JP2014006443A5 - - Google Patents
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- Publication number
- JP2014006443A5 JP2014006443A5 JP2012143396A JP2012143396A JP2014006443A5 JP 2014006443 A5 JP2014006443 A5 JP 2014006443A5 JP 2012143396 A JP2012143396 A JP 2012143396A JP 2012143396 A JP2012143396 A JP 2012143396A JP 2014006443 A5 JP2014006443 A5 JP 2014006443A5
- Authority
- JP
- Japan
- Prior art keywords
- antireflection film
- base material
- refractive index
- index layer
- substrate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000000463 material Substances 0.000 claims description 22
- 238000004519 manufacturing process Methods 0.000 claims description 16
- 229910044991 metal oxide Inorganic materials 0.000 claims description 14
- 150000004706 metal oxides Chemical class 0.000 claims description 14
- 239000006185 dispersion Substances 0.000 claims description 12
- 239000000758 substrate Substances 0.000 claims description 12
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical group O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 8
- 229910017464 nitrogen compound Inorganic materials 0.000 claims description 8
- 150000002830 nitrogen compounds Chemical class 0.000 claims description 8
- 239000002245 particle Substances 0.000 claims description 6
- 239000002612 dispersion medium Substances 0.000 claims description 4
- 239000010419 fine particle Substances 0.000 claims description 4
- 239000007788 liquid Substances 0.000 claims description 4
- 239000002243 precursor Substances 0.000 claims description 4
- 239000000377 silicon dioxide Substances 0.000 claims description 4
- 238000009835 boiling Methods 0.000 claims description 3
- 238000010438 heat treatment Methods 0.000 claims description 3
- XLOMVQKBTHCTTD-UHFFFAOYSA-N zinc oxide Inorganic materials [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 claims description 3
- 239000007787 solid Substances 0.000 claims 3
- RMAQACBXLXPBSY-UHFFFAOYSA-N silicic acid Chemical compound O[Si](O)(O)O RMAQACBXLXPBSY-UHFFFAOYSA-N 0.000 claims 2
- 229910018072 Al 2 O 3 Inorganic materials 0.000 claims 1
- 229910006404 SnO 2 Inorganic materials 0.000 claims 1
- 229910010413 TiO 2 Inorganic materials 0.000 claims 1
- 230000002378 acidificating effect Effects 0.000 claims 1
- 239000002131 composite material Substances 0.000 claims 1
- 239000011521 glass Substances 0.000 claims 1
- 230000003301 hydrolyzing effect Effects 0.000 claims 1
- 238000000034 method Methods 0.000 claims 1
- 239000000203 mixture Substances 0.000 claims 1
- 150000003961 organosilicon compounds Chemical class 0.000 claims 1
- 229920000548 poly(silane) polymer Polymers 0.000 claims 1
- 229920001709 polysilazane Polymers 0.000 claims 1
- 235000012239 silicon dioxide Nutrition 0.000 claims 1
- 230000003746 surface roughness Effects 0.000 claims 1
- 239000002023 wood Substances 0.000 claims 1
- 239000010408 film Substances 0.000 description 12
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 9
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 7
- 239000004065 semiconductor Substances 0.000 description 4
- MRELNEQAGSRDBK-UHFFFAOYSA-N lanthanum(3+);oxygen(2-) Chemical compound [O-2].[O-2].[O-2].[La+3].[La+3] MRELNEQAGSRDBK-UHFFFAOYSA-N 0.000 description 2
- 239000011148 porous material Substances 0.000 description 2
- IATRAKWUXMZMIY-UHFFFAOYSA-N strontium oxide Chemical compound [O-2].[Sr+2] IATRAKWUXMZMIY-UHFFFAOYSA-N 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 230000005484 gravity Effects 0.000 description 1
- 229910003437 indium oxide Inorganic materials 0.000 description 1
- PJXISJQVUVHSOJ-UHFFFAOYSA-N indium(iii) oxide Chemical compound [O-2].[O-2].[O-2].[In+3].[In+3] PJXISJQVUVHSOJ-UHFFFAOYSA-N 0.000 description 1
- 238000010030 laminating Methods 0.000 description 1
- 229910000484 niobium oxide Inorganic materials 0.000 description 1
- URLJKFSTXLNXLG-UHFFFAOYSA-N niobium(5+);oxygen(2-) Chemical compound [O-2].[O-2].[O-2].[O-2].[O-2].[Nb+5].[Nb+5] URLJKFSTXLNXLG-UHFFFAOYSA-N 0.000 description 1
- QGLKJKCYBOYXKC-UHFFFAOYSA-N nonaoxidotritungsten Chemical compound O=[W]1(=O)O[W](=O)(=O)O[W](=O)(=O)O1 QGLKJKCYBOYXKC-UHFFFAOYSA-N 0.000 description 1
- SOQBVABWOPYFQZ-UHFFFAOYSA-N oxygen(2-);titanium(4+) Chemical class [O-2].[O-2].[Ti+4] SOQBVABWOPYFQZ-UHFFFAOYSA-N 0.000 description 1
- RVTZCBVAJQQJTK-UHFFFAOYSA-N oxygen(2-);zirconium(4+) Chemical compound [O-2].[O-2].[Zr+4] RVTZCBVAJQQJTK-UHFFFAOYSA-N 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 description 1
- 229910001887 tin oxide Inorganic materials 0.000 description 1
- 238000002834 transmittance Methods 0.000 description 1
- 229910001930 tungsten oxide Inorganic materials 0.000 description 1
- 239000011787 zinc oxide Substances 0.000 description 1
- 229910001928 zirconium oxide Inorganic materials 0.000 description 1
Priority Applications (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2012143396A JP6317874B2 (ja) | 2012-06-26 | 2012-06-26 | 反射防止膜付基材の製造方法および光電気セル |
| KR1020130072048A KR102018592B1 (ko) | 2012-06-26 | 2013-06-24 | 반사방지막부 기재의 제조방법 및 광전기 셀 |
| CN201310256586.3A CN103515457B (zh) | 2012-06-26 | 2013-06-25 | 带防反射膜的基材的制造方法及光电池 |
| TW102122663A TWI572045B (zh) | 2012-06-26 | 2013-06-26 | 附抗反射膜基材的製造方法及光電單元 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2012143396A JP6317874B2 (ja) | 2012-06-26 | 2012-06-26 | 反射防止膜付基材の製造方法および光電気セル |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2014006443A JP2014006443A (ja) | 2014-01-16 |
| JP2014006443A5 true JP2014006443A5 (https=) | 2015-07-23 |
| JP6317874B2 JP6317874B2 (ja) | 2018-04-25 |
Family
ID=49897866
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2012143396A Expired - Fee Related JP6317874B2 (ja) | 2012-06-26 | 2012-06-26 | 反射防止膜付基材の製造方法および光電気セル |
Country Status (4)
| Country | Link |
|---|---|
| JP (1) | JP6317874B2 (https=) |
| KR (1) | KR102018592B1 (https=) |
| CN (1) | CN103515457B (https=) |
| TW (1) | TWI572045B (https=) |
Families Citing this family (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| AU2015353548B2 (en) | 2014-11-25 | 2018-04-05 | Ppg Industries Ohio, Inc. | Antiglare touch screen displays and other coated articles and methods of forming them |
| WO2017150132A1 (ja) * | 2016-02-29 | 2017-09-08 | 富士フイルム株式会社 | 積層体の製造方法、反射防止膜付ガラス及び太陽電池モジュール |
| JP6609202B2 (ja) * | 2016-03-08 | 2019-11-20 | 株式会社フジクラ | 光電変換装置 |
| CN106449887B (zh) * | 2016-11-23 | 2018-01-16 | 绍兴文理学院 | 一种用于光伏组件的反光薄膜材料 |
| JP2019129185A (ja) * | 2018-01-22 | 2019-08-01 | 三菱マテリアル株式会社 | サーミスタ及びその製造方法並びにサーミスタセンサ |
| JP7358251B2 (ja) * | 2020-01-17 | 2023-10-10 | 株式会社荏原製作所 | めっき支援システム、めっき支援装置、めっき支援プログラムおよびめっき実施条件決定方法 |
| KR102265267B1 (ko) * | 2021-01-13 | 2021-06-17 | (주)에스케이솔라에너지 | 건축물에 적용 가능한 컬러태양광모듈 |
| CN113788631B (zh) * | 2021-10-11 | 2023-05-05 | 上海西源新能源技术有限公司 | 一种ZnO-SiO2双涂层的下转换减反射膜及其制备方法 |
| KR102461977B1 (ko) * | 2022-01-20 | 2022-11-03 | 주식회사 블루비컴퍼니 | 광고 출력 기반의 디스플레이 어셈블리 |
| JP2023125378A (ja) * | 2022-02-28 | 2023-09-07 | 株式会社リコー | 液体組成物、インクジェット吐出用液体組成物、収容容器、無機酸化物含有層の製造装置、無機酸化物含有層の製造方法、及び電気化学素子 |
| CN114879401B (zh) * | 2022-04-28 | 2023-10-31 | Tcl华星光电技术有限公司 | 显示模组 |
Family Cites Families (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CH674596A5 (https=) | 1988-02-12 | 1990-06-15 | Sulzer Ag | |
| JPH0815097B2 (ja) | 1990-04-17 | 1996-02-14 | エコール・ポリテクニツク・フエデラール・ドウ・ローザンヌ | 光電池 |
| JP3424876B2 (ja) * | 1995-07-04 | 2003-07-07 | 松下電器産業株式会社 | 画像表示装置及びその製造方法 |
| JP4100863B2 (ja) | 2000-10-23 | 2008-06-11 | 触媒化成工業株式会社 | 光電気セル |
| JP4080756B2 (ja) * | 2002-02-01 | 2008-04-23 | 富士フイルム株式会社 | 反射防止膜とその製造方法ならびに画像表示装置 |
| JP2006072315A (ja) * | 2004-05-20 | 2006-03-16 | Fuji Photo Film Co Ltd | 反射防止能付き偏光板、その製造方法、及びそれを用いた画像表示装置 |
| FR2898295B1 (fr) * | 2006-03-10 | 2013-08-09 | Saint Gobain | Substrat transparent antireflet presentant une couleur neutre en reflexion |
| TWI371864B (en) * | 2008-01-29 | 2012-09-01 | Big Sun Energy Technology Inc | Solar cell with anti-reflection layer |
| JP2010127951A (ja) * | 2008-11-25 | 2010-06-10 | Toray Advanced Film Co Ltd | 低屈折率層形成用塗布液及び反射防止層の製造方法 |
| CN102782528B (zh) * | 2009-12-11 | 2015-02-25 | 日本板硝子株式会社 | 光电转换装置用玻璃罩及其制造方法 |
| JP2012086477A (ja) * | 2010-10-20 | 2012-05-10 | Hitachi Chemical Co Ltd | 薄膜転写材及びその製造方法並びに薄膜付き成形体及びその製造方法 |
-
2012
- 2012-06-26 JP JP2012143396A patent/JP6317874B2/ja not_active Expired - Fee Related
-
2013
- 2013-06-24 KR KR1020130072048A patent/KR102018592B1/ko active Active
- 2013-06-25 CN CN201310256586.3A patent/CN103515457B/zh not_active Expired - Fee Related
- 2013-06-26 TW TW102122663A patent/TWI572045B/zh not_active IP Right Cessation
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