CN104471672B - 气体混合设备 - Google Patents
气体混合设备 Download PDFInfo
- Publication number
- CN104471672B CN104471672B CN201380036866.1A CN201380036866A CN104471672B CN 104471672 B CN104471672 B CN 104471672B CN 201380036866 A CN201380036866 A CN 201380036866A CN 104471672 B CN104471672 B CN 104471672B
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- CN
- China
- Prior art keywords
- vessel
- gas
- container
- coupled
- inlet
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
- B01F23/00—Mixing according to the phases to be mixed, e.g. dispersing or emulsifying
- B01F23/10—Mixing gases with gases
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
- B01F23/00—Mixing according to the phases to be mixed, e.g. dispersing or emulsifying
- B01F23/10—Mixing gases with gases
- B01F23/19—Mixing systems, i.e. flow charts or diagrams; Arrangements, e.g. comprising controlling means
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
- B01F25/00—Flow mixers; Mixers for falling materials, e.g. solid particles
- B01F25/10—Mixing by creating a vortex flow, e.g. by tangential introduction of flow components
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
- B01F25/00—Flow mixers; Mixers for falling materials, e.g. solid particles
- B01F25/10—Mixing by creating a vortex flow, e.g. by tangential introduction of flow components
- B01F25/103—Mixing by creating a vortex flow, e.g. by tangential introduction of flow components with additional mixing means other than vortex mixers, e.g. the vortex chamber being positioned in another mixing chamber
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
- B01F25/00—Flow mixers; Mixers for falling materials, e.g. solid particles
- B01F25/40—Static mixers
- B01F25/42—Static mixers in which the mixing is affected by moving the components jointly in changing directions, e.g. in tubes provided with baffles or obstructions
- B01F25/43—Mixing tubes, e.g. wherein the material is moved in a radial or partly reversed direction
- B01F25/431—Straight mixing tubes with baffles or obstructions that do not cause substantial pressure drop; Baffles therefor
- B01F25/4315—Straight mixing tubes with baffles or obstructions that do not cause substantial pressure drop; Baffles therefor the baffles being deformed flat pieces of material
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
- B01F25/00—Flow mixers; Mixers for falling materials, e.g. solid particles
- B01F25/40—Static mixers
- B01F25/42—Static mixers in which the mixing is affected by moving the components jointly in changing directions, e.g. in tubes provided with baffles or obstructions
- B01F25/43—Mixing tubes, e.g. wherein the material is moved in a radial or partly reversed direction
- B01F25/431—Straight mixing tubes with baffles or obstructions that do not cause substantial pressure drop; Baffles therefor
- B01F25/4316—Straight mixing tubes with baffles or obstructions that do not cause substantial pressure drop; Baffles therefor the baffles being flat pieces of material, e.g. intermeshing, fixed to the wall or fixed on a central rod
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
- B01F25/00—Flow mixers; Mixers for falling materials, e.g. solid particles
- B01F25/40—Static mixers
- B01F25/42—Static mixers in which the mixing is affected by moving the components jointly in changing directions, e.g. in tubes provided with baffles or obstructions
- B01F25/43—Mixing tubes, e.g. wherein the material is moved in a radial or partly reversed direction
- B01F25/431—Straight mixing tubes with baffles or obstructions that do not cause substantial pressure drop; Baffles therefor
- B01F25/43197—Straight mixing tubes with baffles or obstructions that do not cause substantial pressure drop; Baffles therefor characterised by the mounting of the baffles or obstructions
- B01F25/431971—Mounted on the wall
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/3244—Gas supply means
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/3244—Gas supply means
- H01J37/32449—Gas control, e.g. control of the gas flow
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Dispersion Chemistry (AREA)
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Analytical Chemistry (AREA)
- Chemical Vapour Deposition (AREA)
Applications Claiming Priority (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US201261670654P | 2012-07-12 | 2012-07-12 | |
| US61/670,654 | 2012-07-12 | ||
| US13/918,033 | 2013-06-14 | ||
| US13/918,033 US10232324B2 (en) | 2012-07-12 | 2013-06-14 | Gas mixing apparatus |
| PCT/US2013/048855 WO2014011423A1 (en) | 2012-07-12 | 2013-07-01 | Gas mixing apparatus |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN104471672A CN104471672A (zh) | 2015-03-25 |
| CN104471672B true CN104471672B (zh) | 2020-01-17 |
Family
ID=49912928
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201380036866.1A Active CN104471672B (zh) | 2012-07-12 | 2013-07-01 | 气体混合设备 |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US10232324B2 (enExample) |
| JP (1) | JP6227642B2 (enExample) |
| KR (1) | KR102125764B1 (enExample) |
| CN (1) | CN104471672B (enExample) |
| TW (1) | TWI611458B (enExample) |
| WO (1) | WO2014011423A1 (enExample) |
Families Citing this family (20)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE102014106523A1 (de) * | 2014-05-09 | 2015-11-12 | Aixtron Se | Vorrichtung und Verfahren zum Versorgen einer CVD- oder PVD-Beschichtungseinrichtung mit einem Prozessgasgemisch |
| KR20160147482A (ko) * | 2015-06-15 | 2016-12-23 | 삼성전자주식회사 | 가스 혼합부를 갖는 반도체 소자 제조 설비 |
| CN108138321B (zh) * | 2015-10-06 | 2020-03-20 | 株式会社爱发科 | 混合器、真空处理装置 |
| CN105546348A (zh) * | 2015-12-09 | 2016-05-04 | 无锡拓能自动化科技有限公司 | 应用于气体灌装站的高效混合气体灌装管道 |
| CN105546349A (zh) * | 2015-12-09 | 2016-05-04 | 无锡拓能自动化科技有限公司 | 应用于气体灌装站的气体灌装管道 |
| US10256075B2 (en) * | 2016-01-22 | 2019-04-09 | Applied Materials, Inc. | Gas splitting by time average injection into different zones by fast gas valves |
| JP6419745B2 (ja) * | 2016-03-15 | 2018-11-07 | 株式会社東芝 | ミキサ構造、流体通路装置、および処理装置 |
| US11164737B2 (en) * | 2017-08-30 | 2021-11-02 | Applied Materials, Inc. | Integrated epitaxy and preclean system |
| CN107413218B (zh) * | 2017-09-11 | 2020-11-24 | 张家口新金石科技发展有限公司 | 二氧化碳和氧气气体混合装置及混合气体助燃污染气体零排放系统 |
| HUE060591T2 (hu) * | 2018-09-20 | 2023-03-28 | Noram Eng And Constructors Ltd | Fluid keverõ készülék |
| CN109609929A (zh) * | 2018-11-20 | 2019-04-12 | 沈阳拓荆科技有限公司 | 混气结构及反应设备 |
| CN118841306A (zh) * | 2018-12-20 | 2024-10-25 | 应用材料公司 | 用于供应改良的气流至处理腔室的处理空间的方法和设备 |
| TWI738301B (zh) * | 2019-04-24 | 2021-09-01 | 美商應用材料股份有限公司 | 具有旋轉葉片與氣體注入之用於在固定腔室中塗覆粒子的反應器 |
| CN110237734A (zh) * | 2019-06-10 | 2019-09-17 | 中国石油大学(北京) | 气体混合器及废气处理装置 |
| CN112928008B (zh) * | 2019-12-06 | 2023-03-24 | 中微半导体设备(上海)股份有限公司 | 气体供应系统及其气体输送方法、等离子体处理装置 |
| KR102781656B1 (ko) * | 2020-04-06 | 2025-03-13 | 램 리써치 코포레이션 | 가스 주입기들을 위한 세라믹 애디티브 제작 (additive manufacturing) 기법들 |
| CN113430502B (zh) * | 2021-06-18 | 2022-07-22 | 北京北方华创微电子装备有限公司 | 半导体工艺设备及其混合进气装置 |
| KR20230016923A (ko) * | 2021-07-27 | 2023-02-03 | 삼성전자주식회사 | 증착 장치 |
| TW202440463A (zh) * | 2023-01-20 | 2024-10-16 | 丹麥商托普索公司 | 藍氨的製造方法 |
| US12491681B2 (en) * | 2023-05-19 | 2025-12-09 | Ut-Battelle, Llc | Static mixing nozzles for long fiber and resin mixing and dispersing in polymer additive manufacturing |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20050252449A1 (en) * | 2004-05-12 | 2005-11-17 | Nguyen Son T | Control of gas flow and delivery to suppress the formation of particles in an MOCVD/ALD system |
| US7017514B1 (en) * | 2001-12-03 | 2006-03-28 | Novellus Systems, Inc. | Method and apparatus for plasma optimization in water processing |
Family Cites Families (23)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4520757A (en) * | 1982-10-27 | 1985-06-04 | Energy Conversion Devices, Inc. | Process gas introduction, confinement and evacuation system for glow discharge deposition apparatus |
| JP2922910B2 (ja) | 1988-12-14 | 1999-07-26 | ソニー株式会社 | 低温成膜装置 |
| JP2939823B2 (ja) | 1990-07-20 | 1999-08-25 | 日本酸素株式会社 | 有機金属気相成長装置 |
| JPH0610138A (ja) | 1991-07-01 | 1994-01-18 | Kokusai Chodendo Sangyo Gijutsu Kenkyu Center | Mocvd法による酸化物超電導体の製造方法 |
| US5523063A (en) * | 1992-12-02 | 1996-06-04 | Applied Materials, Inc. | Apparatus for the turbulent mixing of gases |
| JPH07211643A (ja) | 1994-01-20 | 1995-08-11 | Hitachi Electron Eng Co Ltd | Cvd装置の反応ガス混合器 |
| KR100296494B1 (ko) | 1999-03-31 | 2001-07-03 | 윤영환 | 수소산소 혼합가스 발생장치 |
| JP2003133300A (ja) | 2001-10-26 | 2003-05-09 | Tokyo Electron Ltd | 成膜装置及び成膜方法 |
| US7780789B2 (en) * | 2001-10-26 | 2010-08-24 | Applied Materials, Inc. | Vortex chamber lids for atomic layer deposition |
| EP1452626B9 (en) | 2001-12-03 | 2012-01-18 | Ulvac, Inc. | Mixer, and device and method for manufacturing thin film |
| JP4002768B2 (ja) | 2002-02-14 | 2007-11-07 | 株式会社アルバック | 成膜装置 |
| US6684719B2 (en) * | 2002-05-03 | 2004-02-03 | Caterpillar Inc | Method and apparatus for mixing gases |
| JP2004323894A (ja) | 2003-04-23 | 2004-11-18 | Sekisui Chem Co Ltd | ガス供給安定化器、気相成長装置および気相成長方法 |
| US20060042754A1 (en) * | 2004-07-30 | 2006-03-02 | Tokyo Electron Limited | Plasma etching apparatus |
| WO2007075509A2 (en) | 2005-12-23 | 2007-07-05 | Mks Instruments, Inc. | Methods and apparatus for downstream dissociation of gases |
| JP2007335755A (ja) | 2006-06-16 | 2007-12-27 | Matsushita Electric Ind Co Ltd | 基板処理装置および基板処理方法 |
| US20080206987A1 (en) * | 2007-01-29 | 2008-08-28 | Gelatos Avgerinos V | Process for tungsten nitride deposition by a temperature controlled lid assembly |
| US8123902B2 (en) | 2007-03-21 | 2012-02-28 | Applied Materials, Inc. | Gas flow diffuser |
| US8512509B2 (en) * | 2007-12-19 | 2013-08-20 | Applied Materials, Inc. | Plasma reactor gas distribution plate with radially distributed path splitting manifold |
| JP5378416B2 (ja) * | 2009-01-09 | 2013-12-25 | 株式会社アルバック | プラズマ処理装置 |
| KR101671158B1 (ko) * | 2009-04-21 | 2016-11-01 | 어플라이드 머티어리얼스, 인코포레이티드 | 박막 두께 불균일성 및 파티클 성능이 개선된 cvd 장치 |
| US20110203560A1 (en) | 2010-02-23 | 2011-08-25 | Wallace William K | Fuel conditioning vacuum module |
| CN104114266B (zh) * | 2011-09-30 | 2016-12-14 | 生命科技股份有限公司 | 具有膜喷洒器的容器 |
-
2013
- 2013-06-14 US US13/918,033 patent/US10232324B2/en not_active Expired - Fee Related
- 2013-06-18 TW TW102121573A patent/TWI611458B/zh active
- 2013-07-01 JP JP2015521651A patent/JP6227642B2/ja active Active
- 2013-07-01 CN CN201380036866.1A patent/CN104471672B/zh active Active
- 2013-07-01 WO PCT/US2013/048855 patent/WO2014011423A1/en not_active Ceased
- 2013-07-01 KR KR1020157003744A patent/KR102125764B1/ko active Active
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7017514B1 (en) * | 2001-12-03 | 2006-03-28 | Novellus Systems, Inc. | Method and apparatus for plasma optimization in water processing |
| US20050252449A1 (en) * | 2004-05-12 | 2005-11-17 | Nguyen Son T | Control of gas flow and delivery to suppress the formation of particles in an MOCVD/ALD system |
Also Published As
| Publication number | Publication date |
|---|---|
| KR102125764B1 (ko) | 2020-06-23 |
| TW201407660A (zh) | 2014-02-16 |
| WO2014011423A1 (en) | 2014-01-16 |
| US20140014270A1 (en) | 2014-01-16 |
| JP6227642B2 (ja) | 2017-11-08 |
| JP2015528060A (ja) | 2015-09-24 |
| TWI611458B (zh) | 2018-01-11 |
| KR20150036567A (ko) | 2015-04-07 |
| US10232324B2 (en) | 2019-03-19 |
| CN104471672A (zh) | 2015-03-25 |
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| GR01 | Patent grant | ||
| GR01 | Patent grant |