JP6093660B2 - チューナブル・ブラッグ・グレーティング、およびそれを用いたチューナブル・レーザ・ダイオード - Google Patents
チューナブル・ブラッグ・グレーティング、およびそれを用いたチューナブル・レーザ・ダイオード Download PDFInfo
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- JP6093660B2 JP6093660B2 JP2013135652A JP2013135652A JP6093660B2 JP 6093660 B2 JP6093660 B2 JP 6093660B2 JP 2013135652 A JP2013135652 A JP 2013135652A JP 2013135652 A JP2013135652 A JP 2013135652A JP 6093660 B2 JP6093660 B2 JP 6093660B2
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Images
Classifications
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/06—Arrangements for controlling the laser output parameters, e.g. by operating on the active medium
- H01S5/062—Arrangements for controlling the laser output parameters, e.g. by operating on the active medium by varying the potential of the electrodes
- H01S5/0625—Arrangements for controlling the laser output parameters, e.g. by operating on the active medium by varying the potential of the electrodes in multi-section lasers
- H01S5/06255—Controlling the frequency of the radiation
- H01S5/06256—Controlling the frequency of the radiation with DBR-structure
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/02—Structural details or components not essential to laser action
- H01S5/024—Arrangements for thermal management
- H01S5/02461—Structure or details of the laser chip to manipulate the heat flow, e.g. passive layers in the chip with a low heat conductivity
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/06—Arrangements for controlling the laser output parameters, e.g. by operating on the active medium
- H01S5/0607—Arrangements for controlling the laser output parameters, e.g. by operating on the active medium by varying physical parameters other than the potential of the electrodes, e.g. by an electric or magnetic field, mechanical deformation, pressure, light, temperature
- H01S5/0612—Arrangements for controlling the laser output parameters, e.g. by operating on the active medium by varying physical parameters other than the potential of the electrodes, e.g. by an electric or magnetic field, mechanical deformation, pressure, light, temperature controlled by temperature
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
- G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
- G02B2006/12083—Constructional arrangements
- G02B2006/12097—Ridge, rib or the like
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
- G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
- G02B2006/12083—Constructional arrangements
- G02B2006/12107—Grating
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
- G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
- G02B2006/12166—Manufacturing methods
- G02B2006/12176—Etching
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/02—Structural details or components not essential to laser action
- H01S5/026—Monolithically integrated components, e.g. waveguides, monitoring photo-detectors, drivers
- H01S5/0261—Non-optical elements, e.g. laser driver components, heaters
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/10—Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
- H01S5/12—Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region the resonator having a periodic structure, e.g. in distributed feedback [DFB] lasers
- H01S5/1206—Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region the resonator having a periodic structure, e.g. in distributed feedback [DFB] lasers having a non constant or multiplicity of periods
- H01S5/1209—Sampled grating
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/10—Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
- H01S5/12—Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region the resonator having a periodic structure, e.g. in distributed feedback [DFB] lasers
- H01S5/1234—Actively induced grating, e.g. acoustically or electrically induced
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/10—Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
- H01S5/12—Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region the resonator having a periodic structure, e.g. in distributed feedback [DFB] lasers
- H01S5/1237—Lateral grating, i.e. grating only adjacent ridge or mesa
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/20—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers
- H01S5/22—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers having a ridge or stripe structure
Landscapes
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Electromagnetism (AREA)
- Optics & Photonics (AREA)
- Semiconductor Lasers (AREA)
- Optical Modulation, Optical Deflection, Nonlinear Optics, Optical Demodulation, Optical Logic Elements (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US13/542,547 US8861556B2 (en) | 2012-07-05 | 2012-07-05 | Tunable Bragg grating and a tunable laser diode using same |
| US13/542,547 | 2012-07-05 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2014017481A JP2014017481A (ja) | 2014-01-30 |
| JP2014017481A5 JP2014017481A5 (enExample) | 2016-08-04 |
| JP6093660B2 true JP6093660B2 (ja) | 2017-03-08 |
Family
ID=47048966
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2013135652A Active JP6093660B2 (ja) | 2012-07-05 | 2013-06-27 | チューナブル・ブラッグ・グレーティング、およびそれを用いたチューナブル・レーザ・ダイオード |
Country Status (4)
| Country | Link |
|---|---|
| US (1) | US8861556B2 (enExample) |
| EP (1) | EP2682794B1 (enExample) |
| JP (1) | JP6093660B2 (enExample) |
| CN (1) | CN103532009B (enExample) |
Families Citing this family (32)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP2989699B1 (en) * | 2013-04-30 | 2019-12-25 | Huawei Technologies Co., Ltd. | Tunable laser with high thermal wavelength tuning efficiency |
| KR101672586B1 (ko) * | 2014-06-09 | 2016-11-04 | 한국과학기술원 | 파장 조율이 가능한 구조를 갖는 광 격자 커플러 |
| US9509119B2 (en) | 2015-01-13 | 2016-11-29 | Futurewei Technologies, Inc. | Tunable laser with a cascaded filter and comb reflector |
| CN105759350A (zh) * | 2015-07-03 | 2016-07-13 | 苏州峰通光电有限公司 | 一种有机无机混合集成热光调制型光栅及其制备方法 |
| EP3400635B1 (en) | 2016-01-04 | 2023-06-07 | Infinera Corporation | Tunable waveguide devices |
| CN105527730A (zh) * | 2016-01-06 | 2016-04-27 | 北京大学 | 一种光学相位调制器 |
| CN107230930A (zh) * | 2016-03-23 | 2017-10-03 | 华为技术有限公司 | 一种可调激光器及制备方法 |
| GB2554460A (en) * | 2016-09-29 | 2018-04-04 | Oclaro Tech Ltd | Waveguide structure |
| WO2018186471A1 (ja) * | 2017-04-06 | 2018-10-11 | 国立大学法人横浜国立大学 | 光偏向デバイス |
| CN108732667B (zh) * | 2017-04-17 | 2021-01-05 | 华为技术有限公司 | 一种超结构光栅和可调谐激光器 |
| CN108879309B (zh) * | 2017-05-09 | 2021-02-12 | 华为技术有限公司 | 用于可调激光器的反射镜结构和可调激光器 |
| CN108879310B (zh) * | 2017-05-10 | 2020-07-28 | 华为技术有限公司 | 用于可调激光器的反射镜结构和可调激光器 |
| WO2019116657A1 (ja) * | 2017-12-15 | 2019-06-20 | 株式会社堀場製作所 | 半導体レーザ |
| CN108173116B (zh) * | 2018-02-07 | 2020-01-03 | 山东大学 | 一种宽带可调谐Moire光栅激光器及其工作方法 |
| GB2571269B (en) | 2018-02-21 | 2021-07-07 | Rockley Photonics Ltd | Optoelectronic device |
| JP7012409B2 (ja) * | 2018-03-14 | 2022-01-28 | 古河電気工業株式会社 | 光導波路構造及びその製造方法 |
| CN110376766B (zh) * | 2018-04-12 | 2021-03-30 | 海思光电子有限公司 | 一种反射装置及可调谐激光器 |
| EP3565068B1 (en) * | 2018-04-30 | 2021-02-24 | FRAUNHOFER-GESELLSCHAFT zur Förderung der angewandten Forschung e.V. | Thermally tunable laser and method for fabricating such laser |
| CN109066291A (zh) * | 2018-08-30 | 2018-12-21 | 武汉光迅科技股份有限公司 | 一种半导体芯片及其制作方法 |
| CN109193330B (zh) * | 2018-09-14 | 2020-08-25 | 中国科学院半导体研究所 | 光反馈结构及可调谐窄线宽外腔激光器 |
| WO2020107315A1 (zh) * | 2018-11-29 | 2020-06-04 | 华为技术有限公司 | 两段式dbr激光器及单片集成阵列光源芯片 |
| US11262603B2 (en) | 2019-06-13 | 2022-03-01 | Rockley Photonics Limited | Multilayer metal stack heater |
| KR102710733B1 (ko) * | 2019-08-20 | 2024-09-30 | 삼성전자주식회사 | 광 변조 소자 및 이를 포함하는 전자 장치 |
| KR20230015318A (ko) | 2020-04-03 | 2023-01-31 | 오토모티브 코우얼리션 포 트래픽 세이프티, 인크. | 광범위하게 튜닝 가능한 단일 모드 방출 반도체 레이저 |
| CN113568097B (zh) * | 2020-04-29 | 2023-08-22 | 朗美通经营有限责任公司 | 热控光子结构 |
| US11502480B2 (en) * | 2020-04-29 | 2022-11-15 | Lumentum Operations Llc | Thermally-controlled photonic structure |
| KR102687553B1 (ko) * | 2020-07-23 | 2024-07-24 | 한국전자통신연구원 | 광 도파로 소자 및 그를 포함하는 레이저 장치 |
| CN116111451A (zh) * | 2021-11-11 | 2023-05-12 | 武汉光迅科技股份有限公司 | 一种新型结构的热调谐激光器芯片及其制作方法 |
| CN117154531B (zh) * | 2022-05-07 | 2025-11-14 | 武汉光迅科技股份有限公司 | 一种新型结构的热调谐激光器芯片及其制作方法 |
| CN117335261B (zh) * | 2022-06-27 | 2025-11-11 | 武汉光迅科技股份有限公司 | 一种新型结构的热调谐激光器芯片及其制作方法 |
| WO2024257152A1 (ja) * | 2023-06-12 | 2024-12-19 | 日本電信電話株式会社 | 半導体レーザ |
| CN120749533B (zh) * | 2025-09-08 | 2025-12-02 | 武汉国科光领半导体科技有限公司 | 一种可调谐激光器的制备方法及结构 |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2825508B2 (ja) | 1987-10-09 | 1998-11-18 | 株式会社日立製作所 | 半導体レーザ装置および光通信システム |
| FR2737353B1 (fr) | 1995-07-25 | 1997-09-05 | Delorme Franck | Laser a reflecteur de bragg distribue et a reseau echantillonne, tres largement accordable par variation de phase, et procede d'utilisation de ce laser |
| JPH0969666A (ja) * | 1995-09-01 | 1997-03-11 | Oki Electric Ind Co Ltd | 半導体レーザ装置及びその動作方法 |
| GB2371920A (en) | 2001-02-02 | 2002-08-07 | Marconi Caswell Ltd | Sampled Gating Distribiuted Reflector Laser |
| GB2378311A (en) | 2001-08-03 | 2003-02-05 | Marconi Caswell Ltd | Tunable Laser |
| KR20040098421A (ko) | 2003-05-15 | 2004-11-20 | 한국전자통신연구원 | 광대역 파장 가변 추출 격자 분포 궤환 레이저 다이오드 |
| JP4657853B2 (ja) * | 2005-08-11 | 2011-03-23 | 住友電工デバイス・イノベーション株式会社 | 半導体レーザ、レーザモジュール、光学部品、レーザ装置、半導体レーザの製造方法および半導体レーザの制御方法 |
| JP4629022B2 (ja) | 2005-12-27 | 2011-02-09 | 住友電工デバイス・イノベーション株式会社 | レーザ装置、レーザモジュール、および、半導体レーザ |
| JP2007273644A (ja) | 2006-03-30 | 2007-10-18 | Eudyna Devices Inc | 光半導体装置、レーザチップおよびレーザモジュール |
| JP2007273650A (ja) * | 2006-03-30 | 2007-10-18 | Eudyna Devices Inc | 光半導体装置 |
| US7894693B2 (en) * | 2007-04-05 | 2011-02-22 | Eudyna Devices Inc. | Optical semiconductor device and method of controlling the same |
| US7760777B2 (en) | 2007-04-13 | 2010-07-20 | Finisar Corporation | DBR laser with improved thermal tuning efficiency |
| US7778295B2 (en) * | 2007-05-14 | 2010-08-17 | Finisar Corporation | DBR laser with improved thermal tuning efficiency |
| US7848599B2 (en) * | 2009-03-31 | 2010-12-07 | Oracle America, Inc. | Optical device with large thermal impedance |
| US8971674B2 (en) | 2010-03-24 | 2015-03-03 | Oracle International Corporation | Optical device with high thermal tuning efficiency |
-
2012
- 2012-07-05 US US13/542,547 patent/US8861556B2/en active Active
- 2012-09-19 EP EP12184980.6A patent/EP2682794B1/en active Active
-
2013
- 2013-06-27 JP JP2013135652A patent/JP6093660B2/ja active Active
- 2013-06-28 CN CN201310268947.6A patent/CN103532009B/zh active Active
Also Published As
| Publication number | Publication date |
|---|---|
| EP2682794B1 (en) | 2018-05-16 |
| US20140010248A1 (en) | 2014-01-09 |
| CN103532009B (zh) | 2018-05-01 |
| EP2682794A1 (en) | 2014-01-08 |
| CN103532009A (zh) | 2014-01-22 |
| JP2014017481A (ja) | 2014-01-30 |
| US8861556B2 (en) | 2014-10-14 |
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