JP2013227612A5 - - Google Patents

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Publication number
JP2013227612A5
JP2013227612A5 JP2012099773A JP2012099773A JP2013227612A5 JP 2013227612 A5 JP2013227612 A5 JP 2013227612A5 JP 2012099773 A JP2012099773 A JP 2012099773A JP 2012099773 A JP2012099773 A JP 2012099773A JP 2013227612 A5 JP2013227612 A5 JP 2013227612A5
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JP
Japan
Prior art keywords
electrodes
film
pair
powder
film forming
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JP2012099773A
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English (en)
Japanese (ja)
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JP2013227612A (ja
JP5911368B2 (ja
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Priority to JP2012099773A priority Critical patent/JP5911368B2/ja
Priority claimed from JP2012099773A external-priority patent/JP5911368B2/ja
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Publication of JP2013227612A5 publication Critical patent/JP2013227612A5/ja
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Publication of JP5911368B2 publication Critical patent/JP5911368B2/ja
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JP2012099773A 2012-04-25 2012-04-25 成膜装置及び成膜方法 Expired - Fee Related JP5911368B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2012099773A JP5911368B2 (ja) 2012-04-25 2012-04-25 成膜装置及び成膜方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2012099773A JP5911368B2 (ja) 2012-04-25 2012-04-25 成膜装置及び成膜方法

Publications (3)

Publication Number Publication Date
JP2013227612A JP2013227612A (ja) 2013-11-07
JP2013227612A5 true JP2013227612A5 (enExample) 2015-06-11
JP5911368B2 JP5911368B2 (ja) 2016-04-27

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ID=49675529

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JP2012099773A Expired - Fee Related JP5911368B2 (ja) 2012-04-25 2012-04-25 成膜装置及び成膜方法

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JP (1) JP5911368B2 (enExample)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN114032510A (zh) * 2021-11-17 2022-02-11 中国科学院半导体研究所 碲纳米线垂直阵列的生长方法

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6320032A (ja) * 1986-07-14 1988-01-27 Res Dev Corp Of Japan 被膜を有する超微粒子の製造法
JPS6430636A (en) * 1987-07-27 1989-02-01 Ulvac Corp Method and apparatus for producing compound superfine powder
JP2615190B2 (ja) * 1989-03-14 1997-05-28 三菱重工業株式会社 立方晶窒化ほう素の製造方法
JP2853046B2 (ja) * 1989-06-21 1999-02-03 日新製鋼株式会社 超微粉製造装置
JPH042781A (ja) * 1990-04-20 1992-01-07 Vacuum Metallurgical Co Ltd エアロゾル製造装置
JPH04281840A (ja) * 1991-03-07 1992-10-07 Takeshi Masumoto 金属酸化物超微粒子の製造方法及び製造装置
JP3033861B2 (ja) * 1991-08-30 2000-04-17 豊信 吉田 粉末供給装置
JPH06136519A (ja) * 1992-10-23 1994-05-17 Matsushita Electric Ind Co Ltd 結晶質膜の製膜方法およびその製膜装置
JPH07223899A (ja) * 1993-08-30 1995-08-22 Tonen Corp シリコン積層体の製造方法
JPH08158033A (ja) * 1994-12-02 1996-06-18 Nisshin Steel Co Ltd 微細組織厚膜材料の製造法および装置
JP4526162B2 (ja) * 2000-06-06 2010-08-18 独立行政法人産業技術総合研究所 セラミック構造物作製装置

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