JP5805306B2 - 複数の構成素子支持領域を分離する溝構造を備えている構成素子支持体結合体及び複数の構成素子支持体領域の製造方法 - Google Patents
複数の構成素子支持領域を分離する溝構造を備えている構成素子支持体結合体及び複数の構成素子支持体領域の製造方法 Download PDFInfo
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- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- 229910001128 Sn alloy Inorganic materials 0.000 description 1
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- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
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- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 description 1
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Description
Claims (11)
- 半導体構成素子を固定するために設けられている複数の構成素子支持体領域(10)を有している、構成素子支持体結合体(1)において、
前記構成素子支持体結合体は、第1の主面(21)を備えている支持体ボディ(2)を有しており、
前記支持体ボディの前記第1の主面側には、前記第1の主面に沿って延びている第1の方向に沿って延びる複数の第1の溝(31)を有している溝構造(3)が形成されており、前記第1の溝は該溝を横断する方向に延びる第2の方向において前記構成素子支持体領域を画定しており、
前記支持体ボディ上にはコーティング部(4)が形成されており、それにより前記構成素子支持体領域はそれぞれ、前記支持体ボディの少なくとも部分的にコーティングされた第1の主面と、前記溝構造の少なくとも部分的にコーティングされた側面(5)とを有しており、
前記支持体ボディは半導体材料を基礎としており、
前記第1の溝は前記第1の方向に沿って、前記支持体ボディにわたり部分的にしか延在しておらず、前記支持体ボディは一つに繋がっているものとして形成されており、
前記第1の主面とは反対側に位置している、前記支持体ボディの第2の主面(22)には前記コーティング部の材料は設けられていないことを特徴とする、構成素子支持体結合体。 - 一つの構成素子支持体領域の少なくとも二つの側面がコーティングされている、請求項1に記載の構成素子支持体結合体。
- 前記第2の方向に沿って隣接して配置されている複数の構成素子支持体領域は、前記一つに繋がっている支持体ボディにおける前記第1の溝の内の一つによって相互に隔離されている、請求項1又は2に記載の構成素子支持体結合体。
- 前記第1の溝は垂直方向において前記支持体ボディを完全に貫通して延在している、請求項1乃至3のいずれか一項に記載の構成素子支持体結合体。
- 前記第1の溝は相互に平行に延びている、請求項1乃至4のいずれか一項に記載の構成素子支持体結合体。
- 前記構成素子支持体結合体上に固定された半導体構成素子を一緒に電気的に接触接続させることができるように、前記コーティング部は構造化されている、請求項1乃至5のいずれか一項に記載の構成素子支持体結合体。
- 複数の構成素子支持体領域(10)を製造するための方法において、
a)第1の主面(21)と、該第1の主面とは反対側に位置する第2の主面(22)とを有する支持体ボディ(2)を準備するステップと、
b)前記第1の主面に沿って延びている第1の方向に沿って延びる第1の溝(31)を有しており、且つ、該第1の溝(31)によって、前記第1の方向を横断する方向に延びる第2の方向において隣接して配置されている複数の構成素子支持体領域が少なくとも部分的に相互に離隔されている溝構造(3)を、前記支持体ボディにおいて前記第1の主面側に形成するステップと、
c)少なくとも部分的に前記第1の主面を覆い、且つ、少なくとも部分的に前記溝構造の側面(5)を覆うコーティング部(4)を形成するステップと、
d)前記支持体ボディを前記第2の主面側から、前記溝構造が少なくとも部分的に、前記第1の主面に対して斜め又は垂直に延びる方向において前記支持体ボディを完全に貫通するように薄くするステップと、
を備えており、
前記ステップb)において、前記溝構造を帯状に部分的にしか形成せず、
それにより、前記ステップd)の終了後に、前記支持体ボディが一つに繋がっていることにより、前記支持体ボディには複数の構成素子支持体領域が形成されている
ことを特徴とする、複数の構成素子支持体領域(10)を製造するための方法。 - 前記ステップc)において、前記コーティング部をコーティング源を用いて形成し、
前記コーティング源の主コーティング方向は前記第1の主面の垂線に対して斜めに延びている、請求項7に記載の方法。 - 前記溝構造を乾式化学的な方法又は侵食によって形成する、請求項7又は8に記載の方法。
- 前記構成素子支持体領域を個別化する前に、構成素子を構成素子支持体領域に固定する、請求項7から9までのいずれか1項に記載の方法。
- 前記構成素子を個別化の前に駆動させる、請求項10に記載の方法。
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