JP6227642B2 - ガス混合装置 - Google Patents

ガス混合装置 Download PDF

Info

Publication number
JP6227642B2
JP6227642B2 JP2015521651A JP2015521651A JP6227642B2 JP 6227642 B2 JP6227642 B2 JP 6227642B2 JP 2015521651 A JP2015521651 A JP 2015521651A JP 2015521651 A JP2015521651 A JP 2015521651A JP 6227642 B2 JP6227642 B2 JP 6227642B2
Authority
JP
Japan
Prior art keywords
container
gas
mixing device
gas mixing
coupled
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
JP2015521651A
Other languages
English (en)
Japanese (ja)
Other versions
JP2015528060A (ja
JP2015528060A5 (enExample
Inventor
カルティーク シャー，
カルティーク シャー，
カルヤンジット ゴーシュ，
カルヤンジット ゴーシュ，
スコット マクレランド，
スコット マクレランド，
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Applied Materials Inc
Original Assignee
Applied Materials Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Applied Materials Inc filed Critical Applied Materials Inc
Publication of JP2015528060A publication Critical patent/JP2015528060A/ja
Publication of JP2015528060A5 publication Critical patent/JP2015528060A5/ja
Application granted granted Critical
Publication of JP6227642B2 publication Critical patent/JP6227642B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
    • B01F23/00—Mixing according to the phases to be mixed, e.g. dispersing or emulsifying
    • B01F23/10—Mixing gases with gases
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
    • B01F23/00—Mixing according to the phases to be mixed, e.g. dispersing or emulsifying
    • B01F23/10—Mixing gases with gases
    • B01F23/19—Mixing systems, i.e. flow charts or diagrams; Arrangements, e.g. comprising controlling means
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
    • B01F25/00—Flow mixers; Mixers for falling materials, e.g. solid particles
    • B01F25/10—Mixing by creating a vortex flow, e.g. by tangential introduction of flow components
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
    • B01F25/00—Flow mixers; Mixers for falling materials, e.g. solid particles
    • B01F25/10—Mixing by creating a vortex flow, e.g. by tangential introduction of flow components
    • B01F25/103—Mixing by creating a vortex flow, e.g. by tangential introduction of flow components with additional mixing means other than vortex mixers, e.g. the vortex chamber being positioned in another mixing chamber
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
    • B01F25/00—Flow mixers; Mixers for falling materials, e.g. solid particles
    • B01F25/40—Static mixers
    • B01F25/42—Static mixers in which the mixing is affected by moving the components jointly in changing directions, e.g. in tubes provided with baffles or obstructions
    • B01F25/43—Mixing tubes, e.g. wherein the material is moved in a radial or partly reversed direction
    • B01F25/431—Straight mixing tubes with baffles or obstructions that do not cause substantial pressure drop; Baffles therefor
    • B01F25/4315—Straight mixing tubes with baffles or obstructions that do not cause substantial pressure drop; Baffles therefor the baffles being deformed flat pieces of material
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
    • B01F25/00—Flow mixers; Mixers for falling materials, e.g. solid particles
    • B01F25/40—Static mixers
    • B01F25/42—Static mixers in which the mixing is affected by moving the components jointly in changing directions, e.g. in tubes provided with baffles or obstructions
    • B01F25/43—Mixing tubes, e.g. wherein the material is moved in a radial or partly reversed direction
    • B01F25/431—Straight mixing tubes with baffles or obstructions that do not cause substantial pressure drop; Baffles therefor
    • B01F25/4316—Straight mixing tubes with baffles or obstructions that do not cause substantial pressure drop; Baffles therefor the baffles being flat pieces of material, e.g. intermeshing, fixed to the wall or fixed on a central rod
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
    • B01F25/00—Flow mixers; Mixers for falling materials, e.g. solid particles
    • B01F25/40—Static mixers
    • B01F25/42—Static mixers in which the mixing is affected by moving the components jointly in changing directions, e.g. in tubes provided with baffles or obstructions
    • B01F25/43—Mixing tubes, e.g. wherein the material is moved in a radial or partly reversed direction
    • B01F25/431—Straight mixing tubes with baffles or obstructions that do not cause substantial pressure drop; Baffles therefor
    • B01F25/43197—Straight mixing tubes with baffles or obstructions that do not cause substantial pressure drop; Baffles therefor characterised by the mounting of the baffles or obstructions
    • B01F25/431971—Mounted on the wall
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/3244—Gas supply means
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/3244—Gas supply means
    • H01J37/32449—Gas control, e.g. control of the gas flow

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Dispersion Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Analytical Chemistry (AREA)
  • Chemical Vapour Deposition (AREA)
JP2015521651A 2012-07-12 2013-07-01 ガス混合装置 Active JP6227642B2 (ja)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US201261670654P 2012-07-12 2012-07-12
US61/670,654 2012-07-12
US13/918,033 2013-06-14
US13/918,033 US10232324B2 (en) 2012-07-12 2013-06-14 Gas mixing apparatus
PCT/US2013/048855 WO2014011423A1 (en) 2012-07-12 2013-07-01 Gas mixing apparatus

Publications (3)

Publication Number Publication Date
JP2015528060A JP2015528060A (ja) 2015-09-24
JP2015528060A5 JP2015528060A5 (enExample) 2016-08-18
JP6227642B2 true JP6227642B2 (ja) 2017-11-08

Family

ID=49912928

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2015521651A Active JP6227642B2 (ja) 2012-07-12 2013-07-01 ガス混合装置

Country Status (6)

Country Link
US (1) US10232324B2 (enExample)
JP (1) JP6227642B2 (enExample)
KR (1) KR102125764B1 (enExample)
CN (1) CN104471672B (enExample)
TW (1) TWI611458B (enExample)
WO (1) WO2014011423A1 (enExample)

Families Citing this family (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102014106523A1 (de) * 2014-05-09 2015-11-12 Aixtron Se Vorrichtung und Verfahren zum Versorgen einer CVD- oder PVD-Beschichtungseinrichtung mit einem Prozessgasgemisch
KR20160147482A (ko) * 2015-06-15 2016-12-23 삼성전자주식회사 가스 혼합부를 갖는 반도체 소자 제조 설비
CN108138321B (zh) * 2015-10-06 2020-03-20 株式会社爱发科 混合器、真空处理装置
CN105546348A (zh) * 2015-12-09 2016-05-04 无锡拓能自动化科技有限公司 应用于气体灌装站的高效混合气体灌装管道
CN105546349A (zh) * 2015-12-09 2016-05-04 无锡拓能自动化科技有限公司 应用于气体灌装站的气体灌装管道
US10256075B2 (en) * 2016-01-22 2019-04-09 Applied Materials, Inc. Gas splitting by time average injection into different zones by fast gas valves
JP6419745B2 (ja) * 2016-03-15 2018-11-07 株式会社東芝 ミキサ構造、流体通路装置、および処理装置
US11164737B2 (en) * 2017-08-30 2021-11-02 Applied Materials, Inc. Integrated epitaxy and preclean system
CN107413218B (zh) * 2017-09-11 2020-11-24 张家口新金石科技发展有限公司 二氧化碳和氧气气体混合装置及混合气体助燃污染气体零排放系统
CN112739451B (zh) * 2018-09-20 2023-04-04 诺拉姆工程及建造有限公司 流体混合装置
CN109609929A (zh) * 2018-11-20 2019-04-12 沈阳拓荆科技有限公司 混气结构及反应设备
JP2022515081A (ja) * 2018-12-20 2022-02-17 アプライド マテリアルズ インコーポレイテッド 処理チャンバの処理空間に改善されたガス流を供給するための方法および装置
TWI844842B (zh) * 2019-04-24 2024-06-11 美商應用材料股份有限公司 具有旋轉葉片與氣體注入之用於在固定腔室中塗覆粒子的反應器
CN110237734A (zh) * 2019-06-10 2019-09-17 中国石油大学(北京) 气体混合器及废气处理装置
CN112928008B (zh) * 2019-12-06 2023-03-24 中微半导体设备(上海)股份有限公司 气体供应系统及其气体输送方法、等离子体处理装置
US20230187229A1 (en) * 2020-04-06 2023-06-15 Lam Research Corporation Ceramic additive manufacturing techniques for gas injectors
CN113430502B (zh) * 2021-06-18 2022-07-22 北京北方华创微电子装备有限公司 半导体工艺设备及其混合进气装置
KR20230016923A (ko) * 2021-07-27 2023-02-03 삼성전자주식회사 증착 장치
AR131647A1 (es) * 2023-01-20 2025-04-16 Topsoe As Método para la producción de amoníaco azul
US20240383201A1 (en) * 2023-05-19 2024-11-21 Ut-Battelle, Llc Static mixing nozzles for fiber randomization in large scale additive manufacturing applications

Family Cites Families (25)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4520757A (en) * 1982-10-27 1985-06-04 Energy Conversion Devices, Inc. Process gas introduction, confinement and evacuation system for glow discharge deposition apparatus
JP2922910B2 (ja) 1988-12-14 1999-07-26 ソニー株式会社 低温成膜装置
JP2939823B2 (ja) 1990-07-20 1999-08-25 日本酸素株式会社 有機金属気相成長装置
JPH0610138A (ja) 1991-07-01 1994-01-18 Kokusai Chodendo Sangyo Gijutsu Kenkyu Center Ｍｏｃｖｄ法による酸化物超電導体の製造方法
US5523063A (en) * 1992-12-02 1996-06-04 Applied Materials, Inc. Apparatus for the turbulent mixing of gases
JPH07211643A (ja) 1994-01-20 1995-08-11 Hitachi Electron Eng Co Ltd Ｃｖｄ装置の反応ガス混合器
KR100296494B1 (ko) 1999-03-31 2001-07-03 윤영환 수소산소 혼합가스 발생장치
US7780789B2 (en) * 2001-10-26 2010-08-24 Applied Materials, Inc. Vortex chamber lids for atomic layer deposition
JP2003133300A (ja) 2001-10-26 2003-05-09 Tokyo Electron Ltd 成膜装置及び成膜方法
US7017514B1 (en) * 2001-12-03 2006-03-28 Novellus Systems, Inc. Method and apparatus for plasma optimization in water processing
US6933010B2 (en) 2001-12-03 2005-08-23 Ulvac, Inc Mixer, and device and method for manufacturing thin-film
JP4002768B2 (ja) 2002-02-14 2007-11-07 株式会社アルバック 成膜装置
US6684719B2 (en) * 2002-05-03 2004-02-03 Caterpillar Inc Method and apparatus for mixing gases
JP2004323894A (ja) 2003-04-23 2004-11-18 Sekisui Chem Co Ltd ガス供給安定化器、気相成長装置および気相成長方法
US20050252449A1 (en) * 2004-05-12 2005-11-17 Nguyen Son T Control of gas flow and delivery to suppress the formation of particles in an MOCVD/ALD system
US20060042754A1 (en) * 2004-07-30 2006-03-02 Tokyo Electron Limited Plasma etching apparatus
KR20080077642A (ko) 2005-12-23 2008-08-25 엠케이에스 인스트루먼츠, 인코포레이티드 가스들의 다운스트림 해리용 방법들 및 장치들
JP2007335755A (ja) 2006-06-16 2007-12-27 Matsushita Electric Ind Co Ltd 基板処理装置および基板処理方法
US20080206987A1 (en) * 2007-01-29 2008-08-28 Gelatos Avgerinos V Process for tungsten nitride deposition by a temperature controlled lid assembly
US8123902B2 (en) * 2007-03-21 2012-02-28 Applied Materials, Inc. Gas flow diffuser
US8512509B2 (en) * 2007-12-19 2013-08-20 Applied Materials, Inc. Plasma reactor gas distribution plate with radially distributed path splitting manifold
TW201112886A (en) 2009-01-09 2011-04-01 Ulvac Inc Plasma treatment apparatus
US9312154B2 (en) 2009-04-21 2016-04-12 Applied Materials, Inc. CVD apparatus for improved film thickness non-uniformity and particle performance
US20110203560A1 (en) 2010-02-23 2011-08-25 Wallace William K Fuel conditioning vacuum module
CN106635740B (zh) * 2011-09-30 2019-03-15 生命科技股份有限公司 具有膜喷洒器的容器

Also Published As

Publication number Publication date
CN104471672A (zh) 2015-03-25
CN104471672B (zh) 2020-01-17
US10232324B2 (en) 2019-03-19
JP2015528060A (ja) 2015-09-24
TW201407660A (zh) 2014-02-16
KR102125764B1 (ko) 2020-06-23
KR20150036567A (ko) 2015-04-07
WO2014011423A1 (en) 2014-01-16
TWI611458B (zh) 2018-01-11
US20140014270A1 (en) 2014-01-16

Similar Documents

Publication Publication Date Title
JP6227642B2 (ja) ガス混合装置
CN111801779B (zh) 载置台及电极部件
KR101912474B1 (ko) 초크 유동 요소 추출을 위한 시스템, 방법 및 장치
US9240307B2 (en) Plasma processing apparatus
CN105379428B (zh) 等离子体处理装置和等离子体处理方法
KR101358779B1 (ko) 멀티 코어 플라즈마 발생 플레이트를 구비한 플라즈마반응기
JP2011096689A (ja) プラズマ処理装置
US9263237B2 (en) Plasma processing apparatus and method thereof
JP2013016443A (ja) アンテナ、誘電体窓、プラズマ処理装置及びプラズマ処理方法
JP2016534522A (ja) 誘導結合プラズマ（ｉｃｐ）リアクタの電力堆積制御
US10734205B2 (en) Cleaning method and plasma processing apparatus
KR101496841B1 (ko) 혼합형 플라즈마 반응기
TW201311059A (zh) 在基材處理系統中用於控制電源分配的方法及裝置
KR20190035589A (ko) 플라즈마 처리 방법 및 플라즈마 처리 장치
US20240290625A1 (en) Plasma processing apparatus
TWI550708B (zh) 分離的電漿源控制用之系統、方法與設備
US11915850B2 (en) Two channel cosine-theta coil assembly
JP2021019099A (ja) 載置台アセンブリ、基板処理装置及びエッジリング
TW201335992A (zh) 電漿處理方法及電漿處理裝置
TW201608598A (zh) 電漿體處理裝置
JP2012164766A (ja) エッチング装置
KR101364577B1 (ko) 다중 출력 원격 플라즈마 발생기 및 이를 구비한 플라즈마처리 시스템
JP5174848B2 (ja) プラズマ処理方法及びプラズマ処理装置
JP2022123728A (ja) プラズマ処理装置およびプラズマ処理方法
KR100798351B1 (ko) 다중 원격 플라즈마 발생기를 구비한 플라즈마 처리 챔버

Legal Events

Date Code Title Description
A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20160628

A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20160628

A977 Report on retrieval

Free format text: JAPANESE INTERMEDIATE CODE: A971007

Effective date: 20170512

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20170523

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20170818

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20170912

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20171011

R150 Certificate of patent or registration of utility model

Ref document number: 6227642

Country of ref document: JP

Free format text: JAPANESE INTERMEDIATE CODE: R150

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250