JP6321912B2 - 基板の洗浄処理装置及び洗浄処理方法 - Google Patents
基板の洗浄処理装置及び洗浄処理方法 Download PDFInfo
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- JP6321912B2 JP6321912B2 JP2013072364A JP2013072364A JP6321912B2 JP 6321912 B2 JP6321912 B2 JP 6321912B2 JP 2013072364 A JP2013072364 A JP 2013072364A JP 2013072364 A JP2013072364 A JP 2013072364A JP 6321912 B2 JP6321912 B2 JP 6321912B2
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| Application Number | Priority Date | Filing Date | Title |
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| JP2013072364A JP6321912B2 (ja) | 2013-03-29 | 2013-03-29 | 基板の洗浄処理装置及び洗浄処理方法 |
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| JP2013072364A JP6321912B2 (ja) | 2013-03-29 | 2013-03-29 | 基板の洗浄処理装置及び洗浄処理方法 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2014195765A JP2014195765A (ja) | 2014-10-16 |
| JP2014195765A5 JP2014195765A5 (https=) | 2016-05-19 |
| JP6321912B2 true JP6321912B2 (ja) | 2018-05-09 |
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| JP2013072364A Active JP6321912B2 (ja) | 2013-03-29 | 2013-03-29 | 基板の洗浄処理装置及び洗浄処理方法 |
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Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP7772562B2 (ja) * | 2021-11-15 | 2025-11-18 | 株式会社ディスコ | 研削装置、及び加工装置 |
| CN115007520B (zh) * | 2022-06-19 | 2023-09-08 | 上饶市盛祥光学有限公司 | 一种光学加工零部件的清洁设备 |
Family Cites Families (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2942992B2 (ja) * | 1989-10-05 | 1999-08-30 | ノードソン株式会社 | 洗浄方法 |
| JPH04240749A (ja) * | 1991-01-25 | 1992-08-28 | Toshiba Corp | ダイシング装置 |
| JP3704411B2 (ja) * | 1996-12-26 | 2005-10-12 | 富士通株式会社 | 基板処理方法及び処理装置 |
| JP2001044467A (ja) * | 1999-07-29 | 2001-02-16 | Kanegafuchi Chem Ind Co Ltd | 集積型薄膜太陽電池の洗浄装置 |
| JP3816734B2 (ja) * | 2000-09-13 | 2006-08-30 | 東京エレクトロン株式会社 | 基板洗浄装置 |
| JP3333778B2 (ja) * | 2000-11-09 | 2002-10-15 | 不二越機械工業株式会社 | 研磨定盤の洗浄方法及びその洗浄装置 |
| US6949146B2 (en) * | 2002-04-30 | 2005-09-27 | Asm Assembly Automation Ltd | Ultrasonic cleaning module for singulated electronic packages |
| JP4429231B2 (ja) * | 2005-08-01 | 2010-03-10 | 大日本スクリーン製造株式会社 | 基板洗浄方法および基板洗浄装置 |
| JP2006148154A (ja) * | 2006-01-13 | 2006-06-08 | Hitachi Chem Co Ltd | 接着シート及び半導体装置の製造方法 |
| JP2008060284A (ja) * | 2006-08-31 | 2008-03-13 | Matsushita Electric Ind Co Ltd | 半導体基板の洗浄方法および洗浄装置 |
| JP5005328B2 (ja) * | 2006-12-12 | 2012-08-22 | 瀬戸技研工業株式会社 | フォトレジスト端面剥離・洗浄方法及び装置 |
| JP5186161B2 (ja) * | 2007-09-06 | 2013-04-17 | 東京応化工業株式会社 | 塗布装置及び塗布装置のクリーニング方法 |
| JP2010224070A (ja) * | 2009-03-23 | 2010-10-07 | Citizen Finetech Miyota Co Ltd | 液晶表示パネルの製造方法 |
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- 2013-03-29 JP JP2013072364A patent/JP6321912B2/ja active Active
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| JP2014195765A (ja) | 2014-10-16 |
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