JP6178774B2 - 定盤運搬台車 - Google Patents

定盤運搬台車 Download PDF

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Publication number
JP6178774B2
JP6178774B2 JP2014215583A JP2014215583A JP6178774B2 JP 6178774 B2 JP6178774 B2 JP 6178774B2 JP 2014215583 A JP2014215583 A JP 2014215583A JP 2014215583 A JP2014215583 A JP 2014215583A JP 6178774 B2 JP6178774 B2 JP 6178774B2
Authority
JP
Japan
Prior art keywords
surface plate
holding
platen
polishing
polishing apparatus
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
JP2014215583A
Other languages
English (en)
Japanese (ja)
Other versions
JP2016078220A5 (enExample
JP2016078220A (ja
Inventor
三千登 佐藤
三千登 佐藤
洋介 金井
洋介 金井
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujikoshi Machinery Corp
Shin Etsu Handotai Co Ltd
Original Assignee
Fujikoshi Machinery Corp
Shin Etsu Handotai Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority to JP2014215583A priority Critical patent/JP6178774B2/ja
Application filed by Fujikoshi Machinery Corp, Shin Etsu Handotai Co Ltd filed Critical Fujikoshi Machinery Corp
Priority to US15/513,477 priority patent/US10737365B2/en
Priority to PCT/JP2015/005024 priority patent/WO2016063464A1/ja
Priority to KR1020177010065A priority patent/KR102441700B1/ko
Priority to CN201580057427.8A priority patent/CN107073682B/zh
Priority to DE112015004421.3T priority patent/DE112015004421T5/de
Priority to SG11201702264TA priority patent/SG11201702264TA/en
Priority to TW104134406A priority patent/TWI611868B/zh
Publication of JP2016078220A publication Critical patent/JP2016078220A/ja
Publication of JP2016078220A5 publication Critical patent/JP2016078220A5/ja
Application granted granted Critical
Publication of JP6178774B2 publication Critical patent/JP6178774B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

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Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B37/00—Lapping machines or devices; Accessories
    • B24B37/34—Accessories
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16M—FRAMES, CASINGS OR BEDS OF ENGINES, MACHINES OR APPARATUS, NOT SPECIFIC TO ENGINES, MACHINES OR APPARATUS PROVIDED FOR ELSEWHERE; STANDS; SUPPORTS
    • F16M11/00—Stands or trestles as supports for apparatus or articles placed thereon ; Stands for scientific apparatus such as gravitational force meters
    • F16M11/02—Heads
    • F16M11/04—Means for attachment of apparatus; Means allowing adjustment of the apparatus relatively to the stand
    • F16M11/06—Means for attachment of apparatus; Means allowing adjustment of the apparatus relatively to the stand allowing pivoting
    • F16M11/10—Means for attachment of apparatus; Means allowing adjustment of the apparatus relatively to the stand allowing pivoting around a horizontal axis
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16M—FRAMES, CASINGS OR BEDS OF ENGINES, MACHINES OR APPARATUS, NOT SPECIFIC TO ENGINES, MACHINES OR APPARATUS PROVIDED FOR ELSEWHERE; STANDS; SUPPORTS
    • F16M11/00—Stands or trestles as supports for apparatus or articles placed thereon ; Stands for scientific apparatus such as gravitational force meters
    • F16M11/42—Stands or trestles as supports for apparatus or articles placed thereon ; Stands for scientific apparatus such as gravitational force meters with arrangement for propelling the support stands on wheels
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
    • H01L21/67703—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations between different workstations
    • H01L21/67712—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations between different workstations the substrate being handled substantially vertically
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
    • H01L21/67703—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations between different workstations
    • H01L21/67718—Changing orientation of the substrate, e.g. from a horizontal position to a vertical position
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
    • H01L21/67703—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations between different workstations
    • H01L21/67724—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations between different workstations by means of a cart or a vehicule
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L21/687—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
    • H01L21/68707—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a robot blade, or gripped by a gripper for conveyance
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L21/687—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
    • H01L21/68714—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support
    • H01L21/6875—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support characterised by a plurality of individual support members, e.g. support posts or protrusions
    • A—HUMAN NECESSITIES
    • A47—FURNITURE; DOMESTIC ARTICLES OR APPLIANCES; COFFEE MILLS; SPICE MILLS; SUCTION CLEANERS IN GENERAL
    • A47B—TABLES; DESKS; OFFICE FURNITURE; CABINETS; DRAWERS; GENERAL DETAILS OF FURNITURE
    • A47B3/00—Folding or stowable tables
    • A47B3/10—Travelling or trunk tables
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B37/00—Lapping machines or devices; Accessories
    • B24B37/04—Lapping machines or devices; Accessories designed for working plane surfaces
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
    • H01L21/304—Mechanical treatment, e.g. grinding, polishing, cutting

Landscapes

  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Physics & Mathematics (AREA)
  • Power Engineering (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Mechanical Engineering (AREA)
  • General Engineering & Computer Science (AREA)
  • Robotics (AREA)
  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
  • Mechanical Treatment Of Semiconductor (AREA)
  • Handcart (AREA)
  • Braking Arrangements (AREA)
JP2014215583A 2014-10-22 2014-10-22 定盤運搬台車 Active JP6178774B2 (ja)

Priority Applications (8)

Application Number Priority Date Filing Date Title
JP2014215583A JP6178774B2 (ja) 2014-10-22 2014-10-22 定盤運搬台車
PCT/JP2015/005024 WO2016063464A1 (ja) 2014-10-22 2015-10-02 定盤運搬台車
KR1020177010065A KR102441700B1 (ko) 2014-10-22 2015-10-02 정반 운반대차
CN201580057427.8A CN107073682B (zh) 2014-10-22 2015-10-02 平台搬运台车
US15/513,477 US10737365B2 (en) 2014-10-22 2015-10-02 Turn table transport carriage
DE112015004421.3T DE112015004421T5 (de) 2014-10-22 2015-10-02 Drehtischtransportwagen
SG11201702264TA SG11201702264TA (en) 2014-10-22 2015-10-02 Turn table transport carriage
TW104134406A TWI611868B (zh) 2014-10-22 2015-10-20 平台搬運台車

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2014215583A JP6178774B2 (ja) 2014-10-22 2014-10-22 定盤運搬台車

Publications (3)

Publication Number Publication Date
JP2016078220A JP2016078220A (ja) 2016-05-16
JP2016078220A5 JP2016078220A5 (enExample) 2017-04-20
JP6178774B2 true JP6178774B2 (ja) 2017-08-09

Family

ID=55760525

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2014215583A Active JP6178774B2 (ja) 2014-10-22 2014-10-22 定盤運搬台車

Country Status (8)

Country Link
US (1) US10737365B2 (enExample)
JP (1) JP6178774B2 (enExample)
KR (1) KR102441700B1 (enExample)
CN (1) CN107073682B (enExample)
DE (1) DE112015004421T5 (enExample)
SG (1) SG11201702264TA (enExample)
TW (1) TWI611868B (enExample)
WO (1) WO2016063464A1 (enExample)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI628132B (zh) * 2016-11-23 2018-07-01 住華科技股份有限公司 可傾式收集裝置
CN112318251A (zh) * 2020-10-15 2021-02-05 温州源利智能科技有限公司 一种钕铁硼磁性件自动打磨机构及其打磨方法
CN112224935B (zh) * 2020-12-10 2021-03-09 万邑通(潍坊)信息科技有限公司 物流轻便辅助卸车设备
JP7746217B2 (ja) * 2022-05-13 2025-09-30 株式会社荏原製作所 処理システムおよびパッド搬送装置
CN120942796B (zh) * 2025-10-17 2025-12-09 江苏裕科新材料有限公司 一种可辅助对齐的塑木地板搬运机器

Family Cites Families (21)

* Cited by examiner, † Cited by third party
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US3813825A (en) * 1969-09-30 1974-06-04 Alliance Tool And Die Corp Polishing machine or the like with a removable platen
US4268201A (en) * 1979-05-07 1981-05-19 Bud Antle, Inc. Unitizing system for produce cartons and the like
US4558648A (en) * 1983-09-20 1985-12-17 Lift-R Technologies, Inc. Energy-recycling scissors lift
JP3620629B2 (ja) * 1998-02-20 2005-02-16 新東工業株式会社 鋳枠・定盤台車移替え設備
JP2000061832A (ja) * 1998-08-19 2000-02-29 Speedfam-Ipec Co Ltd ポリッシング装置のロードカセットチルト機構
JP2000141205A (ja) * 1998-11-10 2000-05-23 Tokyo Seimitsu Co Ltd ウェーハ研磨装置及び研磨定盤調整装置
KR100591269B1 (ko) * 2004-12-09 2006-06-26 주식회사 금화피에스씨 밸브 디스크 연마 가공기
US7255355B2 (en) * 2005-01-03 2007-08-14 Mk Diamond Products, Inc. Portable collapsible stand
CN2795133Y (zh) * 2005-04-26 2006-07-12 江苏天奇物流系统工程股份有限公司 气动液压升降台车
JP2008093811A (ja) 2006-10-16 2008-04-24 Shin Etsu Handotai Co Ltd 研磨ヘッド及び研磨装置
AR060518A1 (es) * 2007-04-18 2008-06-25 Hugo Enrique Chianale Un conjunto carrito-mesa portatil
JP5142077B2 (ja) * 2008-02-05 2013-02-13 株式会社日立プラントテクノロジー 搬送台車
JP5058853B2 (ja) * 2008-03-10 2012-10-24 旭硝子株式会社 板状貨物の輸送用ウイング式コンテナ及びそれを積載するトレーラ
JP5348610B2 (ja) * 2009-01-26 2013-11-20 旭硝子株式会社 板状体の積載装置
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JP6255303B2 (ja) * 2014-05-14 2017-12-27 株式会社荏原製作所 研磨テーブル交換装置および研磨テーブルの取り出し方法

Also Published As

Publication number Publication date
US20170304991A1 (en) 2017-10-26
TW201636155A (zh) 2016-10-16
CN107073682A (zh) 2017-08-18
CN107073682B (zh) 2020-03-10
TWI611868B (zh) 2018-01-21
WO2016063464A1 (ja) 2016-04-28
JP2016078220A (ja) 2016-05-16
SG11201702264TA (en) 2017-05-30
US10737365B2 (en) 2020-08-11
KR20170072200A (ko) 2017-06-26
KR102441700B1 (ko) 2022-09-08
DE112015004421T5 (de) 2017-08-10

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