JP5930130B2 - 半導体装置の製造方法 - Google Patents
半導体装置の製造方法 Download PDFInfo
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- JP5930130B2 JP5930130B2 JP2015526096A JP2015526096A JP5930130B2 JP 5930130 B2 JP5930130 B2 JP 5930130B2 JP 2015526096 A JP2015526096 A JP 2015526096A JP 2015526096 A JP2015526096 A JP 2015526096A JP 5930130 B2 JP5930130 B2 JP 5930130B2
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- 238000000137 annealing Methods 0.000 description 3
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- JMASRVWKEDWRBT-UHFFFAOYSA-N Gallium nitride Chemical compound [Ga]#N JMASRVWKEDWRBT-UHFFFAOYSA-N 0.000 description 1
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- 238000004544 sputter deposition Methods 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
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Description
図1は、本発明の実施の形態1に係る半導体装置を示す平面図である。図2は、図1のI−IIに沿った断面図である。n型のシリコンからなる半導体基板1の表面にn型層2、p型ベース層3が順に形成されている。p型ベース層3内にn+型エミッタ層4とp+型コンタクト層5が形成されている。半導体基板1の表面側にトレンチ6が形成され、そのトレンチ6内にゲート絶縁膜7を介してn+型のポリシリコンからなるトレンチゲート8が形成されている。
図10は、本発明の実施の形態2に係るダイオードを示す平面図である。本実施の形態では4分割したダイオードは直列に接続されている。その他の構成は実施の形態1と同様である。このように分割したダイオードの接続関係は自由に設定できる。
図11は、本発明の実施の形態3に係るダイオードを示す断面図である。本実施の形態では温度センスダイオード17のn+型層18、n−型層20、及びp+型層19をそれぞれRTAで熱処理して再結晶化する。この際にシリコンの沸点以下の熱量を加える。
図12は、本発明の実施の形態4に係るダイオードを示す断面図である。ダイオードを小型化するとコンタクト抵抗が増大してしまう。そこで、本実施の形態ではn+型層18を選択的に再結晶化する。これにより、カソードのコンタクト抵抗を低減することができる。
図13は、本発明の実施の形態5に係るダイオードを示す平面図である。ダイオードを小型化するとESD耐量が低下してしまう。そこで、本実施の形態ではn−型層20を選択的に再結晶化する。これにより、サージ電流による電流集中を緩和できるため、ESD耐量を向上させることができる。なお、再結晶化の度合いを変化させることで、特性を調整することができる。
図14は、本発明の実施の形態6に係るダイオードを示す断面図である。本実施の形態ではn+型層18とn−型層20を選択的に再結晶化する。これにより、実施の形態4,5の効果を得ることができる。
図15は、本発明の実施の形態7に係るダイオードを示す断面図である。本実施の形態ではp+型層19を選択的に再結晶化する。これにより、アノードのコンタクト抵抗を低減することができる。また、グレイの境界(グレインの境界部)でのホールの消滅がなくなるため、高速応答を実現することができる。
図16は、本発明の実施の形態8に係るダイオードを示す断面図である。本実施の形態ではn+型層18とn−型層20の接合領域29及びp+型層19とn−型層20の接合領域30を選択的に再結晶化する。これにより、リーク電流を小さくして高速応答を実現することができる。
図17は、本発明の実施の形態9に係るダイオードを示す断面図である。本実施の形態では接合領域29,30を除いた領域を選択的に再結晶化する。この場合でも実施の形態4〜7の効果を得ることができる。
図18は、本発明の実施の形態10に係るダイオードを示す断面図である。本実施の形態では温度センスダイオード17の各層の上層部を選択的に再結晶化する。これにより、各層が2つの抵抗を並列接続した構造となる。再結晶化の度合いによりPINダイオードの特性を調整することができる。
図19は、本発明の実施の形態11に係るダイオードを示す断面図である。本実施の形態では温度センスダイオード17のn+型層18の上層部を選択的に再結晶化する。これにより、カソードのコンタクト抵抗を低減することができる。
図20は、本発明の実施の形態12に係るダイオードを示す断面図である。ポリシリコン膜27の厚さのばらつきがVF特性に与える影響は大きい。そこで、本実施の形態では、温度センスダイオード17の各層の上層部のみを酸化して酸化膜31を形成する。これにより、下層部の厚みを高精度に制御することができるため、ポリシリコン膜27の厚みのばらつきによるVFばらつきを低減することができる。また、酸化する領域とその厚みを調整することで、特性を調整することができる。また、RTAにより選択的に熱処理を行なうことで高精度に酸化膜31を形成できるため、温度センスダイオード17の特性を高精度に調整することができる。
図21は、本発明の実施の形態13に係るダイオードを示す断面図である。図22は、本発明の実施の形態13に係るダイオードの下層部を示す平面図である。本実施の形態ではp+型層19の上層部とn+型層18の上層部を選択的に酸化して酸化膜31を形成する。
図23は、本発明の実施の形態14に係るダイオードを示す断面図である。本実施の形態ではn−型層20の上層部を選択的に酸化する。これにより、電子とホールの注入量を変えずに電流経路の幅を調整することができるため、更に高精度に特性を調整することができる。また、高電流密度動作を実現することもできる。
図24は、本発明の実施の形態15に係るダイオードを示す断面図である。本実施の形態では接合領域29,30を除いた領域の上層部を選択的に酸化する。これにより、実施の形態13,14の効果を得ることができ、かつ高温動作も実現できる。
図25は、本発明の実施の形態16に係るダイオードを示す断面図である。図26は、本発明の実施の形態16に係るダイオードを示す平面図である。本実施の形態ではp+型層19の上層部とn+型層18の上層部を選択的に酸化して酸化膜31を形成する。接合領域29,30を選択的に再結晶化する。これにより、実施の形態8,13の効果を得ることができる。
図27は、本発明の実施の形態17に係るダイオードを示す平面図である。本実施の形態では温度センスダイオード17の一部をRTAで選択的に昇華させて分離溝32を形成する。この分離溝32で温度センスダイオード17を複数のダイオードに分割する。これにより、実施の形態1等と同様の効果を得ることができる。さらに、RTAのパワーや雰囲気を調整する必要がないので、簡単に形成することができる。
Claims (10)
- 半導体基板にトランジスタを形成する工程と、
前記半導体基板上にポリシリコン又はアモルファスシリコンによりPINダイオードを形成する工程と、
前記トランジスタを形成した後に前記PINダイオードの一部を選択的に酸化又は昇華させることで前記PINダイオードを複数のダイオードに分割する工程と、
前記複数のダイオードの一部を選択的に熱処理して再結晶化、酸化、又はグレインサイズの変更を行う工程とを備え、
前記PINダイオードのn型層を選択的に再結晶化することを特徴とする半導体装置の製造方法。 - 半導体基板にトランジスタを形成する工程と、
前記半導体基板上にポリシリコン又はアモルファスシリコンによりPINダイオードを形成する工程と、
前記トランジスタを形成した後に前記PINダイオードの一部を選択的に酸化又は昇華させることで前記PINダイオードを複数のダイオードに分割する工程と、
前記複数のダイオードの一部を選択的に熱処理して再結晶化、酸化、又はグレインサイズの変更を行う工程とを備え、
前記PINダイオードのi型層を選択的に再結晶化することを特徴とする半導体装置の製造方法。 - 半導体基板にトランジスタを形成する工程と、
前記半導体基板上にポリシリコン又はアモルファスシリコンによりPINダイオードを形成する工程と、
前記トランジスタを形成した後に前記PINダイオードの一部を選択的に酸化又は昇華させることで前記PINダイオードを複数のダイオードに分割する工程と、
前記複数のダイオードの一部を選択的に熱処理して再結晶化、酸化、又はグレインサイズの変更を行う工程とを備え、
前記PINダイオードのp型層を選択的に再結晶化することを特徴とする半導体装置の製造方法。 - 半導体基板にトランジスタを形成する工程と、
前記半導体基板上にポリシリコン又はアモルファスシリコンによりPINダイオードを形成する工程と、
前記トランジスタを形成した後に前記PINダイオードの一部を選択的に酸化又は昇華させることで前記PINダイオードを複数のダイオードに分割する工程と、
前記複数のダイオードの一部を選択的に熱処理して再結晶化、酸化、又はグレインサイズの変更を行う工程とを備え、
前記PINダイオードのn型層とi型層の接合領域及びp型層と前記i型層の接合領域を選択的に再結晶化する半導体装置の製造方法。 - 半導体基板にトランジスタを形成する工程と、
前記半導体基板上にポリシリコン又はアモルファスシリコンによりPINダイオードを形成する工程と、
前記トランジスタを形成した後に前記PINダイオードの一部を選択的に酸化又は昇華させることで前記PINダイオードを複数のダイオードに分割する工程と、
前記複数のダイオードの一部を選択的に熱処理して再結晶化、酸化、又はグレインサイズの変更を行う工程とを備え、
前記PINダイオードのn型層とi型層の接合領域及びp型層と前記i型層の接合領域を除いた領域を選択的に再結晶化することを特徴とする半導体装置の製造方法。 - 半導体基板にトランジスタを形成する工程と、
前記半導体基板上にポリシリコン又はアモルファスシリコンによりPINダイオードを形成する工程と、
前記トランジスタを形成した後に前記PINダイオードの一部を選択的に酸化又は昇華させることで前記PINダイオードを複数のダイオードに分割する工程と、
前記複数のダイオードの一部を選択的に熱処理して再結晶化、酸化、又はグレインサイズの変更を行う工程とを備え、
前記PINダイオードの上層部を選択的に再結晶化することを特徴とする半導体装置の製造方法。 - 半導体基板にトランジスタを形成する工程と、
前記半導体基板上にポリシリコン又はアモルファスシリコンによりPINダイオードを形成する工程と、
前記トランジスタを形成した後に前記PINダイオードの一部を選択的に酸化又は昇華させることで前記PINダイオードを複数のダイオードに分割する工程と、
前記複数のダイオードの一部を選択的に熱処理して再結晶化、酸化、又はグレインサイズの変更を行う工程とを備え、
前記PINダイオードの上層部を選択的に酸化することを特徴とする半導体装置の製造方法。 - 前記PINダイオードのp型層の上層部とn型層の上層部を選択的に酸化することを特徴とする請求項7に記載の半導体装置の製造方法。
- 前記PINダイオードのi型層の上層部を選択的に酸化することを特徴とする請求項7に記載の半導体装置の製造方法。
- 前記PINダイオードのn型層とi型層の接合領域とp型層と前記i型層の接合領域を除いた領域の上層部を選択的に酸化することを特徴とする請求項7に記載の半導体装置の製造方法。
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Citations (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS59106162A (ja) * | 1982-12-10 | 1984-06-19 | Matsushita Electronics Corp | 半導体装置 |
JPH1197664A (ja) * | 1997-09-20 | 1999-04-09 | Semiconductor Energy Lab Co Ltd | 電子機器およびその作製方法 |
JP2001168357A (ja) * | 1999-12-08 | 2001-06-22 | Sharp Corp | 薄膜太陽電池モジュール及びその製造方法 |
JP2003229377A (ja) * | 2001-11-30 | 2003-08-15 | Semiconductor Energy Lab Co Ltd | レーザー照射装置 |
JP2007220814A (ja) * | 2006-02-15 | 2007-08-30 | Sanyo Electric Co Ltd | 半導体装置 |
JP2009076761A (ja) * | 2007-09-21 | 2009-04-09 | Sanyo Electric Co Ltd | 半導体装置およびその製造方法 |
JP2010129707A (ja) * | 2008-11-27 | 2010-06-10 | Fuji Electric Systems Co Ltd | 半導体装置およびその製造方法 |
JP2011054826A (ja) * | 2009-09-03 | 2011-03-17 | Sharp Corp | 多結晶半導体膜及びその製造方法 |
Family Cites Families (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0251280A (ja) | 1988-08-12 | 1990-02-21 | Toyota Autom Loom Works Ltd | Pn接合型ダイオード及びその製造方法 |
GB0000510D0 (en) | 2000-01-11 | 2000-03-01 | Koninkl Philips Electronics Nv | A charge pump circuit |
JP4799829B2 (ja) * | 2003-08-27 | 2011-10-26 | 三菱電機株式会社 | 絶縁ゲート型トランジスタ及びインバータ回路 |
JP2007294670A (ja) | 2006-04-25 | 2007-11-08 | Toyota Motor Corp | 半導体装置の製造方法および半導体装置 |
US8058675B2 (en) | 2006-12-27 | 2011-11-15 | Semiconductor Energy Laboratory Co., Ltd. | Semiconductor device and electronic device using the same |
US20090283739A1 (en) * | 2008-05-19 | 2009-11-19 | Masahiro Kiyotoshi | Nonvolatile storage device and method for manufacturing same |
US8450181B2 (en) * | 2010-01-08 | 2013-05-28 | Sandisk 3D Llc | In-situ passivation methods to improve performance of polysilicon diode |
IT1403137B1 (it) * | 2010-06-28 | 2013-10-04 | Selex Sistemi Integrati Spa | Metodo di fabbricazione di diodi pin verticali |
JP5842866B2 (ja) * | 2013-05-29 | 2016-01-13 | 三菱電機株式会社 | 半導体装置及びその製造方法 |
-
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Patent Citations (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS59106162A (ja) * | 1982-12-10 | 1984-06-19 | Matsushita Electronics Corp | 半導体装置 |
JPH1197664A (ja) * | 1997-09-20 | 1999-04-09 | Semiconductor Energy Lab Co Ltd | 電子機器およびその作製方法 |
JP2001168357A (ja) * | 1999-12-08 | 2001-06-22 | Sharp Corp | 薄膜太陽電池モジュール及びその製造方法 |
JP2003229377A (ja) * | 2001-11-30 | 2003-08-15 | Semiconductor Energy Lab Co Ltd | レーザー照射装置 |
JP2007220814A (ja) * | 2006-02-15 | 2007-08-30 | Sanyo Electric Co Ltd | 半導体装置 |
JP2009076761A (ja) * | 2007-09-21 | 2009-04-09 | Sanyo Electric Co Ltd | 半導体装置およびその製造方法 |
JP2010129707A (ja) * | 2008-11-27 | 2010-06-10 | Fuji Electric Systems Co Ltd | 半導体装置およびその製造方法 |
JP2011054826A (ja) * | 2009-09-03 | 2011-03-17 | Sharp Corp | 多結晶半導体膜及びその製造方法 |
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