DE102012008175A1 - Verfahren zur Herstellung eines SiO2-Granulats - Google Patents
Verfahren zur Herstellung eines SiO2-Granulats Download PDFInfo
- Publication number
- DE102012008175A1 DE102012008175A1 DE102012008175A DE102012008175A DE102012008175A1 DE 102012008175 A1 DE102012008175 A1 DE 102012008175A1 DE 102012008175 A DE102012008175 A DE 102012008175A DE 102012008175 A DE102012008175 A DE 102012008175A DE 102012008175 A1 DE102012008175 A1 DE 102012008175A1
- Authority
- DE
- Germany
- Prior art keywords
- sio
- suspension
- sediment
- granules
- particles
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
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- 229910004298 SiO 2 Inorganic materials 0.000 title claims abstract description 93
- 239000008187 granular material Substances 0.000 title claims abstract description 54
- 238000000034 method Methods 0.000 title claims description 41
- 239000000725 suspension Substances 0.000 claims abstract description 45
- 239000002245 particle Substances 0.000 claims abstract description 38
- 239000013049 sediment Substances 0.000 claims abstract description 34
- 239000007788 liquid Substances 0.000 claims abstract description 20
- 238000001035 drying Methods 0.000 claims abstract description 19
- 238000007710 freezing Methods 0.000 claims abstract description 15
- 230000008014 freezing Effects 0.000 claims abstract description 15
- 238000004519 manufacturing process Methods 0.000 claims abstract description 14
- 238000000926 separation method Methods 0.000 claims abstract description 7
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 16
- 239000002019 doping agent Substances 0.000 claims description 15
- 239000007791 liquid phase Substances 0.000 claims description 10
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical class N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 claims description 8
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 6
- 239000007858 starting material Substances 0.000 claims description 4
- OAKJQQAXSVQMHS-UHFFFAOYSA-N Hydrazine Chemical compound NN OAKJQQAXSVQMHS-UHFFFAOYSA-N 0.000 claims description 3
- 239000011149 active material Substances 0.000 claims description 3
- 229910021529 ammonia Inorganic materials 0.000 claims description 3
- 238000001312 dry etching Methods 0.000 claims description 3
- 229910000069 nitrogen hydride Inorganic materials 0.000 claims description 3
- ATRRKUHOCOJYRX-UHFFFAOYSA-N Ammonium bicarbonate Chemical compound [NH4+].OC([O-])=O ATRRKUHOCOJYRX-UHFFFAOYSA-N 0.000 claims description 2
- 229910052782 aluminium Inorganic materials 0.000 claims description 2
- BVCZEBOGSOYJJT-UHFFFAOYSA-N ammonium carbamate Chemical compound [NH4+].NC([O-])=O BVCZEBOGSOYJJT-UHFFFAOYSA-N 0.000 claims description 2
- 239000001099 ammonium carbonate Substances 0.000 claims description 2
- 235000012501 ammonium carbonate Nutrition 0.000 claims description 2
- 229910052787 antimony Inorganic materials 0.000 claims description 2
- 229910052788 barium Inorganic materials 0.000 claims description 2
- 229910052796 boron Inorganic materials 0.000 claims description 2
- KXDHJXZQYSOELW-UHFFFAOYSA-N carbonic acid monoamide Natural products NC(O)=O KXDHJXZQYSOELW-UHFFFAOYSA-N 0.000 claims description 2
- 229910052802 copper Inorganic materials 0.000 claims description 2
- 238000010908 decantation Methods 0.000 claims description 2
- 239000008367 deionised water Substances 0.000 claims description 2
- 229910052733 gallium Inorganic materials 0.000 claims description 2
- 229910052735 hafnium Inorganic materials 0.000 claims description 2
- 235000010299 hexamethylene tetramine Nutrition 0.000 claims description 2
- VKYKSIONXSXAKP-UHFFFAOYSA-N hexamethylenetetramine Chemical compound C1N(C2)CN3CN1CN2C3 VKYKSIONXSXAKP-UHFFFAOYSA-N 0.000 claims description 2
- 229910052758 niobium Inorganic materials 0.000 claims description 2
- 229910052698 phosphorus Inorganic materials 0.000 claims description 2
- 239000002243 precursor Substances 0.000 claims description 2
- 229910052761 rare earth metal Inorganic materials 0.000 claims description 2
- 150000002910 rare earth metals Chemical class 0.000 claims description 2
- 229910052719 titanium Inorganic materials 0.000 claims description 2
- 229910052725 zinc Inorganic materials 0.000 claims description 2
- 229910052726 zirconium Inorganic materials 0.000 claims description 2
- 229910021641 deionized water Inorganic materials 0.000 claims 1
- 238000010257 thawing Methods 0.000 abstract description 14
- 239000011521 glass Substances 0.000 description 10
- NLXLAEXVIDQMFP-UHFFFAOYSA-N Ammonium chloride Substances [NH4+].[Cl-] NLXLAEXVIDQMFP-UHFFFAOYSA-N 0.000 description 6
- 239000007787 solid Substances 0.000 description 6
- 238000005469 granulation Methods 0.000 description 5
- 230000003179 granulation Effects 0.000 description 5
- 238000000227 grinding Methods 0.000 description 5
- 239000013078 crystal Substances 0.000 description 4
- 238000005406 washing Methods 0.000 description 4
- 239000006185 dispersion Substances 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 239000012535 impurity Substances 0.000 description 3
- 239000012071 phase Substances 0.000 description 3
- 239000002002 slurry Substances 0.000 description 3
- VHUUQVKOLVNVRT-UHFFFAOYSA-N Ammonium hydroxide Chemical compound [NH4+].[OH-] VHUUQVKOLVNVRT-UHFFFAOYSA-N 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- 239000000654 additive Substances 0.000 description 2
- 235000019270 ammonium chloride Nutrition 0.000 description 2
- 235000011114 ammonium hydroxide Nutrition 0.000 description 2
- 238000005119 centrifugation Methods 0.000 description 2
- 238000011109 contamination Methods 0.000 description 2
- 239000000835 fiber Substances 0.000 description 2
- 239000012530 fluid Substances 0.000 description 2
- 150000002500 ions Chemical class 0.000 description 2
- 238000002156 mixing Methods 0.000 description 2
- 239000004570 mortar (masonry) Substances 0.000 description 2
- 230000003287 optical effect Effects 0.000 description 2
- 239000004033 plastic Substances 0.000 description 2
- 238000004062 sedimentation Methods 0.000 description 2
- 238000003756 stirring Methods 0.000 description 2
- 230000007704 transition Effects 0.000 description 2
- BUHVIAUBTBOHAG-FOYDDCNASA-N (2r,3r,4s,5r)-2-[6-[[2-(3,5-dimethoxyphenyl)-2-(2-methylphenyl)ethyl]amino]purin-9-yl]-5-(hydroxymethyl)oxolane-3,4-diol Chemical compound COC1=CC(OC)=CC(C(CNC=2C=3N=CN(C=3N=CN=2)[C@H]2[C@@H]([C@H](O)[C@@H](CO)O2)O)C=2C(=CC=CC=2)C)=C1 BUHVIAUBTBOHAG-FOYDDCNASA-N 0.000 description 1
- 241000500881 Lepisma Species 0.000 description 1
- 150000003863 ammonium salts Chemical class 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 229910052791 calcium Inorganic materials 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 150000003841 chloride salts Chemical class 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 239000000356 contaminant Substances 0.000 description 1
- 238000007791 dehumidification Methods 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 238000005265 energy consumption Methods 0.000 description 1
- 150000004673 fluoride salts Chemical class 0.000 description 1
- 239000011888 foil Substances 0.000 description 1
- 238000009472 formulation Methods 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 238000000265 homogenisation Methods 0.000 description 1
- 230000036571 hydration Effects 0.000 description 1
- 238000006703 hydration reaction Methods 0.000 description 1
- 239000005457 ice water Substances 0.000 description 1
- 239000000087 laser glass Substances 0.000 description 1
- 229910001416 lithium ion Inorganic materials 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 238000010327 methods by industry Methods 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 238000005191 phase separation Methods 0.000 description 1
- 239000004810 polytetrafluoroethylene Substances 0.000 description 1
- 229920001343 polytetrafluoroethylene Polymers 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 230000000717 retained effect Effects 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 230000006641 stabilisation Effects 0.000 description 1
- 238000011105 stabilization Methods 0.000 description 1
- 230000003068 static effect Effects 0.000 description 1
- 229910052712 strontium Inorganic materials 0.000 description 1
- 238000000859 sublimation Methods 0.000 description 1
- 230000008022 sublimation Effects 0.000 description 1
- 239000006228 supernatant Substances 0.000 description 1
- 238000009736 wetting Methods 0.000 description 1
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/113—Silicon oxides; Hydrates thereof
- C01B33/12—Silica; Hydrates thereof, e.g. lepidoic silicic acid
- C01B33/18—Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B19/00—Other methods of shaping glass
- C03B19/10—Forming beads
- C03B19/108—Forming porous, sintered or foamed beads
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C1/00—Ingredients generally applicable to manufacture of glasses, glazes, or vitreous enamels
- C03C1/02—Pretreated ingredients
- C03C1/026—Pelletisation or prereacting of powdered raw materials
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Inorganic Chemistry (AREA)
- Life Sciences & Earth Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Manufacturing & Machinery (AREA)
- Silicon Compounds (AREA)
Priority Applications (7)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE102012008175A DE102012008175A1 (de) | 2012-04-26 | 2012-04-26 | Verfahren zur Herstellung eines SiO2-Granulats |
| PCT/EP2013/058585 WO2013160388A1 (de) | 2012-04-26 | 2013-04-25 | Verfahren zur herstellung eines sio2-granulats |
| RU2014147493/05A RU2604617C2 (ru) | 2012-04-26 | 2013-04-25 | СПОСОБ ИЗГОТОВЛЕНИЯ ГРАНУЛЯТА ИЗ SiO2 |
| US14/397,484 US9902621B2 (en) | 2012-04-26 | 2013-04-25 | Method for producing SiO2 granulate |
| CN201380022103.1A CN104271507B (zh) | 2012-04-26 | 2013-04-25 | 二氧化硅颗粒的制备方法 |
| JP2015507529A JP6207589B2 (ja) | 2012-04-26 | 2013-04-25 | ＳｉＯ２顆粒の製造方法 |
| EP13718837.1A EP2847131B1 (de) | 2012-04-26 | 2013-04-25 | Verfahren zur herstellung eines sio2-granulats |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE102012008175A DE102012008175A1 (de) | 2012-04-26 | 2012-04-26 | Verfahren zur Herstellung eines SiO2-Granulats |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| DE102012008175A1 true DE102012008175A1 (de) | 2013-10-31 |
Family
ID=48190502
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DE102012008175A Withdrawn DE102012008175A1 (de) | 2012-04-26 | 2012-04-26 | Verfahren zur Herstellung eines SiO2-Granulats |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US9902621B2 (enExample) |
| EP (1) | EP2847131B1 (enExample) |
| JP (1) | JP6207589B2 (enExample) |
| CN (1) | CN104271507B (enExample) |
| DE (1) | DE102012008175A1 (enExample) |
| RU (1) | RU2604617C2 (enExample) |
| WO (1) | WO2013160388A1 (enExample) |
Families Citing this family (15)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP3000790B2 (de) | 2014-09-29 | 2023-07-26 | Heraeus Quarzglas GmbH & Co. KG | Verfahren für die Herstellung von Bauteilen aus synthetischem Quarzglas aus SiO2-Granulat |
| DE102016219930A1 (de) * | 2015-10-13 | 2017-04-13 | Ceram Tec Gmbh | Herstellung von Keramiken ohne piezoelektrische Eigenschaften in wässriger Umgebung |
| CN108698894A (zh) | 2015-12-18 | 2018-10-23 | 贺利氏石英玻璃有限两合公司 | 在多腔式烘箱中制备石英玻璃体 |
| CN109153593A (zh) | 2015-12-18 | 2019-01-04 | 贺利氏石英玻璃有限两合公司 | 合成石英玻璃粉粒的制备 |
| CN108698883A (zh) | 2015-12-18 | 2018-10-23 | 贺利氏石英玻璃有限两合公司 | 石英玻璃制备中的二氧化硅的喷雾造粒 |
| KR20180094087A (ko) | 2015-12-18 | 2018-08-22 | 헤래우스 크바르츠글라스 게엠베하 ＆ 컴파니 케이지 | 실리카 과립으로부터 실리카 유리 제품의 제조 |
| TWI733723B (zh) | 2015-12-18 | 2021-07-21 | 德商何瑞斯廓格拉斯公司 | 不透明石英玻璃體的製備 |
| WO2017103131A1 (de) | 2015-12-18 | 2017-06-22 | Heraeus Quarzglas Gmbh & Co. Kg | Verringern des erdalkalimetallgehalts von siliziumdioxidgranulat durch behandlung von kohlenstoffdotiertem siliziumdioxidgranulat bei hoher temperatur |
| JP6940235B2 (ja) | 2015-12-18 | 2021-09-22 | ヘレウス クワルツグラス ゲーエムベーハー ウント コンパニー カーゲー | 高融点金属の溶融坩堝内での石英ガラス体の調製 |
| EP3390303B1 (de) | 2015-12-18 | 2024-02-07 | Heraeus Quarzglas GmbH & Co. KG | Herstellung von quarzglaskörpern mit taupunktkontrolle im schmelzofen |
| WO2017103153A1 (de) | 2015-12-18 | 2017-06-22 | Heraeus Quarzglas Gmbh & Co. Kg | Glasfasern und vorformen aus quarzglas mit geringem oh-, cl- und al-gehalt |
| KR20180095619A (ko) | 2015-12-18 | 2018-08-27 | 헤래우스 크바르츠글라스 게엠베하 ＆ 컴파니 케이지 | 실리카 유리 제조 동안 규소 함량의 증가 |
| KR102492733B1 (ko) | 2017-09-29 | 2023-01-27 | 삼성디스플레이 주식회사 | 구리 플라즈마 식각 방법 및 디스플레이 패널 제조 방법 |
| WO2022109297A1 (en) * | 2020-11-19 | 2022-05-27 | Georgia Tech Research Corporation | Dewatering of cellulose nanofibrils suspensions |
| US12122289B2 (en) | 2022-03-28 | 2024-10-22 | Gentex Corporation | Full display mirror assembly with a blind spot detection system |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3401017A (en) * | 1965-08-16 | 1968-09-10 | Oliver W. Burke Jr. | Modified silica pigments and processes for producing the same |
| JPH02199015A (ja) * | 1989-01-27 | 1990-08-07 | Tsukishima Kikai Co Ltd | 合成石英の製造方法 |
| DE4100604C1 (enExample) | 1991-01-11 | 1992-02-27 | Schott Glaswerke, 6500 Mainz, De | |
| DE19729505A1 (de) | 1997-07-10 | 1999-01-14 | Heraeus Quarzglas | Verfahren zur Herstellung von Si0¶2¶-Granulat |
Family Cites Families (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US2649388A (en) * | 1948-08-24 | 1953-08-18 | Philadelphia Quartz Co | Manufacture of silica filled materials |
| JPS497800B1 (enExample) * | 1969-02-13 | 1974-02-22 | ||
| US3681017A (en) * | 1970-07-06 | 1972-08-01 | Grace W R & Co | Platelet silica,its production and uses |
| US4054536A (en) * | 1974-12-23 | 1977-10-18 | Nalco Chemical Company | Preparation of aqueous silica sols free of alkali metal oxides |
| DE2840459C2 (de) | 1978-09-16 | 1982-08-05 | Henkel KGaA, 4000 Düsseldorf | Verfahren zur Herstellung hochreiner Kieselsäure und deren Verwendung |
| JPS61158810A (ja) * | 1984-12-28 | 1986-07-18 | Shokubai Kasei Kogyo Kk | 高純度シリカゾルの製造法 |
| US5173811A (en) * | 1991-10-11 | 1992-12-22 | Gumbs Associates, Inc. | Nonlinear optical shield |
| TWI221149B (en) * | 1999-12-28 | 2004-09-21 | Watanabe & Co Ltd | Method for producing synthetic quartz glass |
| JP4141956B2 (ja) * | 2001-10-18 | 2008-08-27 | カウンシル・オブ・サイエンティフィック・アンド・インダストリアル・リサーチ | 希土類元素でドーピングした光ファイバーの製造方法 |
| GB0130907D0 (en) | 2001-12-22 | 2002-02-13 | Ineos Silicas Ltd | Amorphous silica |
| US7119025B2 (en) * | 2004-04-08 | 2006-10-10 | Micron Technology, Inc. | Methods of eliminating pattern collapse on photoresist patterns |
| DE102006043738B4 (de) * | 2006-09-13 | 2008-10-16 | Heraeus Quarzglas Gmbh & Co. Kg | Bauteil aus Quarzglas zum Einsatz bei der Halbleiterfertigung und Verfahren zur Herstellung desselben |
| DE102007045097B4 (de) | 2007-09-20 | 2012-11-29 | Heraeus Quarzglas Gmbh & Co. Kg | Verfahren zur Herstellung von co-dotiertem Quarzglas |
-
2012
- 2012-04-26 DE DE102012008175A patent/DE102012008175A1/de not_active Withdrawn
-
2013
- 2013-04-25 WO PCT/EP2013/058585 patent/WO2013160388A1/de not_active Ceased
- 2013-04-25 CN CN201380022103.1A patent/CN104271507B/zh active Active
- 2013-04-25 JP JP2015507529A patent/JP6207589B2/ja active Active
- 2013-04-25 EP EP13718837.1A patent/EP2847131B1/de active Active
- 2013-04-25 RU RU2014147493/05A patent/RU2604617C2/ru active
- 2013-04-25 US US14/397,484 patent/US9902621B2/en active Active
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3401017A (en) * | 1965-08-16 | 1968-09-10 | Oliver W. Burke Jr. | Modified silica pigments and processes for producing the same |
| JPH02199015A (ja) * | 1989-01-27 | 1990-08-07 | Tsukishima Kikai Co Ltd | 合成石英の製造方法 |
| DE4100604C1 (enExample) | 1991-01-11 | 1992-02-27 | Schott Glaswerke, 6500 Mainz, De | |
| DE19729505A1 (de) | 1997-07-10 | 1999-01-14 | Heraeus Quarzglas | Verfahren zur Herstellung von Si0¶2¶-Granulat |
Also Published As
| Publication number | Publication date |
|---|---|
| EP2847131A1 (de) | 2015-03-18 |
| CN104271507A (zh) | 2015-01-07 |
| CN104271507B (zh) | 2016-08-17 |
| RU2604617C2 (ru) | 2016-12-10 |
| JP2015516940A (ja) | 2015-06-18 |
| JP6207589B2 (ja) | 2017-10-04 |
| EP2847131B1 (de) | 2017-05-31 |
| US9902621B2 (en) | 2018-02-27 |
| WO2013160388A1 (de) | 2013-10-31 |
| RU2014147493A (ru) | 2016-06-20 |
| US20150086462A1 (en) | 2015-03-26 |
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