JP5854707B2 - 透過型ｘ線発生管及び透過型ｘ線発生装置 - Google Patents

透過型ｘ線発生管及び透過型ｘ線発生装置 Download PDF

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Publication number
JP5854707B2
JP5854707B2 JP2011189223A JP2011189223A JP5854707B2 JP 5854707 B2 JP5854707 B2 JP 5854707B2 JP 2011189223 A JP2011189223 A JP 2011189223A JP 2011189223 A JP2011189223 A JP 2011189223A JP 5854707 B2 JP5854707 B2 JP 5854707B2
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Japan
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target
transmission
ray
electron
rays
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Expired - Fee Related
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JP2011189223A
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Japanese (ja)
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JP2013051164A5 (enExample
JP2013051164A (ja
Inventor
孝夫 小倉
孝夫 小倉
美樹 田村
美樹 田村
佐藤　安栄
安栄 佐藤
珠代 廣木
珠代 廣木
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Canon Inc
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Canon Inc
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Application filed by Canon Inc filed Critical Canon Inc
Priority to JP2011189223A priority Critical patent/JP5854707B2/ja
Priority to PCT/JP2012/072514 priority patent/WO2013032014A1/en
Priority to US14/241,401 priority patent/US20140369469A1/en
Publication of JP2013051164A publication Critical patent/JP2013051164A/ja
Publication of JP2013051164A5 publication Critical patent/JP2013051164A5/ja
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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J35/00—X-ray tubes
    • H01J35/02—Details
    • H01J35/04—Electrodes ; Mutual position thereof; Constructional adaptations therefor
    • H01J35/08—Anodes; Anti cathodes
    • H01J35/112—Non-rotating anodes
    • H01J35/116—Transmissive anodes
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
    • G01N23/02—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by transmitting the radiation through the material
    • G01N23/04—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by transmitting the radiation through the material and forming images of the material
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J35/00—X-ray tubes
    • H01J35/02—Details
    • H01J35/16—Vessels; Containers; Shields associated therewith
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2235/00—X-ray tubes
    • H01J2235/08—Targets (anodes) and X-ray converters
    • H01J2235/081—Target material
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2235/00—X-ray tubes
    • H01J2235/16—Vessels
    • H01J2235/165—Shielding arrangements
    • H01J2235/168—Shielding arrangements against charged particles
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J35/00—X-ray tubes
    • H01J35/02—Details
    • H01J35/16—Vessels; Containers; Shields associated therewith
    • H01J35/18—Windows
    • H01J35/186—Windows used as targets or X-ray converters

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  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • X-Ray Techniques (AREA)
JP2011189223A 2011-08-31 2011-08-31 透過型ｘ線発生管及び透過型ｘ線発生装置 Expired - Fee Related JP5854707B2 (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP2011189223A JP5854707B2 (ja) 2011-08-31 2011-08-31 透過型ｘ線発生管及び透過型ｘ線発生装置
PCT/JP2012/072514 WO2013032014A1 (en) 2011-08-31 2012-08-29 X-ray generation apparatus and x-ray radiographic apparatus
US14/241,401 US20140369469A1 (en) 2011-08-31 2012-08-29 X-ray generation apparatus and x-ray radiographic apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2011189223A JP5854707B2 (ja) 2011-08-31 2011-08-31 透過型ｘ線発生管及び透過型ｘ線発生装置

Publications (3)

Publication Number Publication Date
JP2013051164A JP2013051164A (ja) 2013-03-14
JP2013051164A5 JP2013051164A5 (enExample) 2014-10-09
JP5854707B2 true JP5854707B2 (ja) 2016-02-09

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JP2011189223A Expired - Fee Related JP5854707B2 (ja) 2011-08-31 2011-08-31 透過型ｘ線発生管及び透過型ｘ線発生装置

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Country Link
US (1) US20140369469A1 (enExample)
JP (1) JP5854707B2 (enExample)
WO (1) WO2013032014A1 (enExample)

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JP5901180B2 (ja) * 2011-08-31 2016-04-06 キヤノン株式会社 透過型ｘ線発生装置及びそれを用いたｘ線撮影装置
JP5871529B2 (ja) * 2011-08-31 2016-03-01 キヤノン株式会社 透過型ｘ線発生装置及びそれを用いたｘ線撮影装置
JP5871528B2 (ja) * 2011-08-31 2016-03-01 キヤノン株式会社 透過型ｘ線発生装置及びそれを用いたｘ線撮影装置
US20150117599A1 (en) 2013-10-31 2015-04-30 Sigray, Inc. X-ray interferometric imaging system
US9008278B2 (en) * 2012-12-28 2015-04-14 General Electric Company Multilayer X-ray source target with high thermal conductivity
US9368316B2 (en) * 2013-09-03 2016-06-14 Electronics And Telecommunications Research Institute X-ray tube having anode electrode
US9448190B2 (en) 2014-06-06 2016-09-20 Sigray, Inc. High brightness X-ray absorption spectroscopy system
US9570265B1 (en) 2013-12-05 2017-02-14 Sigray, Inc. X-ray fluorescence system with high flux and high flux density
US10269528B2 (en) 2013-09-19 2019-04-23 Sigray, Inc. Diverging X-ray sources using linear accumulation
US10295485B2 (en) 2013-12-05 2019-05-21 Sigray, Inc. X-ray transmission spectrometer system
US10297359B2 (en) 2013-09-19 2019-05-21 Sigray, Inc. X-ray illumination system with multiple target microstructures
US10304580B2 (en) 2013-10-31 2019-05-28 Sigray, Inc. Talbot X-ray microscope
USRE48612E1 (en) 2013-10-31 2021-06-29 Sigray, Inc. X-ray interferometric imaging system
US9666322B2 (en) 2014-02-23 2017-05-30 Bruker Jv Israel Ltd X-ray source assembly
US9594036B2 (en) 2014-02-28 2017-03-14 Sigray, Inc. X-ray surface analysis and measurement apparatus
US9823203B2 (en) 2014-02-28 2017-11-21 Sigray, Inc. X-ray surface analysis and measurement apparatus
US10401309B2 (en) 2014-05-15 2019-09-03 Sigray, Inc. X-ray techniques using structured illumination
JP6598538B2 (ja) 2014-07-18 2019-10-30 キヤノン株式会社 陽極及びこれを用いたｘ線発生管、ｘ線発生装置、ｘ線撮影システム
US9748070B1 (en) * 2014-09-17 2017-08-29 Bruker Jv Israel Ltd. X-ray tube anode
CN104409304B (zh) * 2014-11-17 2017-01-11 中国科学院电工研究所 一种工业ct机x射线管用透射靶及其制备方法
US9818569B2 (en) * 2014-12-31 2017-11-14 Rad Source Technologies, Inc High dose output, through transmission target X-ray system and methods of use
US10352880B2 (en) 2015-04-29 2019-07-16 Sigray, Inc. Method and apparatus for x-ray microscopy
US10295486B2 (en) 2015-08-18 2019-05-21 Sigray, Inc. Detector for X-rays with high spatial and high spectral resolution
US10247683B2 (en) 2016-12-03 2019-04-02 Sigray, Inc. Material measurement techniques using multiple X-ray micro-beams
JP6937380B2 (ja) 2017-03-22 2021-09-22 シグレイ、インコーポレイテッド Ｘ線分光を実施するための方法およびｘ線吸収分光システム
DE102017127372A1 (de) * 2017-11-21 2019-05-23 Smiths Heimann Gmbh Anodenkopf für Röntgenstrahlenerzeuger
US10578566B2 (en) 2018-04-03 2020-03-03 Sigray, Inc. X-ray emission spectrometer system
DE112019002822T5 (de) 2018-06-04 2021-02-18 Sigray, Inc. Wellenlängendispersives röntgenspektrometer
CN112470245B (zh) 2018-07-26 2025-03-18 斯格瑞公司 高亮度x射线反射源
US10656105B2 (en) 2018-08-06 2020-05-19 Sigray, Inc. Talbot-lau x-ray source and interferometric system
US10962491B2 (en) 2018-09-04 2021-03-30 Sigray, Inc. System and method for x-ray fluorescence with filtering
WO2020051221A2 (en) 2018-09-07 2020-03-12 Sigray, Inc. System and method for depth-selectable x-ray analysis
CN112543988A (zh) * 2018-09-14 2021-03-23 康麦特有限公司 用于x射线管的组件或电子俘获套筒及包括这种装置的x射线管
US11302508B2 (en) 2018-11-08 2022-04-12 Bruker Technologies Ltd. X-ray tube
US11152183B2 (en) 2019-07-15 2021-10-19 Sigray, Inc. X-ray source with rotating anode at atmospheric pressure
CN112295113A (zh) * 2019-08-02 2021-02-02 上海西门子医疗器械有限公司 准直器外壳、准直器及放射成像设备
DE112023000574T5 (de) 2022-01-13 2024-10-24 Sigray, Inc. Mikrofokus-röntgenquelle zur erzeugung von röntgenstrahlen mit hohem fluss und niedriger energie
US12360067B2 (en) 2022-03-02 2025-07-15 Sigray, Inc. X-ray fluorescence system and x-ray source with electrically insulative target material
US12181423B1 (en) 2023-09-07 2024-12-31 Sigray, Inc. Secondary image removal using high resolution x-ray transmission sources

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JPH11144653A (ja) * 1997-11-06 1999-05-28 Mitsubishi Heavy Ind Ltd Ｘ線発生装置
US6661876B2 (en) * 2001-07-30 2003-12-09 Moxtek, Inc. Mobile miniature X-ray source
CA2464712A1 (en) * 2002-01-31 2003-08-07 The Johns Hopkins University X-ray source and method for producing selectable x-ray wavelength
JP4174626B2 (ja) * 2002-07-19 2008-11-05 株式会社島津製作所 Ｘ線発生装置
JP2006236656A (ja) * 2005-02-23 2006-09-07 Hitachi Zosen Corp 冷却手段を備えたｘ線ターゲット部材の製造方法およびこれにより製造されたｘ線ターゲット部材を備えた重金属類検出用の高出力ｘ線発生装置
JP4878311B2 (ja) * 2006-03-03 2012-02-15 キヤノン株式会社 マルチｘ線発生装置
JP4956701B2 (ja) * 2007-07-28 2012-06-20 エスアイアイ・ナノテクノロジー株式会社 Ｘ線管及びｘ線分析装置
JP5135602B2 (ja) * 2007-07-28 2013-02-06 エスアイアイ・ナノテクノロジー株式会社 Ｘ線管及びｘ線分析装置
JP5294653B2 (ja) * 2008-02-28 2013-09-18 キヤノン株式会社 マルチｘ線発生装置及びｘ線撮影装置
US7869572B2 (en) * 2008-05-07 2011-01-11 General Electric Company Apparatus for reducing kV-dependent artifacts in an imaging system and method of making same
JP5670111B2 (ja) * 2009-09-04 2015-02-18 東京エレクトロン株式会社 Ｘ線発生用ターゲット、ｘ線発生装置、及びｘ線発生用ターゲットの製造方法
JP5641916B2 (ja) * 2010-02-23 2014-12-17 キヤノン株式会社 放射線発生装置および放射線撮像システム
JP5717234B2 (ja) 2010-03-11 2015-05-13 Ａｇｃエンジニアリング株式会社 水素イオン選択透過膜および酸回収方法

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WO2013032014A1 (en) 2013-03-07
US20140369469A1 (en) 2014-12-18
JP2013051164A (ja) 2013-03-14

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