KR102472315B1 - 기판 처리 장치, 기판 처리 방법 및 기판 처리 방법을 실행시키는 프로그램이 기록된 기억 매체 - Google Patents

기판 처리 장치, 기판 처리 방법 및 기판 처리 방법을 실행시키는 프로그램이 기록된 기억 매체 Download PDF

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KR102472315B1
KR102472315B1 KR1020160016976A KR20160016976A KR102472315B1 KR 102472315 B1 KR102472315 B1 KR 102472315B1 KR 1020160016976 A KR1020160016976 A KR 1020160016976A KR 20160016976 A KR20160016976 A KR 20160016976A KR 102472315 B1 KR102472315 B1 KR 102472315B1
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gas
processing chamber
cup
passage
exhaust
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KR20160103511A (ko
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준야 미나미다
가즈히로 아이우라
게이스케 츠가오
미츠오 다나카
세이야 후지모토
히로키 요네카와
야스코 가메시마
다카히사 오츠카
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도쿄엘렉트론가부시키가이샤
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    • H01L21/02046—
    • H01L21/02052—
    • H01L21/02054—
    • H01L21/67034—
    • H01L21/6704—
    • H01L2021/60187—

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KR1020160016976A 2015-02-24 2016-02-15 기판 처리 장치, 기판 처리 방법 및 기판 처리 방법을 실행시키는 프로그램이 기록된 기억 매체 Active KR102472315B1 (ko)

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JP2015034263A JP6392143B2 (ja) 2015-02-24 2015-02-24 基板処理装置、基板処理方法および基板処理方法を実行させるプログラムが記録された記憶媒体
JPJP-P-2015-034263 2015-02-24

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KR20160103511A KR20160103511A (ko) 2016-09-01
KR102472315B1 true KR102472315B1 (ko) 2022-11-29

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Families Citing this family (16)

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Publication number Priority date Publication date Assignee Title
JP7023065B2 (ja) * 2016-09-13 2022-02-21 株式会社Ｓｃｒｅｅｎホールディングス 基板処理装置
WO2018051825A1 (ja) * 2016-09-13 2018-03-22 株式会社Ｓｃｒｅｅｎホールディングス 基板処理装置
JP6710178B2 (ja) * 2017-04-27 2020-06-17 三菱電機株式会社 半導体製造装置
CN110137121B (zh) * 2018-02-09 2024-03-26 东京毅力科创株式会社 基板处理装置
JP7358044B2 (ja) * 2018-02-09 2023-10-10 東京エレクトロン株式会社 基板処理装置
JP7175782B2 (ja) * 2019-01-25 2022-11-21 株式会社東芝 ケイ素含有物質形成装置
JP7307575B2 (ja) * 2019-03-28 2023-07-12 株式会社Ｓｃｒｅｅｎホールディングス 基板処理装置および基板処理方法
JP7315389B2 (ja) * 2019-06-28 2023-07-26 株式会社Ｓｃｒｅｅｎホールディングス 基板処理装置および基板処理方法
KR102351341B1 (ko) * 2019-12-09 2022-01-18 무진전자 주식회사 팬 필터 유닛 및 이를 포함하는 기판 처리 장치
KR102835069B1 (ko) * 2020-04-16 2025-07-17 주식회사 제우스 기판 처리장치 및 기판 처리방법
NL2025916B1 (en) * 2020-06-25 2022-02-21 Suss Microtec Lithography Gmbh Wet Process Module and Method of Operation
KR102388473B1 (ko) * 2020-08-11 2022-04-20 (주)마스 클린 건조 공기 셔터 팬 필터 유닛
KR102421628B1 (ko) * 2020-12-16 2022-07-15 주식회사 디엠에스 댐퍼시스템, 이를 포함한 기판처리장치 및 기판처리방법
KR102723924B1 (ko) * 2021-02-15 2024-10-30 세메스 주식회사 기판 처리 장치 및 기판 처리 방법
KR20250100684A (ko) * 2022-12-26 2025-07-03 가부시키가이샤 스크린 홀딩스 기판 처리 장치, 기판 처리 방법, 기판 처리 시스템의 급배기 구조 및 급배기 방법
CN119525067B (zh) * 2024-11-06 2025-12-30 泉芯半导体科技(无锡)有限公司 一种旋喷式晶圆湿法处理一体机

Citations (1)

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Publication number Priority date Publication date Assignee Title
JP2011187851A (ja) * 2010-03-11 2011-09-22 Dainippon Screen Mfg Co Ltd 基板処理装置

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JPH0613383A (ja) * 1992-01-24 1994-01-21 Taiyo Sanso Co Ltd バンプ形成用基板の再生処理方法及び再生処理装置
JP3352865B2 (ja) * 1995-11-24 2002-12-03 大日本スクリーン製造株式会社 基板処理装置
JP3453519B2 (ja) * 1998-06-26 2003-10-06 稔 小笠原 低湿乾燥方式の乾燥装置
JP4578531B2 (ja) 2008-02-01 2010-11-10 東京エレクトロン株式会社 基板処理方法，記録媒体及び基板処理装置
JP6005588B2 (ja) * 2013-05-31 2016-10-12 東京エレクトロン株式会社 液処理装置

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2011187851A (ja) * 2010-03-11 2011-09-22 Dainippon Screen Mfg Co Ltd 基板処理装置

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KR20160103511A (ko) 2016-09-01
JP6392143B2 (ja) 2018-09-19

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