JP6328052B2 - 情報記録媒体用ガラス基板の製造方法、情報記録媒体の製造方法および研磨パッド - Google Patents
情報記録媒体用ガラス基板の製造方法、情報記録媒体の製造方法および研磨パッド Download PDFInfo
- Publication number
- JP6328052B2 JP6328052B2 JP2014536623A JP2014536623A JP6328052B2 JP 6328052 B2 JP6328052 B2 JP 6328052B2 JP 2014536623 A JP2014536623 A JP 2014536623A JP 2014536623 A JP2014536623 A JP 2014536623A JP 6328052 B2 JP6328052 B2 JP 6328052B2
- Authority
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- Japan
- Prior art keywords
- glass substrate
- polishing
- polishing pad
- information recording
- surface plate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Links
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- 239000011521 glass Substances 0.000 title claims description 241
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- 238000000034 method Methods 0.000 title claims description 38
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- 238000009825 accumulation Methods 0.000 description 14
- 238000007689 inspection Methods 0.000 description 14
- 238000007517 polishing process Methods 0.000 description 14
- 238000003426 chemical strengthening reaction Methods 0.000 description 13
- 239000011241 protective layer Substances 0.000 description 9
- 239000010408 film Substances 0.000 description 7
- 230000002093 peripheral effect Effects 0.000 description 7
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 6
- 239000006061 abrasive grain Substances 0.000 description 6
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 5
- 239000002585 base Substances 0.000 description 4
- 230000015572 biosynthetic process Effects 0.000 description 4
- 229910052804 chromium Inorganic materials 0.000 description 4
- 238000004544 sputter deposition Methods 0.000 description 4
- 229910000943 NiAl Inorganic materials 0.000 description 3
- NPXOKRUENSOPAO-UHFFFAOYSA-N Raney nickel Chemical compound [Al].[Ni] NPXOKRUENSOPAO-UHFFFAOYSA-N 0.000 description 3
- 230000000274 adsorptive effect Effects 0.000 description 3
- 229910045601 alloy Inorganic materials 0.000 description 3
- 239000000956 alloy Substances 0.000 description 3
- 239000005354 aluminosilicate glass Substances 0.000 description 3
- 229910000420 cerium oxide Inorganic materials 0.000 description 3
- 238000007772 electroless plating Methods 0.000 description 3
- 150000002500 ions Chemical class 0.000 description 3
- BMMGVYCKOGBVEV-UHFFFAOYSA-N oxo(oxoceriooxy)cerium Chemical compound [Ce]=O.O=[Ce]=O BMMGVYCKOGBVEV-UHFFFAOYSA-N 0.000 description 3
- 238000002360 preparation method Methods 0.000 description 3
- 238000004528 spin coating Methods 0.000 description 3
- 230000003746 surface roughness Effects 0.000 description 3
- 229910001149 41xx steel Inorganic materials 0.000 description 2
- 229910000599 Cr alloy Inorganic materials 0.000 description 2
- CBENFWSGALASAD-UHFFFAOYSA-N Ozone Chemical compound [O-][O+]=O CBENFWSGALASAD-UHFFFAOYSA-N 0.000 description 2
- 229910004298 SiO 2 Inorganic materials 0.000 description 2
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 description 2
- 229910001413 alkali metal ion Inorganic materials 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 2
- 230000015556 catabolic process Effects 0.000 description 2
- 239000008119 colloidal silica Substances 0.000 description 2
- 229910003460 diamond Inorganic materials 0.000 description 2
- 239000010432 diamond Substances 0.000 description 2
- 239000005357 flat glass Substances 0.000 description 2
- 239000000314 lubricant Substances 0.000 description 2
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- 238000003754 machining Methods 0.000 description 2
- 229910052759 nickel Inorganic materials 0.000 description 2
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- 239000002245 particle Substances 0.000 description 2
- 239000010702 perfluoropolyether Substances 0.000 description 2
- 229920002635 polyurethane Polymers 0.000 description 2
- 239000004814 polyurethane Substances 0.000 description 2
- FGIUAXJPYTZDNR-UHFFFAOYSA-N potassium nitrate Chemical compound [K+].[O-][N+]([O-])=O FGIUAXJPYTZDNR-UHFFFAOYSA-N 0.000 description 2
- 239000002356 single layer Substances 0.000 description 2
- VWDWKYIASSYTQR-UHFFFAOYSA-N sodium nitrate Chemical compound [Na+].[O-][N+]([O-])=O VWDWKYIASSYTQR-UHFFFAOYSA-N 0.000 description 2
- 238000005406 washing Methods 0.000 description 2
- 229910018072 Al 2 O 3 Inorganic materials 0.000 description 1
- 238000012935 Averaging Methods 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- 229910019222 CoCrPt Inorganic materials 0.000 description 1
- 229910005335 FePt Inorganic materials 0.000 description 1
- 229910018068 Li 2 O Inorganic materials 0.000 description 1
- HBBGRARXTFLTSG-UHFFFAOYSA-N Lithium ion Chemical compound [Li+] HBBGRARXTFLTSG-UHFFFAOYSA-N 0.000 description 1
- 238000006124 Pilkington process Methods 0.000 description 1
- 229920005830 Polyurethane Foam Polymers 0.000 description 1
- 239000005456 alcohol based solvent Substances 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 229910052796 boron Inorganic materials 0.000 description 1
- 150000001721 carbon Chemical class 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 230000015271 coagulation Effects 0.000 description 1
- 238000005345 coagulation Methods 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 238000005520 cutting process Methods 0.000 description 1
- 230000002950 deficient Effects 0.000 description 1
- 239000003599 detergent Substances 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 230000002542 deteriorative effect Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000007865 diluting Methods 0.000 description 1
- 238000003280 down draw process Methods 0.000 description 1
- 239000010419 fine particle Substances 0.000 description 1
- 238000007667 floating Methods 0.000 description 1
- 230000004907 flux Effects 0.000 description 1
- 238000005342 ion exchange Methods 0.000 description 1
- 229910001416 lithium ion Inorganic materials 0.000 description 1
- 239000010687 lubricating oil Substances 0.000 description 1
- 239000000696 magnetic material Substances 0.000 description 1
- 239000006249 magnetic particle Substances 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 239000006060 molten glass Substances 0.000 description 1
- 229910052750 molybdenum Inorganic materials 0.000 description 1
- 238000000465 moulding Methods 0.000 description 1
- 239000011496 polyurethane foam Substances 0.000 description 1
- 239000011148 porous material Substances 0.000 description 1
- 229910001414 potassium ion Inorganic materials 0.000 description 1
- 235000010333 potassium nitrate Nutrition 0.000 description 1
- 239000004323 potassium nitrate Substances 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 229910052814 silicon oxide Inorganic materials 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- 239000011734 sodium Substances 0.000 description 1
- 229910001415 sodium ion Inorganic materials 0.000 description 1
- 235000010344 sodium nitrate Nutrition 0.000 description 1
- 239000004317 sodium nitrate Substances 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 239000008400 supply water Substances 0.000 description 1
- 229910052715 tantalum Inorganic materials 0.000 description 1
- 229920001187 thermosetting polymer Polymers 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 229910052720 vanadium Inorganic materials 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Images
Classifications
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/84—Processes or apparatus specially adapted for manufacturing record carriers
- G11B5/8404—Processes or apparatus specially adapted for manufacturing record carriers manufacturing base layers
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B37/00—Lapping machines or devices; Accessories
- B24B37/11—Lapping tools
- B24B37/20—Lapping pads for working plane surfaces
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Mechanical Engineering (AREA)
- Manufacturing Of Magnetic Record Carriers (AREA)
- Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
- Grinding And Polishing Of Tertiary Curved Surfaces And Surfaces With Complex Shapes (AREA)
- Grinding Of Cylindrical And Plane Surfaces (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2012206985 | 2012-09-20 | ||
| JP2012206985 | 2012-09-20 | ||
| PCT/JP2013/066705 WO2014045653A1 (fr) | 2012-09-20 | 2013-06-18 | Procédé de fabrication de substrat de verre pour support d'enregistrement d'informations |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPWO2014045653A1 JPWO2014045653A1 (ja) | 2016-08-18 |
| JP6328052B2 true JP6328052B2 (ja) | 2018-05-23 |
Family
ID=50340984
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2014536623A Active JP6328052B2 (ja) | 2012-09-20 | 2013-06-18 | 情報記録媒体用ガラス基板の製造方法、情報記録媒体の製造方法および研磨パッド |
Country Status (5)
| Country | Link |
|---|---|
| JP (1) | JP6328052B2 (fr) |
| CN (1) | CN104603877B (fr) |
| MY (1) | MY175952A (fr) |
| SG (2) | SG10201705207SA (fr) |
| WO (1) | WO2014045653A1 (fr) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2018012468A1 (fr) * | 2016-07-12 | 2018-01-18 | 株式会社ノリタケカンパニーリミテド | Corps de polissage et son procédé de fabrication |
Family Cites Families (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2002092867A (ja) * | 2000-09-21 | 2002-03-29 | Hoya Corp | 情報記録媒体用ガラス基板の製造方法及び情報記録媒体の製造方法 |
| US6802955B2 (en) * | 2002-01-11 | 2004-10-12 | Speedfam-Ipec Corporation | Method and apparatus for the electrochemical deposition and planarization of a material on a workpiece surface |
| JP4448766B2 (ja) * | 2004-12-08 | 2010-04-14 | 信越化学工業株式会社 | 研磨方法 |
| JP5242903B2 (ja) * | 2006-09-29 | 2013-07-24 | 帝人コードレ株式会社 | 研磨布の製造方法 |
| KR101146966B1 (ko) * | 2007-02-01 | 2012-05-23 | 가부시키가이샤 구라레 | 연마 패드 및 연마 패드의 제조 방법 |
| KR20100028294A (ko) * | 2008-09-04 | 2010-03-12 | 주식회사 코오롱 | 연마패드 및 그의 제조방법 |
| JP5421635B2 (ja) * | 2009-03-30 | 2014-02-19 | 富士紡ホールディングス株式会社 | 研磨パッド |
| JP5184448B2 (ja) * | 2009-06-23 | 2013-04-17 | 富士紡ホールディングス株式会社 | 研磨パッド、その製造方法および研磨加工方法 |
| JP2011025343A (ja) * | 2009-07-24 | 2011-02-10 | Toray Ind Inc | 研磨パッドの製造方法 |
| JP2010042508A (ja) * | 2009-11-25 | 2010-02-25 | Shin-Etsu Chemical Co Ltd | 研磨方法 |
| JP5598371B2 (ja) * | 2011-02-21 | 2014-10-01 | 旭硝子株式会社 | ガラス基板の研磨方法 |
-
2013
- 2013-06-18 SG SG10201705207SA patent/SG10201705207SA/en unknown
- 2013-06-18 WO PCT/JP2013/066705 patent/WO2014045653A1/fr active Application Filing
- 2013-06-18 JP JP2014536623A patent/JP6328052B2/ja active Active
- 2013-06-18 SG SG11201501490WA patent/SG11201501490WA/en unknown
- 2013-06-18 CN CN201380045143.8A patent/CN104603877B/zh active Active
- 2013-06-18 MY MYPI2015700624A patent/MY175952A/en unknown
Also Published As
| Publication number | Publication date |
|---|---|
| SG10201705207SA (en) | 2017-07-28 |
| SG11201501490WA (en) | 2015-04-29 |
| JPWO2014045653A1 (ja) | 2016-08-18 |
| CN104603877A (zh) | 2015-05-06 |
| MY175952A (en) | 2020-07-16 |
| WO2014045653A1 (fr) | 2014-03-27 |
| CN104603877B (zh) | 2018-06-26 |
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