JP6144858B1 - 酸化物焼結体およびスパッタリングターゲット、並びにそれらの製造方法 - Google Patents

酸化物焼結体およびスパッタリングターゲット、並びにそれらの製造方法 Download PDF

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JP6144858B1
JP6144858B1 JP2017007848A JP2017007848A JP6144858B1 JP 6144858 B1 JP6144858 B1 JP 6144858B1 JP 2017007848 A JP2017007848 A JP 2017007848A JP 2017007848 A JP2017007848 A JP 2017007848A JP 6144858 B1 JP6144858 B1 JP 6144858B1
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sintered body
oxide
oxide sintered
sintering
atomic
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JP2017193477A (ja
Inventor
幸樹 田尾
幸樹 田尾
中根　靖夫
靖夫 中根
英雄 畠
英雄 畠
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Kobelco Research Institute Inc
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Kobelco Research Institute Inc
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Priority to CN201780022824.0A priority Critical patent/CN109071356B/zh
Priority to PCT/JP2017/004812 priority patent/WO2017179278A1/ja
Priority to KR1020187028334A priority patent/KR102099197B1/ko
Priority to TW106111954A priority patent/TWI669283B/zh
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    • C—CHEMISTRY; METALLURGY
    • C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B35/00—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
    • C04B35/01—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics
    • C—CHEMISTRY; METALLURGY
    • C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B35/00—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
    • C04B35/01—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics
    • C04B35/453—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics based on zinc, tin, or bismuth oxides or solid solutions thereof with other oxides, e.g. zincates, stannates or bismuthates
    • C—CHEMISTRY; METALLURGY
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    • C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B35/00—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
    • C04B35/622—Forming processes; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
    • C04B35/626—Preparing or treating the powders individually or as batches ; preparing or treating macroscopic reinforcing agents for ceramic products, e.g. fibres; mechanical aspects section B
    • C04B35/62605—Treating the starting powders individually or as mixtures
    • C04B35/6261—Milling
    • C04B35/62615—High energy or reactive ball milling
    • C—CHEMISTRY; METALLURGY
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    • C04B35/00—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
    • C04B35/622—Forming processes; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
    • C04B35/626—Preparing or treating the powders individually or as batches ; preparing or treating macroscopic reinforcing agents for ceramic products, e.g. fibres; mechanical aspects section B
    • C04B35/62605—Treating the starting powders individually or as mixtures
    • C04B35/62695—Granulation or pelletising
    • C—CHEMISTRY; METALLURGY
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    • C04B35/00—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
    • C04B35/622—Forming processes; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
    • C04B35/626—Preparing or treating the powders individually or as batches ; preparing or treating macroscopic reinforcing agents for ceramic products, e.g. fibres; mechanical aspects section B
    • C04B35/63—Preparing or treating the powders individually or as batches ; preparing or treating macroscopic reinforcing agents for ceramic products, e.g. fibres; mechanical aspects section B using additives specially adapted for forming the products, e.g.. binder binders
    • C04B35/638—Removal thereof
    • C—CHEMISTRY; METALLURGY
    • C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
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    • C04B35/00—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
    • C04B35/622—Forming processes; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
    • C04B35/64—Burning or sintering processes
    • C04B35/645—Pressure sintering
    • C—CHEMISTRY; METALLURGY
    • C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B37/00—Joining burned ceramic articles with other burned ceramic articles or other articles by heating
    • C04B37/02—Joining burned ceramic articles with other burned ceramic articles or other articles by heating with metallic articles
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
    • C23C14/3414—Metallurgical or chemical aspects of target preparation, e.g. casting, powder metallurgy
    • C—CHEMISTRY; METALLURGY
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    • C04B2235/00—Aspects relating to ceramic starting mixtures or sintered ceramic products
    • C04B2235/02—Composition of constituents of the starting material or of secondary phases of the final product
    • C04B2235/30—Constituents and secondary phases not being of a fibrous nature
    • C04B2235/32—Metal oxides, mixed metal oxides, or oxide-forming salts thereof, e.g. carbonates, nitrates, (oxy)hydroxides, chlorides
    • C04B2235/3286—Gallium oxides, gallates, indium oxides, indates, thallium oxides, thallates or oxide forming salts thereof, e.g. zinc gallate
    • C—CHEMISTRY; METALLURGY
    • C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
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    • C04B2235/00—Aspects relating to ceramic starting mixtures or sintered ceramic products
    • C04B2235/02—Composition of constituents of the starting material or of secondary phases of the final product
    • C04B2235/30—Constituents and secondary phases not being of a fibrous nature
    • C04B2235/32—Metal oxides, mixed metal oxides, or oxide-forming salts thereof, e.g. carbonates, nitrates, (oxy)hydroxides, chlorides
    • C04B2235/3293—Tin oxides, stannates or oxide forming salts thereof, e.g. indium tin oxide [ITO]
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    • C04B2235/00—Aspects relating to ceramic starting mixtures or sintered ceramic products
    • C04B2235/60—Aspects relating to the preparation, properties or mechanical treatment of green bodies or pre-forms
    • C04B2235/604—Pressing at temperatures other than sintering temperatures
    • C—CHEMISTRY; METALLURGY
    • C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B2235/00—Aspects relating to ceramic starting mixtures or sintered ceramic products
    • C04B2235/65—Aspects relating to heat treatments of ceramic bodies such as green ceramics or pre-sintered ceramics, e.g. burning, sintering or melting processes
    • C04B2235/66—Specific sintering techniques, e.g. centrifugal sintering
    • C04B2235/668—Pressureless sintering

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Ceramic Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Organic Chemistry (AREA)
  • Materials Engineering (AREA)
  • Structural Engineering (AREA)
  • Inorganic Chemistry (AREA)
  • Metallurgy (AREA)
  • Mechanical Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Physical Vapour Deposition (AREA)
  • Compositions Of Oxide Ceramics (AREA)
  • Ceramic Products (AREA)
  • Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
JP2017007848A 2016-04-13 2017-01-19 酸化物焼結体およびスパッタリングターゲット、並びにそれらの製造方法 Active JP6144858B1 (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
CN201780022824.0A CN109071356B (zh) 2016-04-13 2017-02-09 氧化物烧结体和溅射靶及它们的制造方法
PCT/JP2017/004812 WO2017179278A1 (ja) 2016-04-13 2017-02-09 酸化物焼結体およびスパッタリングターゲット、並びにそれらの製造方法
KR1020187028334A KR102099197B1 (ko) 2016-04-13 2017-02-09 산화물 소결체 및 스퍼터링 타깃, 그리고 그것들의 제조 방법
TW106111954A TWI669283B (zh) 2016-04-13 2017-04-11 氧化物燒結體及濺鍍靶材以及它們的製造方法

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2016080333 2016-04-13
JP2016080333 2016-04-13

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JP6144858B1 true JP6144858B1 (ja) 2017-06-07
JP2017193477A JP2017193477A (ja) 2017-10-26

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JP (1) JP6144858B1 (zh)
KR (1) KR102099197B1 (zh)
CN (1) CN109071356B (zh)
TW (1) TWI669283B (zh)
WO (1) WO2017179278A1 (zh)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7333028B2 (ja) * 2019-09-12 2023-08-24 国立大学法人北海道大学 焼結体及びその製造方法並びに誘電体組成物
CN112079626A (zh) * 2020-09-16 2020-12-15 韶关市欧莱高新材料有限公司 一种铝钕铟锌氧化物旋转靶及其制备方法

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2007000878A1 (ja) * 2005-06-28 2007-01-04 Nippon Mining & Metals Co., Ltd. 酸化ガリウム－酸化亜鉛系スパッタリングターゲット、透明導電膜の形成方法及び透明導電膜
JP2013067531A (ja) * 2011-09-22 2013-04-18 Sumitomo Metal Mining Co Ltd Ｚｎ−Ｓｉ−Ｏ系酸化物焼結体とその製造方法および透明導電膜
JP2014024738A (ja) * 2012-07-30 2014-02-06 Tosoh Corp Ｉｇｚｏ焼結体、及びスパッタリングターゲット並びに酸化物膜
JP2014058416A (ja) * 2012-09-14 2014-04-03 Kobelco Kaken:Kk 酸化物焼結体およびスパッタリングターゲット
JP2015140450A (ja) * 2014-01-28 2015-08-03 Jx日鉱日石金属株式会社 酸化物焼結体、酸化物半導体膜及び薄膜トランジスタ

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN100549219C (zh) * 2005-06-28 2009-10-14 日矿金属株式会社 氧化镓-氧化锌系溅射靶、透明导电膜的形成方法及透明导电膜
KR101313327B1 (ko) * 2006-06-08 2013-09-27 스미토모 긴조쿠 고잔 가부시키가이샤 산화물 소결체, 타겟, 이를 사용하여 제조된 투명 도전막 및 투명 도전성 기재
CN103258857B (zh) * 2007-12-13 2016-05-11 出光兴产株式会社 使用了氧化物半导体的场效应晶体管及其制造方法
JP5288142B2 (ja) * 2008-06-06 2013-09-11 出光興産株式会社 酸化物薄膜用スパッタリングターゲットおよびその製造法
US8641932B2 (en) * 2008-12-15 2014-02-04 Idemitsu Kosan Co., Ltd. Sintered complex oxide and sputtering target comprising same
TW201119971A (en) * 2009-09-30 2011-06-16 Idemitsu Kosan Co Sintered in-ga-zn-o-type oxide
JP4843083B2 (ja) 2009-11-19 2011-12-21 出光興産株式会社 Ｉｎ−Ｇａ−Ｚｎ系酸化物スパッタリングターゲット
JP5887819B2 (ja) * 2010-12-06 2016-03-16 東ソー株式会社 酸化亜鉛焼結体、それから成るスパッタリングターゲットおよび酸化亜鉛薄膜
CN103608924B (zh) * 2011-05-27 2016-08-10 三井金属矿业株式会社 氧化物型半导体材料及溅镀靶
TWI555867B (zh) * 2012-05-31 2016-11-01 Idemitsu Kosan Co Sputtering target
WO2014021334A1 (ja) * 2012-07-30 2014-02-06 東ソー株式会社 酸化物焼結体、及びスパッタリングターゲット
JP5883367B2 (ja) * 2012-09-14 2016-03-15 株式会社コベルコ科研 酸化物焼結体およびスパッタリングターゲット、並びにその製造方法
JP2014111818A (ja) 2012-11-09 2014-06-19 Idemitsu Kosan Co Ltd スパッタリングターゲット、酸化物半導体薄膜及びそれらの製造方法
JP6231924B2 (ja) 2014-03-28 2017-11-15 出光興産株式会社 酸化物焼結体及びスパッタリングターゲット

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2007000878A1 (ja) * 2005-06-28 2007-01-04 Nippon Mining & Metals Co., Ltd. 酸化ガリウム－酸化亜鉛系スパッタリングターゲット、透明導電膜の形成方法及び透明導電膜
JP2013067531A (ja) * 2011-09-22 2013-04-18 Sumitomo Metal Mining Co Ltd Ｚｎ−Ｓｉ−Ｏ系酸化物焼結体とその製造方法および透明導電膜
JP2014024738A (ja) * 2012-07-30 2014-02-06 Tosoh Corp Ｉｇｚｏ焼結体、及びスパッタリングターゲット並びに酸化物膜
JP2014058416A (ja) * 2012-09-14 2014-04-03 Kobelco Kaken:Kk 酸化物焼結体およびスパッタリングターゲット
JP2015140450A (ja) * 2014-01-28 2015-08-03 Jx日鉱日石金属株式会社 酸化物焼結体、酸化物半導体膜及び薄膜トランジスタ

Also Published As

Publication number Publication date
CN109071356A (zh) 2018-12-21
KR102099197B1 (ko) 2020-04-09
JP2017193477A (ja) 2017-10-26
CN109071356B (zh) 2021-06-11
TW201736319A (zh) 2017-10-16
KR20180118195A (ko) 2018-10-30
WO2017179278A1 (ja) 2017-10-19
TWI669283B (zh) 2019-08-21

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