JP5836838B2 - 荷電粒子線装置 - Google Patents

荷電粒子線装置 Download PDF

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Publication number
JP5836838B2
JP5836838B2 JP2012039500A JP2012039500A JP5836838B2 JP 5836838 B2 JP5836838 B2 JP 5836838B2 JP 2012039500 A JP2012039500 A JP 2012039500A JP 2012039500 A JP2012039500 A JP 2012039500A JP 5836838 B2 JP5836838 B2 JP 5836838B2
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JP
Japan
Prior art keywords
charged particle
diaphragm
housing
particle beam
space
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP2012039500A
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English (en)
Japanese (ja)
Other versions
JP2013175377A (ja
JP2013175377A5 (enExample
Inventor
祐介 大南
祐介 大南
卓 大嶋
卓 大嶋
伊藤　博之
博之 伊藤
佐藤　貢
佐藤　　貢
祐博 伊東
祐博 伊東
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi High Tech Corp
Original Assignee
Hitachi High Technologies Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority to JP2012039500A priority Critical patent/JP5836838B2/ja
Application filed by Hitachi High Technologies Corp filed Critical Hitachi High Technologies Corp
Priority to US14/379,291 priority patent/US9208995B2/en
Priority to PCT/JP2013/053737 priority patent/WO2013129143A1/ja
Priority to DE112013000696.0T priority patent/DE112013000696B4/de
Priority to KR1020147021504A priority patent/KR101607043B1/ko
Priority to CN201380008021.1A priority patent/CN104094373B/zh
Publication of JP2013175377A publication Critical patent/JP2013175377A/ja
Publication of JP2013175377A5 publication Critical patent/JP2013175377A5/ja
Application granted granted Critical
Publication of JP5836838B2 publication Critical patent/JP5836838B2/ja
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
    • H01J37/28—Electron or ion microscopes; Electron or ion diffraction tubes with scanning beams
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/09—Diaphragms; Shields associated with electron or ion-optical arrangements; Compensation of disturbing fields
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/16—Vessels; Containers
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/18—Vacuum locks ; Means for obtaining or maintaining the desired pressure within the vessel
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/04—Means for controlling the discharge
    • H01J2237/045—Diaphragms
    • H01J2237/0451—Diaphragms with fixed aperture
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/06—Sources
    • H01J2237/063—Electron sources
    • H01J2237/06325—Cold-cathode sources
    • H01J2237/06341—Field emission
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/10—Lenses
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/10—Lenses
    • H01J2237/14—Lenses magnetic
    • H01J2237/1405—Constructional details
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/16—Vessels
    • H01J2237/164—Particle-permeable windows
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/26—Electron or ion microscopes
    • H01J2237/2602—Details
    • H01J2237/2605—Details operating at elevated pressures, e.g. atmosphere
    • H01J2237/2608—Details operating at elevated pressures, e.g. atmosphere with environmental specimen chamber
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/26—Electron or ion microscopes
    • H01J2237/28—Scanning microscopes
    • H01J2237/2801—Details

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
JP2012039500A 2012-02-27 2012-02-27 荷電粒子線装置 Expired - Fee Related JP5836838B2 (ja)

Priority Applications (6)

Application Number Priority Date Filing Date Title
JP2012039500A JP5836838B2 (ja) 2012-02-27 2012-02-27 荷電粒子線装置
PCT/JP2013/053737 WO2013129143A1 (ja) 2012-02-27 2013-02-15 荷電粒子線装置
DE112013000696.0T DE112013000696B4 (de) 2012-02-27 2013-02-15 Ladungsteilchenstrahlvorrichtung
KR1020147021504A KR101607043B1 (ko) 2012-02-27 2013-02-15 하전 입자선 장치
US14/379,291 US9208995B2 (en) 2012-02-27 2013-02-15 Charged particle beam apparatus
CN201380008021.1A CN104094373B (zh) 2012-02-27 2013-02-15 带电粒子线装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2012039500A JP5836838B2 (ja) 2012-02-27 2012-02-27 荷電粒子線装置

Publications (3)

Publication Number Publication Date
JP2013175377A JP2013175377A (ja) 2013-09-05
JP2013175377A5 JP2013175377A5 (enExample) 2014-10-30
JP5836838B2 true JP5836838B2 (ja) 2015-12-24

Family

ID=49082344

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2012039500A Expired - Fee Related JP5836838B2 (ja) 2012-02-27 2012-02-27 荷電粒子線装置

Country Status (6)

Country Link
US (1) US9208995B2 (enExample)
JP (1) JP5836838B2 (enExample)
KR (1) KR101607043B1 (enExample)
CN (1) CN104094373B (enExample)
DE (1) DE112013000696B4 (enExample)
WO (1) WO2013129143A1 (enExample)

Families Citing this family (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6035602B2 (ja) * 2012-11-21 2016-11-30 株式会社日立ハイテクノロジーズ 荷電粒子線装置、試料台ユニット、及び試料観察方法
KR101554594B1 (ko) * 2013-12-02 2015-09-22 한국표준과학연구원 하전입자 빔 프로브 형성 장치 및 이의 이용방법
JP6047508B2 (ja) * 2014-01-27 2016-12-21 株式会社日立ハイテクノロジーズ 荷電粒子線装置、試料画像取得方法、およびプログラム記録媒体
JP6302702B2 (ja) * 2014-02-27 2018-03-28 株式会社日立ハイテクノロジーズ 走査電子顕微鏡および画像生成方法
JP6491890B2 (ja) * 2015-01-21 2019-03-27 株式会社日立ハイテクノロジーズ 荷電粒子線装置
KR101663730B1 (ko) * 2015-03-23 2016-10-10 한국원자력연구원 차등진공을 이용한 하전입자빔 대기인출장치
KR101682522B1 (ko) * 2015-06-02 2016-12-06 참엔지니어링(주) 시료 관찰 방법
KR101756171B1 (ko) * 2015-12-15 2017-07-12 (주)새론테크놀로지 주사 전자 현미경
JP6097863B2 (ja) * 2016-05-16 2017-03-15 株式会社日立ハイテクノロジーズ 荷電粒子線装置、試料画像取得方法、およびプログラム記録媒体
WO2018189817A1 (ja) 2017-04-11 2018-10-18 株式会社アドバンテスト 露光装置
US10824077B2 (en) 2017-04-11 2020-11-03 Advantest Corporation Exposure device
JP2021055996A (ja) * 2017-12-13 2021-04-08 株式会社日立ハイテク 電子線照射装置、分析システム
TWI744671B (zh) * 2018-08-03 2021-11-01 日商紐富來科技股份有限公司 電子光學系統及多射束圖像取得裝置
US10998166B2 (en) * 2019-07-29 2021-05-04 Fei Company System and method for beam position visualization
KR102552225B1 (ko) * 2020-02-04 2023-07-06 (주)새론테크놀로지 주사 전자 현미경
JP7430909B2 (ja) * 2020-08-19 2024-02-14 株式会社ブイ・テクノロジー 集束イオンビーム装置
EP4211711A1 (en) * 2020-09-07 2023-07-19 ASML Netherlands B.V. Electron-optical assembly comprising electromagnetic shielding
DE102020124306B4 (de) * 2020-09-17 2022-08-11 Carl Zeiss Smt Gmbh Vorrichtung zum Analysieren und/oder Bearbeiten einer Probe mit einem Teilchenstrahl und Verfahren
CN112397300B (zh) * 2020-10-26 2022-03-25 南京新康达磁业股份有限公司 一种金属磁粉心粉末的无机绝缘粘接设备及其粘接方法
EP4156227A1 (en) * 2021-09-27 2023-03-29 ASML Netherlands B.V. Charged particle apparatus and method

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02139842A (ja) * 1988-11-18 1990-05-29 Nikon Corp 電子線装置
JP4528014B2 (ja) * 2004-04-05 2010-08-18 株式会社日立ハイテクノロジーズ 試料検査方法
JP2006147430A (ja) * 2004-11-22 2006-06-08 Hokkaido Univ 電子顕微鏡
TW200639901A (en) * 2005-05-09 2006-11-16 Li Bing Huan Device for operating gas in vacuum or low-pressure environment and for observation of the operation
JP4855135B2 (ja) * 2006-05-15 2012-01-18 株式会社日立ハイテクノロジーズ 差動排気走査形電子顕微鏡
US8164057B2 (en) 2006-10-24 2012-04-24 Dov Shachal Interface, a method for observing an object within a non-vacuum environment and a scanning electron microscope
JP2008153086A (ja) 2006-12-19 2008-07-03 Jeol Ltd 試料検査装置及び試料検査方法並びに試料検査システム
EP1936363A3 (en) 2006-12-19 2010-12-08 JEOL Ltd. Sample inspection apparatus, sample inspection method, and sample inspection system
JP2008262886A (ja) * 2007-04-12 2008-10-30 Beam Seiko:Kk 走査型電子顕微鏡装置
US8334510B2 (en) 2008-07-03 2012-12-18 B-Nano Ltd. Scanning electron microscope, an interface and a method for observing an object within a non-vacuum environment
JP5237728B2 (ja) 2008-08-29 2013-07-17 日本電子株式会社 粒子線装置
US8492716B2 (en) * 2008-09-28 2013-07-23 B-Nano Ltd. Vacuumed device and a scanning electron microscope
JP2010230417A (ja) 2009-03-26 2010-10-14 Jeol Ltd 試料の検査装置及び検査方法
JP2013020918A (ja) * 2011-07-14 2013-01-31 Hitachi High-Technologies Corp 荷電粒子線装置

Also Published As

Publication number Publication date
CN104094373A (zh) 2014-10-08
KR101607043B1 (ko) 2016-03-28
KR20140119078A (ko) 2014-10-08
JP2013175377A (ja) 2013-09-05
DE112013000696B4 (de) 2018-08-02
US20150014530A1 (en) 2015-01-15
WO2013129143A1 (ja) 2013-09-06
US9208995B2 (en) 2015-12-08
DE112013000696T5 (de) 2014-10-09
CN104094373B (zh) 2016-08-17

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