JP5986538B2 - 露光装置および物品の製造方法 - Google Patents

露光装置および物品の製造方法 Download PDF

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Publication number
JP5986538B2
JP5986538B2 JP2013122024A JP2013122024A JP5986538B2 JP 5986538 B2 JP5986538 B2 JP 5986538B2 JP 2013122024 A JP2013122024 A JP 2013122024A JP 2013122024 A JP2013122024 A JP 2013122024A JP 5986538 B2 JP5986538 B2 JP 5986538B2
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Japan
Prior art keywords
exposure
shot area
substrate
substrate stage
shot
Prior art date
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JP2013122024A
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English (en)
Japanese (ja)
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JP2014239193A5 (enExample
JP2014239193A (ja
Inventor
覚 伊藤
覚 伊藤
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
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Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP2013122024A priority Critical patent/JP5986538B2/ja
Priority to CN201410245805.2A priority patent/CN104238278B/zh
Priority to CN201611027383.7A priority patent/CN106444300B/zh
Priority to US14/299,244 priority patent/US9557657B2/en
Priority to KR1020140069354A priority patent/KR101784045B1/ko
Publication of JP2014239193A publication Critical patent/JP2014239193A/ja
Publication of JP2014239193A5 publication Critical patent/JP2014239193A5/ja
Application granted granted Critical
Publication of JP5986538B2 publication Critical patent/JP5986538B2/ja
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70716—Stages
    • G03F7/70725—Stages control
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F2009/005—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Engineering & Computer Science (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
JP2013122024A 2013-06-10 2013-06-10 露光装置および物品の製造方法 Active JP5986538B2 (ja)

Priority Applications (5)

Application Number Priority Date Filing Date Title
JP2013122024A JP5986538B2 (ja) 2013-06-10 2013-06-10 露光装置および物品の製造方法
CN201410245805.2A CN104238278B (zh) 2013-06-10 2014-06-05 曝光装置以及制造物品的方法
CN201611027383.7A CN106444300B (zh) 2013-06-10 2014-06-05 曝光装置以及制造物品的方法
US14/299,244 US9557657B2 (en) 2013-06-10 2014-06-09 Exposure apparatus and method of manufacturing article
KR1020140069354A KR101784045B1 (ko) 2013-06-10 2014-06-09 노광 장치 및 물품의 제조 방법

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2013122024A JP5986538B2 (ja) 2013-06-10 2013-06-10 露光装置および物品の製造方法

Publications (3)

Publication Number Publication Date
JP2014239193A JP2014239193A (ja) 2014-12-18
JP2014239193A5 JP2014239193A5 (enExample) 2016-07-07
JP5986538B2 true JP5986538B2 (ja) 2016-09-06

Family

ID=52005226

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2013122024A Active JP5986538B2 (ja) 2013-06-10 2013-06-10 露光装置および物品の製造方法

Country Status (4)

Country Link
US (1) US9557657B2 (enExample)
JP (1) JP5986538B2 (enExample)
KR (1) KR101784045B1 (enExample)
CN (2) CN106444300B (enExample)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN111345031B (zh) * 2019-04-25 2021-10-15 深圳市大疆创新科技有限公司 无人机及其拍摄控制方法
JP7466403B2 (ja) * 2020-08-03 2024-04-12 キヤノン株式会社 制御装置、リソグラフィー装置、制御方法および物品製造方法

Family Cites Families (23)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5343270A (en) * 1990-10-30 1994-08-30 Nikon Corporation Projection exposure apparatus
JPH06260384A (ja) * 1993-03-08 1994-09-16 Nikon Corp 露光量制御方法
US5617182A (en) * 1993-11-22 1997-04-01 Nikon Corporation Scanning exposure method
US6118515A (en) * 1993-12-08 2000-09-12 Nikon Corporation Scanning exposure method
JP3451604B2 (ja) * 1994-06-17 2003-09-29 株式会社ニコン 走査型露光装置
JPH0992611A (ja) * 1995-09-21 1997-04-04 Canon Inc 走査型露光装置および方法
JPH09115825A (ja) * 1995-10-19 1997-05-02 Nikon Corp 走査型投影露光装置
JP3514401B2 (ja) 1996-01-16 2004-03-31 キヤノン株式会社 走査型露光装置および方法ならびに半導体デバイスの製造方法
JP3728610B2 (ja) * 1996-07-04 2005-12-21 株式会社ニコン 走査型露光装置及び露光方法
US6646715B1 (en) * 1997-01-14 2003-11-11 Nikon Corporation Scanning exposure apparatus and method with run-up distance control
JP3428872B2 (ja) * 1997-08-29 2003-07-22 キヤノン株式会社 露光方法および装置
JPH11204421A (ja) * 1998-01-09 1999-07-30 Nikon Corp 露光装置の制御方法、露光装置、露光方法及び素子製造方法
US6285438B1 (en) * 1999-05-19 2001-09-04 Nikon Corporation Scanning exposure method with reduced time between scans
JP4585649B2 (ja) * 2000-05-19 2010-11-24 キヤノン株式会社 露光装置およびデバイス製造方法
JP2002110526A (ja) * 2000-10-03 2002-04-12 Canon Inc 走査露光方法及び走査露光装置
KR100585108B1 (ko) * 2003-11-14 2006-06-01 삼성전자주식회사 스캔 방식의 노광 장치를 이용한 웨이퍼 노광 방법
JP4625673B2 (ja) * 2004-10-15 2011-02-02 株式会社東芝 露光方法及び露光装置
US8236467B2 (en) * 2005-04-28 2012-08-07 Nikon Corporation Exposure method, exposure apparatus, and device manufacturing method
US8330936B2 (en) * 2006-09-20 2012-12-11 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
JP2009010202A (ja) * 2007-06-28 2009-01-15 Canon Inc 露光方法、露光装置およびデバイス製造方法
JP5489534B2 (ja) * 2009-05-21 2014-05-14 キヤノン株式会社 露光装置及びデバイス製造方法
JP5498243B2 (ja) * 2010-05-07 2014-05-21 キヤノン株式会社 露光装置、露光方法及びデバイス製造方法
JP5406861B2 (ja) * 2011-01-01 2014-02-05 キヤノン株式会社 露光装置及びデバイス製造方法

Also Published As

Publication number Publication date
US9557657B2 (en) 2017-01-31
KR101784045B1 (ko) 2017-10-10
CN106444300A (zh) 2017-02-22
CN106444300B (zh) 2018-08-14
CN104238278A (zh) 2014-12-24
JP2014239193A (ja) 2014-12-18
CN104238278B (zh) 2017-01-11
KR20140144145A (ko) 2014-12-18
US20140362357A1 (en) 2014-12-11

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