JP6320975B2 - 自発光感光性樹脂組成物、それにより製造された色変換層を含む表示装置 - Google Patents

自発光感光性樹脂組成物、それにより製造された色変換層を含む表示装置 Download PDF

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JP6320975B2
JP6320975B2 JP2015182179A JP2015182179A JP6320975B2 JP 6320975 B2 JP6320975 B2 JP 6320975B2 JP 2015182179 A JP2015182179 A JP 2015182179A JP 2015182179 A JP2015182179 A JP 2015182179A JP 6320975 B2 JP6320975 B2 JP 6320975B2
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acrylate
self
resin composition
photosensitive resin
compounds
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JP2016071360A (ja
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オ・ヨンホ
キム・ジュホ
パク・ジョンヒョ
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Dongwoo Fine Chem Co Ltd
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Dongwoo Fine Chem Co Ltd
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09B—ORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
    • C09B11/00—Diaryl- or thriarylmethane dyes
    • C09B11/04—Diaryl- or thriarylmethane dyes derived from triarylmethanes, i.e. central C-atom is substituted by amino, cyano, alkyl
    • C09B11/10—Amino derivatives of triarylmethanes
    • C09B11/24—Phthaleins containing amino groups ; Phthalanes; Fluoranes; Phthalides; Rhodamine dyes; Phthaleins having heterocyclic aryl rings; Lactone or lactame forms of triarylmethane dyes
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G02B5/22—Absorbing filters
    • G02B5/223—Absorbing filters containing organic substances, e.g. dyes, inks or pigments
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Optics & Photonics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials For Photolithography (AREA)
  • Optical Filters (AREA)
  • Liquid Crystal (AREA)
JP2015182179A 2014-09-26 2015-09-15 自発光感光性樹脂組成物、それにより製造された色変換層を含む表示装置 Active JP6320975B2 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
KR1020140129192A KR102201361B1 (ko) 2014-09-26 2014-09-26 자발광 감광성 수지 조성물, 이로부터 제조된 색변환층을 포함하는 표시장치
KR10-2014-0129192 2014-09-26

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JP2016071360A JP2016071360A (ja) 2016-05-09
JP6320975B2 true JP6320975B2 (ja) 2018-05-09

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JP (1) JP6320975B2 (zh)
KR (1) KR102201361B1 (zh)
CN (1) CN105467759B (zh)
TW (1) TWI576664B (zh)

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KR101941573B1 (ko) * 2016-11-28 2019-01-23 동우 화인켐 주식회사 자발광 감광성 수지 조성물, 이를 이용하여 제조된 컬러필터 및 화상 표시 장치
KR102317627B1 (ko) * 2016-12-28 2021-10-26 디아이씨 가부시끼가이샤 잉크 조성물, 광변환층 및 컬러 필터
KR101992009B1 (ko) * 2017-02-03 2019-06-21 동우 화인켐 주식회사 자발광 감광성 수지 조성물, 이를 이용한 색변환층을 포함하는 컬러필터 및 화상표시장치
KR101909541B1 (ko) * 2017-11-14 2018-10-18 (주)이노큐디 양자점 필름의 제조방법, 이로써 제조된 양자점 필름, 및 이를 포함하는 파장변환 시트 및 디스플레이
KR102198801B1 (ko) * 2017-12-07 2021-01-05 삼성에스디아이 주식회사 색 변환 패널 및 색 변환 패널의 제조 방법
TWI830714B (zh) * 2018-01-09 2024-02-01 南韓商東友精細化工有限公司 自發光感光性樹脂組合物、顏色轉換層及顯示裝置
KR102329975B1 (ko) * 2018-03-07 2021-11-23 동우 화인켐 주식회사 염료 분산액 조성물, 상기 염료 분산액 조성물을 포함하는 자발광 감광성 수지 조성물 및 색 변환층, 상기 색 변환층을 포함하는 컬러필터, 상기 컬러 필터를 포함하는 표시장치
CN111868627B (zh) 2018-03-23 2023-10-17 东丽株式会社 感光性树脂组合物、固化膜、颜色转换基板、图像显示装置及固化膜的制造方法
KR101992084B1 (ko) * 2019-02-21 2019-06-21 동우 화인켐 주식회사 자발광 조성물, 이를 이용하여 제조된 색변환층 및 이를 포함하는 컬러필터 및 화상표시장치
JP7354704B2 (ja) * 2019-09-09 2023-10-03 三菱ケミカル株式会社 自発光型感光性樹脂組成物、カラーフィルタ、及び画像表示装置
JP7494469B2 (ja) 2020-01-09 2024-06-04 三菱ケミカル株式会社 自発光型感光性樹脂組成物、カラーフィルタ、及び画像表示装置

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JP2016071360A (ja) 2016-05-09
KR20160036917A (ko) 2016-04-05
CN105467759B (zh) 2020-09-22
KR102201361B1 (ko) 2021-01-11
TWI576664B (zh) 2017-04-01
CN105467759A (zh) 2016-04-06
TW201616230A (zh) 2016-05-01

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