JP6111335B2 - 半導体素子基板およびその製造方法 - Google Patents
半導体素子基板およびその製造方法 Download PDFInfo
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- JP6111335B2 JP6111335B2 JP2015530675A JP2015530675A JP6111335B2 JP 6111335 B2 JP6111335 B2 JP 6111335B2 JP 2015530675 A JP2015530675 A JP 2015530675A JP 2015530675 A JP2015530675 A JP 2015530675A JP 6111335 B2 JP6111335 B2 JP 6111335B2
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- 239000004065 semiconductor Substances 0.000 title claims description 136
- 239000000758 substrate Substances 0.000 title claims description 88
- 238000004519 manufacturing process Methods 0.000 title claims description 34
- 238000009792 diffusion process Methods 0.000 claims description 179
- 238000002955 isolation Methods 0.000 claims description 138
- 239000012535 impurity Substances 0.000 claims description 36
- 238000000034 method Methods 0.000 claims description 19
- 230000015572 biosynthetic process Effects 0.000 claims description 15
- 238000010438 heat treatment Methods 0.000 claims description 15
- 239000011159 matrix material Substances 0.000 claims description 4
- 238000002513 implantation Methods 0.000 claims description 3
- 239000010410 layer Substances 0.000 description 118
- 239000011295 pitch Substances 0.000 description 53
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 21
- 229910052710 silicon Inorganic materials 0.000 description 21
- 239000010703 silicon Substances 0.000 description 21
- 238000005336 cracking Methods 0.000 description 12
- 229910052796 boron Inorganic materials 0.000 description 8
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 description 6
- 229910052698 phosphorus Inorganic materials 0.000 description 6
- 239000011574 phosphorus Substances 0.000 description 6
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 4
- -1 boron ions Chemical class 0.000 description 4
- 230000002457 bidirectional effect Effects 0.000 description 3
- 238000005530 etching Methods 0.000 description 3
- 238000005468 ion implantation Methods 0.000 description 3
- 150000002500 ions Chemical class 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- 238000000206 photolithography Methods 0.000 description 3
- 238000000926 separation method Methods 0.000 description 3
- 238000007740 vapor deposition Methods 0.000 description 3
- 238000010586 diagram Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- VMXJCRHCUWKQCB-UHFFFAOYSA-N NPNP Chemical compound NPNP VMXJCRHCUWKQCB-UHFFFAOYSA-N 0.000 description 1
- 230000002159 abnormal effect Effects 0.000 description 1
- 230000005856 abnormality Effects 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 238000005520 cutting process Methods 0.000 description 1
- 230000001771 impaired effect Effects 0.000 description 1
- 238000002347 injection Methods 0.000 description 1
- 239000007924 injection Substances 0.000 description 1
- 238000009413 insulation Methods 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- 230000002093 peripheral effect Effects 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 239000002344 surface layer Substances 0.000 description 1
Images
Classifications
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/71—Manufacture of specific parts of devices defined in group H01L21/70
- H01L21/76—Making of isolation regions between components
- H01L21/761—PN junctions
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/544—Marks applied to semiconductor devices or parts, e.g. registration marks, alignment structures, wafer maps
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/22—Diffusion of impurity materials, e.g. doping materials, electrode materials, into or out of a semiconductor body, or between semiconductor regions; Interactions between two or more impurities; Redistribution of impurities
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/02—Semiconductor bodies ; Multistep manufacturing processes therefor
- H01L29/06—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions
- H01L29/0603—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions characterised by particular constructional design considerations, e.g. for preventing surface leakage, for controlling electric field concentration or for internal isolations regions
- H01L29/0642—Isolation within the component, i.e. internal isolation
- H01L29/0646—PN junctions
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/66007—Multistep manufacturing processes
- H01L29/66075—Multistep manufacturing processes of devices having semiconductor bodies comprising group 14 or group 13/15 materials
- H01L29/66227—Multistep manufacturing processes of devices having semiconductor bodies comprising group 14 or group 13/15 materials the devices being controllable only by the electric current supplied or the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched, e.g. three-terminal devices
- H01L29/66363—Thyristors
- H01L29/66386—Bidirectional thyristors
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/68—Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
- H01L29/70—Bipolar devices
- H01L29/74—Thyristor-type devices, e.g. having four-zone regenerative action
- H01L29/747—Bidirectional devices, e.g. triacs
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2223/00—Details relating to semiconductor or other solid state devices covered by the group H01L23/00
- H01L2223/544—Marks applied to semiconductor devices or parts
- H01L2223/54453—Marks applied to semiconductor devices or parts for use prior to dicing
- H01L2223/5446—Located in scribe lines
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/0001—Technical content checked by a classifier
- H01L2924/0002—Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00
Description
入した後に拡散して、N型シリコン基板101内に深くP型アイソレーション拡散層104を形成し、N型シリコン基板101の表層部にP型ベース拡散層105を形成し、N型シリコン基板101の裏面側にP型アノード拡散層106をそれぞれ形成する。
2 オリフラ
3 半導体チップ
SL スクライブライン
4a,4b 円形穴
5a,5b アイソレーション拡散層
6a,6b 長円形穴
7a,7b アイソレーション拡散層
11 半導体ウエハ(N型基板)
12a,12b 第1酸化絶縁膜
13a,13b 第2酸化絶縁膜
14 表面側のP型拡散層
15 裏面側のP型拡散層
16、17 表面側のN型拡散層
18 裏面側のN型拡散層
19 CVD膜
20 PIコート膜
図1は、本発明の実施形態1における半導体素子基板として半導体ウエハを概略的に示す平面図である。
上記実施形態1では、半導体ウエハの両面に形成された円形穴4a,4bの各ピッチが互いにずれていない場合について説明したが、本実施形態2では、半導体ウエハの両面に形成された円形穴4a,4bの各ピッチが互いに半ピッチだけ順次ずれている場合について説明する。
上記実施形態1、2では、半導体ウエハの両面に有底の円形穴4a,4bが形成された場合について説明したが、本実施形態3では、半導体ウエハの両面に、円形穴4a,4bの円形以外の穴形状として長円形穴や4角形穴(正方形または長方形)などがあるが、ここでは長円形穴が形成された場合について説明する。
上記実施形態1〜3では、半導体素子基板およびその製造方法について説明したが、本実施形態4では、具体的にサイリスタ素子基板およびその製造方法について説明する。
Claims (5)
- 複数の半導体装置がマトリクス状に配置され、互いに隣接する半導体装置間のスクライブラインに沿って不連続に複数の穴が配設され、該複数の穴の周りにそれぞれ素子分離用のアイソレーション拡散層が形成されている半導体素子基板。
- 前記複数の穴は基板両面からそれぞれ前記スクライブラインに沿って形成されて前記素子分離用の一導電型の各アイソレーション拡散層が該基板両面から深さ方向中央部に達して隣接穴間および上下に互いに少なくとも一部が重なるように形成されている請求項1に記載の半導体素子基板。
- 前記基板表面から形成された複数の穴のピッチと前記基板裏面から形成された複数の穴のピッチとが互いにずれて形成されており、前記複数の穴は円形穴である請求項2に記載の半導体素子基板。
- 前記スクライブラインの方向に隣接する前記隣接穴間の繋がり部分の距離と、前記基板表面の穴の底面と前記基板裏面の穴の底面の間の深さ方向距離とが同一であり、前記複数の穴は円形穴である請求項2または3に記載の半導体素子基板。
- 基板の片面または両面に、スクライブラインに沿った不連続な複数の穴を形成する穴形成工程と、該穴を介してウエハ両面から不純物をイオン注入して不純物領域を形成する不純物注入工程と、加熱処理により該不純物領域を拡散してアイソレーション拡散層を形成するアイソレーション拡散工程と、該アイソレーション拡散層で囲まれた素子分離領域毎に半導体装置を形成する半導体装置形成工程とを有する半導体素子基板の製造方法。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2013165615 | 2013-08-08 | ||
JP2013165615 | 2013-08-08 | ||
PCT/JP2014/003426 WO2015019540A1 (ja) | 2013-08-08 | 2014-06-26 | 半導体素子基板およびその製造方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPWO2015019540A1 JPWO2015019540A1 (ja) | 2017-03-02 |
JP6111335B2 true JP6111335B2 (ja) | 2017-04-05 |
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Application Number | Title | Priority Date | Filing Date |
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JP2015530675A Expired - Fee Related JP6111335B2 (ja) | 2013-08-08 | 2014-06-26 | 半導体素子基板およびその製造方法 |
Country Status (4)
Country | Link |
---|---|
US (1) | US20160148875A1 (ja) |
JP (1) | JP6111335B2 (ja) |
CN (1) | CN105453250A (ja) |
WO (1) | WO2015019540A1 (ja) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
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EP3142143A1 (en) * | 2015-09-11 | 2017-03-15 | ABB Technology AG | Method for manufacturing a power semiconductor device |
JP6953246B2 (ja) | 2017-09-08 | 2021-10-27 | 浜松ホトニクス株式会社 | 半導体ウエハの製造方法、半導体エネルギー線検出素子の製造方法、及び半導体ウエハ |
JP7142606B2 (ja) * | 2019-06-04 | 2022-09-27 | 三菱電機株式会社 | 半導体装置 |
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JP2013108111A (ja) * | 2011-11-18 | 2013-06-06 | Tokyo Electron Ltd | 基板の処理方法及びテンプレート |
FR2987698B1 (fr) * | 2012-03-02 | 2014-04-04 | St Microelectronics Tours Sas | Composant de puissance vertical |
JP6142496B2 (ja) * | 2012-10-12 | 2017-06-07 | 富士電機株式会社 | 半導体装置の製造方法 |
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- 2014-06-26 WO PCT/JP2014/003426 patent/WO2015019540A1/ja active Application Filing
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US20160148875A1 (en) | 2016-05-26 |
WO2015019540A1 (ja) | 2015-02-12 |
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