JP6020829B2 - 塗液観察方法、塗布方法、塗液観察装置および塗布装置 - Google Patents

塗液観察方法、塗布方法、塗液観察装置および塗布装置 Download PDF

Info

Publication number
JP6020829B2
JP6020829B2 JP2013219140A JP2013219140A JP6020829B2 JP 6020829 B2 JP6020829 B2 JP 6020829B2 JP 2013219140 A JP2013219140 A JP 2013219140A JP 2013219140 A JP2013219140 A JP 2013219140A JP 6020829 B2 JP6020829 B2 JP 6020829B2
Authority
JP
Japan
Prior art keywords
coating
coating liquid
support
defect
film forming
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP2013219140A
Other languages
English (en)
Japanese (ja)
Other versions
JP2015080747A (ja
Inventor
弘章 槇野
弘章 槇野
充 長島
充 長島
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Murata Manufacturing Co Ltd
Original Assignee
Murata Manufacturing Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Murata Manufacturing Co Ltd filed Critical Murata Manufacturing Co Ltd
Priority to JP2013219140A priority Critical patent/JP6020829B2/ja
Priority to KR1020140123504A priority patent/KR101750355B1/ko
Priority to CN201410509533.2A priority patent/CN104549940B/zh
Priority to TW103133798A priority patent/TWI576163B/zh
Publication of JP2015080747A publication Critical patent/JP2015080747A/ja
Application granted granted Critical
Publication of JP6020829B2 publication Critical patent/JP6020829B2/ja
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/25—Colour; Spectral properties, i.e. comparison of effect of material on the light at two or more different wavelengths or wavelength bands
    • G01N21/31—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry
    • G01N21/35—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry using infrared light
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C5/00—Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work
    • B05C5/02—Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work the liquid or other fluent material being discharged through an outlet orifice by pressure, e.g. from an outlet device in contact or almost in contact, with the work
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D1/00—Processes for applying liquids or other fluent materials
    • B05D1/26—Processes for applying liquids or other fluent materials performed by applying the liquid or other fluent material from an outlet device in contact with, or almost in contact with, the surface
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/25—Colour; Spectral properties, i.e. comparison of effect of material on the light at two or more different wavelengths or wavelength bands
    • G01N21/31—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry
    • G01N21/35—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry using infrared light
    • G01N21/3563—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry using infrared light for analysing solids; Preparation of samples therefor
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/47—Scattering, i.e. diffuse reflection
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination

Landscapes

  • Physics & Mathematics (AREA)
  • General Health & Medical Sciences (AREA)
  • Immunology (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Pathology (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Coating Apparatus (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Length Measuring Devices By Optical Means (AREA)
JP2013219140A 2013-10-22 2013-10-22 塗液観察方法、塗布方法、塗液観察装置および塗布装置 Expired - Fee Related JP6020829B2 (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP2013219140A JP6020829B2 (ja) 2013-10-22 2013-10-22 塗液観察方法、塗布方法、塗液観察装置および塗布装置
KR1020140123504A KR101750355B1 (ko) 2013-10-22 2014-09-17 도포액 관찰방법, 도포방법, 도포액 관찰장치 및 도포장치
CN201410509533.2A CN104549940B (zh) 2013-10-22 2014-09-28 涂液观察方法、涂布方法、涂液观察装置及涂布装置
TW103133798A TWI576163B (zh) 2013-10-22 2014-09-29 A coating method, a coating method, a coating liquid observation apparatus, and a coating apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2013219140A JP6020829B2 (ja) 2013-10-22 2013-10-22 塗液観察方法、塗布方法、塗液観察装置および塗布装置

Publications (2)

Publication Number Publication Date
JP2015080747A JP2015080747A (ja) 2015-04-27
JP6020829B2 true JP6020829B2 (ja) 2016-11-02

Family

ID=53011657

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2013219140A Expired - Fee Related JP6020829B2 (ja) 2013-10-22 2013-10-22 塗液観察方法、塗布方法、塗液観察装置および塗布装置

Country Status (4)

Country Link
JP (1) JP6020829B2 (ko)
KR (1) KR101750355B1 (ko)
CN (1) CN104549940B (ko)
TW (1) TWI576163B (ko)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20210210392A1 (en) * 2020-01-06 2021-07-08 Tokyo Electron Limited Hardware Improvements and Methods for the Analysis of a Spinning Reflective Substrates
US11738363B2 (en) 2021-06-07 2023-08-29 Tokyo Electron Limited Bath systems and methods thereof
US12123778B2 (en) 2021-03-04 2024-10-22 Tokyo Electron Limited Thermal imaging sensor for integration into track system

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN105181651B (zh) * 2015-07-24 2017-08-25 中国计量学院 一种测试纺织品正反面红外发射差异的方法及装置
KR20180064582A (ko) * 2016-12-05 2018-06-15 주식회사 탑 엔지니어링 디스펜서 및 디스펜서의 토출량 검사 방법
CN107833202A (zh) * 2017-10-11 2018-03-23 汕头大学 一种涂布浸渍辊在供料盘浸没深度的机器视觉检测方法
CN108499792A (zh) * 2018-04-28 2018-09-07 上海市安装工程集团有限公司 一种自动化喷胶装置及涂胶方法
CN117414982B (zh) * 2023-12-19 2024-04-19 深圳无限光能技术有限公司 涂布设备及检测方法

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2684460B2 (ja) 1991-03-25 1997-12-03 富士写真フイルム株式会社 塗布膜の検査方法
JP3700170B2 (ja) * 2001-06-04 2005-09-28 日産自動車株式会社 塗装品質解析装置
JP2003117466A (ja) * 2001-10-16 2003-04-22 Toray Ind Inc 塗布方法および装置
JP2005214875A (ja) 2004-01-30 2005-08-11 Fuji Photo Film Co Ltd マーキング検出装置
CN1908638A (zh) * 2006-08-24 2007-02-07 上海交通大学 玻璃缺陷的光学检测装置
CN101952049B (zh) * 2008-02-22 2015-01-07 武藏工业株式会社 排出量修正方法以及涂布装置
JP2010091529A (ja) * 2008-10-10 2010-04-22 Olympus Corp プリント基板の検査方法および検査装置
JP5200887B2 (ja) * 2008-11-21 2013-06-05 セイコーエプソン株式会社 液滴吐出装置の吐出量評価方法
JP5534715B2 (ja) * 2009-05-27 2014-07-02 株式会社ジャパンディスプレイ 電子回路パターンの欠陥修正方法およびその装置
JP2011038773A (ja) * 2009-08-06 2011-02-24 Sanyu Kogyo Kk ロボット追従式画像検査装置、ロボット追従式画像検査方法及びロボット追従式画像検査に用いるコンピュータプログラム
JP2011123019A (ja) * 2009-12-14 2011-06-23 Olympus Corp 画像検査装置
KR101205834B1 (ko) * 2010-08-24 2012-11-29 세메스 주식회사 세정 유닛 및 이를 가지는 처리액 토출 장치, 헤드 세정 방법
JP2012189544A (ja) * 2011-03-14 2012-10-04 Toray Eng Co Ltd 膜厚むら検査装置及び方法
JP2013044729A (ja) * 2011-08-26 2013-03-04 Sumitomo Electric Ind Ltd 塗布状態測定方法

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20210210392A1 (en) * 2020-01-06 2021-07-08 Tokyo Electron Limited Hardware Improvements and Methods for the Analysis of a Spinning Reflective Substrates
US11624607B2 (en) * 2020-01-06 2023-04-11 Tokyo Electron Limited Hardware improvements and methods for the analysis of a spinning reflective substrates
US12123778B2 (en) 2021-03-04 2024-10-22 Tokyo Electron Limited Thermal imaging sensor for integration into track system
US11738363B2 (en) 2021-06-07 2023-08-29 Tokyo Electron Limited Bath systems and methods thereof

Also Published As

Publication number Publication date
CN104549940A (zh) 2015-04-29
CN104549940B (zh) 2017-11-24
TW201519960A (zh) 2015-06-01
KR20150046726A (ko) 2015-04-30
KR101750355B1 (ko) 2017-06-23
TWI576163B (zh) 2017-04-01
JP2015080747A (ja) 2015-04-27

Similar Documents

Publication Publication Date Title
JP6020829B2 (ja) 塗液観察方法、塗布方法、塗液観察装置および塗布装置
JP6246684B2 (ja) 検査装置及び捲回装置
JP6348782B2 (ja) 両面塗布装置
JP2008247526A (ja) ウェブ加工ライン
JP2015134469A (ja) 液体吐出装置
CN104070789A (zh) 印刷装置
TWI574805B (zh) 光學薄膜切斷裝置、光學薄膜切斷方法及記錄媒體
JP2008126302A (ja) レーザー加工装置及び保護膜被覆装置
CN108535274B (zh) 标注装置、缺陷检查系统以及膜制造方法
JP4202707B2 (ja) 周期欠陥発生箇所の特定方法および検査システム
JP7411441B2 (ja) 複合シートの製造方法
JP2012075980A (ja) 塗工装置
JP2011073421A (ja) 印刷検査装置
JP6802228B2 (ja) 液体塗布シートの製造方法及び製造装置並びに塗布手段のクリーニング方法
JP2017056367A (ja) 塗工装置および塗工方法
JP2017194370A (ja) ウェブ欠陥検査装置
JP7411440B2 (ja) 複合シートの製造方法及び製造装置
JP2003117466A (ja) 塗布方法および装置
JP6357829B2 (ja) 媒体搬送装置及び印刷装置
JP2004125493A (ja) 検査システム
JP2018039117A (ja) グラビア版の版面状態管理装置
JP2010125716A (ja) スクリーン印刷機
JP7365886B2 (ja) 接着剤の塗布状態検査方法及び検査装置
JP5185806B2 (ja) スクリーン印刷機
JP4936195B2 (ja) 光透過性フィルムの欠陥検出装置

Legal Events

Date Code Title Description
A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20150414

A977 Report on retrieval

Free format text: JAPANESE INTERMEDIATE CODE: A971007

Effective date: 20150723

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20150902

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20151030

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20160330

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20160422

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20160907

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20160920

R150 Certificate of patent or registration of utility model

Ref document number: 6020829

Country of ref document: JP

Free format text: JAPANESE INTERMEDIATE CODE: R150

LAPS Cancellation because of no payment of annual fees