JP2015528060A5 - - Google Patents
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- Publication number
- JP2015528060A5 JP2015528060A5 JP2015521651A JP2015521651A JP2015528060A5 JP 2015528060 A5 JP2015528060 A5 JP 2015528060A5 JP 2015521651 A JP2015521651 A JP 2015521651A JP 2015521651 A JP2015521651 A JP 2015521651A JP 2015528060 A5 JP2015528060 A5 JP 2015528060A5
- Authority
- JP
- Japan
- Prior art keywords
- plasma
- wafer
- substrate
- gas
- chamber
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000007789 gas Substances 0.000 description 7
- 239000000758 substrate Substances 0.000 description 5
- 238000000034 method Methods 0.000 description 4
- 150000002500 ions Chemical class 0.000 description 3
- NJPPVKZQTLUDBO-UHFFFAOYSA-N novaluron Chemical compound C1=C(Cl)C(OC(F)(F)C(OC(F)(F)F)F)=CC=C1NC(=O)NC(=O)C1=C(F)C=CC=C1F NJPPVKZQTLUDBO-UHFFFAOYSA-N 0.000 description 2
- 230000004907 flux Effects 0.000 description 1
- 238000007654 immersion Methods 0.000 description 1
- 238000002513 implantation Methods 0.000 description 1
Applications Claiming Priority (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US201261670654P | 2012-07-12 | 2012-07-12 | |
| US61/670,654 | 2012-07-12 | ||
| US13/918,033 | 2013-06-14 | ||
| US13/918,033 US10232324B2 (en) | 2012-07-12 | 2013-06-14 | Gas mixing apparatus |
| PCT/US2013/048855 WO2014011423A1 (en) | 2012-07-12 | 2013-07-01 | Gas mixing apparatus |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2015528060A JP2015528060A (ja) | 2015-09-24 |
| JP2015528060A5 true JP2015528060A5 (enExample) | 2016-08-18 |
| JP6227642B2 JP6227642B2 (ja) | 2017-11-08 |
Family
ID=49912928
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2015521651A Active JP6227642B2 (ja) | 2012-07-12 | 2013-07-01 | ガス混合装置 |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US10232324B2 (enExample) |
| JP (1) | JP6227642B2 (enExample) |
| KR (1) | KR102125764B1 (enExample) |
| CN (1) | CN104471672B (enExample) |
| TW (1) | TWI611458B (enExample) |
| WO (1) | WO2014011423A1 (enExample) |
Families Citing this family (20)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE102014106523A1 (de) * | 2014-05-09 | 2015-11-12 | Aixtron Se | Vorrichtung und Verfahren zum Versorgen einer CVD- oder PVD-Beschichtungseinrichtung mit einem Prozessgasgemisch |
| KR20160147482A (ko) * | 2015-06-15 | 2016-12-23 | 삼성전자주식회사 | 가스 혼합부를 갖는 반도체 소자 제조 설비 |
| CN108138321B (zh) * | 2015-10-06 | 2020-03-20 | 株式会社爱发科 | 混合器、真空处理装置 |
| CN105546348A (zh) * | 2015-12-09 | 2016-05-04 | 无锡拓能自动化科技有限公司 | 应用于气体灌装站的高效混合气体灌装管道 |
| CN105546349A (zh) * | 2015-12-09 | 2016-05-04 | 无锡拓能自动化科技有限公司 | 应用于气体灌装站的气体灌装管道 |
| US10256075B2 (en) * | 2016-01-22 | 2019-04-09 | Applied Materials, Inc. | Gas splitting by time average injection into different zones by fast gas valves |
| JP6419745B2 (ja) * | 2016-03-15 | 2018-11-07 | 株式会社東芝 | ミキサ構造、流体通路装置、および処理装置 |
| US11164737B2 (en) * | 2017-08-30 | 2021-11-02 | Applied Materials, Inc. | Integrated epitaxy and preclean system |
| CN107413218B (zh) * | 2017-09-11 | 2020-11-24 | 张家口新金石科技发展有限公司 | 二氧化碳和氧气气体混合装置及混合气体助燃污染气体零排放系统 |
| CN112739451B (zh) * | 2018-09-20 | 2023-04-04 | 诺拉姆工程及建造有限公司 | 流体混合装置 |
| CN109609929A (zh) * | 2018-11-20 | 2019-04-12 | 沈阳拓荆科技有限公司 | 混气结构及反应设备 |
| JP2022515081A (ja) * | 2018-12-20 | 2022-02-17 | アプライド マテリアルズ インコーポレイテッド | 処理チャンバの処理空間に改善されたガス流を供給するための方法および装置 |
| TWI844842B (zh) * | 2019-04-24 | 2024-06-11 | 美商應用材料股份有限公司 | 具有旋轉葉片與氣體注入之用於在固定腔室中塗覆粒子的反應器 |
| CN110237734A (zh) * | 2019-06-10 | 2019-09-17 | 中国石油大学(北京) | 气体混合器及废气处理装置 |
| CN112928008B (zh) * | 2019-12-06 | 2023-03-24 | 中微半导体设备(上海)股份有限公司 | 气体供应系统及其气体输送方法、等离子体处理装置 |
| US20230187229A1 (en) * | 2020-04-06 | 2023-06-15 | Lam Research Corporation | Ceramic additive manufacturing techniques for gas injectors |
| CN113430502B (zh) * | 2021-06-18 | 2022-07-22 | 北京北方华创微电子装备有限公司 | 半导体工艺设备及其混合进气装置 |
| KR20230016923A (ko) * | 2021-07-27 | 2023-02-03 | 삼성전자주식회사 | 증착 장치 |
| AR131647A1 (es) * | 2023-01-20 | 2025-04-16 | Topsoe As | Método para la producción de amoníaco azul |
| US20240383201A1 (en) * | 2023-05-19 | 2024-11-21 | Ut-Battelle, Llc | Static mixing nozzles for fiber randomization in large scale additive manufacturing applications |
Family Cites Families (25)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4520757A (en) * | 1982-10-27 | 1985-06-04 | Energy Conversion Devices, Inc. | Process gas introduction, confinement and evacuation system for glow discharge deposition apparatus |
| JP2922910B2 (ja) | 1988-12-14 | 1999-07-26 | ソニー株式会社 | 低温成膜装置 |
| JP2939823B2 (ja) | 1990-07-20 | 1999-08-25 | 日本酸素株式会社 | 有機金属気相成長装置 |
| JPH0610138A (ja) | 1991-07-01 | 1994-01-18 | Kokusai Chodendo Sangyo Gijutsu Kenkyu Center | Ｍｏｃｖｄ法による酸化物超電導体の製造方法 |
| US5523063A (en) * | 1992-12-02 | 1996-06-04 | Applied Materials, Inc. | Apparatus for the turbulent mixing of gases |
| JPH07211643A (ja) | 1994-01-20 | 1995-08-11 | Hitachi Electron Eng Co Ltd | Ｃｖｄ装置の反応ガス混合器 |
| KR100296494B1 (ko) | 1999-03-31 | 2001-07-03 | 윤영환 | 수소산소 혼합가스 발생장치 |
| US7780789B2 (en) * | 2001-10-26 | 2010-08-24 | Applied Materials, Inc. | Vortex chamber lids for atomic layer deposition |
| JP2003133300A (ja) | 2001-10-26 | 2003-05-09 | Tokyo Electron Ltd | 成膜装置及び成膜方法 |
| US7017514B1 (en) * | 2001-12-03 | 2006-03-28 | Novellus Systems, Inc. | Method and apparatus for plasma optimization in water processing |
| US6933010B2 (en) | 2001-12-03 | 2005-08-23 | Ulvac, Inc | Mixer, and device and method for manufacturing thin-film |
| JP4002768B2 (ja) | 2002-02-14 | 2007-11-07 | 株式会社アルバック | 成膜装置 |
| US6684719B2 (en) * | 2002-05-03 | 2004-02-03 | Caterpillar Inc | Method and apparatus for mixing gases |
| JP2004323894A (ja) | 2003-04-23 | 2004-11-18 | Sekisui Chem Co Ltd | ガス供給安定化器、気相成長装置および気相成長方法 |
| US20050252449A1 (en) * | 2004-05-12 | 2005-11-17 | Nguyen Son T | Control of gas flow and delivery to suppress the formation of particles in an MOCVD/ALD system |
| US20060042754A1 (en) * | 2004-07-30 | 2006-03-02 | Tokyo Electron Limited | Plasma etching apparatus |
| KR20080077642A (ko) | 2005-12-23 | 2008-08-25 | 엠케이에스 인스트루먼츠, 인코포레이티드 | 가스들의 다운스트림 해리용 방법들 및 장치들 |
| JP2007335755A (ja) | 2006-06-16 | 2007-12-27 | Matsushita Electric Ind Co Ltd | 基板処理装置および基板処理方法 |
| US20080206987A1 (en) * | 2007-01-29 | 2008-08-28 | Gelatos Avgerinos V | Process for tungsten nitride deposition by a temperature controlled lid assembly |
| US8123902B2 (en) * | 2007-03-21 | 2012-02-28 | Applied Materials, Inc. | Gas flow diffuser |
| US8512509B2 (en) * | 2007-12-19 | 2013-08-20 | Applied Materials, Inc. | Plasma reactor gas distribution plate with radially distributed path splitting manifold |
| TW201112886A (en) | 2009-01-09 | 2011-04-01 | Ulvac Inc | Plasma treatment apparatus |
| US9312154B2 (en) | 2009-04-21 | 2016-04-12 | Applied Materials, Inc. | CVD apparatus for improved film thickness non-uniformity and particle performance |
| US20110203560A1 (en) | 2010-02-23 | 2011-08-25 | Wallace William K | Fuel conditioning vacuum module |
| CN106635740B (zh) * | 2011-09-30 | 2019-03-15 | 生命科技股份有限公司 | 具有膜喷洒器的容器 |
-
2013
- 2013-06-14 US US13/918,033 patent/US10232324B2/en not_active Expired - Fee Related
- 2013-06-18 TW TW102121573A patent/TWI611458B/zh active
- 2013-07-01 KR KR1020157003744A patent/KR102125764B1/ko active Active
- 2013-07-01 CN CN201380036866.1A patent/CN104471672B/zh active Active
- 2013-07-01 WO PCT/US2013/048855 patent/WO2014011423A1/en not_active Ceased
- 2013-07-01 JP JP2015521651A patent/JP6227642B2/ja active Active
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