JP5809892B2 - マスクユニット - Google Patents
マスクユニット Download PDFInfo
- Publication number
- JP5809892B2 JP5809892B2 JP2011198617A JP2011198617A JP5809892B2 JP 5809892 B2 JP5809892 B2 JP 5809892B2 JP 2011198617 A JP2011198617 A JP 2011198617A JP 2011198617 A JP2011198617 A JP 2011198617A JP 5809892 B2 JP5809892 B2 JP 5809892B2
- Authority
- JP
- Japan
- Prior art keywords
- mask
- unit
- tension member
- length direction
- coupled
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Links
- 230000008878 coupling Effects 0.000 claims description 10
- 238000010168 coupling process Methods 0.000 claims description 10
- 238000005859 coupling reaction Methods 0.000 claims description 10
- 238000003466 welding Methods 0.000 claims description 7
- 238000000034 method Methods 0.000 description 5
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 239000010409 thin film Substances 0.000 description 2
- 230000007547 defect Effects 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
Images
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B3/00—Layered products comprising a layer with external or internal discontinuities or unevennesses, or a layer of non-planar shape; Layered products comprising a layer having particular features of form
- B32B3/10—Layered products comprising a layer with external or internal discontinuities or unevennesses, or a layer of non-planar shape; Layered products comprising a layer having particular features of form characterised by a discontinuous layer, i.e. formed of separate pieces of material
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/38—Masks having auxiliary features, e.g. special coatings or marks for alignment or testing; Preparation thereof
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B2457/00—Electrical equipment
- B32B2457/20—Displays, e.g. liquid crystal displays, plasma displays
- B32B2457/202—LCD, i.e. liquid crystal displays
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B2457/00—Electrical equipment
- B32B2457/20—Displays, e.g. liquid crystal displays, plasma displays
- B32B2457/206—Organic displays, e.g. OLED
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
- Y10T428/24802—Discontinuous or differential coating, impregnation or bond [e.g., artwork, printing, retouched photograph, etc.]
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Electroluminescent Light Sources (AREA)
- Physical Vapour Deposition (AREA)
- Chemical Vapour Deposition (AREA)
Description
110:単位マスク
200:マスクフレーム
250:クランプ部
310:交差引張部材
Claims (6)
- 長さ方向に沿って配列された複数のパターン領域と、前記複数のパターン領域の間に配置されたダミー領域とを有する1つ以上の単位マスク、
前記単位マスクの長さ方向に引張力が加えられるように、前記単位マスクの長さ方向の両側端部を引っ張って固定するマスクフレーム、および
前記単位マスクの前記ダミー領域に結合し、前記単位マスクの長さ方向と交差する方向に形成され、前記単位マスクの長さ方向と交差する方向に前記単位マスクに引張力を加える交差引張部材、
を含み、前記交差引張部材と結合する前記単位マスクの前記ダミー領域には、マスク結合溝が形成され、前記交差引張部材と前記単位マスクは、溶接(welding)によって結合されるマスクユニット。 - 前記交差引張部材は、前記単位マスクの長さ方向の両側端部の間の中央部に結合する、請求項1に記載のマスクユニット。
- 前記交差引張部材の両端部は、前記マスクフレームに結合する、請求項1に記載のマスクユニット。
- 前記交差引張部材と結合する前記マスクフレームの一領域には、フレーム結合溝が形成される、請求項3に記載のマスクユニット。
- 前記交差引張部材と前記マスクフレームは、溶接によって結合される、請求項3に記載のマスクユニット。
- 前記マスクフレームは、前記単位マスクの両端部を固定するクランプ(clamp)部を含む、請求項1に記載のマスクユニット。
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020110060248A KR20130028165A (ko) | 2011-06-21 | 2011-06-21 | 마스크 유닛 |
KR10-2011-0060248 | 2011-06-21 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2013002000A JP2013002000A (ja) | 2013-01-07 |
JP5809892B2 true JP5809892B2 (ja) | 2015-11-11 |
Family
ID=47362110
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2011198617A Active JP5809892B2 (ja) | 2011-06-21 | 2011-09-12 | マスクユニット |
Country Status (3)
Country | Link |
---|---|
US (1) | US20120328851A1 (ja) |
JP (1) | JP5809892B2 (ja) |
KR (1) | KR20130028165A (ja) |
Families Citing this family (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR101232181B1 (ko) * | 2010-02-03 | 2013-02-12 | 엘지디스플레이 주식회사 | 마스크 어셈블리 |
JP6511908B2 (ja) * | 2014-03-31 | 2019-05-15 | 大日本印刷株式会社 | 蒸着マスクの引張方法、フレーム付き蒸着マスクの製造方法、有機半導体素子の製造方法、及び引張装置 |
KR102624714B1 (ko) | 2016-09-12 | 2024-01-12 | 삼성디스플레이 주식회사 | 마스크 및 이를 포함하는 마스크 조립체의 제조방법 |
EP3543370A4 (en) * | 2016-11-18 | 2020-04-01 | Dai Nippon Printing Co., Ltd. | STEAM DEPOSIT MASK |
KR20210065255A (ko) | 2019-11-26 | 2021-06-04 | 삼성디스플레이 주식회사 | 증막 마스크, 이를 이용한 디스플레이 장치의 제조 방법 및 디스플레이 장치 |
CN111270201B (zh) * | 2020-02-19 | 2022-06-17 | 昆山国显光电有限公司 | 掩膜版 |
WO2023125484A1 (zh) * | 2021-12-28 | 2023-07-06 | 江苏菲沃泰纳米科技股份有限公司 | 一种镀膜夹具及其形成方法、以及镀膜遮蔽方法 |
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US2958147A (en) * | 1956-11-30 | 1960-11-01 | Gen Dynamics Corp | Chemical milling apparatus |
US3887421A (en) * | 1973-01-22 | 1975-06-03 | Gen Motors Corp | Method of masking semiconductor wafers using a self-aligning mask |
US3841261A (en) * | 1973-01-22 | 1974-10-15 | Gen Motors Corp | Self-aligning etch-out spray mask |
US4840596A (en) * | 1987-12-31 | 1989-06-20 | Zenith Electronics Corporation | Factory fixture frame with means for temporarily and removably supporting an in-process tension mask for a color cathode ray tube |
US4772238A (en) * | 1987-12-30 | 1988-09-20 | Zenith Electronics Corporation | Foil mask stretching apparatus and process |
US4915658A (en) * | 1988-04-04 | 1990-04-10 | Corning Incorporated | Reference and support system for flat CRT tension mask |
US5162008A (en) * | 1988-07-22 | 1992-11-10 | Zenith Electronics Corporation | Method and apparatus for stretching interchangeable tension masks in color cathode ray tubes |
JPH1050584A (ja) * | 1996-08-07 | 1998-02-20 | Nikon Corp | マスク保持装置 |
US6280276B1 (en) * | 1999-12-14 | 2001-08-28 | Thomson Licensing S.A. | Method of attaching a tension mask to a frame |
WO2003019988A1 (fr) * | 2001-08-24 | 2003-03-06 | Dai Nippon Printing Co., Ltd. | Dispositif de masque de formation a plusieurs faces pour depot sous vide |
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US7006202B2 (en) * | 2002-02-21 | 2006-02-28 | Lg.Philips Lcd Co., Ltd. | Mask holder for irradiating UV-rays |
JP2004006257A (ja) * | 2002-04-26 | 2004-01-08 | Tohoku Pioneer Corp | 真空蒸着用マスク及びこれを用いて製造された有機elディスプレイパネル |
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JP4173722B2 (ja) * | 2002-11-29 | 2008-10-29 | 三星エスディアイ株式会社 | 蒸着マスク、これを利用した有機el素子の製造方法及び有機el素子 |
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EP1802177A4 (en) * | 2004-09-08 | 2010-04-14 | Toray Industries | ORGANIC ELECTROLUMINESCENCE ELEMENT AND METHOD OF MANUFACTURING THEREOF |
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JP4349531B2 (ja) * | 2006-10-27 | 2009-10-21 | Tdk株式会社 | マスク装置 |
US20090311427A1 (en) * | 2008-06-13 | 2009-12-17 | Advantech Global, Ltd | Mask Dimensional Adjustment and Positioning System and Method |
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-
2011
- 2011-06-21 KR KR1020110060248A patent/KR20130028165A/ko active Search and Examination
- 2011-09-12 JP JP2011198617A patent/JP5809892B2/ja active Active
-
2012
- 2012-03-20 US US13/425,376 patent/US20120328851A1/en not_active Abandoned
Also Published As
Publication number | Publication date |
---|---|
JP2013002000A (ja) | 2013-01-07 |
KR20130028165A (ko) | 2013-03-19 |
US20120328851A1 (en) | 2012-12-27 |
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