KR101607043B1 - 하전 입자선 장치 - Google Patents

하전 입자선 장치 Download PDF

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Publication number
KR101607043B1
KR101607043B1 KR1020147021504A KR20147021504A KR101607043B1 KR 101607043 B1 KR101607043 B1 KR 101607043B1 KR 1020147021504 A KR1020147021504 A KR 1020147021504A KR 20147021504 A KR20147021504 A KR 20147021504A KR 101607043 B1 KR101607043 B1 KR 101607043B1
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KR
South Korea
Prior art keywords
diaphragm
charged particle
housing
space
tube
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
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KR1020147021504A
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English (en)
Korean (ko)
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KR20140119078A (ko
Inventor
유스께 오미나미
다까시 오시마
히로유끼 이또
미쯔구 사또
스께히로 이또
Original Assignee
가부시키가이샤 히다치 하이테크놀로지즈
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Publication of KR20140119078A publication Critical patent/KR20140119078A/ko
Application granted granted Critical
Publication of KR101607043B1 publication Critical patent/KR101607043B1/ko
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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
    • H01J37/28—Electron or ion microscopes; Electron or ion diffraction tubes with scanning beams
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/09—Diaphragms; Shields associated with electron or ion-optical arrangements; Compensation of disturbing fields
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/16—Vessels; Containers
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/18—Vacuum locks ; Means for obtaining or maintaining the desired pressure within the vessel
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/04—Means for controlling the discharge
    • H01J2237/045—Diaphragms
    • H01J2237/0451—Diaphragms with fixed aperture
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/06—Sources
    • H01J2237/063—Electron sources
    • H01J2237/06325—Cold-cathode sources
    • H01J2237/06341—Field emission
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/10—Lenses
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/10—Lenses
    • H01J2237/14—Lenses magnetic
    • H01J2237/1405—Constructional details
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/16—Vessels
    • H01J2237/164—Particle-permeable windows
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/26—Electron or ion microscopes
    • H01J2237/2602—Details
    • H01J2237/2605—Details operating at elevated pressures, e.g. atmosphere
    • H01J2237/2608—Details operating at elevated pressures, e.g. atmosphere with environmental specimen chamber
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/26—Electron or ion microscopes
    • H01J2237/28—Scanning microscopes
    • H01J2237/2801—Details

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
KR1020147021504A 2012-02-27 2013-02-15 하전 입자선 장치 Expired - Fee Related KR101607043B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JPJP-P-2012-039500 2012-02-27
JP2012039500A JP5836838B2 (ja) 2012-02-27 2012-02-27 荷電粒子線装置
PCT/JP2013/053737 WO2013129143A1 (ja) 2012-02-27 2013-02-15 荷電粒子線装置

Publications (2)

Publication Number Publication Date
KR20140119078A KR20140119078A (ko) 2014-10-08
KR101607043B1 true KR101607043B1 (ko) 2016-03-28

Family

ID=49082344

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020147021504A Expired - Fee Related KR101607043B1 (ko) 2012-02-27 2013-02-15 하전 입자선 장치

Country Status (6)

Country Link
US (1) US9208995B2 (enExample)
JP (1) JP5836838B2 (enExample)
KR (1) KR101607043B1 (enExample)
CN (1) CN104094373B (enExample)
DE (1) DE112013000696B4 (enExample)
WO (1) WO2013129143A1 (enExample)

Families Citing this family (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6035602B2 (ja) * 2012-11-21 2016-11-30 株式会社日立ハイテクノロジーズ 荷電粒子線装置、試料台ユニット、及び試料観察方法
KR101554594B1 (ko) * 2013-12-02 2015-09-22 한국표준과학연구원 하전입자 빔 프로브 형성 장치 및 이의 이용방법
JP6047508B2 (ja) 2014-01-27 2016-12-21 株式会社日立ハイテクノロジーズ 荷電粒子線装置、試料画像取得方法、およびプログラム記録媒体
JP6302702B2 (ja) * 2014-02-27 2018-03-28 株式会社日立ハイテクノロジーズ 走査電子顕微鏡および画像生成方法
JP6491890B2 (ja) * 2015-01-21 2019-03-27 株式会社日立ハイテクノロジーズ 荷電粒子線装置
KR101663730B1 (ko) * 2015-03-23 2016-10-10 한국원자력연구원 차등진공을 이용한 하전입자빔 대기인출장치
KR101682522B1 (ko) * 2015-06-02 2016-12-06 참엔지니어링(주) 시료 관찰 방법
KR101756171B1 (ko) * 2015-12-15 2017-07-12 (주)새론테크놀로지 주사 전자 현미경
JP6097863B2 (ja) * 2016-05-16 2017-03-15 株式会社日立ハイテクノロジーズ 荷電粒子線装置、試料画像取得方法、およびプログラム記録媒体
KR102271660B1 (ko) 2017-04-11 2021-07-01 주식회사 아도반테스토 노광 장치
WO2018189816A1 (ja) 2017-04-11 2018-10-18 株式会社アドバンテスト 露光装置
JP2021055996A (ja) * 2017-12-13 2021-04-08 株式会社日立ハイテク 電子線照射装置、分析システム
US11621144B2 (en) * 2018-08-03 2023-04-04 Nuflare Technology, Inc. Electron optical system and multi-beam image acquiring apparatus
US10998166B2 (en) * 2019-07-29 2021-05-04 Fei Company System and method for beam position visualization
KR102552225B1 (ko) * 2020-02-04 2023-07-06 (주)새론테크놀로지 주사 전자 현미경
JP7430909B2 (ja) * 2020-08-19 2024-02-14 株式会社ブイ・テクノロジー 集束イオンビーム装置
WO2022048898A1 (en) * 2020-09-07 2022-03-10 Asml Netherlands B.V. Electron-optical assembly comprising electromagnetic shielding
DE102020124306B4 (de) * 2020-09-17 2022-08-11 Carl Zeiss Smt Gmbh Vorrichtung zum Analysieren und/oder Bearbeiten einer Probe mit einem Teilchenstrahl und Verfahren
CN112397300B (zh) * 2020-10-26 2022-03-25 南京新康达磁业股份有限公司 一种金属磁粉心粉末的无机绝缘粘接设备及其粘接方法
EP4156227A1 (en) * 2021-09-27 2023-03-29 ASML Netherlands B.V. Charged particle apparatus and method

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010509709A (ja) * 2006-10-24 2010-03-25 ビー・ナノ・リミテッド インターフェース、非真空環境内で物体を観察する方法、および走査型電子顕微鏡

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02139842A (ja) * 1988-11-18 1990-05-29 Nikon Corp 電子線装置
JP4528014B2 (ja) * 2004-04-05 2010-08-18 株式会社日立ハイテクノロジーズ 試料検査方法
JP2006147430A (ja) * 2004-11-22 2006-06-08 Hokkaido Univ 電子顕微鏡
TW200639901A (en) * 2005-05-09 2006-11-16 Li Bing Huan Device for operating gas in vacuum or low-pressure environment and for observation of the operation
JP4855135B2 (ja) * 2006-05-15 2012-01-18 株式会社日立ハイテクノロジーズ 差動排気走査形電子顕微鏡
JP2008153086A (ja) 2006-12-19 2008-07-03 Jeol Ltd 試料検査装置及び試料検査方法並びに試料検査システム
EP2365321B1 (en) 2006-12-19 2013-10-02 JEOL Ltd. Sample inspection apparatus, sample inspection method, and sample inspection system
JP2008262886A (ja) * 2007-04-12 2008-10-30 Beam Seiko:Kk 走査型電子顕微鏡装置
WO2010001399A1 (en) 2008-07-03 2010-01-07 B-Nano A scanning electron microscope, an interface and a method for observing an object within a non-vacuum environment
JP5237728B2 (ja) 2008-08-29 2013-07-17 日本電子株式会社 粒子線装置
CN102197301B (zh) * 2008-09-28 2015-05-06 B-纳诺有限公司 被抽真空的装置和扫描电子显微镜
JP2010230417A (ja) 2009-03-26 2010-10-14 Jeol Ltd 試料の検査装置及び検査方法
JP2013020918A (ja) * 2011-07-14 2013-01-31 Hitachi High-Technologies Corp 荷電粒子線装置

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010509709A (ja) * 2006-10-24 2010-03-25 ビー・ナノ・リミテッド インターフェース、非真空環境内で物体を観察する方法、および走査型電子顕微鏡

Also Published As

Publication number Publication date
CN104094373A (zh) 2014-10-08
DE112013000696B4 (de) 2018-08-02
JP5836838B2 (ja) 2015-12-24
US20150014530A1 (en) 2015-01-15
DE112013000696T5 (de) 2014-10-09
US9208995B2 (en) 2015-12-08
WO2013129143A1 (ja) 2013-09-06
CN104094373B (zh) 2016-08-17
JP2013175377A (ja) 2013-09-05
KR20140119078A (ko) 2014-10-08

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