JP5726294B2 - ジオルガノジハロシランの調製方法 - Google Patents

ジオルガノジハロシランの調製方法 Download PDF

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Publication number
JP5726294B2
JP5726294B2 JP2013512620A JP2013512620A JP5726294B2 JP 5726294 B2 JP5726294 B2 JP 5726294B2 JP 2013512620 A JP2013512620 A JP 2013512620A JP 2013512620 A JP2013512620 A JP 2013512620A JP 5726294 B2 JP5726294 B2 JP 5726294B2
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Japan
Prior art keywords
silicon
copper catalyst
catalyst
organic halide
containing copper
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Japanese (ja)
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JP2013528187A5 (enExample
JP2013528187A (ja
Inventor
カツーリス ディミトリス
カツーリス ディミトリス
トーマス ラーセン ロバート
トーマス ラーセン ロバート
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Dow Silicones Corp
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Dow Corning Corp
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Publication of JP2013528187A5 publication Critical patent/JP2013528187A5/ja
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Classifications

    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
    • C07F7/02—Silicon compounds
    • C07F7/08—Compounds having one or more C—Si linkages
    • C07F7/12—Organo silicon halides
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
    • C07F7/02—Silicon compounds
    • C07F7/08—Compounds having one or more C—Si linkages
    • C07F7/12—Organo silicon halides
    • C07F7/121—Preparation or treatment not provided for in C07F7/14, C07F7/16 or C07F7/20
    • C07F7/125—Preparation or treatment not provided for in C07F7/14, C07F7/16 or C07F7/20 by reactions involving both Si-C and Si-halogen linkages, the Si-C and Si-halogen linkages can be to the same or to different Si atoms, e.g. redistribution reactions
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J23/00—Catalysts comprising metals or metal oxides or hydroxides, not provided for in group B01J21/00
    • B01J23/70—Catalysts comprising metals or metal oxides or hydroxides, not provided for in group B01J21/00 of the iron group metals or copper
    • B01J23/72—Copper
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J37/00—Processes, in general, for preparing catalysts; Processes, in general, for activation of catalysts
    • B01J37/08—Heat treatment
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
    • C07F7/02—Silicon compounds
    • C07F7/08—Compounds having one or more C—Si linkages
    • C07F7/12—Organo silicon halides
    • C07F7/121—Preparation or treatment not provided for in C07F7/14, C07F7/16 or C07F7/20
    • C07F7/122—Preparation or treatment not provided for in C07F7/14, C07F7/16 or C07F7/20 by reactions involving the formation of Si-C linkages

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  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Thermal Sciences (AREA)
  • Catalysts (AREA)
  • Low-Molecular Organic Synthesis Reactions Using Catalysts (AREA)
JP2013512620A 2010-05-28 2011-03-31 ジオルガノジハロシランの調製方法 Active JP5726294B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US34924210P 2010-05-28 2010-05-28
US61/349,242 2010-05-28
PCT/US2011/030683 WO2011149588A1 (en) 2010-05-28 2011-03-31 A method for preparing a diorganodihalosilane

Publications (3)

Publication Number Publication Date
JP2013528187A JP2013528187A (ja) 2013-07-08
JP2013528187A5 JP2013528187A5 (enExample) 2013-12-19
JP5726294B2 true JP5726294B2 (ja) 2015-05-27

Family

ID=44065690

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2013512620A Active JP5726294B2 (ja) 2010-05-28 2011-03-31 ジオルガノジハロシランの調製方法

Country Status (6)

Country Link
US (2) US8772525B2 (enExample)
EP (1) EP2576573B1 (enExample)
JP (1) JP5726294B2 (enExample)
KR (1) KR101839585B1 (enExample)
CN (1) CN102844322B (enExample)
WO (1) WO2011149588A1 (enExample)

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9073951B2 (en) 2010-01-26 2015-07-07 Dow Corning Corporation Method of preparing an organohalosilane
KR101839585B1 (ko) * 2010-05-28 2018-03-16 다우 코닝 코포레이션 디오가노디할로실란의 제조 방법
US20130039831A1 (en) * 2011-01-25 2013-02-14 Aswini Dash Method of preparing a hydridohalosilane compound
EP2780347B1 (en) * 2011-11-17 2015-08-12 Dow Corning Corporation A method for preparing a diorganodihalosilane
US20150045571A1 (en) * 2012-04-05 2015-02-12 Dow Corning Corporation Method for Preparing an Organofunctional Compound
US20150005156A1 (en) 2012-04-16 2015-01-01 Dow Corning Corporation Processes for the Preparation of Silicon Containing Intermetallic Compounds and Intermetallic Compounds Prepared Thereby
US8865850B2 (en) 2012-06-14 2014-10-21 Dow Corning Corporation Method of selectively forming a reaction product in the presence of a metal silicide
US9296765B2 (en) 2012-08-13 2016-03-29 Dow Corning Corporation Method of preparing an organohalosilane
KR102082629B1 (ko) * 2012-10-16 2020-02-28 다우 실리콘즈 코포레이션 할로겐화 실라하이드로카르빌렌의 제조 방법
WO2014099125A1 (en) * 2012-12-19 2014-06-26 Dow Corning Corporation Method for preparing a diorganodihalosilane
WO2014149224A1 (en) * 2013-03-15 2014-09-25 Dow Corning Corporation Method for preparing a halosilane using copper silicides as catalysts
KR102299593B1 (ko) 2013-11-12 2021-09-09 다우 실리콘즈 코포레이션 할로실란의 제조 방법
WO2015100075A1 (en) * 2013-12-23 2015-07-02 Dow Corning Corporation Solid binary copper-silicon material catalysts for emissions control
US10081643B2 (en) 2014-12-18 2018-09-25 Dow Silicones Corporation Method for producing aryl-functional silanes

Family Cites Families (32)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2380996A (en) * 1941-09-26 1945-08-07 Gen Electric Preparation of organosilicon halides
BE473151A (enExample) 1945-03-15
US2888476A (en) 1956-08-01 1959-05-26 Du Pont Preparation of long-chain alkylhalosilanes
US3057686A (en) 1957-08-01 1962-10-09 Du Pont Process for preparing silanes
JPS5747917B2 (enExample) 1974-08-20 1982-10-13
US4314908A (en) * 1979-10-24 1982-02-09 Union Carbide Corporation Preparation of reaction mass for the production of methylchlorosilane
DE3024319C2 (de) 1980-06-27 1983-07-21 Wacker-Chemitronic Gesellschaft für Elektronik-Grundstoffe mbH, 8263 Burghausen Kontinuierliches Verfahren zur Herstellung von Trichlorsilan
FR2530638A1 (fr) 1982-07-26 1984-01-27 Rhone Poulenc Spec Chim Procede de preparation d'un melange a base de trichlorosilane utilisable pour la preparation de silicium de haute purete
US4526769A (en) 1983-07-18 1985-07-02 Motorola, Inc. Trichlorosilane production process
JPS63118069A (ja) * 1986-11-07 1988-05-23 Sumitomo Electric Ind Ltd 耐食性・耐摩耗性部材
US4973725A (en) * 1988-06-28 1990-11-27 Union Carbide Chemicals And Plastics Company Inc. Direct synthesis process for organohalohydrosilanes
US4946980A (en) 1988-10-17 1990-08-07 Dow Corning Corporation Preparation of organosilanes
US4888435A (en) 1989-06-22 1989-12-19 Dow Corning Corporation Integrated process for alkylation and redistribution of halosilanes
DE4041644A1 (de) 1990-12-22 1992-06-25 Nuenchritz Chemie Gmbh Verfahren zur reduktiven umwandlung von siliciumtetrachlorid in trichlorsilan
TW232751B (en) 1992-10-09 1994-10-21 Semiconductor Energy Res Co Ltd Semiconductor device and method for forming the same
DE19654154A1 (de) 1995-12-25 1997-06-26 Tokuyama Corp Verfahren zur Herstellung von Trichlorsilan
US7223879B2 (en) 1998-07-10 2007-05-29 Massachusetts Institute Of Technology Ligands for metals and improved metal-catalyzed processes based thereon
US6156380A (en) 1998-10-05 2000-12-05 Shin-Etsu Chemical Co., Ltd. Method for preparing contact mass for organohalosilane synthesis
US6528674B1 (en) * 2000-04-20 2003-03-04 General Electric Company Method for preparing a contact mass
DE10044796A1 (de) 2000-09-11 2002-04-04 Bayer Ag Verfahren zur Herstellung von Chlorsilanen
DE10061682A1 (de) 2000-12-11 2002-07-04 Solarworld Ag Verfahren zur Herstellung von Reinstsilicium
EP1626083B1 (en) 2002-08-06 2006-11-02 Loma Linda University Substances for preventing and treating autoimmune diseases
US7716590B1 (en) 2002-10-28 2010-05-11 Oracle International Corporation Method and apparatus for dynamically updating a secondary form element based on a selection in a primary form element
JP2007505992A (ja) 2003-09-19 2007-03-15 エスアールアイ インターナショナル 金属ハロゲン化物の還元によって金属組成物を製造するための方法および装置
US7728176B2 (en) 2003-11-28 2010-06-01 Hokko Chemical Industry Co., Ltd. Process for producing phosphonium borate compound, novel phosphonium borate compound, and method of using the same
JP2005292324A (ja) 2004-03-31 2005-10-20 Canon Inc 画像形成装置のクリーニング装置
WO2006081384A2 (en) * 2005-01-26 2006-08-03 The Regents Of The University Of California Heterogeneous copper catalysts
DE102005046703A1 (de) 2005-09-29 2007-04-05 Wacker Chemie Ag Verfahren und Vorrichtung zur Hydrierung von Chlorsilanen
EP2039669A1 (en) 2007-09-19 2009-03-25 Max-Planck-Gesellschaft zur Förderung der Wissenschaften e.V. Use of a mixture of an ordered intermetallic compound and an inert material as a catalyst and corresponding hydrogenation processes
JP2009111202A (ja) 2007-10-31 2009-05-21 Panasonic Corp 半導体装置及びその製造方法
KR101839585B1 (ko) * 2010-05-28 2018-03-16 다우 코닝 코포레이션 디오가노디할로실란의 제조 방법
DE102011005647A1 (de) 2011-03-16 2012-10-04 Evonik Degussa Gmbh Verbundverfahren zur Umstetzung von STC-haltigen und OCS-haltigen Nebenströmen zu wasserstoffhaltigen Chlorsilanen

Also Published As

Publication number Publication date
EP2576573B1 (en) 2015-06-24
EP2576573A1 (en) 2013-04-10
KR101839585B1 (ko) 2018-03-16
CN102844322A (zh) 2012-12-26
JP2013528187A (ja) 2013-07-08
US20130066096A1 (en) 2013-03-14
KR20130079349A (ko) 2013-07-10
CN102844322B (zh) 2015-09-23
US20140256975A1 (en) 2014-09-11
US8772525B2 (en) 2014-07-08
WO2011149588A1 (en) 2011-12-01

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