JP5887272B2 - 細胞培養基材の製造方法 - Google Patents
細胞培養基材の製造方法 Download PDFInfo
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- JP5887272B2 JP5887272B2 JP2012531871A JP2012531871A JP5887272B2 JP 5887272 B2 JP5887272 B2 JP 5887272B2 JP 2012531871 A JP2012531871 A JP 2012531871A JP 2012531871 A JP2012531871 A JP 2012531871A JP 5887272 B2 JP5887272 B2 JP 5887272B2
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- 235000010267 sodium hydrogen sulphite Nutrition 0.000 description 1
- 229910001379 sodium hypophosphite Inorganic materials 0.000 description 1
- 125000004079 stearyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 1
- 229940035024 thioglycerol Drugs 0.000 description 1
- LFXJGGDONSCPOF-UHFFFAOYSA-N trichloro(hexyl)silane Chemical compound CCCCCC[Si](Cl)(Cl)Cl LFXJGGDONSCPOF-UHFFFAOYSA-N 0.000 description 1
- JLGLQAWTXXGVEM-UHFFFAOYSA-N triethylene glycol monomethyl ether Chemical compound COCCOCCOCCO JLGLQAWTXXGVEM-UHFFFAOYSA-N 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
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- C12N5/00—Undifferentiated human, animal or plant cells, e.g. cell lines; Tissues; Cultivation or maintenance thereof; Culture media therefor
- C12N5/06—Animal cells or tissues; Human cells or tissues
- C12N5/0602—Vertebrate cells
- C12N5/0684—Cells of the urinary tract or kidneys
- C12N5/0686—Kidney cells
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- C12N5/00—Undifferentiated human, animal or plant cells, e.g. cell lines; Tissues; Cultivation or maintenance thereof; Culture media therefor
- C12N5/0068—General culture methods using substrates
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- C—CHEMISTRY; METALLURGY
- C12—BIOCHEMISTRY; BEER; SPIRITS; WINE; VINEGAR; MICROBIOLOGY; ENZYMOLOGY; MUTATION OR GENETIC ENGINEERING
- C12N—MICROORGANISMS OR ENZYMES; COMPOSITIONS THEREOF; PROPAGATING, PRESERVING, OR MAINTAINING MICROORGANISMS; MUTATION OR GENETIC ENGINEERING; CULTURE MEDIA
- C12N2533/00—Supports or coatings for cell culture, characterised by material
- C12N2533/30—Synthetic polymers
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Description
(1) 基材の表面上に重合体の被覆層が形成された細胞培養基材の製造方法であって、前記重合体が式(I):
で表わされる窒素原子含有単量体を含有する単量体成分を重合させてなる重合体であり、前記重合体の被覆層の所定位置にイオンビームを照射することによって当該イオンビームが照射された重合体の被覆層を除去することを特徴とする細胞培養基材の製造方法、
(2) 単量体成分が、さらに、アルキル(メタ)アクリルアミド系単量体、ポリオキシアルキレン(メタ)アクリレート系単量体、糖骨格含有単量体、ホスホベタイン系単量体およびスルホベタイン系単量体からなる群より選ばれた少なくとも1種の共重合性単量体を含有する前記(1)に記載の細胞培養基材の製造方法、
(3) 基材の表面上で単量体成分を重合させることによって重合体の被覆層を形成する前記(1)または(2)に記載の細胞培養基材の製造方法、ならびに
(4) 前記(1)〜(3)のいずれかに記載の細胞培養基材の製造方法によって得られた細胞培養基材
に関する。
で表わされる窒素原子含有単量体を含有する単量体成分を重合させることによって得られる重合体であり、前記重合体の被覆層の所定位置にイオンビームを照射することによって当該イオンビームが照射された重合体の被覆層を除去することを特徴とする。
Yは、酸素原子または−NH−基である。
(11−(2−ブロモ−2−メチル)プロピオニルオキシ)ウンデシルトリクロロシラン1.82g(4mmol)をトルエン15mLに溶解させ、重合開始剤溶液を調製した。
実施例1において、N−メタクリロイルオキシエチル−N,N−ジメチルアンモニウム−α−N−メチルカルボキシベタイン1.007g(4.317mmol)の代わりに、N−メタクリロイルオキシエチル−N,N−ジメチルアンモニウム−α−N−メチルカルボキシベタイン0.5035g(2.159mmol)およびN−イソプロピルアクリルアミド0.2440g(2.159mmol)を用いたこと以外は、実施例1と同様の操作を行なった。その結果、イオンビームを照射することによって被覆層が除去された部分にのみHEK−293細胞の成長が見られた。
実施例1において、N−メタクリロイルオキシエチル−N,N−ジメチルアンモニウム−α−N−メチルカルボキシベタイン1.007g(4.317mmol)の代わりに、N−メタクリロイルオキシエチル−N,N−ジメチルアンモニウム−α−N−メチルカルボキシベタイン0.5035g(2.159mmol)および2−メトキシエチルメタクリレート0.2807g(2.159mmol)を用いたこと以外は、実施例1と同様の操作を行なった。その結果、イオンビームを照射することによって被覆層が除去された部分にのみHEK−293細胞の成長が見られた。
実施例1において、N−メタクリロイルオキシエチル−N,N−ジメチルアンモニウム−α−N−メチルカルボキシベタイン1.007g(4.317mmol)の代わりに、N−メタクリロイルオキシエチル−N,N−ジメチルアンモニウム−α−N−メチルカルボキシベタイン0.5035g(2.159mmol)およびグルコシルエチルメタクリレート0.7211g(2.159mmol)を用いたこと以外は、実施例1と同様の操作を行なった。その結果、イオンビームを照射することによって被覆層が除去された部分にのみHEK−293細胞の成長が見られた。
実施例1において、N−メタクリロイルオキシエチル−N,N−ジメチルアンモニウム−α−N−メチルカルボキシベタイン1.007g(4.317mmol)の代わりに、N−メタクリロイルオキシエチル−N,N−ジメチルアンモニウム−α−N−メチルカルボキシベタイン0.5035g(2.159mmol)および2−メタクリロリルオキシエチルホスホコリン0.5095g(2.159mmol)を用いたこと以外は、実施例1と同様の操作を行なった。その結果、イオンビームを照射することによって被覆層が除去された部分にのみHEK−293細胞の成長が見られた。
実施例1において、N−メタクリロイルオキシエチル−N,N−ジメチルアンモニウム−α−N−メチルカルボキシベタイン1.007g(4.317mmol)の代わりに、N−メタクリロイルオキシエチル−N,N−ジメチルアンモニウム−α−N−メチルカルボキシベタイン0.5035g(2.159mmol)およびN−メタクリロイルオキシエチル−N,N−ジメチルアンモニウム−N−プロピルスルホベタイン0.462g(2.159mmol)を用いたこと以外は、実施例1と同様の操作を行なった。その結果、イオンビームを照射することによって被覆層が除去された部分にのみHEK−293細胞の成長が見られた。
窒素ガス導入管、コンデンサーおよび撹拌機を備えた1L容のコルベンに、γ−メタクリロイルオキシプロピルトリメトキシシラン〔信越化学工業(株)製、商品名:KBM−503〕100gおよびエチルアルコール400gを添加した。コルベン内を減圧することによって脱気した後、窒素ガスをコルベン内に導入して常圧に戻した。
Claims (3)
- 細胞を培養するための基材の表面上に重合体の被覆層が形成された細胞培養基材の製造方法であって、前記基材として表面上に水酸基が存在する基材を用い、当該基材上に式(I):
で表わされる窒素原子含有単量体を含有する単量体成分を重合させてなる重合体の被複層を形成させ、当該重合体の被覆層の所定位置にイオンビームを照射することによって当該イオンビームが照射された重合体の被覆層を当該基材から除去することを特徴とする細胞培養基材の製造方法。 - 単量体成分が、さらに、アルキル(メタ)アクリルアミド系単量体、ポリエチレングリコール系単量体、ポリプロピレングリコール系単量体、糖骨格含有単量体、ホスホベタイン系単量体およびスルホベタイン系単量体からなる群より選ばれた少なくとも1種の共重合性単量体を含有する請求項1に記載の細胞培養基材の製造方法。
- 基材の表面上で単量体成分を重合させることによって重合体の被覆層を形成する請求項1または2に記載の細胞培養基材の製造方法。
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JPH0284174A (ja) * | 1988-06-22 | 1990-03-26 | Dainippon Printing Co Ltd | 細胞培養基板およびその製法 |
JP2003082119A (ja) * | 2001-09-10 | 2003-03-19 | Inst Of Physical & Chemical Res | 細胞回収膜およびその製造方法 |
JP2005052011A (ja) * | 2003-08-04 | 2005-03-03 | Institute Of Physical & Chemical Research | マイクロパターン化細胞基質およびその製造方法 |
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