JP6207589B2 - ＳｉＯ２顆粒の製造方法 - Google Patents

ＳｉＯ２顆粒の製造方法 Download PDF

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Publication number
JP6207589B2
JP6207589B2 JP2015507529A JP2015507529A JP6207589B2 JP 6207589 B2 JP6207589 B2 JP 6207589B2 JP 2015507529 A JP2015507529 A JP 2015507529A JP 2015507529 A JP2015507529 A JP 2015507529A JP 6207589 B2 JP6207589 B2 JP 6207589B2
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Prior art keywords
sio
suspension
granules
precipitate
particles
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Japanese (ja)
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JP2015516940A (ja
JP2015516940A5 (enExample
Inventor
ズーフ マリオ
ズーフ マリオ
シェッツ ゲアハート
シェッツ ゲアハート
ラングナー アンドレアス
ラングナー アンドレアス
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Heraeus Quarzglas GmbH and Co KG
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Heraeus Quarzglas GmbH and Co KG
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    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00—Silicon; Compounds thereof
    • C01B33/113—Silicon oxides; Hydrates thereof
    • C01B33/12—Silica; Hydrates thereof, e.g. lepidoic silicic acid
    • C01B33/18—Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B19/00—Other methods of shaping glass
    • C03B19/10—Forming beads
    • C03B19/108—Forming porous, sintered or foamed beads
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C1/00—Ingredients generally applicable to manufacture of glasses, glazes, or vitreous enamels
    • C03C1/02—Pretreated ingredients
    • C03C1/026—Pelletisation or prereacting of powdered raw materials

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  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Inorganic Chemistry (AREA)
  • Manufacturing & Machinery (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Silicon Compounds (AREA)
JP2015507529A 2012-04-26 2013-04-25 ＳｉＯ２顆粒の製造方法 Active JP6207589B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
DE102012008175A DE102012008175A1 (de) 2012-04-26 2012-04-26 Verfahren zur Herstellung eines SiO2-Granulats
DE102012008175.8 2012-04-26
PCT/EP2013/058585 WO2013160388A1 (de) 2012-04-26 2013-04-25 Verfahren zur herstellung eines sio2-granulats

Publications (3)

Publication Number Publication Date
JP2015516940A JP2015516940A (ja) 2015-06-18
JP2015516940A5 JP2015516940A5 (enExample) 2016-03-17
JP6207589B2 true JP6207589B2 (ja) 2017-10-04

Family

ID=48190502

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2015507529A Active JP6207589B2 (ja) 2012-04-26 2013-04-25 ＳｉＯ２顆粒の製造方法

Country Status (7)

Country Link
US (1) US9902621B2 (enExample)
EP (1) EP2847131B1 (enExample)
JP (1) JP6207589B2 (enExample)
CN (1) CN104271507B (enExample)
DE (1) DE102012008175A1 (enExample)
RU (1) RU2604617C2 (enExample)
WO (1) WO2013160388A1 (enExample)

Families Citing this family (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP3000790B2 (de) 2014-09-29 2023-07-26 Heraeus Quarzglas GmbH & Co. KG Verfahren für die Herstellung von Bauteilen aus synthetischem Quarzglas aus SiO2-Granulat
DE102016219930A1 (de) * 2015-10-13 2017-04-13 Ceram Tec Gmbh Herstellung von Keramiken ohne piezoelektrische Eigenschaften in wässriger Umgebung
CN108698894A (zh) 2015-12-18 2018-10-23 贺利氏石英玻璃有限两合公司 在多腔式烘箱中制备石英玻璃体
CN109153593A (zh) 2015-12-18 2019-01-04 贺利氏石英玻璃有限两合公司 合成石英玻璃粉粒的制备
CN108698883A (zh) 2015-12-18 2018-10-23 贺利氏石英玻璃有限两合公司 石英玻璃制备中的二氧化硅的喷雾造粒
KR20180094087A (ko) 2015-12-18 2018-08-22 헤래우스 크바르츠글라스 게엠베하 ＆ 컴파니 케이지 실리카 과립으로부터 실리카 유리 제품의 제조
TWI733723B (zh) 2015-12-18 2021-07-21 德商何瑞斯廓格拉斯公司 不透明石英玻璃體的製備
WO2017103131A1 (de) 2015-12-18 2017-06-22 Heraeus Quarzglas Gmbh & Co. Kg Verringern des erdalkalimetallgehalts von siliziumdioxidgranulat durch behandlung von kohlenstoffdotiertem siliziumdioxidgranulat bei hoher temperatur
JP6940235B2 (ja) 2015-12-18 2021-09-22 ヘレウス クワルツグラス ゲーエムベーハー ウント コンパニー カーゲー 高融点金属の溶融坩堝内での石英ガラス体の調製
EP3390303B1 (de) 2015-12-18 2024-02-07 Heraeus Quarzglas GmbH & Co. KG Herstellung von quarzglaskörpern mit taupunktkontrolle im schmelzofen
WO2017103153A1 (de) 2015-12-18 2017-06-22 Heraeus Quarzglas Gmbh & Co. Kg Glasfasern und vorformen aus quarzglas mit geringem oh-, cl- und al-gehalt
KR20180095619A (ko) 2015-12-18 2018-08-27 헤래우스 크바르츠글라스 게엠베하 ＆ 컴파니 케이지 실리카 유리 제조 동안 규소 함량의 증가
KR102492733B1 (ko) 2017-09-29 2023-01-27 삼성디스플레이 주식회사 구리 플라즈마 식각 방법 및 디스플레이 패널 제조 방법
WO2022109297A1 (en) * 2020-11-19 2022-05-27 Georgia Tech Research Corporation Dewatering of cellulose nanofibrils suspensions
US12122289B2 (en) 2022-03-28 2024-10-22 Gentex Corporation Full display mirror assembly with a blind spot detection system

Family Cites Families (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2649388A (en) * 1948-08-24 1953-08-18 Philadelphia Quartz Co Manufacture of silica filled materials
US3401017A (en) * 1965-08-16 1968-09-10 Oliver W. Burke Jr. Modified silica pigments and processes for producing the same
JPS497800B1 (enExample) * 1969-02-13 1974-02-22
US3681017A (en) * 1970-07-06 1972-08-01 Grace W R & Co Platelet silica,its production and uses
US4054536A (en) * 1974-12-23 1977-10-18 Nalco Chemical Company Preparation of aqueous silica sols free of alkali metal oxides
DE2840459C2 (de) 1978-09-16 1982-08-05 Henkel KGaA, 4000 Düsseldorf Verfahren zur Herstellung hochreiner Kieselsäure und deren Verwendung
JPS61158810A (ja) * 1984-12-28 1986-07-18 Shokubai Kasei Kogyo Kk 高純度シリカゾルの製造法
JPH02199015A (ja) * 1989-01-27 1990-08-07 Tsukishima Kikai Co Ltd 合成石英の製造方法
DE4100604C1 (enExample) 1991-01-11 1992-02-27 Schott Glaswerke, 6500 Mainz, De
US5173811A (en) * 1991-10-11 1992-12-22 Gumbs Associates, Inc. Nonlinear optical shield
DE19729505A1 (de) 1997-07-10 1999-01-14 Heraeus Quarzglas Verfahren zur Herstellung von Si0¶2¶-Granulat
TWI221149B (en) * 1999-12-28 2004-09-21 Watanabe & Co Ltd Method for producing synthetic quartz glass
JP4141956B2 (ja) * 2001-10-18 2008-08-27 カウンシル・オブ・サイエンティフィック・アンド・インダストリアル・リサーチ 希土類元素でドーピングした光ファイバーの製造方法
GB0130907D0 (en) 2001-12-22 2002-02-13 Ineos Silicas Ltd Amorphous silica
US7119025B2 (en) * 2004-04-08 2006-10-10 Micron Technology, Inc. Methods of eliminating pattern collapse on photoresist patterns
DE102006043738B4 (de) * 2006-09-13 2008-10-16 Heraeus Quarzglas Gmbh & Co. Kg Bauteil aus Quarzglas zum Einsatz bei der Halbleiterfertigung und Verfahren zur Herstellung desselben
DE102007045097B4 (de) 2007-09-20 2012-11-29 Heraeus Quarzglas Gmbh & Co. Kg Verfahren zur Herstellung von co-dotiertem Quarzglas

Also Published As

Publication number Publication date
EP2847131A1 (de) 2015-03-18
CN104271507A (zh) 2015-01-07
CN104271507B (zh) 2016-08-17
RU2604617C2 (ru) 2016-12-10
JP2015516940A (ja) 2015-06-18
DE102012008175A1 (de) 2013-10-31
EP2847131B1 (de) 2017-05-31
US9902621B2 (en) 2018-02-27
WO2013160388A1 (de) 2013-10-31
RU2014147493A (ru) 2016-06-20
US20150086462A1 (en) 2015-03-26

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