン硬化性塗料組成物。
に関する。
本明細書において「シルセスキオキサン化合物」は、Si−OH基(ヒドロキシシリル基)の全てが加水分解縮合した構造のシルセスキオキサン化合物のみを意味するのではなく、Si−OH基が残存したラダー構造、不完全籠型構造、ランダム縮合体のシルセスキオキサン化合物をも含むことができる。
R2SiX3 (II)
[式(II)は、式(I)以外の化合物であって、R2は、置換されていても良い炭素数1〜18の1価の有機基を示す。Xはハロゲン元素又は炭素数1〜6のアルコキシ基であり、3つのXはそれぞれ同一でも又は異なっていてもよい。]。
(a)成分であるシルセスキオキサン化合物は、一般的なシルセスキオキサンの製造に用いられている製造方法と従来公知の化学反応とを組み合わせることにより得ることができ、例えば、以下の製造方法を用いて製造することができる。
製造方法pとしては、光カチオン重合性基を有する加水分解性シランを出発物質として用いた製造方法が挙げられる。
前記式(I)及び前記式(II)で表される加水分解性シランの合計モル質量に対して、
前記式(I)で表される加水分解性シラン55〜100モル%と、
前記式(II)で表される加水分解性シラン0〜45モル%と、
を加水分解縮合して得られたもので、特に耐擦傷性の点から、下記範囲であることが好ましい。
本発明の光カチオン硬化性塗料組成物は、ヨードニウム塩系光酸発生剤(b)を含有する。
ヨードニウム塩系光酸発生剤(b)は、光によってカチオン(酸)を発生する化合物であり、カチオン重合の開始剤となりうる。
本発明の光カチオン硬化性塗料組成物は、さらに、その他の光カチオン重合性基含有化合物(c)を含有してもよい。
他のモノマー:0〜90質量部、好ましくは20〜80質量部。
9,10−ジメトキシアントラセン、
9,10−ジエトキシアントラセン、
9,10−ジプロポキシアントラセン、
9,10−ジイソプロポキシアントラセン、
9,10−ジブトキシアントラセン、
9,10−ジペンチルオキシアントラセン、
9,10−ジヘキシルオキシアントラセン、
9,10−ビス(2−メトキシエトキシ)アントラセン、
9,10−ビス(2−エトキシエトキシ)アントラセン、
9,10−ビス(2−ブトキシエトキシ)アントラセン、
9,10−ビス(3−ブトキシプロポキシ)アントラセン、
2−メチル−または2−エチル−9,10−ジメトキシアントラセン、
2−メチル−または2−エチル−9,10−ジエトキシアントラセン、
2−メチル−または2−エチル−9,10−ジプロポキシアントラセン、
2−メチル−または2−エチル−9,10−ジイソプロポキシアントラセン、
2−メチル−または2−エチル−9,10−ジブトキシアントラセン、
2−メチル−または2−エチル−9,10−ジペンチルオキシアントラセン、
2−メチル−または2−エチル−9,10−ジヘキシルオキシアントラセン、
等が挙げられる。
また、上記チオキサントン系増感剤の市販品としては、例えば、「KAYACURE(登録商標) DETX−S」(日本化薬社製)、「Speedcure(登録商標) ITX」、「Speedcure(登録商標) DETX」、「Speedcure(登録商標) CPTX」(以上、LAMBSON社製)等が挙げられる。
4−メトキシ−1−ナフトール、
4−エトキシ−1−ナフトール、
4−プロポキシ−1−ナフトール、
4−ブトキシ−1−ナフトール、
4−ヘキシルオキシ−1−ナフトール、
1,4−ジメトキシナフタレン、
1−エトキシ−4−メトキシナフタレン、
1,4−ジエトキシナフタレン、
1,4−ジプロポキシナフタレン、
1,4−ジブトキシナフタレン
等が挙げられる。
本発明の光カチオン硬化性塗料組成物の不揮発分は特に限定されるものではないが、塗膜の平滑性及び乾燥時間の短縮化の点から、20〜100質量%であり、さらに25〜70質量%の範囲内が好ましい。なお、本発明のカチオン硬化性塗料組成物の不揮発分は、溶剤以外の配合する全成分の質量を合計した値である。
式 HM=F/(26.43×h2)
F:試験荷重(mN)
h:押し込み深さ(μm)。
れた、指触乾燥状態及び半硬化乾燥状態をも含むものである。
本発明の光カチオン硬化性塗料組成物の塗膜形成方法は、被塗物上に、光カチオン硬化性塗料組成物を乾燥膜厚が1〜10μmとなるように塗装して、セッティングおよび/または予備加熱を施した後、光照射する。
本発明でいう光とは、太陽光、レーザー光、放射光(赤外線、可視光線、紫外線、β線、γ線、X線)などを含み、特に可視光線に限定されない。光は、光照射によってカチオン(酸)を発生させる化合物を活性化させ、また、カチオン重合反応を進行させる働きがある。
(29Si−NMR)
装置:JEOL社製 FT−NMR EX−400
溶媒:CDCl3
内部標準物質:テトラメチルシラン。
還流冷却器、温度計、空気導入管、攪拌機を取り付けたセパラブルフラスコに、メチルエチルケトン800部、脱イオン水22部、及びテトラブチルアンモニウムフルオリド0.5部を配合し、攪拌しながら溶解させた。ここに2−(3,4-エポキシシクロヘキシル)エチルトリメトキシシラン200部を投入し、40℃にて12時間反応させた。生成物をロータリーエバポレーターで濃縮し、生成物(A−1)の不揮発分50%溶液を得た。
製造例1において、各成分の配合を表1に示すものとする以外は製造例1と同様にして、実施例2〜9の不揮発分50%の生成物(A−2)〜(A−9)を得た。表1に示す各成分の配合比率はモル比であり、各生成物の重量平均分子量及びエポキシ当量も併せて示す。
(a)アクリル樹脂板:100×150mmに裁断した厚さ3mmのアクリル樹脂板(三菱レイヨン(株)社製 アクリライト(登録商標)L001、メタクリル樹脂板〔ポリメチルメタクリレートおよびメチルメタクリレートとn−ブチルアクリレートとの共重合物の含有量が88%以上〕をイソプロピルアルコールで脱脂したものを被塗物(a)とした。
(イ)被塗物に、各カチオン硬化性塗料組成物をバーコーターで硬化後の膜厚が5μmとなる条件で塗装し、60℃で30秒プレヒートして溶剤を除去した後、紫外線照射装置で、紫外線(ピークトップ波長365nm)を積算照射量100mJ/cm2となる条件で照射し、塗膜を硬化させたものを得た。
・紫外線照射装置:ベルトコンベア式UV照射装置
・ランプ:240W/cm2 高圧水銀灯(ランプ個数1個)
(ヘレウス・ノーブルライト・フュージョン・ユーブイ株式会社)
・ランプ出力:60%
・照度(紫外線積算光量計UIT(登録商標)−250、受光器UVD−C365(ウシオ電機株式会社製)で測定):140mW/cm2
・照射距離:10cm
・積算照射量(紫外線積算光量計UIT(登録商標)−250、受光器UVD−C365で測定)コンベアスピードにより調整
スピード 10m/min=積算照射量100mJ/cm2相当
(ロ)上記の塗膜形成方法(イ)のうち、使用ランプ、照射距離、積算照射量を下記のものとする以外は、塗膜形成方法(イ)と同様の方法で硬化させた。
・ランプ:192W 365nmUV−LED(ランプ個数96個)
・照度(紫外線積算光量計UIT−250、受光器UVD−C365で測定):630mW/cm2
・照射距離:1cm
・積算照射量(紫外線積算光量計UIT−250、受光器UVD−C365で測定)コンベアスピードにより調整
スピード 2m/min=積算照射量500mJ/cm2相当。
(実施例1)光カチオン硬化性塗料組成物No.1
製造例1で得られた生成物(A−1)の不揮発分50%溶液および下記式(B−1)の光酸発生剤(注1)、BYK−333(注10)を質量比で100:5:0.1となるように配合し、メチルエチルケトンで不揮発分40%まで希釈し攪拌し、光カチオン硬化性塗料組成物No.1を製造した。表2に各成分の配合量を質量比で示した。
(注1)
(注2)
(注3)
(注4)
(注5)成分C−1:セロキサイド(登録商標) 2012P(商品名、株式会社ダイセル社製、下記式C−1で表される化合物、エポキシ当量118〜145g/当量。
(注10)BYK(登録商標)−333:商品名、ビックケミー社製、ポリエーテル変性ジメチルポリシロキンサン、表面調整剤
(注11、12)マルテンス硬度および弾性回復率:
<測定方法>
各試験板のマルテンス硬度を、フィッシャースコープ(登録商標)HM200S(商品名、(株)フィッシャー・インストルメンツ社製)を用いて、23℃、50%相対湿度の雰囲気下、20mN/25秒の荷重をかけ測定した。圧子はビッカース四角錐(材質:ダイヤモンド)を用い、プリズム部1山の中央付近が圧子作用点となるようにサンプルの位置を調節した。
(1−1)速度20mN/25秒で荷重10mNに達するまで荷重を負荷。
(1−2)同速度で荷重0.4mNに達するまで除荷。
測定位置を変えながら、以上の手順を繰り返し行い、1サンプルにつき3点データを取った。
<算出方法>
上記測定方法で得られた、試験力と圧子の押込み深さとの関係よりマルテンス硬度および弾性回復率を求めた。マルテンス硬度(HM)および弾性回復率(ηIT)は、超微小硬さ試験システム付属の解析ソフトを用いて算出した。
被塗物(b)上に、実施例1で得られた光カチオン硬化性塗料組成物No.1を塗装し、前記塗膜形成方法(イ)の方法により硬化させた塗装シートを、硬化後30分以内に23℃、50%相対湿度の雰囲気下に1時間放置したものを試験サンプルとし、各種評価に供した。評価結果を表3に示す。
実施例19において、被塗物、塗膜形成方法、硬化膜厚を表3に記載のものとする以外は、実施例19と同様に、試験サンプルを作成し、各種評価に供した。評価結果を表3に示す。表中注は下記のとおりである。
JIS K 5600−5−6(1990)に準じて素地に達するまで塗膜に1mm×1mmのゴバン目100個を作り、その面に粘着テープを貼着し、急激に剥がした後に、塗面に残ったゴバン目積層膜の数を評価した。
S :残存個数/全体個数=100個/100個で縁欠けなし
AA :残存個数/全体個数=100個/100個で縁欠け5個以下である
B :残存個数/全体個数=99個〜90個/100個、
又は100個/100個で縁欠け6個以上
C :残存個数/全体個数=89個以下/100個。
各試験サンプルの外観(目視)と、着色性を評価した。外観は、塗膜のにごり、ワレ等異常の有無を確認した。にごり、ワレ等異常のない塗膜をAAとした。にごり、ワレ等異常のある塗膜をBとする。
各塗装シートの中央部分を10cm角に切り出して測定用試料とした。評価は4隅の反りを定規で計測し、その4点の合計を各試験サンプルにおけるカール値とした。
数値が小さいほど良好な値である。
S :5mm未満
AA :5mm以上20mm未満
B :20mm以上50mm未満
C :50mm以上
なお、被塗物がガラス板の場合は測定していない。
スチールウール法:各試験サンプルの塗膜面に市販のスチールウール(#0000)を荷重1000gで50往復擦り、塗膜を目視で観察し下記の基準に従って評価した。耐擦傷性がよいため、傷の個数で評価した。
S :ワレ、剥がれがない、若しくは傷がまったくない
AA :ワレ、剥がれがない、若しくは傷の数が5個未満である
A:ワレ、剥がれがない、若しくは傷が5個以上10個未満認められるが実用上問題ない
B :ワレ、剥がれがない、若しくは傷が10個以上20個未満認められる
C :ワレ、剥がれ、若しくは著しい傷等が認められる。
Claims (6)
- 被塗物上に、下記の光カチオン硬化塗料組成物をハードコート剤として塗装して、セッティングおよび/または予備加熱を施した後、光照射することを特徴とする塗膜形成方法。
シルセスキオキサン化合物(a)と、ヨードニウム塩系光酸発生剤(b)とを含む光カチオン硬化性塗料組成物であって、
該シルセスキオキサン化合物(a)が、式(I)で表される加水分解性シラン化合物及び式(II)で表される加水分解性シラン化合物の混合物を加水分解縮合して得られたものであり、該式(I)で表される加水分解性シラン化合物及び式(II)で表される加水分解性シラン化合物の混合物の配合割合が、式(I)と式(II)で表される加水分解性シラン化合物との総量を基準に、
式(I)で表される加水分解性シラン化合物が55モル%以上100モル%未満、
式(II)で表される加水分解性シラン化合物が45モル%以下であり、
R2SiX3 (II)
[式(II)中、R2は、置換されていても良い炭素数1〜18の1価の有機基を示す。Xはハロゲン元素又は炭素数1〜6のアルコキシ基であり、3つのXはそれぞれ同一でも又は異なっていてもよい。ただし、式(I)で表わされる化合物を除く]
前記ヨードニウム塩系光酸発生剤(b)が、下記式(III)で表されるヨードニウム塩系光酸発生剤である、光カチオン硬化性塗料組成物。
- 該シルセスキオキサン化合物(a)のエポキシ当量が、10〜500g/当量である請求項1に記載の塗膜形成方法。
- 前記光カチオン硬化性塗料組成物が、さらに、前記シルセスキオキサン化合物(a)以外の化合物であるその他の光カチオン重合性基含有化合物(c)を含有し、前記その他の光カチオン重合性基含有化合物(c)をシルセスキオキサン化合物(a)100質量部に対して、50質量部以下含有するものである請求項1又は2に記載の塗膜形成方法。
- 前記光カチオン硬化性塗料組成物が、さらに、増感剤(d)を含有する請求項1〜3のいずれか1項に記載の塗膜形成方法。
- 厚さ3mmのアクリル樹脂板上に膜厚5μmの硬化塗膜を形成したときの塗膜表面を超微小硬さ試験装置により温度23℃・荷重20mN下で測定したマルテンス硬度が、0.5〜350N/mm2となる塗膜を形成できる請求項1〜4のいずれか1項に記載の塗膜形成方法。
- 前記光カチオン硬化性塗料組成物を乾燥膜厚が1〜10μmとなるように塗装する請求項1〜5のいずれか1項に記載の塗膜形成方法。
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JP2011006610A (ja) * | 2009-06-26 | 2011-01-13 | Nagase Chemtex Corp | 透明複合体 |
JP2011079927A (ja) * | 2009-10-06 | 2011-04-21 | Nagase Chemtex Corp | 透明複合材 |
JP5740893B2 (ja) * | 2010-05-12 | 2015-07-01 | ナガセケムテックス株式会社 | ハードコート用組成物、ハードコートフィルム及び表示デバイス |
JP2012022227A (ja) * | 2010-07-16 | 2012-02-02 | San Apro Kk | フッ素化アルキルリン酸ヨードニウム系光酸発生剤含有エネルギー線硬化性組成物 |
JP2012116989A (ja) * | 2010-12-02 | 2012-06-21 | Nagase Chemtex Corp | 樹脂レンズ及び光学樹脂組成物 |
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