JP6317874B2 - 反射防止膜付基材の製造方法および光電気セル - Google Patents

反射防止膜付基材の製造方法および光電気セル Download PDF

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JP6317874B2
JP6317874B2 JP2012143396A JP2012143396A JP6317874B2 JP 6317874 B2 JP6317874 B2 JP 6317874B2 JP 2012143396 A JP2012143396 A JP 2012143396A JP 2012143396 A JP2012143396 A JP 2012143396A JP 6317874 B2 JP6317874 B2 JP 6317874B2
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refractive index
substrate
antireflection film
index layer
electrode
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JP2012143396A
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Japanese (ja)
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JP2014006443A (ja
JP2014006443A5 (https=
Inventor
夕子 箱嶋
夕子 箱嶋
政幸 松田
政幸 松田
良 村口
良 村口
小松　通郎
通郎 小松
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JGC Catalysts and Chemicals Ltd
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JGC Catalysts and Chemicals Ltd
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Priority to JP2012143396A priority Critical patent/JP6317874B2/ja
Priority to KR1020130072048A priority patent/KR102018592B1/ko
Priority to CN201310256586.3A priority patent/CN103515457B/zh
Priority to TW102122663A priority patent/TWI572045B/zh
Publication of JP2014006443A publication Critical patent/JP2014006443A/ja
Publication of JP2014006443A5 publication Critical patent/JP2014006443A5/ja
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    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/11—Anti-reflection coatings
    • G02B1/113—Anti-reflection coatings using inorganic layer materials only
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01G—CAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES, LIGHT-SENSITIVE OR TEMPERATURE-SENSITIVE DEVICES OF THE ELECTROLYTIC TYPE
    • H01G9/00—Electrolytic capacitors, rectifiers, detectors, switching devices, light-sensitive or temperature-sensitive devices; Processes of their manufacture
    • H01G9/20—Light-sensitive devices
    • H01G9/209—Light trapping arrangements
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01G—CAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES, LIGHT-SENSITIVE OR TEMPERATURE-SENSITIVE DEVICES OF THE ELECTROLYTIC TYPE
    • H01G9/00—Electrolytic capacitors, rectifiers, detectors, switching devices, light-sensitive or temperature-sensitive devices; Processes of their manufacture
    • H01G9/20—Light-sensitive devices
    • H01G9/2027—Light-sensitive devices comprising an oxide semiconductor electrode
    • H01G9/2036—Light-sensitive devices comprising an oxide semiconductor electrode comprising mixed oxides, e.g. ZnO covered TiO2 particles
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F77/00—Constructional details of devices covered by this subclass
    • H10F77/30—Coatings
    • H10F77/306—Coatings for devices having potential barriers
    • H10F77/311—Coatings for devices having potential barriers for photovoltaic cells
    • H10F77/315—Coatings for devices having potential barriers for photovoltaic cells the coatings being antireflective or having enhancing optical properties
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E10/00—Energy generation through renewable energy sources
    • Y02E10/50—Photovoltaic [PV] energy
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E10/00—Energy generation through renewable energy sources
    • Y02E10/50—Photovoltaic [PV] energy
    • Y02E10/542—Dye sensitized solar cells
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
    • Y02P70/50—Manufacturing or production processes characterised by the final manufactured product

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  • Engineering & Computer Science (AREA)
  • Power Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Chemical & Material Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Surface Treatment Of Optical Elements (AREA)
  • Photovoltaic Devices (AREA)
  • Hybrid Cells (AREA)
JP2012143396A 2012-06-26 2012-06-26 反射防止膜付基材の製造方法および光電気セル Expired - Fee Related JP6317874B2 (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP2012143396A JP6317874B2 (ja) 2012-06-26 2012-06-26 反射防止膜付基材の製造方法および光電気セル
KR1020130072048A KR102018592B1 (ko) 2012-06-26 2013-06-24 반사방지막부 기재의 제조방법 및 광전기 셀
CN201310256586.3A CN103515457B (zh) 2012-06-26 2013-06-25 带防反射膜的基材的制造方法及光电池
TW102122663A TWI572045B (zh) 2012-06-26 2013-06-26 附抗反射膜基材的製造方法及光電單元

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Application Number Priority Date Filing Date Title
JP2012143396A JP6317874B2 (ja) 2012-06-26 2012-06-26 反射防止膜付基材の製造方法および光電気セル

Publications (3)

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JP2014006443A JP2014006443A (ja) 2014-01-16
JP2014006443A5 JP2014006443A5 (https=) 2015-07-23
JP6317874B2 true JP6317874B2 (ja) 2018-04-25

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JP2012143396A Expired - Fee Related JP6317874B2 (ja) 2012-06-26 2012-06-26 反射防止膜付基材の製造方法および光電気セル

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JP (1) JP6317874B2 (https=)
KR (1) KR102018592B1 (https=)
CN (1) CN103515457B (https=)
TW (1) TWI572045B (https=)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
AU2015353548B2 (en) 2014-11-25 2018-04-05 Ppg Industries Ohio, Inc. Antiglare touch screen displays and other coated articles and methods of forming them
WO2017150132A1 (ja) * 2016-02-29 2017-09-08 富士フイルム株式会社 積層体の製造方法、反射防止膜付ガラス及び太陽電池モジュール
JP6609202B2 (ja) * 2016-03-08 2019-11-20 株式会社フジクラ 光電変換装置
CN106449887B (zh) * 2016-11-23 2018-01-16 绍兴文理学院 一种用于光伏组件的反光薄膜材料
JP2019129185A (ja) * 2018-01-22 2019-08-01 三菱マテリアル株式会社 サーミスタ及びその製造方法並びにサーミスタセンサ
JP7358251B2 (ja) * 2020-01-17 2023-10-10 株式会社荏原製作所 めっき支援システム、めっき支援装置、めっき支援プログラムおよびめっき実施条件決定方法
KR102265267B1 (ko) * 2021-01-13 2021-06-17 (주)에스케이솔라에너지 건축물에 적용 가능한 컬러태양광모듈
CN113788631B (zh) * 2021-10-11 2023-05-05 上海西源新能源技术有限公司 一种ZnO-SiO2双涂层的下转换减反射膜及其制备方法
KR102461977B1 (ko) * 2022-01-20 2022-11-03 주식회사 블루비컴퍼니 광고 출력 기반의 디스플레이 어셈블리
JP2023125378A (ja) * 2022-02-28 2023-09-07 株式会社リコー 液体組成物、インクジェット吐出用液体組成物、収容容器、無機酸化物含有層の製造装置、無機酸化物含有層の製造方法、及び電気化学素子
CN114879401B (zh) * 2022-04-28 2023-10-31 Tcl华星光电技术有限公司 显示模组

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CH674596A5 (https=) 1988-02-12 1990-06-15 Sulzer Ag
JPH0815097B2 (ja) 1990-04-17 1996-02-14 エコール・ポリテクニツク・フエデラール・ドウ・ローザンヌ 光電池
JP3424876B2 (ja) * 1995-07-04 2003-07-07 松下電器産業株式会社 画像表示装置及びその製造方法
JP4100863B2 (ja) 2000-10-23 2008-06-11 触媒化成工業株式会社 光電気セル
JP4080756B2 (ja) * 2002-02-01 2008-04-23 富士フイルム株式会社 反射防止膜とその製造方法ならびに画像表示装置
JP2006072315A (ja) * 2004-05-20 2006-03-16 Fuji Photo Film Co Ltd 反射防止能付き偏光板、その製造方法、及びそれを用いた画像表示装置
FR2898295B1 (fr) * 2006-03-10 2013-08-09 Saint Gobain Substrat transparent antireflet presentant une couleur neutre en reflexion
TWI371864B (en) * 2008-01-29 2012-09-01 Big Sun Energy Technology Inc Solar cell with anti-reflection layer
JP2010127951A (ja) * 2008-11-25 2010-06-10 Toray Advanced Film Co Ltd 低屈折率層形成用塗布液及び反射防止層の製造方法
CN102782528B (zh) * 2009-12-11 2015-02-25 日本板硝子株式会社 光电转换装置用玻璃罩及其制造方法
JP2012086477A (ja) * 2010-10-20 2012-05-10 Hitachi Chemical Co Ltd 薄膜転写材及びその製造方法並びに薄膜付き成形体及びその製造方法

Also Published As

Publication number Publication date
JP2014006443A (ja) 2014-01-16
TWI572045B (zh) 2017-02-21
KR102018592B1 (ko) 2019-09-05
CN103515457B (zh) 2017-08-25
TW201407794A (zh) 2014-02-16
CN103515457A (zh) 2014-01-15
KR20140004004A (ko) 2014-01-10

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