JP2014195765A5 - - Google Patents

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Publication number
JP2014195765A5
JP2014195765A5 JP2013072364A JP2013072364A JP2014195765A5 JP 2014195765 A5 JP2014195765 A5 JP 2014195765A5 JP 2013072364 A JP2013072364 A JP 2013072364A JP 2013072364 A JP2013072364 A JP 2013072364A JP 2014195765 A5 JP2014195765 A5 JP 2014195765A5
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JP
Japan
Prior art keywords
substrate
cleaning
along
holding means
groove
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JP2013072364A
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English (en)
Japanese (ja)
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JP2014195765A (ja
JP6321912B2 (ja
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Publication of JP2014195765A5 publication Critical patent/JP2014195765A5/ja
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JP2013072364A 2013-03-29 2013-03-29 基板の洗浄処理装置及び洗浄処理方法 Active JP6321912B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2013072364A JP6321912B2 (ja) 2013-03-29 2013-03-29 基板の洗浄処理装置及び洗浄処理方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2013072364A JP6321912B2 (ja) 2013-03-29 2013-03-29 基板の洗浄処理装置及び洗浄処理方法

Publications (3)

Publication Number Publication Date
JP2014195765A JP2014195765A (ja) 2014-10-16
JP2014195765A5 true JP2014195765A5 (https=) 2016-05-19
JP6321912B2 JP6321912B2 (ja) 2018-05-09

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ID=52357014

Family Applications (1)

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JP2013072364A Active JP6321912B2 (ja) 2013-03-29 2013-03-29 基板の洗浄処理装置及び洗浄処理方法

Country Status (1)

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JP (1) JP6321912B2 (https=)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7772562B2 (ja) * 2021-11-15 2025-11-18 株式会社ディスコ 研削装置、及び加工装置
CN115007520B (zh) * 2022-06-19 2023-09-08 上饶市盛祥光学有限公司 一种光学加工零部件的清洁设备

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2942992B2 (ja) * 1989-10-05 1999-08-30 ノードソン株式会社 洗浄方法
JPH04240749A (ja) * 1991-01-25 1992-08-28 Toshiba Corp ダイシング装置
JP3704411B2 (ja) * 1996-12-26 2005-10-12 富士通株式会社 基板処理方法及び処理装置
JP2001044467A (ja) * 1999-07-29 2001-02-16 Kanegafuchi Chem Ind Co Ltd 集積型薄膜太陽電池の洗浄装置
JP3816734B2 (ja) * 2000-09-13 2006-08-30 東京エレクトロン株式会社 基板洗浄装置
JP3333778B2 (ja) * 2000-11-09 2002-10-15 不二越機械工業株式会社 研磨定盤の洗浄方法及びその洗浄装置
US6949146B2 (en) * 2002-04-30 2005-09-27 Asm Assembly Automation Ltd Ultrasonic cleaning module for singulated electronic packages
JP4429231B2 (ja) * 2005-08-01 2010-03-10 大日本スクリーン製造株式会社 基板洗浄方法および基板洗浄装置
JP2006148154A (ja) * 2006-01-13 2006-06-08 Hitachi Chem Co Ltd 接着シート及び半導体装置の製造方法
JP2008060284A (ja) * 2006-08-31 2008-03-13 Matsushita Electric Ind Co Ltd 半導体基板の洗浄方法および洗浄装置
JP5005328B2 (ja) * 2006-12-12 2012-08-22 瀬戸技研工業株式会社 フォトレジスト端面剥離・洗浄方法及び装置
JP5186161B2 (ja) * 2007-09-06 2013-04-17 東京応化工業株式会社 塗布装置及び塗布装置のクリーニング方法
JP2010224070A (ja) * 2009-03-23 2010-10-07 Citizen Finetech Miyota Co Ltd 液晶表示パネルの製造方法

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