JP6398310B2 - ネガ型感光性樹脂組成物、電子装置、ネガ型感光性ポリマーの製造方法、およびネガ型感光性樹脂組成物の製造方法 - Google Patents

ネガ型感光性樹脂組成物、電子装置、ネガ型感光性ポリマーの製造方法、およびネガ型感光性樹脂組成物の製造方法 Download PDF

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JP6398310B2
JP6398310B2 JP2014101826A JP2014101826A JP6398310B2 JP 6398310 B2 JP6398310 B2 JP 6398310B2 JP 2014101826 A JP2014101826 A JP 2014101826A JP 2014101826 A JP2014101826 A JP 2014101826A JP 6398310 B2 JP6398310 B2 JP 6398310B2
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negative photosensitive
resin composition
photosensitive resin
group
polymer
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JP2015007762A (ja
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大西　治
治 大西
陽雄 池田
陽雄 池田
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Sumitomo Bakelite Co Ltd
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Sumitomo Bakelite Co Ltd
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G02B5/201—Filters in the form of arrays
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G03F7/0226—Quinonediazides characterised by the non-macromolecular additives
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
    • G03F7/0233—Macromolecular quinonediazides; Macromolecular additives, e.g. binders characterised by the polymeric binders or the macromolecular additives other than the macromolecular quinonediazides
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/075—Silicon-containing compounds
    • G03F7/0757—Macromolecular compounds containing Si-O, Si-C or Si-N bonds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/085—Photosensitive compositions characterised by adhesion-promoting non-macromolecular additives

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Optics & Photonics (AREA)
  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials For Photolithography (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
JP2014101826A 2013-05-29 2014-05-15 ネガ型感光性樹脂組成物、電子装置、ネガ型感光性ポリマーの製造方法、およびネガ型感光性樹脂組成物の製造方法 Active JP6398310B2 (ja)

Priority Applications (1)

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JP2014101826A JP6398310B2 (ja) 2013-05-29 2014-05-15 ネガ型感光性樹脂組成物、電子装置、ネガ型感光性ポリマーの製造方法、およびネガ型感光性樹脂組成物の製造方法

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2013113407 2013-05-29
JP2013113407 2013-05-29
JP2014101826A JP6398310B2 (ja) 2013-05-29 2014-05-15 ネガ型感光性樹脂組成物、電子装置、ネガ型感光性ポリマーの製造方法、およびネガ型感光性樹脂組成物の製造方法

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JP2015007762A JP2015007762A (ja) 2015-01-15
JP6398310B2 true JP6398310B2 (ja) 2018-10-03

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JP (1) JP6398310B2 (zh)
KR (1) KR102262621B1 (zh)
CN (1) CN104216228B (zh)
TW (1) TWI636330B (zh)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN107615167A (zh) * 2015-05-29 2018-01-19 住友电木株式会社 着色感光性树脂组合物、着色图案或黑矩阵、滤色器、液晶显示装置或固体摄像元件和滤色器的制造方法
WO2017033633A1 (ja) * 2015-08-21 2017-03-02 住友ベークライト株式会社 樹脂組成物、感光性樹脂組成物、樹脂膜および電子装置
JP6661929B2 (ja) * 2015-09-15 2020-03-11 住友ベークライト株式会社 ネガ型感光性樹脂組成物、樹脂膜および電子装置
KR20180122381A (ko) * 2016-03-08 2018-11-12 스미또모 베이크라이트 가부시키가이샤 폴리머의 제조 방법, 네거티브형 감광성 수지 조성물의 제조 방법, 수지막의 제조 방법, 전자 장치의 제조 방법 및 폴리머
SG11201807874YA (en) 2016-03-28 2018-10-30 Toray Industries Photosensitive resin composition
WO2018131351A1 (ja) * 2017-01-10 2018-07-19 住友ベークライト株式会社 ネガ型感光性樹脂組成物、樹脂膜及び電子装置
JP6332583B1 (ja) * 2017-01-10 2018-05-30 住友ベークライト株式会社 ネガ型感光性樹脂組成物、樹脂膜及び電子装置
TWI732111B (zh) * 2017-03-28 2021-07-01 日商住友電木股份有限公司 感光性組成物、彩色濾光片及由其衍生之微透鏡
JP2019095581A (ja) * 2017-11-22 2019-06-20 住友ベークライト株式会社 感光性樹脂組成物、感光性樹脂組成物溶液および電子装置
JP7200532B2 (ja) * 2018-08-09 2023-01-10 住友ベークライト株式会社 感光性樹脂組成物、及び、電子装置
CN114450318A (zh) * 2019-09-26 2022-05-06 住友电木株式会社 聚合物、感光性树脂组合物、树脂膜和电子装置

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02146045A (ja) 1988-02-17 1990-06-05 Tosoh Corp フォトレジスト組成物
JP2001125272A (ja) * 1999-10-28 2001-05-11 Fuji Photo Film Co Ltd ポジ型フォトレジスト組成物
KR100546105B1 (ko) * 1999-11-03 2006-01-24 주식회사 하이닉스반도체 신규의 포토레지스트용 중합체 및 이를 함유하는포토레지스트 조성물
JP2001183521A (ja) * 1999-12-27 2001-07-06 Hitachi Chem Co Ltd カラーフィルター保護膜の製造法及びカラーフィルター
JP2006243564A (ja) * 2005-03-04 2006-09-14 Fuji Photo Film Co Ltd 感光性組成物及び感光性フィルム、並びに、永久パターン及びその形成方法
JP2007206165A (ja) * 2006-01-31 2007-08-16 Sumitomo Chemical Co Ltd 着色感光性樹脂組成物
JP2008180992A (ja) * 2007-01-25 2008-08-07 Hitachi Chem Co Ltd 感光性樹脂組成物、永久レジスト用感光性フィルム、レジストパターンの形成方法、プリント配線板及び半導体パッケージ
CN102844712B (zh) * 2010-04-13 2015-01-07 昭和电工株式会社 加成共聚物、感光性树脂组合物以及滤色器

Also Published As

Publication number Publication date
CN104216228B (zh) 2019-11-19
KR20140140496A (ko) 2014-12-09
TW201510656A (zh) 2015-03-16
TWI636330B (zh) 2018-09-21
JP2015007762A (ja) 2015-01-15
CN104216228A (zh) 2014-12-17
KR102262621B1 (ko) 2021-06-08

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