TWI572045B - 附抗反射膜基材的製造方法及光電單元 - Google Patents

附抗反射膜基材的製造方法及光電單元 Download PDF

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Publication number
TWI572045B
TWI572045B TW102122663A TW102122663A TWI572045B TW I572045 B TWI572045 B TW I572045B TW 102122663 A TW102122663 A TW 102122663A TW 102122663 A TW102122663 A TW 102122663A TW I572045 B TWI572045 B TW I572045B
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TW
Taiwan
Prior art keywords
refractive index
index layer
film substrate
antireflection film
electrode
Prior art date
Application number
TW102122663A
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English (en)
Chinese (zh)
Other versions
TW201407794A (zh
Inventor
箱嶋夕子
松田政幸
村口良
小松通郎
Original Assignee
日揮觸媒化成股份有限公司
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Publication of TW201407794A publication Critical patent/TW201407794A/zh
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Publication of TWI572045B publication Critical patent/TWI572045B/zh

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    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/11—Anti-reflection coatings
    • G02B1/113—Anti-reflection coatings using inorganic layer materials only
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01G—CAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES, LIGHT-SENSITIVE OR TEMPERATURE-SENSITIVE DEVICES OF THE ELECTROLYTIC TYPE
    • H01G9/00—Electrolytic capacitors, rectifiers, detectors, switching devices, light-sensitive or temperature-sensitive devices; Processes of their manufacture
    • H01G9/20—Light-sensitive devices
    • H01G9/209—Light trapping arrangements
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01G—CAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES, LIGHT-SENSITIVE OR TEMPERATURE-SENSITIVE DEVICES OF THE ELECTROLYTIC TYPE
    • H01G9/00—Electrolytic capacitors, rectifiers, detectors, switching devices, light-sensitive or temperature-sensitive devices; Processes of their manufacture
    • H01G9/20—Light-sensitive devices
    • H01G9/2027—Light-sensitive devices comprising an oxide semiconductor electrode
    • H01G9/2036—Light-sensitive devices comprising an oxide semiconductor electrode comprising mixed oxides, e.g. ZnO covered TiO2 particles
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F77/00—Constructional details of devices covered by this subclass
    • H10F77/30—Coatings
    • H10F77/306—Coatings for devices having potential barriers
    • H10F77/311—Coatings for devices having potential barriers for photovoltaic cells
    • H10F77/315—Coatings for devices having potential barriers for photovoltaic cells the coatings being antireflective or having enhancing optical properties
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E10/00—Energy generation through renewable energy sources
    • Y02E10/50—Photovoltaic [PV] energy
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E10/00—Energy generation through renewable energy sources
    • Y02E10/50—Photovoltaic [PV] energy
    • Y02E10/542—Dye sensitized solar cells
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
    • Y02P70/50—Manufacturing or production processes characterised by the final manufactured product

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  • Engineering & Computer Science (AREA)
  • Power Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Chemical & Material Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Surface Treatment Of Optical Elements (AREA)
  • Photovoltaic Devices (AREA)
  • Hybrid Cells (AREA)
TW102122663A 2012-06-26 2013-06-26 附抗反射膜基材的製造方法及光電單元 TWI572045B (zh)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2012143396A JP6317874B2 (ja) 2012-06-26 2012-06-26 反射防止膜付基材の製造方法および光電気セル

Publications (2)

Publication Number Publication Date
TW201407794A TW201407794A (zh) 2014-02-16
TWI572045B true TWI572045B (zh) 2017-02-21

Family

ID=49897866

Family Applications (1)

Application Number Title Priority Date Filing Date
TW102122663A TWI572045B (zh) 2012-06-26 2013-06-26 附抗反射膜基材的製造方法及光電單元

Country Status (4)

Country Link
JP (1) JP6317874B2 (https=)
KR (1) KR102018592B1 (https=)
CN (1) CN103515457B (https=)
TW (1) TWI572045B (https=)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI841817B (zh) * 2020-01-17 2024-05-11 日商荏原製作所股份有限公司 鍍敷支援系統、鍍敷支援裝置以及記錄媒體

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
AU2015353548B2 (en) 2014-11-25 2018-04-05 Ppg Industries Ohio, Inc. Antiglare touch screen displays and other coated articles and methods of forming them
WO2017150132A1 (ja) * 2016-02-29 2017-09-08 富士フイルム株式会社 積層体の製造方法、反射防止膜付ガラス及び太陽電池モジュール
JP6609202B2 (ja) * 2016-03-08 2019-11-20 株式会社フジクラ 光電変換装置
CN106449887B (zh) * 2016-11-23 2018-01-16 绍兴文理学院 一种用于光伏组件的反光薄膜材料
JP2019129185A (ja) * 2018-01-22 2019-08-01 三菱マテリアル株式会社 サーミスタ及びその製造方法並びにサーミスタセンサ
KR102265267B1 (ko) * 2021-01-13 2021-06-17 (주)에스케이솔라에너지 건축물에 적용 가능한 컬러태양광모듈
CN113788631B (zh) * 2021-10-11 2023-05-05 上海西源新能源技术有限公司 一种ZnO-SiO2双涂层的下转换减反射膜及其制备方法
KR102461977B1 (ko) * 2022-01-20 2022-11-03 주식회사 블루비컴퍼니 광고 출력 기반의 디스플레이 어셈블리
JP2023125378A (ja) * 2022-02-28 2023-09-07 株式会社リコー 液体組成物、インクジェット吐出用液体組成物、収容容器、無機酸化物含有層の製造装置、無機酸化物含有層の製造方法、及び電気化学素子
CN114879401B (zh) * 2022-04-28 2023-10-31 Tcl华星光电技术有限公司 显示模组

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US20030175502A1 (en) * 2002-02-01 2003-09-18 Fuji Photo Film Co., Ltd. Anti-reflection film, method for producing the same, and image display device
JP2006072315A (ja) * 2004-05-20 2006-03-16 Fuji Photo Film Co Ltd 反射防止能付き偏光板、その製造方法、及びそれを用いた画像表示装置
TW200933911A (en) * 2008-01-29 2009-08-01 Big Sun Energy Technology Inc Solar cell with anti-reflection layer
JP2010127951A (ja) * 2008-11-25 2010-06-10 Toray Advanced Film Co Ltd 低屈折率層形成用塗布液及び反射防止層の製造方法
WO2011070714A1 (ja) * 2009-12-11 2011-06-16 日本板硝子株式会社 光電変換装置用カバーガラスおよびその製造方法
JP2012086477A (ja) * 2010-10-20 2012-05-10 Hitachi Chemical Co Ltd 薄膜転写材及びその製造方法並びに薄膜付き成形体及びその製造方法

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CH674596A5 (https=) 1988-02-12 1990-06-15 Sulzer Ag
JPH0815097B2 (ja) 1990-04-17 1996-02-14 エコール・ポリテクニツク・フエデラール・ドウ・ローザンヌ 光電池
JP3424876B2 (ja) * 1995-07-04 2003-07-07 松下電器産業株式会社 画像表示装置及びその製造方法
JP4100863B2 (ja) 2000-10-23 2008-06-11 触媒化成工業株式会社 光電気セル
FR2898295B1 (fr) * 2006-03-10 2013-08-09 Saint Gobain Substrat transparent antireflet presentant une couleur neutre en reflexion

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20030175502A1 (en) * 2002-02-01 2003-09-18 Fuji Photo Film Co., Ltd. Anti-reflection film, method for producing the same, and image display device
JP2006072315A (ja) * 2004-05-20 2006-03-16 Fuji Photo Film Co Ltd 反射防止能付き偏光板、その製造方法、及びそれを用いた画像表示装置
TW200933911A (en) * 2008-01-29 2009-08-01 Big Sun Energy Technology Inc Solar cell with anti-reflection layer
JP2010127951A (ja) * 2008-11-25 2010-06-10 Toray Advanced Film Co Ltd 低屈折率層形成用塗布液及び反射防止層の製造方法
WO2011070714A1 (ja) * 2009-12-11 2011-06-16 日本板硝子株式会社 光電変換装置用カバーガラスおよびその製造方法
JP2012086477A (ja) * 2010-10-20 2012-05-10 Hitachi Chemical Co Ltd 薄膜転写材及びその製造方法並びに薄膜付き成形体及びその製造方法

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI841817B (zh) * 2020-01-17 2024-05-11 日商荏原製作所股份有限公司 鍍敷支援系統、鍍敷支援裝置以及記錄媒體

Also Published As

Publication number Publication date
JP2014006443A (ja) 2014-01-16
KR102018592B1 (ko) 2019-09-05
CN103515457B (zh) 2017-08-25
TW201407794A (zh) 2014-02-16
CN103515457A (zh) 2014-01-15
JP6317874B2 (ja) 2018-04-25
KR20140004004A (ko) 2014-01-10

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