KR102125764B1 - 가스 혼합 장치 - Google Patents
가스 혼합 장치 Download PDFInfo
- Publication number
- KR102125764B1 KR102125764B1 KR1020157003744A KR20157003744A KR102125764B1 KR 102125764 B1 KR102125764 B1 KR 102125764B1 KR 1020157003744 A KR1020157003744 A KR 1020157003744A KR 20157003744 A KR20157003744 A KR 20157003744A KR 102125764 B1 KR102125764 B1 KR 102125764B1
- Authority
- KR
- South Korea
- Prior art keywords
- container
- gas
- mixing device
- gas mixing
- coupled
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
Images
Classifications
-
- B01F3/026—
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/3244—Gas supply means
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
- B01F23/00—Mixing according to the phases to be mixed, e.g. dispersing or emulsifying
- B01F23/10—Mixing gases with gases
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
- B01F23/00—Mixing according to the phases to be mixed, e.g. dispersing or emulsifying
- B01F23/10—Mixing gases with gases
- B01F23/19—Mixing systems, i.e. flow charts or diagrams; Arrangements, e.g. comprising controlling means
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
- B01F25/00—Flow mixers; Mixers for falling materials, e.g. solid particles
- B01F25/10—Mixing by creating a vortex flow, e.g. by tangential introduction of flow components
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
- B01F25/00—Flow mixers; Mixers for falling materials, e.g. solid particles
- B01F25/10—Mixing by creating a vortex flow, e.g. by tangential introduction of flow components
- B01F25/103—Mixing by creating a vortex flow, e.g. by tangential introduction of flow components with additional mixing means other than vortex mixers, e.g. the vortex chamber being positioned in another mixing chamber
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
- B01F25/00—Flow mixers; Mixers for falling materials, e.g. solid particles
- B01F25/40—Static mixers
- B01F25/42—Static mixers in which the mixing is affected by moving the components jointly in changing directions, e.g. in tubes provided with baffles or obstructions
- B01F25/43—Mixing tubes, e.g. wherein the material is moved in a radial or partly reversed direction
- B01F25/431—Straight mixing tubes with baffles or obstructions that do not cause substantial pressure drop; Baffles therefor
- B01F25/4315—Straight mixing tubes with baffles or obstructions that do not cause substantial pressure drop; Baffles therefor the baffles being deformed flat pieces of material
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
- B01F25/00—Flow mixers; Mixers for falling materials, e.g. solid particles
- B01F25/40—Static mixers
- B01F25/42—Static mixers in which the mixing is affected by moving the components jointly in changing directions, e.g. in tubes provided with baffles or obstructions
- B01F25/43—Mixing tubes, e.g. wherein the material is moved in a radial or partly reversed direction
- B01F25/431—Straight mixing tubes with baffles or obstructions that do not cause substantial pressure drop; Baffles therefor
- B01F25/4316—Straight mixing tubes with baffles or obstructions that do not cause substantial pressure drop; Baffles therefor the baffles being flat pieces of material, e.g. intermeshing, fixed to the wall or fixed on a central rod
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
- B01F25/00—Flow mixers; Mixers for falling materials, e.g. solid particles
- B01F25/40—Static mixers
- B01F25/42—Static mixers in which the mixing is affected by moving the components jointly in changing directions, e.g. in tubes provided with baffles or obstructions
- B01F25/43—Mixing tubes, e.g. wherein the material is moved in a radial or partly reversed direction
- B01F25/431—Straight mixing tubes with baffles or obstructions that do not cause substantial pressure drop; Baffles therefor
- B01F25/43197—Straight mixing tubes with baffles or obstructions that do not cause substantial pressure drop; Baffles therefor characterised by the mounting of the baffles or obstructions
- B01F25/431971—Mounted on the wall
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/3244—Gas supply means
- H01J37/32449—Gas control, e.g. control of the gas flow
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Dispersion Chemistry (AREA)
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Analytical Chemistry (AREA)
- Chemical Vapour Deposition (AREA)
Applications Claiming Priority (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US201261670654P | 2012-07-12 | 2012-07-12 | |
| US61/670,654 | 2012-07-12 | ||
| US13/918,033 US10232324B2 (en) | 2012-07-12 | 2013-06-14 | Gas mixing apparatus |
| US13/918,033 | 2013-06-14 | ||
| PCT/US2013/048855 WO2014011423A1 (en) | 2012-07-12 | 2013-07-01 | Gas mixing apparatus |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| KR20150036567A KR20150036567A (ko) | 2015-04-07 |
| KR102125764B1 true KR102125764B1 (ko) | 2020-06-23 |
Family
ID=49912928
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR1020157003744A Active KR102125764B1 (ko) | 2012-07-12 | 2013-07-01 | 가스 혼합 장치 |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US10232324B2 (enExample) |
| JP (1) | JP6227642B2 (enExample) |
| KR (1) | KR102125764B1 (enExample) |
| CN (1) | CN104471672B (enExample) |
| TW (1) | TWI611458B (enExample) |
| WO (1) | WO2014011423A1 (enExample) |
Families Citing this family (20)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE102014106523A1 (de) * | 2014-05-09 | 2015-11-12 | Aixtron Se | Vorrichtung und Verfahren zum Versorgen einer CVD- oder PVD-Beschichtungseinrichtung mit einem Prozessgasgemisch |
| KR20160147482A (ko) * | 2015-06-15 | 2016-12-23 | 삼성전자주식회사 | 가스 혼합부를 갖는 반도체 소자 제조 설비 |
| CN108138321B (zh) * | 2015-10-06 | 2020-03-20 | 株式会社爱发科 | 混合器、真空处理装置 |
| CN105546349A (zh) * | 2015-12-09 | 2016-05-04 | 无锡拓能自动化科技有限公司 | 应用于气体灌装站的气体灌装管道 |
| CN105546348A (zh) * | 2015-12-09 | 2016-05-04 | 无锡拓能自动化科技有限公司 | 应用于气体灌装站的高效混合气体灌装管道 |
| US10256075B2 (en) * | 2016-01-22 | 2019-04-09 | Applied Materials, Inc. | Gas splitting by time average injection into different zones by fast gas valves |
| JP6419745B2 (ja) * | 2016-03-15 | 2018-11-07 | 株式会社東芝 | ミキサ構造、流体通路装置、および処理装置 |
| US11164737B2 (en) * | 2017-08-30 | 2021-11-02 | Applied Materials, Inc. | Integrated epitaxy and preclean system |
| CN107413218B (zh) * | 2017-09-11 | 2020-11-24 | 张家口新金石科技发展有限公司 | 二氧化碳和氧气气体混合装置及混合气体助燃污染气体零排放系统 |
| KR102608001B1 (ko) * | 2018-09-20 | 2023-12-01 | 노람 엔지니어링 앤드 콘스트럭터스 엘티디. | 유체 혼합 장치 |
| CN109609929A (zh) * | 2018-11-20 | 2019-04-12 | 沈阳拓荆科技有限公司 | 混气结构及反应设备 |
| JP2022515081A (ja) * | 2018-12-20 | 2022-02-17 | アプライド マテリアルズ インコーポレイテッド | 処理チャンバの処理空間に改善されたガス流を供給するための方法および装置 |
| TWI738301B (zh) | 2019-04-24 | 2021-09-01 | 美商應用材料股份有限公司 | 具有旋轉葉片與氣體注入之用於在固定腔室中塗覆粒子的反應器 |
| CN110237734A (zh) * | 2019-06-10 | 2019-09-17 | 中国石油大学(北京) | 气体混合器及废气处理装置 |
| CN112928008B (zh) * | 2019-12-06 | 2023-03-24 | 中微半导体设备(上海)股份有限公司 | 气体供应系统及其气体输送方法、等离子体处理装置 |
| WO2021206950A1 (en) * | 2020-04-06 | 2021-10-14 | Lam Research Corporation | Ceramic additive manufacturing techniques for gas injectors |
| CN113430502B (zh) * | 2021-06-18 | 2022-07-22 | 北京北方华创微电子装备有限公司 | 半导体工艺设备及其混合进气装置 |
| KR20230016923A (ko) * | 2021-07-27 | 2023-02-03 | 삼성전자주식회사 | 증착 장치 |
| KR20250137133A (ko) * | 2023-01-20 | 2025-09-17 | 토프쉐 에이/에스 | 블루 암모니아의 생산 방법 |
| US20240383196A1 (en) * | 2023-05-19 | 2024-11-21 | Ut-Battelle, Llc | Highly aligned fiber nozzle for additive manufacturing applications |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2004323894A (ja) * | 2003-04-23 | 2004-11-18 | Sekisui Chem Co Ltd | ガス供給安定化器、気相成長装置および気相成長方法 |
| JP2007335755A (ja) * | 2006-06-16 | 2007-12-27 | Matsushita Electric Ind Co Ltd | 基板処理装置および基板処理方法 |
| JP2009521783A (ja) * | 2005-12-23 | 2009-06-04 | エム ケー エス インストルメンツ インコーポレーテッド | 気体を下流にて解離する方法及び装置 |
Family Cites Families (22)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4520757A (en) * | 1982-10-27 | 1985-06-04 | Energy Conversion Devices, Inc. | Process gas introduction, confinement and evacuation system for glow discharge deposition apparatus |
| JP2922910B2 (ja) | 1988-12-14 | 1999-07-26 | ソニー株式会社 | 低温成膜装置 |
| JP2939823B2 (ja) | 1990-07-20 | 1999-08-25 | 日本酸素株式会社 | 有機金属気相成長装置 |
| JPH0610138A (ja) | 1991-07-01 | 1994-01-18 | Kokusai Chodendo Sangyo Gijutsu Kenkyu Center | Mocvd法による酸化物超電導体の製造方法 |
| US5523063A (en) * | 1992-12-02 | 1996-06-04 | Applied Materials, Inc. | Apparatus for the turbulent mixing of gases |
| JPH07211643A (ja) | 1994-01-20 | 1995-08-11 | Hitachi Electron Eng Co Ltd | Cvd装置の反応ガス混合器 |
| KR100296494B1 (ko) | 1999-03-31 | 2001-07-03 | 윤영환 | 수소산소 혼합가스 발생장치 |
| JP2003133300A (ja) | 2001-10-26 | 2003-05-09 | Tokyo Electron Ltd | 成膜装置及び成膜方法 |
| US7780789B2 (en) * | 2001-10-26 | 2010-08-24 | Applied Materials, Inc. | Vortex chamber lids for atomic layer deposition |
| US7017514B1 (en) * | 2001-12-03 | 2006-03-28 | Novellus Systems, Inc. | Method and apparatus for plasma optimization in water processing |
| KR100974848B1 (ko) | 2001-12-03 | 2010-08-11 | 가부시키가이샤 알박 | 혼합기, 박막 제조 장치 및 박막 제조 방법 |
| JP4002768B2 (ja) | 2002-02-14 | 2007-11-07 | 株式会社アルバック | 成膜装置 |
| US6684719B2 (en) * | 2002-05-03 | 2004-02-03 | Caterpillar Inc | Method and apparatus for mixing gases |
| US20050252449A1 (en) * | 2004-05-12 | 2005-11-17 | Nguyen Son T | Control of gas flow and delivery to suppress the formation of particles in an MOCVD/ALD system |
| US20060042754A1 (en) * | 2004-07-30 | 2006-03-02 | Tokyo Electron Limited | Plasma etching apparatus |
| US8821637B2 (en) * | 2007-01-29 | 2014-09-02 | Applied Materials, Inc. | Temperature controlled lid assembly for tungsten nitride deposition |
| US8123902B2 (en) * | 2007-03-21 | 2012-02-28 | Applied Materials, Inc. | Gas flow diffuser |
| US8512509B2 (en) * | 2007-12-19 | 2013-08-20 | Applied Materials, Inc. | Plasma reactor gas distribution plate with radially distributed path splitting manifold |
| JP5378416B2 (ja) * | 2009-01-09 | 2013-12-25 | 株式会社アルバック | プラズマ処理装置 |
| JP5822823B2 (ja) * | 2009-04-21 | 2015-11-24 | アプライド マテリアルズ インコーポレイテッドApplied Materials,Incorporated | 膜厚不均一性および粒子性能を改善するcvd装置 |
| US20110203560A1 (en) | 2010-02-23 | 2011-08-25 | Wallace William K | Fuel conditioning vacuum module |
| JP6101698B2 (ja) * | 2011-09-30 | 2017-03-22 | ライフ テクノロジーズ コーポレイション | フィルムスパージャを有する容器 |
-
2013
- 2013-06-14 US US13/918,033 patent/US10232324B2/en not_active Expired - Fee Related
- 2013-06-18 TW TW102121573A patent/TWI611458B/zh active
- 2013-07-01 WO PCT/US2013/048855 patent/WO2014011423A1/en not_active Ceased
- 2013-07-01 CN CN201380036866.1A patent/CN104471672B/zh active Active
- 2013-07-01 KR KR1020157003744A patent/KR102125764B1/ko active Active
- 2013-07-01 JP JP2015521651A patent/JP6227642B2/ja active Active
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2004323894A (ja) * | 2003-04-23 | 2004-11-18 | Sekisui Chem Co Ltd | ガス供給安定化器、気相成長装置および気相成長方法 |
| JP2009521783A (ja) * | 2005-12-23 | 2009-06-04 | エム ケー エス インストルメンツ インコーポレーテッド | 気体を下流にて解離する方法及び装置 |
| JP2007335755A (ja) * | 2006-06-16 | 2007-12-27 | Matsushita Electric Ind Co Ltd | 基板処理装置および基板処理方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| WO2014011423A1 (en) | 2014-01-16 |
| US20140014270A1 (en) | 2014-01-16 |
| JP6227642B2 (ja) | 2017-11-08 |
| TW201407660A (zh) | 2014-02-16 |
| US10232324B2 (en) | 2019-03-19 |
| CN104471672A (zh) | 2015-03-25 |
| KR20150036567A (ko) | 2015-04-07 |
| CN104471672B (zh) | 2020-01-17 |
| JP2015528060A (ja) | 2015-09-24 |
| TWI611458B (zh) | 2018-01-11 |
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