CN103515457B - 带防反射膜的基材的制造方法及光电池 - Google Patents

带防反射膜的基材的制造方法及光电池 Download PDF

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Publication number
CN103515457B
CN103515457B CN201310256586.3A CN201310256586A CN103515457B CN 103515457 B CN103515457 B CN 103515457B CN 201310256586 A CN201310256586 A CN 201310256586A CN 103515457 B CN103515457 B CN 103515457B
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CN
China
Prior art keywords
substrate
refractive index
index layer
antireflection film
base material
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Expired - Fee Related
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CN201310256586.3A
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English (en)
Chinese (zh)
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CN103515457A (zh
Inventor
箱嶋夕子
松田政幸
村口良
小松通郎
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GC CATALYSTS AND CHEMICALS LT
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GC CATALYSTS AND CHEMICALS LT
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    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/11Anti-reflection coatings
    • G02B1/113Anti-reflection coatings using inorganic layer materials only
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01GCAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES, LIGHT-SENSITIVE OR TEMPERATURE-SENSITIVE DEVICES OF THE ELECTROLYTIC TYPE
    • H01G9/00Electrolytic capacitors, rectifiers, detectors, switching devices, light-sensitive or temperature-sensitive devices; Processes of their manufacture
    • H01G9/20Light-sensitive devices
    • H01G9/209Light trapping arrangements
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01GCAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES, LIGHT-SENSITIVE OR TEMPERATURE-SENSITIVE DEVICES OF THE ELECTROLYTIC TYPE
    • H01G9/00Electrolytic capacitors, rectifiers, detectors, switching devices, light-sensitive or temperature-sensitive devices; Processes of their manufacture
    • H01G9/20Light-sensitive devices
    • H01G9/2027Light-sensitive devices comprising an oxide semiconductor electrode
    • H01G9/2036Light-sensitive devices comprising an oxide semiconductor electrode comprising mixed oxides, e.g. ZnO covered TiO2 particles
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10FINORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F77/00Constructional details of devices covered by this subclass
    • H10F77/30Coatings
    • H10F77/306Coatings for devices having potential barriers
    • H10F77/311Coatings for devices having potential barriers for photovoltaic cells
    • H10F77/315Coatings for devices having potential barriers for photovoltaic cells the coatings being antireflective or having enhancing optical properties
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02EREDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E10/00Energy generation through renewable energy sources
    • Y02E10/50Photovoltaic [PV] energy
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02EREDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E10/00Energy generation through renewable energy sources
    • Y02E10/50Photovoltaic [PV] energy
    • Y02E10/542Dye sensitized solar cells
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02PCLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P70/00Climate change mitigation technologies in the production process for final industrial or consumer products
    • Y02P70/50Manufacturing or production processes characterised by the final manufactured product

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  • Engineering & Computer Science (AREA)
  • Power Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Chemical & Material Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Surface Treatment Of Optical Elements (AREA)
  • Photovoltaic Devices (AREA)
  • Hybrid Cells (AREA)
CN201310256586.3A 2012-06-26 2013-06-25 带防反射膜的基材的制造方法及光电池 Expired - Fee Related CN103515457B (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2012143396A JP6317874B2 (ja) 2012-06-26 2012-06-26 反射防止膜付基材の製造方法および光電気セル
JP2012-143396 2012-06-26

Publications (2)

Publication Number Publication Date
CN103515457A CN103515457A (zh) 2014-01-15
CN103515457B true CN103515457B (zh) 2017-08-25

Family

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CN201310256586.3A Expired - Fee Related CN103515457B (zh) 2012-06-26 2013-06-25 带防反射膜的基材的制造方法及光电池

Country Status (4)

Country Link
JP (1) JP6317874B2 (https=)
KR (1) KR102018592B1 (https=)
CN (1) CN103515457B (https=)
TW (1) TWI572045B (https=)

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
AU2015353548B2 (en) 2014-11-25 2018-04-05 Ppg Industries Ohio, Inc. Antiglare touch screen displays and other coated articles and methods of forming them
WO2017150132A1 (ja) * 2016-02-29 2017-09-08 富士フイルム株式会社 積層体の製造方法、反射防止膜付ガラス及び太陽電池モジュール
JP6609202B2 (ja) * 2016-03-08 2019-11-20 株式会社フジクラ 光電変換装置
CN106449887B (zh) * 2016-11-23 2018-01-16 绍兴文理学院 一种用于光伏组件的反光薄膜材料
JP2019129185A (ja) * 2018-01-22 2019-08-01 三菱マテリアル株式会社 サーミスタ及びその製造方法並びにサーミスタセンサ
JP7358251B2 (ja) * 2020-01-17 2023-10-10 株式会社荏原製作所 めっき支援システム、めっき支援装置、めっき支援プログラムおよびめっき実施条件決定方法
KR102265267B1 (ko) * 2021-01-13 2021-06-17 (주)에스케이솔라에너지 건축물에 적용 가능한 컬러태양광모듈
CN113788631B (zh) * 2021-10-11 2023-05-05 上海西源新能源技术有限公司 一种ZnO-SiO2双涂层的下转换减反射膜及其制备方法
KR102461977B1 (ko) * 2022-01-20 2022-11-03 주식회사 블루비컴퍼니 광고 출력 기반의 디스플레이 어셈블리
JP2023125378A (ja) * 2022-02-28 2023-09-07 株式会社リコー 液体組成物、インクジェット吐出用液体組成物、収容容器、無機酸化物含有層の製造装置、無機酸化物含有層の製造方法、及び電気化学素子
CN114879401B (zh) * 2022-04-28 2023-10-31 Tcl华星光电技术有限公司 显示模组

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006072315A (ja) * 2004-05-20 2006-03-16 Fuji Photo Film Co Ltd 反射防止能付き偏光板、その製造方法、及びそれを用いた画像表示装置
JP2010127951A (ja) * 2008-11-25 2010-06-10 Toray Advanced Film Co Ltd 低屈折率層形成用塗布液及び反射防止層の製造方法
WO2011070714A1 (ja) * 2009-12-11 2011-06-16 日本板硝子株式会社 光電変換装置用カバーガラスおよびその製造方法
JP2012086477A (ja) * 2010-10-20 2012-05-10 Hitachi Chemical Co Ltd 薄膜転写材及びその製造方法並びに薄膜付き成形体及びその製造方法

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* Cited by examiner, † Cited by third party
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CH674596A5 (https=) 1988-02-12 1990-06-15 Sulzer Ag
JPH0815097B2 (ja) 1990-04-17 1996-02-14 エコール・ポリテクニツク・フエデラール・ドウ・ローザンヌ 光電池
JP3424876B2 (ja) * 1995-07-04 2003-07-07 松下電器産業株式会社 画像表示装置及びその製造方法
JP4100863B2 (ja) 2000-10-23 2008-06-11 触媒化成工業株式会社 光電気セル
JP4080756B2 (ja) * 2002-02-01 2008-04-23 富士フイルム株式会社 反射防止膜とその製造方法ならびに画像表示装置
FR2898295B1 (fr) * 2006-03-10 2013-08-09 Saint Gobain Substrat transparent antireflet presentant une couleur neutre en reflexion
TWI371864B (en) * 2008-01-29 2012-09-01 Big Sun Energy Technology Inc Solar cell with anti-reflection layer

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006072315A (ja) * 2004-05-20 2006-03-16 Fuji Photo Film Co Ltd 反射防止能付き偏光板、その製造方法、及びそれを用いた画像表示装置
JP2010127951A (ja) * 2008-11-25 2010-06-10 Toray Advanced Film Co Ltd 低屈折率層形成用塗布液及び反射防止層の製造方法
WO2011070714A1 (ja) * 2009-12-11 2011-06-16 日本板硝子株式会社 光電変換装置用カバーガラスおよびその製造方法
JP2012086477A (ja) * 2010-10-20 2012-05-10 Hitachi Chemical Co Ltd 薄膜転写材及びその製造方法並びに薄膜付き成形体及びその製造方法

Also Published As

Publication number Publication date
JP2014006443A (ja) 2014-01-16
TWI572045B (zh) 2017-02-21
KR102018592B1 (ko) 2019-09-05
TW201407794A (zh) 2014-02-16
CN103515457A (zh) 2014-01-15
JP6317874B2 (ja) 2018-04-25
KR20140004004A (ko) 2014-01-10

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PB01 Publication
C53 Correction of patent of invention or patent application
CB03 Change of inventor or designer information

Inventor after: Hakoshima Yuhk

Inventor after: Matsuda Masayuki

Inventor after: Muraguchi Ryo

Inventor after: Komatsu Michio

Inventor before: Hakoshima Yuhk

Inventor before: Matsuda Masayuki

Inventor before: Muraguchi Ryo

COR Change of bibliographic data

Free format text: CORRECT: INVENTOR; FROM: YUHKO HAKOSHIMA MASAYUKI MATSUDA RYO MURAGUCHI TO: YUHKO HAKOSHIMA MASAYUKI MATSUDA RYO MURAGUCHI KOMATSU TONGURANGU

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Granted publication date: 20170825