JP6392143B2 - 基板処理装置、基板処理方法および基板処理方法を実行させるプログラムが記録された記憶媒体 - Google Patents

基板処理装置、基板処理方法および基板処理方法を実行させるプログラムが記録された記憶媒体 Download PDF

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JP6392143B2
JP6392143B2 JP2015034263A JP2015034263A JP6392143B2 JP 6392143 B2 JP6392143 B2 JP 6392143B2 JP 2015034263 A JP2015034263 A JP 2015034263A JP 2015034263 A JP2015034263 A JP 2015034263A JP 6392143 B2 JP6392143 B2 JP 6392143B2
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gas
processing chamber
exhaust
cup
chamber
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JP2016157802A5 (enExample
JP2016157802A (ja
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田 純 也 南
田 純 也 南
浦 一 博 相
浦 一 博 相
圭 祐 津賀尾
圭 祐 津賀尾
中 満 雄 田
中 満 雄 田
本 誠 也 藤
本 誠 也 藤
川 裕 基 米
川 裕 基 米
嶋 寧 子 亀
嶋 寧 子 亀
塚 貴 久 大
塚 貴 久 大
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Tokyo Electron Ltd
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Tokyo Electron Ltd
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Priority to KR1020160016976A priority patent/KR102472315B1/ko
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JP2015034263A 2015-02-24 2015-02-24 基板処理装置、基板処理方法および基板処理方法を実行させるプログラムが記録された記憶媒体 Active JP6392143B2 (ja)

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JP2015034263A JP6392143B2 (ja) 2015-02-24 2015-02-24 基板処理装置、基板処理方法および基板処理方法を実行させるプログラムが記録された記憶媒体
KR1020160016976A KR102472315B1 (ko) 2015-02-24 2016-02-15 기판 처리 장치, 기판 처리 방법 및 기판 처리 방법을 실행시키는 프로그램이 기록된 기억 매체

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JP2015034263A JP6392143B2 (ja) 2015-02-24 2015-02-24 基板処理装置、基板処理方法および基板処理方法を実行させるプログラムが記録された記憶媒体

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JP2016157802A JP2016157802A (ja) 2016-09-01
JP2016157802A5 JP2016157802A5 (enExample) 2017-03-23
JP6392143B2 true JP6392143B2 (ja) 2018-09-19

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Families Citing this family (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7023065B2 (ja) * 2016-09-13 2022-02-21 株式会社Ｓｃｒｅｅｎホールディングス 基板処理装置
WO2018051825A1 (ja) * 2016-09-13 2018-03-22 株式会社Ｓｃｒｅｅｎホールディングス 基板処理装置
JP6710178B2 (ja) * 2017-04-27 2020-06-17 三菱電機株式会社 半導体製造装置
CN110137121B (zh) * 2018-02-09 2024-03-26 东京毅力科创株式会社 基板处理装置
JP7358044B2 (ja) * 2018-02-09 2023-10-10 東京エレクトロン株式会社 基板処理装置
JP7175782B2 (ja) * 2019-01-25 2022-11-21 株式会社東芝 ケイ素含有物質形成装置
JP7307575B2 (ja) * 2019-03-28 2023-07-12 株式会社Ｓｃｒｅｅｎホールディングス 基板処理装置および基板処理方法
JP7315389B2 (ja) * 2019-06-28 2023-07-26 株式会社Ｓｃｒｅｅｎホールディングス 基板処理装置および基板処理方法
KR102351341B1 (ko) * 2019-12-09 2022-01-18 무진전자 주식회사 팬 필터 유닛 및 이를 포함하는 기판 처리 장치
KR102835069B1 (ko) * 2020-04-16 2025-07-17 주식회사 제우스 기판 처리장치 및 기판 처리방법
NL2025916B1 (en) * 2020-06-25 2022-02-21 Suss Microtec Lithography Gmbh Wet Process Module and Method of Operation
KR102388473B1 (ko) * 2020-08-11 2022-04-20 (주)마스 클린 건조 공기 셔터 팬 필터 유닛
KR102421628B1 (ko) * 2020-12-16 2022-07-15 주식회사 디엠에스 댐퍼시스템, 이를 포함한 기판처리장치 및 기판처리방법
KR102723924B1 (ko) * 2021-02-15 2024-10-30 세메스 주식회사 기판 처리 장치 및 기판 처리 방법
KR20250100684A (ko) * 2022-12-26 2025-07-03 가부시키가이샤 스크린 홀딩스 기판 처리 장치, 기판 처리 방법, 기판 처리 시스템의 급배기 구조 및 급배기 방법
CN119525067B (zh) * 2024-11-06 2025-12-30 泉芯半导体科技(无锡)有限公司 一种旋喷式晶圆湿法处理一体机

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0613383A (ja) * 1992-01-24 1994-01-21 Taiyo Sanso Co Ltd バンプ形成用基板の再生処理方法及び再生処理装置
JP3352865B2 (ja) * 1995-11-24 2002-12-03 大日本スクリーン製造株式会社 基板処理装置
JP3453519B2 (ja) * 1998-06-26 2003-10-06 稔 小笠原 低湿乾燥方式の乾燥装置
JP4578531B2 (ja) 2008-02-01 2010-11-10 東京エレクトロン株式会社 基板処理方法，記録媒体及び基板処理装置
JP5484136B2 (ja) * 2010-03-11 2014-05-07 大日本スクリーン製造株式会社 基板処理装置
JP6005588B2 (ja) * 2013-05-31 2016-10-12 東京エレクトロン株式会社 液処理装置

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KR102472315B1 (ko) 2022-11-29
JP2016157802A (ja) 2016-09-01
KR20160103511A (ko) 2016-09-01

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