JP6125661B2 - 磁気記録膜形成用スパッタリングターゲット及びその製造方法 - Google Patents
磁気記録膜形成用スパッタリングターゲット及びその製造方法 Download PDFInfo
- Publication number
- JP6125661B2 JP6125661B2 JP2015549124A JP2015549124A JP6125661B2 JP 6125661 B2 JP6125661 B2 JP 6125661B2 JP 2015549124 A JP2015549124 A JP 2015549124A JP 2015549124 A JP2015549124 A JP 2015549124A JP 6125661 B2 JP6125661 B2 JP 6125661B2
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- JP
- Japan
- Prior art keywords
- sputtering target
- phase
- sputtering
- alloy
- mol
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Links
- 230000005291 magnetic effect Effects 0.000 title claims description 45
- 238000005477 sputtering target Methods 0.000 title claims description 42
- 238000004519 manufacturing process Methods 0.000 title claims description 8
- 229910001260 Pt alloy Inorganic materials 0.000 claims description 65
- 238000004544 sputter deposition Methods 0.000 claims description 57
- 239000000843 powder Substances 0.000 claims description 45
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 31
- 229910005335 FePt Inorganic materials 0.000 claims description 13
- 239000000654 additive Substances 0.000 claims description 9
- 230000000996 additive effect Effects 0.000 claims description 9
- 229910010272 inorganic material Inorganic materials 0.000 claims description 8
- 239000011147 inorganic material Substances 0.000 claims description 8
- 229910052796 boron Inorganic materials 0.000 claims description 7
- 229910052802 copper Inorganic materials 0.000 claims description 7
- 229910052737 gold Inorganic materials 0.000 claims description 7
- 229910052751 metal Inorganic materials 0.000 claims description 7
- 238000005520 cutting process Methods 0.000 claims description 6
- 238000002156 mixing Methods 0.000 claims description 6
- 150000004767 nitrides Chemical class 0.000 claims description 6
- 150000001247 metal acetylides Chemical class 0.000 claims description 4
- 239000002245 particle Substances 0.000 description 35
- 239000002994 raw material Substances 0.000 description 23
- 229910002804 graphite Inorganic materials 0.000 description 14
- 239000010439 graphite Substances 0.000 description 14
- 229910045601 alloy Inorganic materials 0.000 description 12
- 239000000956 alloy Substances 0.000 description 12
- 239000000463 material Substances 0.000 description 12
- 239000000203 mixture Substances 0.000 description 12
- 238000001000 micrograph Methods 0.000 description 11
- 230000000007 visual effect Effects 0.000 description 10
- 230000002159 abnormal effect Effects 0.000 description 9
- 229910052799 carbon Inorganic materials 0.000 description 9
- 238000001513 hot isostatic pressing Methods 0.000 description 9
- 239000010408 film Substances 0.000 description 8
- 238000010438 heat treatment Methods 0.000 description 7
- 239000010409 thin film Substances 0.000 description 7
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 6
- 230000000052 comparative effect Effects 0.000 description 6
- 230000005294 ferromagnetic effect Effects 0.000 description 6
- 238000007731 hot pressing Methods 0.000 description 6
- 238000000034 method Methods 0.000 description 6
- 239000000758 substrate Substances 0.000 description 6
- 239000003302 ferromagnetic material Substances 0.000 description 5
- 239000002184 metal Substances 0.000 description 5
- 238000003756 stirring Methods 0.000 description 5
- 239000011324 bead Substances 0.000 description 4
- 238000001755 magnetron sputter deposition Methods 0.000 description 4
- 238000005245 sintering Methods 0.000 description 4
- 229910001233 yttria-stabilized zirconia Inorganic materials 0.000 description 4
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 3
- 229910000905 alloy phase Inorganic materials 0.000 description 3
- 238000005266 casting Methods 0.000 description 3
- 238000007689 inspection Methods 0.000 description 3
- 229910052742 iron Inorganic materials 0.000 description 3
- 238000005259 measurement Methods 0.000 description 3
- 238000012545 processing Methods 0.000 description 3
- 230000000630 rising effect Effects 0.000 description 3
- 229910052710 silicon Inorganic materials 0.000 description 3
- 239000010703 silicon Substances 0.000 description 3
- 239000013078 crystal Substances 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 239000006185 dispersion Substances 0.000 description 2
- 238000009826 distribution Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 230000005611 electricity Effects 0.000 description 2
- 239000010419 fine particle Substances 0.000 description 2
- 238000000227 grinding Methods 0.000 description 2
- 239000006249 magnetic particle Substances 0.000 description 2
- 238000002844 melting Methods 0.000 description 2
- 230000008018 melting Effects 0.000 description 2
- 239000011812 mixed powder Substances 0.000 description 2
- 239000004570 mortar (masonry) Substances 0.000 description 2
- 238000005498 polishing Methods 0.000 description 2
- 230000008569 process Effects 0.000 description 2
- 238000010298 pulverizing process Methods 0.000 description 2
- 239000002904 solvent Substances 0.000 description 2
- 238000004220 aggregation Methods 0.000 description 1
- 230000002776 aggregation Effects 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 230000008878 coupling Effects 0.000 description 1
- 238000010168 coupling process Methods 0.000 description 1
- 238000005859 coupling reaction Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 230000005307 ferromagnetism Effects 0.000 description 1
- 229910021389 graphene Inorganic materials 0.000 description 1
- 230000006698 induction Effects 0.000 description 1
- 239000010954 inorganic particle Substances 0.000 description 1
- 230000001788 irregular Effects 0.000 description 1
- 238000003754 machining Methods 0.000 description 1
- 239000000696 magnetic material Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 230000005502 phase rule Effects 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 230000009466 transformation Effects 0.000 description 1
Classifications
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/84—Processes or apparatus specially adapted for manufacturing record carriers
- G11B5/851—Coating a support with a magnetic layer by sputtering
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C33/00—Making ferrous alloys
- C22C33/02—Making ferrous alloys by powder metallurgy
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C38/00—Ferrous alloys, e.g. steel alloys
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C5/00—Alloys based on noble metals
- C22C5/04—Alloys based on a platinum group metal
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
- C23C14/3414—Metallurgical or chemical aspects of target preparation, e.g. casting, powder metallurgy
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C2202/00—Physical properties
- C22C2202/02—Magnetic
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Physical Vapour Deposition (AREA)
- Manufacturing Of Magnetic Record Carriers (AREA)
- Powder Metallurgy (AREA)
- Manufacture Of Metal Powder And Suspensions Thereof (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2013241537 | 2013-11-22 | ||
| JP2013241537 | 2013-11-22 | ||
| PCT/JP2014/080144 WO2015076190A1 (ja) | 2013-11-22 | 2014-11-14 | 磁気記録膜形成用スパッタリングターゲット及びその製造方法 |
Related Child Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2017075235A Division JP6484276B2 (ja) | 2013-11-22 | 2017-04-05 | 磁気記録膜形成用スパッタリングターゲット及びその製造方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPWO2015076190A1 JPWO2015076190A1 (ja) | 2017-03-16 |
| JP6125661B2 true JP6125661B2 (ja) | 2017-05-17 |
Family
ID=53179455
Family Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2015549124A Active JP6125661B2 (ja) | 2013-11-22 | 2014-11-14 | 磁気記録膜形成用スパッタリングターゲット及びその製造方法 |
| JP2017075235A Active JP6484276B2 (ja) | 2013-11-22 | 2017-04-05 | 磁気記録膜形成用スパッタリングターゲット及びその製造方法 |
Family Applications After (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2017075235A Active JP6484276B2 (ja) | 2013-11-22 | 2017-04-05 | 磁気記録膜形成用スパッタリングターゲット及びその製造方法 |
Country Status (6)
| Country | Link |
|---|---|
| JP (2) | JP6125661B2 (zh) |
| CN (2) | CN109943814B (zh) |
| MY (2) | MY177997A (zh) |
| SG (1) | SG11201602163YA (zh) |
| TW (1) | TWI642799B (zh) |
| WO (1) | WO2015076190A1 (zh) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPWO2023079857A1 (zh) * | 2021-11-05 | 2023-05-11 |
Family Cites Families (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2610575B2 (ja) * | 1993-11-25 | 1997-05-14 | 株式会社 ジャパンエナジー | Ｗ−Ｔｉ合金ターゲット |
| US20070189916A1 (en) * | 2002-07-23 | 2007-08-16 | Heraeus Incorporated | Sputtering targets and methods for fabricating sputtering targets having multiple materials |
| KR100470151B1 (ko) * | 2002-10-29 | 2005-02-05 | 한국과학기술원 | ＦｅＰｔＣ 박막을 이용한 고밀도 자기기록매체 및 그제조방법 |
| JP5590322B2 (ja) * | 2010-11-12 | 2014-09-17 | 三菱マテリアル株式会社 | 磁気記録媒体膜形成用スパッタリングターゲットおよびその製造方法 |
| CN102087858B (zh) * | 2010-11-26 | 2012-07-18 | 山西师范大学 | 一种梯度复合磁记录介质及其制备方法 |
| US9945026B2 (en) * | 2010-12-20 | 2018-04-17 | Jx Nippon Mining & Metals Corporation | Fe-Pt-based sputtering target with dispersed C grains |
| JP5041262B2 (ja) * | 2011-01-31 | 2012-10-03 | 三菱マテリアル株式会社 | 磁気記録媒体膜形成用スパッタリングターゲットおよびその製造方法 |
| JP5912559B2 (ja) * | 2011-03-30 | 2016-04-27 | 田中貴金属工業株式会社 | ＦｅＰｔ−Ｃ系スパッタリングターゲットの製造方法 |
| US20140083847A1 (en) * | 2011-09-26 | 2014-03-27 | Jx Nippon Mining & Metals Corporation | Fe-Pt-C Based Sputtering Target |
| JP6212419B2 (ja) * | 2014-03-17 | 2017-10-11 | 株式会社Ｓｕｂａｒｕ | エンジンの排気凝縮水排出装置 |
-
2014
- 2014-11-14 JP JP2015549124A patent/JP6125661B2/ja active Active
- 2014-11-14 MY MYPI2016701306A patent/MY177997A/en unknown
- 2014-11-14 WO PCT/JP2014/080144 patent/WO2015076190A1/ja active Application Filing
- 2014-11-14 SG SG11201602163YA patent/SG11201602163YA/en unknown
- 2014-11-14 CN CN201910149068.9A patent/CN109943814B/zh active Active
- 2014-11-14 MY MYPI2019002518A patent/MY191633A/en unknown
- 2014-11-14 CN CN201480063680.XA patent/CN105793465B/zh active Active
- 2014-11-18 TW TW103139844A patent/TWI642799B/zh active
-
2017
- 2017-04-05 JP JP2017075235A patent/JP6484276B2/ja active Active
Also Published As
| Publication number | Publication date |
|---|---|
| CN105793465B (zh) | 2019-03-22 |
| CN105793465A (zh) | 2016-07-20 |
| TWI642799B (zh) | 2018-12-01 |
| MY191633A (en) | 2022-07-04 |
| CN109943814A (zh) | 2019-06-28 |
| CN109943814B (zh) | 2021-04-20 |
| JP6484276B2 (ja) | 2019-03-13 |
| TW201531575A (zh) | 2015-08-16 |
| MY177997A (en) | 2020-09-29 |
| WO2015076190A1 (ja) | 2015-05-28 |
| SG11201602163YA (en) | 2016-04-28 |
| JP2017197840A (ja) | 2017-11-02 |
| JPWO2015076190A1 (ja) | 2017-03-16 |
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