JP6195623B2 - 感放射線性組成物及びパターン製造方法 - Google Patents

感放射線性組成物及びパターン製造方法 Download PDF

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JP6195623B2
JP6195623B2 JP2015539332A JP2015539332A JP6195623B2 JP 6195623 B2 JP6195623 B2 JP 6195623B2 JP 2015539332 A JP2015539332 A JP 2015539332A JP 2015539332 A JP2015539332 A JP 2015539332A JP 6195623 B2 JP6195623 B2 JP 6195623B2
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JPWO2015046332A1 (ja
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信太　勝
勝 信太
照博 植松
照博 植松
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Tokyo Ohka Kogyo Co Ltd
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Tokyo Ohka Kogyo Co Ltd
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0048—Photosensitive materials characterised by the solvents or agents facilitating spreading, e.g. tensio-active agents
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G03F7/0226—Quinonediazides characterised by the non-macromolecular additives
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
    • G03F7/0233—Macromolecular quinonediazides; Macromolecular additives, e.g. binders characterised by the polymeric binders or the macromolecular additives other than the macromolecular quinonediazides
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials For Photolithography (AREA)
  • Optical Filters (AREA)
JP2015539332A 2013-09-25 2014-09-25 感放射線性組成物及びパターン製造方法 Active JP6195623B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2013198912 2013-09-25
JP2013198912 2013-09-25
PCT/JP2014/075431 WO2015046332A1 (ja) 2013-09-25 2014-09-25 感放射線性組成物及びパターン製造方法

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JPWO2015046332A1 JPWO2015046332A1 (ja) 2017-03-09
JP6195623B2 true JP6195623B2 (ja) 2017-09-13

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JP (1) JP6195623B2 (zh)
KR (2) KR20160045094A (zh)
CN (1) CN105579907B (zh)
TW (1) TWI637936B (zh)
WO (1) WO2015046332A1 (zh)

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JP6228796B2 (ja) * 2013-09-26 2017-11-08 東京応化工業株式会社 レジスト組成物、レジストパターン形成方法
JP6292976B2 (ja) 2014-05-21 2018-03-14 東京応化工業株式会社 ポリベンゾオキサゾール樹脂の製造方法
KR102232969B1 (ko) * 2015-04-01 2021-03-29 도레이 카부시키가이샤 감광성 착색 수지 조성물
CN108027561B (zh) * 2015-09-30 2021-10-08 东丽株式会社 负型感光性树脂组合物、固化膜、具备固化膜的元件及显示装置、以及其制造方法
JP6661358B2 (ja) * 2015-12-08 2020-03-11 東京応化工業株式会社 黒色感光性組成物
KR102463845B1 (ko) * 2015-12-24 2022-11-04 주식회사 두산 접착력이 향상된 폴리아믹산 조성물 및 이를 포함하는 폴리이미드 필름
JP2017151209A (ja) * 2016-02-23 2017-08-31 アーゼッド・エレクトロニック・マテリアルズ（ルクセンブルグ）ソシエテ・ア・レスポンサビリテ・リミテ ポジ型感光性シロキサン組成物
CN109563342B (zh) 2016-10-05 2021-06-22 东丽株式会社 树脂组合物、固化膜、半导体器件及它们的制造方法
JP6785122B2 (ja) * 2016-10-24 2020-11-18 東京応化工業株式会社 感光性組成物、及び硬化膜の形成方法
US11798810B2 (en) * 2017-01-13 2023-10-24 Nissan Chemical Corporation Resist underlayer film-forming composition containing amide solvent
JP7011644B2 (ja) * 2017-02-28 2022-01-26 株式会社Ｄｎｐファインケミカル カラーフィルタ用色材分散液、分散剤、カラーフィルタ用感光性着色樹脂組成物、カラーフィルタ、表示装置
CN110392864B (zh) * 2017-03-29 2023-05-23 东丽株式会社 负型感光性树脂组合物、固化膜、具备固化膜的元件及有机el显示器、以及其制造方法
JP7313136B2 (ja) * 2018-11-29 2023-07-24 東京応化工業株式会社 感光性樹脂組成物、パターン化された硬化膜の製造方法、及びパターン化された硬化膜
CN118444528A (zh) * 2018-12-18 2024-08-06 三菱化学株式会社 感光性着色树脂组合物、固化物、着色间隔物及图像显示装置
JP7247676B2 (ja) * 2019-03-15 2023-03-29 三菱ケミカル株式会社 感光性着色樹脂組成物、硬化物、及び画像表示装置
JP7329344B2 (ja) * 2019-03-22 2023-08-18 太陽ホールディングス株式会社 感光性樹脂組成物、ドライフィルム、硬化物、及び、電子部品
JP7404686B2 (ja) * 2019-07-18 2023-12-26 東洋インキＳｃホールディングス株式会社 感光性着色組成物、カラーフィルタおよび液晶表示装置
KR20230006826A (ko) 2020-04-27 2023-01-11 브레우어 사이언스, 인코포레이션 임시 접합을 위한 다기능 재료
CN112198760B (zh) * 2020-09-23 2021-07-02 上海玟昕科技有限公司 一种正性低温固化型感光性树脂组合物
JP7060166B1 (ja) * 2020-09-28 2022-04-26 東レ株式会社 感光性樹脂組成物、導電パターン付き基板、アンテナ素子、画像表示装置の製造方法およびタッチパネルの製造方法

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ATE199985T1 (de) * 1996-02-09 2001-04-15 Wako Pure Chem Ind Ltd Polymer und resistmaterial
JP2008122501A (ja) * 2006-11-09 2008-05-29 Sumitomo Chemical Co Ltd ポジ型感放射線性樹脂組成物
JP2009014938A (ja) * 2007-07-03 2009-01-22 Toagosei Co Ltd レジスト剥離剤組成物
JP5020142B2 (ja) * 2008-03-26 2012-09-05 凸版印刷株式会社 カラーレジスト組成物及び該組成物を用いたカラーフィルタ
JP5571431B2 (ja) * 2010-03-30 2014-08-13 旭化成イーマテリアルズ株式会社 感光性樹脂組成物
JP5819693B2 (ja) * 2011-09-26 2015-11-24 東京応化工業株式会社 着色感光性樹脂組成物、カラーフィルタ及び表示装置
JP2013076845A (ja) * 2011-09-30 2013-04-25 Nippon Zeon Co Ltd 感光性樹脂組成物

Also Published As

Publication number Publication date
CN105579907B (zh) 2019-12-17
KR20160045094A (ko) 2016-04-26
TWI637936B (zh) 2018-10-11
KR102128155B1 (ko) 2020-06-29
TW201524943A (zh) 2015-07-01
WO2015046332A1 (ja) 2015-04-02
CN105579907A (zh) 2016-05-11
JPWO2015046332A1 (ja) 2017-03-09
KR20170136653A (ko) 2017-12-11

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