CN103532009B - 可调谐布拉格光栅及使用该光栅的可调谐激光二极管 - Google Patents
可调谐布拉格光栅及使用该光栅的可调谐激光二极管 Download PDFInfo
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- CN103532009B CN103532009B CN201310268947.6A CN201310268947A CN103532009B CN 103532009 B CN103532009 B CN 103532009B CN 201310268947 A CN201310268947 A CN 201310268947A CN 103532009 B CN103532009 B CN 103532009B
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- 238000010438 heat treatment Methods 0.000 claims abstract description 15
- 239000010410 layer Substances 0.000 claims description 110
- 238000005253 cladding Methods 0.000 claims description 31
- 239000012792 core layer Substances 0.000 claims description 20
- 125000006850 spacer group Chemical group 0.000 claims description 17
- 238000009826 distribution Methods 0.000 claims description 16
- 229910000530 Gallium indium arsenide Inorganic materials 0.000 claims description 12
- 238000000034 method Methods 0.000 claims description 12
- 238000005459 micromachining Methods 0.000 claims description 8
- 239000010409 thin film Substances 0.000 claims description 7
- 238000004519 manufacturing process Methods 0.000 claims description 5
- 238000000926 separation method Methods 0.000 claims description 5
- 230000008878 coupling Effects 0.000 claims description 3
- 238000010168 coupling process Methods 0.000 claims description 3
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- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
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- 230000005540 biological transmission Effects 0.000 description 1
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- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 238000002840 optical waveguide grating Methods 0.000 description 1
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- MZLGASXMSKOWSE-UHFFFAOYSA-N tantalum nitride Chemical compound [Ta]#N MZLGASXMSKOWSE-UHFFFAOYSA-N 0.000 description 1
- 229910052724 xenon Inorganic materials 0.000 description 1
- FHNFHKCVQCLJFQ-UHFFFAOYSA-N xenon atom Chemical compound [Xe] FHNFHKCVQCLJFQ-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/06—Arrangements for controlling the laser output parameters, e.g. by operating on the active medium
- H01S5/062—Arrangements for controlling the laser output parameters, e.g. by operating on the active medium by varying the potential of the electrodes
- H01S5/0625—Arrangements for controlling the laser output parameters, e.g. by operating on the active medium by varying the potential of the electrodes in multi-section lasers
- H01S5/06255—Controlling the frequency of the radiation
- H01S5/06256—Controlling the frequency of the radiation with DBR-structure
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/02—Structural details or components not essential to laser action
- H01S5/024—Arrangements for thermal management
- H01S5/02461—Structure or details of the laser chip to manipulate the heat flow, e.g. passive layers in the chip with a low heat conductivity
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/06—Arrangements for controlling the laser output parameters, e.g. by operating on the active medium
- H01S5/0607—Arrangements for controlling the laser output parameters, e.g. by operating on the active medium by varying physical parameters other than the potential of the electrodes, e.g. by an electric or magnetic field, mechanical deformation, pressure, light, temperature
- H01S5/0612—Arrangements for controlling the laser output parameters, e.g. by operating on the active medium by varying physical parameters other than the potential of the electrodes, e.g. by an electric or magnetic field, mechanical deformation, pressure, light, temperature controlled by temperature
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
- G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
- G02B2006/12083—Constructional arrangements
- G02B2006/12097—Ridge, rib or the like
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
- G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
- G02B2006/12083—Constructional arrangements
- G02B2006/12107—Grating
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
- G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
- G02B2006/12166—Manufacturing methods
- G02B2006/12176—Etching
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/02—Structural details or components not essential to laser action
- H01S5/026—Monolithically integrated components, e.g. waveguides, monitoring photo-detectors, drivers
- H01S5/0261—Non-optical elements, e.g. laser driver components, heaters
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/10—Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
- H01S5/12—Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region the resonator having a periodic structure, e.g. in distributed feedback [DFB] lasers
- H01S5/1206—Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region the resonator having a periodic structure, e.g. in distributed feedback [DFB] lasers having a non constant or multiplicity of periods
- H01S5/1209—Sampled grating
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/10—Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
- H01S5/12—Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region the resonator having a periodic structure, e.g. in distributed feedback [DFB] lasers
- H01S5/1234—Actively induced grating, e.g. acoustically or electrically induced
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/10—Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
- H01S5/12—Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region the resonator having a periodic structure, e.g. in distributed feedback [DFB] lasers
- H01S5/1237—Lateral grating, i.e. grating only adjacent ridge or mesa
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/20—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers
- H01S5/22—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers having a ridge or stripe structure
Landscapes
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Electromagnetism (AREA)
- Optics & Photonics (AREA)
- Semiconductor Lasers (AREA)
- Optical Modulation, Optical Deflection, Nonlinear Optics, Optical Demodulation, Optical Logic Elements (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US13/542,547 US8861556B2 (en) | 2012-07-05 | 2012-07-05 | Tunable Bragg grating and a tunable laser diode using same |
| US13/542,547 | 2012-07-05 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN103532009A CN103532009A (zh) | 2014-01-22 |
| CN103532009B true CN103532009B (zh) | 2018-05-01 |
Family
ID=47048966
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201310268947.6A Active CN103532009B (zh) | 2012-07-05 | 2013-06-28 | 可调谐布拉格光栅及使用该光栅的可调谐激光二极管 |
Country Status (4)
| Country | Link |
|---|---|
| US (1) | US8861556B2 (enExample) |
| EP (1) | EP2682794B1 (enExample) |
| JP (1) | JP6093660B2 (enExample) |
| CN (1) | CN103532009B (enExample) |
Families Citing this family (32)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP2989699B1 (en) * | 2013-04-30 | 2019-12-25 | Huawei Technologies Co., Ltd. | Tunable laser with high thermal wavelength tuning efficiency |
| KR101672586B1 (ko) * | 2014-06-09 | 2016-11-04 | 한국과학기술원 | 파장 조율이 가능한 구조를 갖는 광 격자 커플러 |
| US9509119B2 (en) | 2015-01-13 | 2016-11-29 | Futurewei Technologies, Inc. | Tunable laser with a cascaded filter and comb reflector |
| CN105759350A (zh) * | 2015-07-03 | 2016-07-13 | 苏州峰通光电有限公司 | 一种有机无机混合集成热光调制型光栅及其制备方法 |
| EP3400635B1 (en) | 2016-01-04 | 2023-06-07 | Infinera Corporation | Tunable waveguide devices |
| CN105527730A (zh) * | 2016-01-06 | 2016-04-27 | 北京大学 | 一种光学相位调制器 |
| CN107230930A (zh) * | 2016-03-23 | 2017-10-03 | 华为技术有限公司 | 一种可调激光器及制备方法 |
| GB2554460A (en) * | 2016-09-29 | 2018-04-04 | Oclaro Tech Ltd | Waveguide structure |
| WO2018186471A1 (ja) * | 2017-04-06 | 2018-10-11 | 国立大学法人横浜国立大学 | 光偏向デバイス |
| CN108732667B (zh) * | 2017-04-17 | 2021-01-05 | 华为技术有限公司 | 一种超结构光栅和可调谐激光器 |
| CN108879309B (zh) * | 2017-05-09 | 2021-02-12 | 华为技术有限公司 | 用于可调激光器的反射镜结构和可调激光器 |
| CN108879310B (zh) * | 2017-05-10 | 2020-07-28 | 华为技术有限公司 | 用于可调激光器的反射镜结构和可调激光器 |
| WO2019116657A1 (ja) * | 2017-12-15 | 2019-06-20 | 株式会社堀場製作所 | 半導体レーザ |
| CN108173116B (zh) * | 2018-02-07 | 2020-01-03 | 山东大学 | 一种宽带可调谐Moire光栅激光器及其工作方法 |
| GB2571269B (en) | 2018-02-21 | 2021-07-07 | Rockley Photonics Ltd | Optoelectronic device |
| JP7012409B2 (ja) * | 2018-03-14 | 2022-01-28 | 古河電気工業株式会社 | 光導波路構造及びその製造方法 |
| CN110376766B (zh) * | 2018-04-12 | 2021-03-30 | 海思光电子有限公司 | 一种反射装置及可调谐激光器 |
| EP3565068B1 (en) * | 2018-04-30 | 2021-02-24 | FRAUNHOFER-GESELLSCHAFT zur Förderung der angewandten Forschung e.V. | Thermally tunable laser and method for fabricating such laser |
| CN109066291A (zh) * | 2018-08-30 | 2018-12-21 | 武汉光迅科技股份有限公司 | 一种半导体芯片及其制作方法 |
| CN109193330B (zh) * | 2018-09-14 | 2020-08-25 | 中国科学院半导体研究所 | 光反馈结构及可调谐窄线宽外腔激光器 |
| WO2020107315A1 (zh) * | 2018-11-29 | 2020-06-04 | 华为技术有限公司 | 两段式dbr激光器及单片集成阵列光源芯片 |
| US11262603B2 (en) | 2019-06-13 | 2022-03-01 | Rockley Photonics Limited | Multilayer metal stack heater |
| KR102710733B1 (ko) * | 2019-08-20 | 2024-09-30 | 삼성전자주식회사 | 광 변조 소자 및 이를 포함하는 전자 장치 |
| KR20230015318A (ko) | 2020-04-03 | 2023-01-31 | 오토모티브 코우얼리션 포 트래픽 세이프티, 인크. | 광범위하게 튜닝 가능한 단일 모드 방출 반도체 레이저 |
| CN113568097B (zh) * | 2020-04-29 | 2023-08-22 | 朗美通经营有限责任公司 | 热控光子结构 |
| US11502480B2 (en) * | 2020-04-29 | 2022-11-15 | Lumentum Operations Llc | Thermally-controlled photonic structure |
| KR102687553B1 (ko) * | 2020-07-23 | 2024-07-24 | 한국전자통신연구원 | 광 도파로 소자 및 그를 포함하는 레이저 장치 |
| CN116111451A (zh) * | 2021-11-11 | 2023-05-12 | 武汉光迅科技股份有限公司 | 一种新型结构的热调谐激光器芯片及其制作方法 |
| CN117154531B (zh) * | 2022-05-07 | 2025-11-14 | 武汉光迅科技股份有限公司 | 一种新型结构的热调谐激光器芯片及其制作方法 |
| CN117335261B (zh) * | 2022-06-27 | 2025-11-11 | 武汉光迅科技股份有限公司 | 一种新型结构的热调谐激光器芯片及其制作方法 |
| WO2024257152A1 (ja) * | 2023-06-12 | 2024-12-19 | 日本電信電話株式会社 | 半導体レーザ |
| CN120749533B (zh) * | 2025-09-08 | 2025-12-02 | 武汉国科光领半导体科技有限公司 | 一种可调谐激光器的制备方法及结构 |
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| Publication number | Priority date | Publication date | Assignee | Title |
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| CN1913261A (zh) * | 2005-08-11 | 2007-02-14 | 优迪那半导体有限公司 | 半导体激光器及其控制方法、光学器件以及激光器装置 |
| EP1841023B1 (en) * | 2006-03-30 | 2010-02-17 | Eudyna Devices Inc. | Temperature tuning of the wavelength of a laser diode by heating |
| CN102414600A (zh) * | 2009-03-31 | 2012-04-11 | 甲骨文美国公司 | 具有大热阻抗的光学器件 |
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| JP2825508B2 (ja) | 1987-10-09 | 1998-11-18 | 株式会社日立製作所 | 半導体レーザ装置および光通信システム |
| FR2737353B1 (fr) | 1995-07-25 | 1997-09-05 | Delorme Franck | Laser a reflecteur de bragg distribue et a reseau echantillonne, tres largement accordable par variation de phase, et procede d'utilisation de ce laser |
| JPH0969666A (ja) * | 1995-09-01 | 1997-03-11 | Oki Electric Ind Co Ltd | 半導体レーザ装置及びその動作方法 |
| GB2371920A (en) | 2001-02-02 | 2002-08-07 | Marconi Caswell Ltd | Sampled Gating Distribiuted Reflector Laser |
| GB2378311A (en) | 2001-08-03 | 2003-02-05 | Marconi Caswell Ltd | Tunable Laser |
| KR20040098421A (ko) | 2003-05-15 | 2004-11-20 | 한국전자통신연구원 | 광대역 파장 가변 추출 격자 분포 궤환 레이저 다이오드 |
| JP4629022B2 (ja) | 2005-12-27 | 2011-02-09 | 住友電工デバイス・イノベーション株式会社 | レーザ装置、レーザモジュール、および、半導体レーザ |
| JP2007273650A (ja) * | 2006-03-30 | 2007-10-18 | Eudyna Devices Inc | 光半導体装置 |
| US7894693B2 (en) * | 2007-04-05 | 2011-02-22 | Eudyna Devices Inc. | Optical semiconductor device and method of controlling the same |
| US7760777B2 (en) | 2007-04-13 | 2010-07-20 | Finisar Corporation | DBR laser with improved thermal tuning efficiency |
| US7778295B2 (en) * | 2007-05-14 | 2010-08-17 | Finisar Corporation | DBR laser with improved thermal tuning efficiency |
| US8971674B2 (en) | 2010-03-24 | 2015-03-03 | Oracle International Corporation | Optical device with high thermal tuning efficiency |
-
2012
- 2012-07-05 US US13/542,547 patent/US8861556B2/en active Active
- 2012-09-19 EP EP12184980.6A patent/EP2682794B1/en active Active
-
2013
- 2013-06-27 JP JP2013135652A patent/JP6093660B2/ja active Active
- 2013-06-28 CN CN201310268947.6A patent/CN103532009B/zh active Active
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1913261A (zh) * | 2005-08-11 | 2007-02-14 | 优迪那半导体有限公司 | 半导体激光器及其控制方法、光学器件以及激光器装置 |
| EP1841023B1 (en) * | 2006-03-30 | 2010-02-17 | Eudyna Devices Inc. | Temperature tuning of the wavelength of a laser diode by heating |
| CN102414600A (zh) * | 2009-03-31 | 2012-04-11 | 甲骨文美国公司 | 具有大热阻抗的光学器件 |
Also Published As
| Publication number | Publication date |
|---|---|
| JP6093660B2 (ja) | 2017-03-08 |
| EP2682794B1 (en) | 2018-05-16 |
| US20140010248A1 (en) | 2014-01-09 |
| EP2682794A1 (en) | 2014-01-08 |
| CN103532009A (zh) | 2014-01-22 |
| JP2014017481A (ja) | 2014-01-30 |
| US8861556B2 (en) | 2014-10-14 |
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