JP6317874B2 - 反射防止膜付基材の製造方法および光電気セル - Google Patents
反射防止膜付基材の製造方法および光電気セル Download PDFInfo
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- JP6317874B2 JP6317874B2 JP2012143396A JP2012143396A JP6317874B2 JP 6317874 B2 JP6317874 B2 JP 6317874B2 JP 2012143396 A JP2012143396 A JP 2012143396A JP 2012143396 A JP2012143396 A JP 2012143396A JP 6317874 B2 JP6317874 B2 JP 6317874B2
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- DOEHJNBEOVLHGL-UHFFFAOYSA-N trichloro(propyl)silane Chemical compound CCC[Si](Cl)(Cl)Cl DOEHJNBEOVLHGL-UHFFFAOYSA-N 0.000 description 1
- DNKIGCMPHGFTRD-UHFFFAOYSA-N trichloro-(2,4,6-trimethylphenyl)silane Chemical compound CC1=CC(C)=C([Si](Cl)(Cl)Cl)C(C)=C1 DNKIGCMPHGFTRD-UHFFFAOYSA-N 0.000 description 1
- NYQDBZQWFXNBRZ-UHFFFAOYSA-N trichloro-(2-chlorophenyl)silane Chemical compound ClC1=CC=CC=C1[Si](Cl)(Cl)Cl NYQDBZQWFXNBRZ-UHFFFAOYSA-N 0.000 description 1
- WOMUGKOOLXQCTQ-UHFFFAOYSA-N trichloro-(4-methylphenyl)silane Chemical compound CC1=CC=C([Si](Cl)(Cl)Cl)C=C1 WOMUGKOOLXQCTQ-UHFFFAOYSA-N 0.000 description 1
- AAAQKTZKLRYKHR-UHFFFAOYSA-N triphenylmethane Chemical compound C1=CC=CC=C1C(C=1C=CC=CC=1)C1=CC=CC=C1 AAAQKTZKLRYKHR-UHFFFAOYSA-N 0.000 description 1
- YFTHZRPMJXBUME-UHFFFAOYSA-N tripropylamine Chemical compound CCCN(CCC)CCC YFTHZRPMJXBUME-UHFFFAOYSA-N 0.000 description 1
- 229910001930 tungsten oxide Inorganic materials 0.000 description 1
- 238000000108 ultra-filtration Methods 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
- 210000002268 wool Anatomy 0.000 description 1
- 239000001018 xanthene dye Substances 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
- 229910001928 zirconium oxide Inorganic materials 0.000 description 1
Images
Classifications
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
- G02B1/11—Anti-reflection coatings
- G02B1/113—Anti-reflection coatings using inorganic layer materials only
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01G—CAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES OR LIGHT-SENSITIVE DEVICES, OF THE ELECTROLYTIC TYPE
- H01G9/00—Electrolytic capacitors, rectifiers, detectors, switching devices, light-sensitive or temperature-sensitive devices; Processes of their manufacture
- H01G9/20—Light-sensitive devices
- H01G9/209—Light trapping arrangements
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01G—CAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES OR LIGHT-SENSITIVE DEVICES, OF THE ELECTROLYTIC TYPE
- H01G9/00—Electrolytic capacitors, rectifiers, detectors, switching devices, light-sensitive or temperature-sensitive devices; Processes of their manufacture
- H01G9/20—Light-sensitive devices
- H01G9/2027—Light-sensitive devices comprising an oxide semiconductor electrode
- H01G9/2036—Light-sensitive devices comprising an oxide semiconductor electrode comprising mixed oxides, e.g. ZnO covered TiO2 particles
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/02—Details
- H01L31/0216—Coatings
- H01L31/02161—Coatings for devices characterised by at least one potential jump barrier or surface barrier
- H01L31/02167—Coatings for devices characterised by at least one potential jump barrier or surface barrier for solar cells
- H01L31/02168—Coatings for devices characterised by at least one potential jump barrier or surface barrier for solar cells the coatings being antireflective or having enhancing optical properties for the solar cells
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
- Y02E10/542—Dye sensitized solar cells
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
- Y02P70/50—Manufacturing or production processes characterised by the final manufactured product
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JP2012143396A JP6317874B2 (ja) | 2012-06-26 | 2012-06-26 | 反射防止膜付基材の製造方法および光電気セル |
KR1020130072048A KR102018592B1 (ko) | 2012-06-26 | 2013-06-24 | 반사방지막부 기재의 제조방법 및 광전기 셀 |
CN201310256586.3A CN103515457B (zh) | 2012-06-26 | 2013-06-25 | 带防反射膜的基材的制造方法及光电池 |
TW102122663A TWI572045B (zh) | 2012-06-26 | 2013-06-26 | 附抗反射膜基材的製造方法及光電單元 |
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US20160146975A1 (en) * | 2014-11-25 | 2016-05-26 | Ppg Industries Ohio, Inc. | Antiglare touch screen displays and other coated articles and methods of forming them |
JPWO2017150132A1 (ja) * | 2016-02-29 | 2018-09-13 | 富士フイルム株式会社 | 積層体の製造方法、反射防止膜付ガラス及び太陽電池モジュール |
JP6609202B2 (ja) * | 2016-03-08 | 2019-11-20 | 株式会社フジクラ | 光電変換装置 |
CN106449887B (zh) * | 2016-11-23 | 2018-01-16 | 绍兴文理学院 | 一种用于光伏组件的反光薄膜材料 |
JP2019129185A (ja) * | 2018-01-22 | 2019-08-01 | 三菱マテリアル株式会社 | サーミスタ及びその製造方法並びにサーミスタセンサ |
KR102265267B1 (ko) * | 2021-01-13 | 2021-06-17 | (주)에스케이솔라에너지 | 건축물에 적용 가능한 컬러태양광모듈 |
CN113788631B (zh) * | 2021-10-11 | 2023-05-05 | 上海西源新能源技术有限公司 | 一种ZnO-SiO2双涂层的下转换减反射膜及其制备方法 |
KR102461977B1 (ko) * | 2022-01-20 | 2022-11-03 | 주식회사 블루비컴퍼니 | 광고 출력 기반의 디스플레이 어셈블리 |
JP2023125378A (ja) * | 2022-02-28 | 2023-09-07 | 株式会社リコー | 液体組成物、インクジェット吐出用液体組成物、収容容器、無機酸化物含有層の製造装置、無機酸化物含有層の製造方法、及び電気化学素子 |
CN114879401B (zh) * | 2022-04-28 | 2023-10-31 | Tcl华星光电技术有限公司 | 显示模组 |
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JP3424876B2 (ja) * | 1995-07-04 | 2003-07-07 | 松下電器産業株式会社 | 画像表示装置及びその製造方法 |
JP4100863B2 (ja) | 2000-10-23 | 2008-06-11 | 触媒化成工業株式会社 | 光電気セル |
JP4080756B2 (ja) * | 2002-02-01 | 2008-04-23 | 富士フイルム株式会社 | 反射防止膜とその製造方法ならびに画像表示装置 |
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TWI371864B (en) * | 2008-01-29 | 2012-09-01 | Big Sun Energy Technology Inc | Solar cell with anti-reflection layer |
JP2010127951A (ja) * | 2008-11-25 | 2010-06-10 | Toray Advanced Film Co Ltd | 低屈折率層形成用塗布液及び反射防止層の製造方法 |
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TW201407794A (zh) | 2014-02-16 |
JP2014006443A (ja) | 2014-01-16 |
KR20140004004A (ko) | 2014-01-10 |
TWI572045B (zh) | 2017-02-21 |
KR102018592B1 (ko) | 2019-09-05 |
CN103515457A (zh) | 2014-01-15 |
CN103515457B (zh) | 2017-08-25 |
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