JP5911368B2 - 成膜装置及び成膜方法 - Google Patents

成膜装置及び成膜方法 Download PDF

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JP5911368B2
JP5911368B2 JP2012099773A JP2012099773A JP5911368B2 JP 5911368 B2 JP5911368 B2 JP 5911368B2 JP 2012099773 A JP2012099773 A JP 2012099773A JP 2012099773 A JP2012099773 A JP 2012099773A JP 5911368 B2 JP5911368 B2 JP 5911368B2
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powder
film forming
electrodes
pair
gas
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Japanese (ja)
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JP2013227612A (ja
JP2013227612A5 (enExample
Inventor
齊藤　哲郎
哲郎 齊藤
康 蒲池
康 蒲池
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Canon Inc
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Canon Inc
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JP2012099773A 2012-04-25 2012-04-25 成膜装置及び成膜方法 Expired - Fee Related JP5911368B2 (ja)

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JP2012099773A JP5911368B2 (ja) 2012-04-25 2012-04-25 成膜装置及び成膜方法

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JP2012099773A JP5911368B2 (ja) 2012-04-25 2012-04-25 成膜装置及び成膜方法

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JP2013227612A JP2013227612A (ja) 2013-11-07
JP2013227612A5 JP2013227612A5 (enExample) 2015-06-11
JP5911368B2 true JP5911368B2 (ja) 2016-04-27

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Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN114032510A (zh) * 2021-11-17 2022-02-11 中国科学院半导体研究所 碲纳米线垂直阵列的生长方法

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6320032A (ja) * 1986-07-14 1988-01-27 Res Dev Corp Of Japan 被膜を有する超微粒子の製造法
JPS6430636A (en) * 1987-07-27 1989-02-01 Ulvac Corp Method and apparatus for producing compound superfine powder
JP2615190B2 (ja) * 1989-03-14 1997-05-28 三菱重工業株式会社 立方晶窒化ほう素の製造方法
JP2853046B2 (ja) * 1989-06-21 1999-02-03 日新製鋼株式会社 超微粉製造装置
JPH042781A (ja) * 1990-04-20 1992-01-07 Vacuum Metallurgical Co Ltd エアロゾル製造装置
JPH04281840A (ja) * 1991-03-07 1992-10-07 Takeshi Masumoto 金属酸化物超微粒子の製造方法及び製造装置
JP3033861B2 (ja) * 1991-08-30 2000-04-17 豊信 吉田 粉末供給装置
JPH06136519A (ja) * 1992-10-23 1994-05-17 Matsushita Electric Ind Co Ltd 結晶質膜の製膜方法およびその製膜装置
JPH07223899A (ja) * 1993-08-30 1995-08-22 Tonen Corp シリコン積層体の製造方法
JPH08158033A (ja) * 1994-12-02 1996-06-18 Nisshin Steel Co Ltd 微細組織厚膜材料の製造法および装置
JP4526162B2 (ja) * 2000-06-06 2010-08-18 独立行政法人産業技術総合研究所 セラミック構造物作製装置

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