CN106444300B - 曝光装置以及制造物品的方法 - Google Patents
曝光装置以及制造物品的方法 Download PDFInfo
- Publication number
- CN106444300B CN106444300B CN201611027383.7A CN201611027383A CN106444300B CN 106444300 B CN106444300 B CN 106444300B CN 201611027383 A CN201611027383 A CN 201611027383A CN 106444300 B CN106444300 B CN 106444300B
- Authority
- CN
- China
- Prior art keywords
- shooting area
- substrate
- exposure
- exposed
- substrate table
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
- 238000000034 method Methods 0.000 title claims abstract description 28
- 238000004519 manufacturing process Methods 0.000 title claims description 20
- 239000000758 substrate Substances 0.000 claims abstract description 250
- 230000004913 activation Effects 0.000 claims abstract description 38
- 230000001133 acceleration Effects 0.000 claims description 37
- 230000003287 optical effect Effects 0.000 claims description 25
- 238000012545 processing Methods 0.000 claims description 6
- 238000011161 development Methods 0.000 claims description 4
- 238000005259 measurement Methods 0.000 description 8
- 238000012937 correction Methods 0.000 description 7
- 238000003384 imaging method Methods 0.000 description 5
- 230000006641 stabilisation Effects 0.000 description 5
- 238000011105 stabilization Methods 0.000 description 5
- 238000005286 illumination Methods 0.000 description 3
- 230000008859 change Effects 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 238000006073 displacement reaction Methods 0.000 description 2
- NJPPVKZQTLUDBO-UHFFFAOYSA-N novaluron Chemical compound C1=C(Cl)C(OC(F)(F)C(OC(F)(F)F)F)=CC=C1NC(=O)NC(=O)C1=C(F)C=CC=C1F NJPPVKZQTLUDBO-UHFFFAOYSA-N 0.000 description 2
- 230000004044 response Effects 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 230000003321 amplification Effects 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 238000005520 cutting process Methods 0.000 description 1
- 235000013399 edible fruits Nutrition 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 230000006870 function Effects 0.000 description 1
- 238000001459 lithography Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000003199 nucleic acid amplification method Methods 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 239000003504 photosensitizing agent Substances 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 230000001360 synchronised effect Effects 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70716—Stages
- G03F7/70725—Stages control
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
- G03F2009/005—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Engineering & Computer Science (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2013-122024 | 2013-06-10 | ||
| JP2013122024A JP5986538B2 (ja) | 2013-06-10 | 2013-06-10 | 露光装置および物品の製造方法 |
| CN201410245805.2A CN104238278B (zh) | 2013-06-10 | 2014-06-05 | 曝光装置以及制造物品的方法 |
Related Parent Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201410245805.2A Division CN104238278B (zh) | 2013-06-10 | 2014-06-05 | 曝光装置以及制造物品的方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN106444300A CN106444300A (zh) | 2017-02-22 |
| CN106444300B true CN106444300B (zh) | 2018-08-14 |
Family
ID=52005226
Family Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201611027383.7A Active CN106444300B (zh) | 2013-06-10 | 2014-06-05 | 曝光装置以及制造物品的方法 |
| CN201410245805.2A Expired - Fee Related CN104238278B (zh) | 2013-06-10 | 2014-06-05 | 曝光装置以及制造物品的方法 |
Family Applications After (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201410245805.2A Expired - Fee Related CN104238278B (zh) | 2013-06-10 | 2014-06-05 | 曝光装置以及制造物品的方法 |
Country Status (4)
| Country | Link |
|---|---|
| US (1) | US9557657B2 (enExample) |
| JP (1) | JP5986538B2 (enExample) |
| KR (1) | KR101784045B1 (enExample) |
| CN (2) | CN106444300B (enExample) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2020215274A1 (zh) * | 2019-04-25 | 2020-10-29 | 深圳市大疆创新科技有限公司 | 无人机及其拍摄控制方法 |
| JP7466403B2 (ja) * | 2020-08-03 | 2024-04-12 | キヤノン株式会社 | 制御装置、リソグラフィー装置、制御方法および物品製造方法 |
Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6236447B1 (en) * | 1997-08-29 | 2001-05-22 | Canon Kabushiki Kaisha | Exposure method and apparatus, and semiconductor device manufactured using the method |
| US6686990B2 (en) * | 1999-05-19 | 2004-02-03 | Nikon Corporation, Inc. | Scanning exposure method with reduced time between scans |
| CN101221363A (zh) * | 2006-09-20 | 2008-07-16 | Asml荷兰有限公司 | 光刻设备和器件制造方法 |
| US20120170008A1 (en) * | 2011-01-01 | 2012-07-05 | Canon Kabushiki Kaisha | Exposure apparatus and method of manufacturing device |
| JP5489534B2 (ja) * | 2009-05-21 | 2014-05-14 | キヤノン株式会社 | 露光装置及びデバイス製造方法 |
Family Cites Families (18)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5343270A (en) * | 1990-10-30 | 1994-08-30 | Nikon Corporation | Projection exposure apparatus |
| JPH06260384A (ja) * | 1993-03-08 | 1994-09-16 | Nikon Corp | 露光量制御方法 |
| US5617182A (en) * | 1993-11-22 | 1997-04-01 | Nikon Corporation | Scanning exposure method |
| US6118515A (en) * | 1993-12-08 | 2000-09-12 | Nikon Corporation | Scanning exposure method |
| JP3451604B2 (ja) * | 1994-06-17 | 2003-09-29 | 株式会社ニコン | 走査型露光装置 |
| JPH0992611A (ja) * | 1995-09-21 | 1997-04-04 | Canon Inc | 走査型露光装置および方法 |
| JPH09115825A (ja) * | 1995-10-19 | 1997-05-02 | Nikon Corp | 走査型投影露光装置 |
| JP3514401B2 (ja) | 1996-01-16 | 2004-03-31 | キヤノン株式会社 | 走査型露光装置および方法ならびに半導体デバイスの製造方法 |
| JP3728610B2 (ja) * | 1996-07-04 | 2005-12-21 | 株式会社ニコン | 走査型露光装置及び露光方法 |
| US6646715B1 (en) * | 1997-01-14 | 2003-11-11 | Nikon Corporation | Scanning exposure apparatus and method with run-up distance control |
| JPH11204421A (ja) * | 1998-01-09 | 1999-07-30 | Nikon Corp | 露光装置の制御方法、露光装置、露光方法及び素子製造方法 |
| JP4585649B2 (ja) * | 2000-05-19 | 2010-11-24 | キヤノン株式会社 | 露光装置およびデバイス製造方法 |
| JP2002110526A (ja) * | 2000-10-03 | 2002-04-12 | Canon Inc | 走査露光方法及び走査露光装置 |
| KR100585108B1 (ko) * | 2003-11-14 | 2006-06-01 | 삼성전자주식회사 | 스캔 방식의 노광 장치를 이용한 웨이퍼 노광 방법 |
| JP4625673B2 (ja) * | 2004-10-15 | 2011-02-02 | 株式会社東芝 | 露光方法及び露光装置 |
| WO2006118258A1 (ja) * | 2005-04-28 | 2006-11-09 | Nikon Corporation | 露光方法及び露光装置、並びにデバイス製造方法 |
| JP2009010202A (ja) * | 2007-06-28 | 2009-01-15 | Canon Inc | 露光方法、露光装置およびデバイス製造方法 |
| JP5498243B2 (ja) | 2010-05-07 | 2014-05-21 | キヤノン株式会社 | 露光装置、露光方法及びデバイス製造方法 |
-
2013
- 2013-06-10 JP JP2013122024A patent/JP5986538B2/ja active Active
-
2014
- 2014-06-05 CN CN201611027383.7A patent/CN106444300B/zh active Active
- 2014-06-05 CN CN201410245805.2A patent/CN104238278B/zh not_active Expired - Fee Related
- 2014-06-09 KR KR1020140069354A patent/KR101784045B1/ko active Active
- 2014-06-09 US US14/299,244 patent/US9557657B2/en active Active
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6236447B1 (en) * | 1997-08-29 | 2001-05-22 | Canon Kabushiki Kaisha | Exposure method and apparatus, and semiconductor device manufactured using the method |
| US6686990B2 (en) * | 1999-05-19 | 2004-02-03 | Nikon Corporation, Inc. | Scanning exposure method with reduced time between scans |
| CN101221363A (zh) * | 2006-09-20 | 2008-07-16 | Asml荷兰有限公司 | 光刻设备和器件制造方法 |
| JP5489534B2 (ja) * | 2009-05-21 | 2014-05-14 | キヤノン株式会社 | 露光装置及びデバイス製造方法 |
| US20120170008A1 (en) * | 2011-01-01 | 2012-07-05 | Canon Kabushiki Kaisha | Exposure apparatus and method of manufacturing device |
Also Published As
| Publication number | Publication date |
|---|---|
| KR101784045B1 (ko) | 2017-10-10 |
| CN106444300A (zh) | 2017-02-22 |
| CN104238278B (zh) | 2017-01-11 |
| JP5986538B2 (ja) | 2016-09-06 |
| CN104238278A (zh) | 2014-12-24 |
| JP2014239193A (ja) | 2014-12-18 |
| KR20140144145A (ko) | 2014-12-18 |
| US20140362357A1 (en) | 2014-12-11 |
| US9557657B2 (en) | 2017-01-31 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JP5498243B2 (ja) | 露光装置、露光方法及びデバイス製造方法 | |
| US9915878B2 (en) | Exposure apparatus, exposure method, and device manufacturing method | |
| TW200807164A (en) | Exposure apparatus and device manufacturing method | |
| CN109100920B (zh) | 曝光装置以及物品的制造方法 | |
| TWI693667B (zh) | 移動體之控制方法、曝光方法、元件製造方法、移動體裝置、及曝光裝置 | |
| CN104678714B (zh) | 定位装置、光刻装置和物品制造方法 | |
| JP5739837B2 (ja) | 露光装置、露光方法及びデバイス製造方法 | |
| CN106444300B (zh) | 曝光装置以及制造物品的方法 | |
| TWI509369B (zh) | 曝光方法、曝光設備、和製造裝置的方法 | |
| JP6267530B2 (ja) | 露光装置、および物品の製造方法 | |
| JP5641210B2 (ja) | 露光装置、露光方法及びデバイス製造方法 | |
| CN107305320A (zh) | 检测装置、检测方法、程序、光刻装置和物品制造方法 | |
| JP5734344B2 (ja) | 露光装置および物品の製造方法 | |
| JP5773735B2 (ja) | 露光装置、および、デバイス製造方法 | |
| JP5811855B2 (ja) | 両面露光装置 | |
| TW201608344A (zh) | 曝光裝置及曝光方法、以及元件製造方法 | |
| JP2023528753A (ja) | 高さ測定方法及び高さ測定システム | |
| TWI896908B (zh) | 曝光裝置、曝光方法及物品之製造方法 | |
| JP2015146342A (ja) | リソグラフィ装置、及び物品の製造方法 | |
| JP6861503B2 (ja) | 走査露光装置およびその制御方法ならびに物品製造方法 | |
| JP2014143429A (ja) | 露光装置、露光方法及びデバイス製造方法 | |
| CN115685688B (zh) | 波像差测量装置及波像差测量方法 | |
| JP2011146449A (ja) | フレア計測方法、露光方法及び装置、並びにデバイス製造方法 | |
| JP2016149405A (ja) | 計測装置、露光装置、デバイス製造方法、及び計測方法 |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C06 | Publication | ||
| PB01 | Publication | ||
| C10 | Entry into substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| GR01 | Patent grant | ||
| GR01 | Patent grant |