JP5716897B2 - 液体噴射ヘッド、液体噴射装置、圧電素子、超音波センサー及び赤外センサー - Google Patents
液体噴射ヘッド、液体噴射装置、圧電素子、超音波センサー及び赤外センサー Download PDFInfo
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- JP5716897B2 JP5716897B2 JP2011014618A JP2011014618A JP5716897B2 JP 5716897 B2 JP5716897 B2 JP 5716897B2 JP 2011014618 A JP2011014618 A JP 2011014618A JP 2011014618 A JP2011014618 A JP 2011014618A JP 5716897 B2 JP5716897 B2 JP 5716897B2
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- Prior art keywords
- piezoelectric
- film
- liquid ejecting
- piezoelectric element
- electrode
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- 239000007788 liquid Substances 0.000 title claims description 29
- XEEYBQQBJWHFJM-UHFFFAOYSA-N iron Substances [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 claims description 59
- 239000002243 precursor Substances 0.000 claims description 47
- 229910052742 iron Inorganic materials 0.000 claims description 37
- 239000000463 material Substances 0.000 claims description 29
- 229910052719 titanium Inorganic materials 0.000 claims description 28
- 229910052797 bismuth Inorganic materials 0.000 claims description 26
- 150000001875 compounds Chemical class 0.000 claims description 26
- 229910052788 barium Inorganic materials 0.000 claims description 24
- 150000002736 metal compounds Chemical class 0.000 claims description 22
- 229910052748 manganese Inorganic materials 0.000 claims description 20
- WWZKQHOCKIZLMA-UHFFFAOYSA-N octanoic acid Chemical compound CCCCCCCC(O)=O WWZKQHOCKIZLMA-UHFFFAOYSA-N 0.000 claims description 20
- 229910004298 SiO 2 Inorganic materials 0.000 claims description 19
- 238000000034 method Methods 0.000 claims description 19
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 claims description 15
- 238000004519 manufacturing process Methods 0.000 claims description 14
- 238000010438 heat treatment Methods 0.000 claims description 11
- JRPBQTZRNDNNOP-UHFFFAOYSA-N barium titanate Chemical compound [Ba+2].[Ba+2].[O-][Ti]([O-])([O-])[O-] JRPBQTZRNDNNOP-UHFFFAOYSA-N 0.000 claims description 8
- 229910002113 barium titanate Inorganic materials 0.000 claims description 8
- 229910052697 platinum Inorganic materials 0.000 claims description 7
- 238000002425 crystallisation Methods 0.000 claims description 4
- 230000008025 crystallization Effects 0.000 claims description 4
- KTMLBHVBHVXWKQ-UHFFFAOYSA-N dibismuth dioxido(dioxo)manganese Chemical compound [Bi+3].[Bi+3].[O-][Mn]([O-])(=O)=O.[O-][Mn]([O-])(=O)=O.[O-][Mn]([O-])(=O)=O KTMLBHVBHVXWKQ-UHFFFAOYSA-N 0.000 claims description 3
- 239000010408 film Substances 0.000 description 83
- 239000000758 substrate Substances 0.000 description 44
- 239000010936 titanium Substances 0.000 description 29
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- 239000000243 solution Substances 0.000 description 27
- 230000000052 comparative effect Effects 0.000 description 23
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- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 8
- JCXGWMGPZLAOME-UHFFFAOYSA-N bismuth atom Chemical compound [Bi] JCXGWMGPZLAOME-UHFFFAOYSA-N 0.000 description 7
- 229910052710 silicon Inorganic materials 0.000 description 7
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 6
- 238000002441 X-ray diffraction Methods 0.000 description 6
- DSAJWYNOEDNPEQ-UHFFFAOYSA-N barium atom Chemical compound [Ba] DSAJWYNOEDNPEQ-UHFFFAOYSA-N 0.000 description 6
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- 238000004151 rapid thermal annealing Methods 0.000 description 6
- 239000010703 silicon Substances 0.000 description 6
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- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 4
- HKAASGNXFXHLHR-UHFFFAOYSA-N [Mn](=O)(=O)([O-])[O-].[Fe+2].[Bi+3] Chemical compound [Mn](=O)(=O)([O-])[O-].[Fe+2].[Bi+3] HKAASGNXFXHLHR-UHFFFAOYSA-N 0.000 description 4
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- 239000002184 metal Substances 0.000 description 4
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- 235000012239 silicon dioxide Nutrition 0.000 description 4
- 239000000377 silicon dioxide Substances 0.000 description 4
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- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- 238000001514 detection method Methods 0.000 description 3
- 238000010304 firing Methods 0.000 description 3
- LZKLAOYSENRNKR-LNTINUHCSA-N iron;(z)-4-oxoniumylidenepent-2-en-2-olate Chemical compound [Fe].C\C(O)=C\C(C)=O.C\C(O)=C\C(C)=O.C\C(O)=C\C(C)=O LZKLAOYSENRNKR-LNTINUHCSA-N 0.000 description 3
- 238000004544 sputter deposition Methods 0.000 description 3
- KBPLFHHGFOOTCA-UHFFFAOYSA-N 1-Octanol Chemical compound CCCCCCCCO KBPLFHHGFOOTCA-UHFFFAOYSA-N 0.000 description 2
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 2
- AMQJEAYHLZJPGS-UHFFFAOYSA-N N-Pentanol Chemical compound CCCCCO AMQJEAYHLZJPGS-UHFFFAOYSA-N 0.000 description 2
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 2
- 239000000853 adhesive Substances 0.000 description 2
- 230000001070 adhesive effect Effects 0.000 description 2
- UQZIWOQVLUASCR-UHFFFAOYSA-N alumane;titanium Chemical compound [AlH3].[Ti] UQZIWOQVLUASCR-UHFFFAOYSA-N 0.000 description 2
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 2
- ZCKXRHNLRWLPLJ-UHFFFAOYSA-N barium(2+);propan-1-olate Chemical compound [Ba+2].CCC[O-].CCC[O-] ZCKXRHNLRWLPLJ-UHFFFAOYSA-N 0.000 description 2
- DIOQZVSQGTUSAI-UHFFFAOYSA-N decane Chemical compound CCCCCCCCCC DIOQZVSQGTUSAI-UHFFFAOYSA-N 0.000 description 2
- -1 for example Substances 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 239000010931 gold Substances 0.000 description 2
- ZSIAUFGUXNUGDI-UHFFFAOYSA-N hexan-1-ol Chemical compound CCCCCCO ZSIAUFGUXNUGDI-UHFFFAOYSA-N 0.000 description 2
- 238000009413 insulation Methods 0.000 description 2
- 239000012212 insulator Substances 0.000 description 2
- 229910052451 lead zirconate titanate Inorganic materials 0.000 description 2
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- 229910052760 oxygen Inorganic materials 0.000 description 2
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- HYZQBNDRDQEWAN-LNTINUHCSA-N (z)-4-hydroxypent-3-en-2-one;manganese(3+) Chemical compound [Mn+3].C\C(O)=C\C(C)=O.C\C(O)=C\C(C)=O.C\C(O)=C\C(C)=O HYZQBNDRDQEWAN-LNTINUHCSA-N 0.000 description 1
- WGOMEMWEJIKLSU-UJUIXPSJSA-J (z)-octadec-9-enoate;titanium(4+) Chemical compound [Ti+4].CCCCCCCC\C=C/CCCCCCCC([O-])=O.CCCCCCCC\C=C/CCCCCCCC([O-])=O.CCCCCCCC\C=C/CCCCCCCC([O-])=O.CCCCCCCC\C=C/CCCCCCCC([O-])=O WGOMEMWEJIKLSU-UJUIXPSJSA-J 0.000 description 1
- QYIGOGBGVKONDY-UHFFFAOYSA-N 1-(2-bromo-5-chlorophenyl)-3-methylpyrazole Chemical compound N1=C(C)C=CN1C1=CC(Cl)=CC=C1Br QYIGOGBGVKONDY-UHFFFAOYSA-N 0.000 description 1
- GEGLCBTXYBXOJA-UHFFFAOYSA-N 1-methoxyethanol Chemical compound COC(C)O GEGLCBTXYBXOJA-UHFFFAOYSA-N 0.000 description 1
- KKMOSYLWYLMHAL-UHFFFAOYSA-N 2-bromo-6-nitroaniline Chemical compound NC1=C(Br)C=CC=C1[N+]([O-])=O KKMOSYLWYLMHAL-UHFFFAOYSA-N 0.000 description 1
- UKWUOTZGXIZAJC-UHFFFAOYSA-N 4-nitrosalicylic acid Chemical compound OC(=O)C1=CC=C([N+]([O-])=O)C=C1O UKWUOTZGXIZAJC-UHFFFAOYSA-N 0.000 description 1
- OURWKHLDAVYMGO-UHFFFAOYSA-N 7-thiophen-2-ylpyrazolo[1,5-a]pyrimidine-3-carboxylic acid Chemical compound C=1C=NC2=C(C(=O)O)C=NN2C=1C1=CC=CS1 OURWKHLDAVYMGO-UHFFFAOYSA-N 0.000 description 1
- JZUFKLXOESDKRF-UHFFFAOYSA-N Chlorothiazide Chemical compound C1=C(Cl)C(S(=O)(=O)N)=CC2=C1NCNS2(=O)=O JZUFKLXOESDKRF-UHFFFAOYSA-N 0.000 description 1
- XDTMQSROBMDMFD-UHFFFAOYSA-N Cyclohexane Chemical compound C1CCCCC1 XDTMQSROBMDMFD-UHFFFAOYSA-N 0.000 description 1
- 238000000018 DNA microarray Methods 0.000 description 1
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 1
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 1
- 229910002367 SrTiO Inorganic materials 0.000 description 1
- 239000007983 Tris buffer Substances 0.000 description 1
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 description 1
- 230000001133 acceleration Effects 0.000 description 1
- 125000005595 acetylacetonate group Chemical group 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 150000004703 alkoxides Chemical class 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 238000000137 annealing Methods 0.000 description 1
- ITHZDDVSAWDQPZ-UHFFFAOYSA-L barium acetate Chemical compound [Ba+2].CC([O-])=O.CC([O-])=O ITHZDDVSAWDQPZ-UHFFFAOYSA-L 0.000 description 1
- 229940112016 barium acetate Drugs 0.000 description 1
- 229940006612 barium citrate Drugs 0.000 description 1
- RQPZNWPYLFFXCP-UHFFFAOYSA-L barium dihydroxide Chemical compound [OH-].[OH-].[Ba+2] RQPZNWPYLFFXCP-UHFFFAOYSA-L 0.000 description 1
- 229910001863 barium hydroxide Inorganic materials 0.000 description 1
- GXUARMXARIJAFV-UHFFFAOYSA-L barium oxalate Chemical compound [Ba+2].[O-]C(=O)C([O-])=O GXUARMXARIJAFV-UHFFFAOYSA-L 0.000 description 1
- 229940094800 barium oxalate Drugs 0.000 description 1
- BHDOPTZJCSDVJE-CVBJKYQLSA-L barium(2+);(z)-octadec-9-enoate Chemical compound [Ba+2].CCCCCCCC\C=C/CCCCCCCC([O-])=O.CCCCCCCC\C=C/CCCCCCCC([O-])=O BHDOPTZJCSDVJE-CVBJKYQLSA-L 0.000 description 1
- HQYOWPDUMCBSLQ-UHFFFAOYSA-L barium(2+);2,3-dihydroxybutanedioate Chemical compound [Ba+2].[O-]C(=O)C(O)C(O)C([O-])=O HQYOWPDUMCBSLQ-UHFFFAOYSA-L 0.000 description 1
- PAVWOHWZXOQYDB-UHFFFAOYSA-H barium(2+);2-hydroxypropane-1,2,3-tricarboxylate Chemical compound [Ba+2].[Ba+2].[Ba+2].[O-]C(=O)CC(O)(CC([O-])=O)C([O-])=O.[O-]C(=O)CC(O)(CC([O-])=O)C([O-])=O PAVWOHWZXOQYDB-UHFFFAOYSA-H 0.000 description 1
- HLKMEIITONDPGG-UHFFFAOYSA-L barium(2+);2-hydroxypropanoate Chemical compound [Ba+2].CC(O)C([O-])=O.CC(O)C([O-])=O HLKMEIITONDPGG-UHFFFAOYSA-L 0.000 description 1
- SLPLCLDJTNLWPW-UHFFFAOYSA-N barium(2+);2-methylpropan-2-olate Chemical compound [Ba+2].CC(C)(C)[O-].CC(C)(C)[O-] SLPLCLDJTNLWPW-UHFFFAOYSA-N 0.000 description 1
- TVSNZOUKUFGNLK-UHFFFAOYSA-N barium(2+);butan-1-olate Chemical compound [Ba+2].CCCC[O-].CCCC[O-] TVSNZOUKUFGNLK-UHFFFAOYSA-N 0.000 description 1
- ZCOUZNWQYNAYNR-UHFFFAOYSA-N barium(2+);butan-2-olate Chemical compound [Ba+2].CCC(C)[O-].CCC(C)[O-] ZCOUZNWQYNAYNR-UHFFFAOYSA-N 0.000 description 1
- MJIAXOYYJWECDI-UHFFFAOYSA-L barium(2+);dibenzoate Chemical compound [Ba+2].[O-]C(=O)C1=CC=CC=C1.[O-]C(=O)C1=CC=CC=C1 MJIAXOYYJWECDI-UHFFFAOYSA-L 0.000 description 1
- UXFOSWFWQAUFFZ-UHFFFAOYSA-L barium(2+);diformate Chemical compound [Ba+2].[O-]C=O.[O-]C=O UXFOSWFWQAUFFZ-UHFFFAOYSA-L 0.000 description 1
- LKZCRGABYQYUFX-UHFFFAOYSA-L barium(2+);dithiocyanate Chemical compound [Ba+2].[S-]C#N.[S-]C#N LKZCRGABYQYUFX-UHFFFAOYSA-L 0.000 description 1
- GYIWFHXWLCXGQO-UHFFFAOYSA-N barium(2+);ethanolate Chemical compound [Ba+2].CC[O-].CC[O-] GYIWFHXWLCXGQO-UHFFFAOYSA-N 0.000 description 1
- BQDSDRAVKYTTTH-UHFFFAOYSA-N barium(2+);methanolate Chemical compound [Ba+2].[O-]C.[O-]C BQDSDRAVKYTTTH-UHFFFAOYSA-N 0.000 description 1
- PJUKKJYOSBWEQO-UHFFFAOYSA-L barium(2+);octanoate Chemical compound [Ba+2].CCCCCCCC([O-])=O.CCCCCCCC([O-])=O PJUKKJYOSBWEQO-UHFFFAOYSA-L 0.000 description 1
- 238000005452 bending Methods 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- FPCJKVGGYOAWIZ-UHFFFAOYSA-N butan-1-ol;titanium Chemical compound [Ti].CCCCO.CCCCO.CCCCO.CCCCO FPCJKVGGYOAWIZ-UHFFFAOYSA-N 0.000 description 1
- 239000003985 ceramic capacitor Substances 0.000 description 1
- 229910010293 ceramic material Inorganic materials 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 238000000354 decomposition reaction Methods 0.000 description 1
- IZRTVYMPRPTBAI-UHFFFAOYSA-K dibenzoyloxybismuthanyl benzoate Chemical compound [Bi+3].[O-]C(=O)C1=CC=CC=C1.[O-]C(=O)C1=CC=CC=C1.[O-]C(=O)C1=CC=CC=C1 IZRTVYMPRPTBAI-UHFFFAOYSA-K 0.000 description 1
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- 125000005594 diketone group Chemical group 0.000 description 1
- HTXDPTMKBJXEOW-UHFFFAOYSA-N dioxoiridium Chemical compound O=[Ir]=O HTXDPTMKBJXEOW-UHFFFAOYSA-N 0.000 description 1
- 239000007772 electrode material Substances 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- ZFSQRSOTOXERMJ-UHFFFAOYSA-N ethanol;iron Chemical compound [Fe].CCO.CCO.CCO ZFSQRSOTOXERMJ-UHFFFAOYSA-N 0.000 description 1
- XGZNHFPFJRZBBT-UHFFFAOYSA-N ethanol;titanium Chemical compound [Ti].CCO.CCO.CCO.CCO XGZNHFPFJRZBBT-UHFFFAOYSA-N 0.000 description 1
- UKRVECBFDMVBPU-UHFFFAOYSA-N ethyl 3-oxoheptanoate Chemical compound CCCCC(=O)CC(=O)OCC UKRVECBFDMVBPU-UHFFFAOYSA-N 0.000 description 1
- 230000001747 exhibiting effect Effects 0.000 description 1
- 239000002241 glass-ceramic Substances 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 229910052741 iridium Inorganic materials 0.000 description 1
- GKOZUEZYRPOHIO-UHFFFAOYSA-N iridium atom Chemical compound [Ir] GKOZUEZYRPOHIO-UHFFFAOYSA-N 0.000 description 1
- 229910000457 iridium oxide Inorganic materials 0.000 description 1
- PQQAOTNUALRVTE-UHFFFAOYSA-L iron(2+);diformate Chemical compound [Fe+2].[O-]C=O.[O-]C=O PQQAOTNUALRVTE-UHFFFAOYSA-L 0.000 description 1
- FRVCGRDGKAINSV-UHFFFAOYSA-L iron(2+);octadecanoate Chemical compound [Fe+2].CCCCCCCCCCCCCCCCCC([O-])=O.CCCCCCCCCCCCCCCCCC([O-])=O FRVCGRDGKAINSV-UHFFFAOYSA-L 0.000 description 1
- MVQMKWMKHHXUHG-UHFFFAOYSA-N iron(3+);propan-1-olate Chemical compound [Fe+3].CCC[O-].CCC[O-].CCC[O-] MVQMKWMKHHXUHG-UHFFFAOYSA-N 0.000 description 1
- 125000003253 isopropoxy group Chemical group [H]C([H])([H])C([H])(O*)C([H])([H])[H] 0.000 description 1
- HFGPZNIAWCZYJU-UHFFFAOYSA-N lead zirconate titanate Chemical compound [O-2].[O-2].[O-2].[O-2].[O-2].[Ti+4].[Zr+4].[Pb+2] HFGPZNIAWCZYJU-UHFFFAOYSA-N 0.000 description 1
- 239000003446 ligand Substances 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 238000001459 lithography Methods 0.000 description 1
- 229940071125 manganese acetate Drugs 0.000 description 1
- UOGMEBQRZBEZQT-UHFFFAOYSA-L manganese(2+);diacetate Chemical compound [Mn+2].CC([O-])=O.CC([O-])=O UOGMEBQRZBEZQT-UHFFFAOYSA-L 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 229910044991 metal oxide Inorganic materials 0.000 description 1
- 150000004706 metal oxides Chemical class 0.000 description 1
- ZEIWWVGGEOHESL-UHFFFAOYSA-N methanol;titanium Chemical compound [Ti].OC.OC.OC.OC ZEIWWVGGEOHESL-UHFFFAOYSA-N 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 229910052758 niobium Inorganic materials 0.000 description 1
- 150000004767 nitrides Chemical class 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- RVTZCBVAJQQJTK-UHFFFAOYSA-N oxygen(2-);zirconium(4+) Chemical compound [O-2].[O-2].[Zr+4] RVTZCBVAJQQJTK-UHFFFAOYSA-N 0.000 description 1
- 238000000634 powder X-ray diffraction Methods 0.000 description 1
- BDERNNFJNOPAEC-UHFFFAOYSA-N propan-1-ol Chemical compound CCCO BDERNNFJNOPAEC-UHFFFAOYSA-N 0.000 description 1
- 238000001552 radio frequency sputter deposition Methods 0.000 description 1
- 229910052706 scandium Inorganic materials 0.000 description 1
- 238000003980 solgel method Methods 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
- 229910052715 tantalum Inorganic materials 0.000 description 1
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 1
- MNWRORMXBIWXCI-UHFFFAOYSA-N tetrakis(dimethylamido)titanium Chemical compound CN(C)[Ti](N(C)C)(N(C)C)N(C)C MNWRORMXBIWXCI-UHFFFAOYSA-N 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- MYXUYXMJVQWRPU-UHFFFAOYSA-N triethoxybismuthane Chemical compound [Bi+3].CC[O-].CC[O-].CC[O-] MYXUYXMJVQWRPU-UHFFFAOYSA-N 0.000 description 1
- ZHXAZZQXWJJBHA-UHFFFAOYSA-N triphenylbismuthane Chemical compound C1=CC=CC=C1[Bi](C=1C=CC=CC=1)C1=CC=CC=C1 ZHXAZZQXWJJBHA-UHFFFAOYSA-N 0.000 description 1
- DRFVTYUXJVLNLR-UHFFFAOYSA-N tris(2-methylbutan-2-yloxy)bismuthane Chemical compound CCC(C)(C)O[Bi](OC(C)(C)CC)OC(C)(C)CC DRFVTYUXJVLNLR-UHFFFAOYSA-N 0.000 description 1
- 229910052720 vanadium Inorganic materials 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
- 229910052726 zirconium Inorganic materials 0.000 description 1
- 229910001928 zirconium oxide Inorganic materials 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/14—Structure thereof only for on-demand ink jet heads
- B41J2/14201—Structure of print heads with piezoelectric elements
- B41J2/14233—Structure of print heads with piezoelectric elements of film type, deformed by bending and disposed on a diaphragm
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D3/00—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials
- B05D3/007—After-treatment
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
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Description
かかる態様では、Bi、Fe、Mn、Ba及びTiを含有する金属化合物を含む前駆体溶液で形成した圧電体前駆体膜を加熱して結晶化することにより(110)面に優先配向した圧電体膜を製造すると、低鉛化、すなわち鉛含有量が低く且つ比誘電率が高い圧電体膜を製造することができる。
図1は、本発明の実施形態1に係る液体噴射ヘッドの一例であるインクジェット式記録ヘッドの概略構成を示す分解斜視図であり、図2は、図1の平面図及びそのA−A′線断面図である。
(0.60<x<1、0<y<0.40、好ましくは、0.70≦x≦0.80、0.20≦y≦0.30であり、x+y=1、0.01<a<0.10である。)
まず、シリコン基板の表面に熱酸化により膜厚400nmのSiO2膜を形成した。次に、SiO2膜上にRFスパッタ法により膜厚100nmのTiAlN膜を形成した。次に、TiAlN膜上にDCスパッタ法により膜厚100nmのIr膜及び膜厚30nmのIrO2膜を順に形成し、その上に蒸着法により(111)に配向したPt膜を形成し、第1電極60とした。
前駆体溶液にSiの化合物を添加せず、0.75Bi(Fe0.95Mn0.05)O3−0.25BaTiO3のペロブスカイト型化合物からなる圧電材料で構成された圧電体層70となるようにした以外は、実施例1と同様にして、圧電素子300を形成した。
Bi、Fe、Mn、Ba、Tiの金属化合物の混合割合を変更して、0.80Bi(Fe0.95Mn0.05)O3−0.20BaTiO3のペロブスカイト型化合物からなる圧電材料で構成された圧電体層70となるようにした以外は、実施例2と同様にして、圧電素子300を形成した。
Bi、Fe、Mn、Ba、Tiの金属化合物の混合割合を変更して、0.70Bi(Fe0.95Mn0.05)O3−0.30BaTiO3のペロブスカイト型化合物からなる圧電材料で構成された圧電体層70となるようにした以外は、実施例2と同様にして、圧電素子300を形成した。
Bi、Fe、Mn、Ba、Ti、Siの金属化合物の混合割合を変更して、0.60Bi(Fe0.95Mn0.05)O3−0.40BaTiO3のペロブスカイト型化合物と、このペロブスカイト型化合物に対して2モル%のSiO2とを有する圧電材料で構成された圧電体層70となるようにした以外は、実施例1と同様にして、圧電素子300を形成した。
オクチル酸鉄のかわりにトリス(アセチルアセトナト)鉄を用いた以外は実施例2と同様にして、圧電素子300を形成した。
実施例1〜4及び比較例1〜2の各圧電素子300について、東陽テクニカ社製「FCE−1A」で、φ=400μmの電極パターンを使用し、周波数1kHz、3V〜60Vの三角波を印加して、P(分極量)−V(電圧)の関係を求めた。実施例1のヒステリシスを図3に、実施例2のヒステリシスを図4に、実施例3のヒステリシスを図5に、実施例4のヒステリシスを図6に、比較例1のヒステリシスを図7に、比較例2のヒステリシスを図8に示す。なお、図3〜図8に示すように、実施例1〜4及び比較例1〜2の圧電体層は強誘電体であった。
実施例1〜4及び比較例1〜2の圧電素子300の圧電体層70について、アジレント社製インピーダンスアナライザー「HP4294A」を用い1kHz、振幅141mVの条件で25℃〜300℃における比誘電率を測定した。結果を図9に示す。図9に示すように、実施例1〜4の圧電体層70は、比較例1〜2と比べて比誘電率が顕著に高く、比誘電率が320以上であった。具体的には、25℃での比誘電率は、図9に示すように、実施例1は370、実施例2は355、実施例3は325、実施例4は415であるのに対し、比較例1は205、比較例2は220であった。
実施例1〜4及び比較例1〜2の圧電素子について、Bruker AXS社製の「D8 Discover」を用い、X線源にCuKα線を使用し、室温で、圧電体層の粉末X線回折パターンをφ=ψ=0°で求めた。実施例1の結果を図10に、実施例2の結果を図11に、実施例3の結果を図12に、実施例4の結果を図13に、比較例1の結果を図14に、比較例2の結果を図15に示す。また、2次元検出画像の一例を、実施例1について図16に示す。
以上、本発明の一実施形態を説明したが、本発明の基本的構成は上述したものに限定されるものではない。例えば、圧電特性を良好にする等のために、Ni、Co、Cr、Sc、V等をさらに有する圧電材料からなる圧電体層としてもよい。
Claims (10)
- Bi、Fe、Mn、Ba及びTiを含有する金属化合物を含み且つオクチル酸鉄を含む前駆体溶液により圧電体前駆体膜を形成する工程と、前記圧電体前駆体膜を加熱して結晶化することにより(110)面に優先配向した圧電体膜を得る工程とを有することを特徴とする圧電体膜の製造方法。
- (111)面に配向している白金膜上に、前記圧電体前駆体膜を形成することを特徴とする請求項1に記載する圧電体膜の製造方法。
- 前記圧電体膜は、自然配向した膜であることを特徴とする請求項1又は2に記載する圧電体膜の製造方法。
- 前記前駆体溶液は、SiO2をさらに含むことを特徴とする請求項1〜3のいずれか一項に記載する圧電体膜の製造方法。
- 前記圧電体膜は、鉄酸マンガン酸ビスマス及びチタン酸バリウムを含むペロブスカイト型化合物を含有する圧電材料からなることを特徴とする請求項1〜3のいずれか一項に記載する圧電体膜の製造方法。
- 請求項1〜5のいずれか一項に記載する圧電体膜の製造方法により形成された圧電体膜と、前記圧電体膜に電圧を印加する電極とを有することを特徴とする圧電素子。
- 請求項6に記載する圧電素子を具備することを特徴とする液体噴射ヘッド。
- 請求項7に記載する液体噴射ヘッドを具備することを特徴とする液体噴射装置。
- 請求項6に記載する圧電素子を具備することを特徴とする超音波センサー。
- 請求項6に記載する圧電素子を具備することを特徴とする赤外センサー。
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EP20110156110 EP2363903B1 (en) | 2010-03-02 | 2011-02-25 | Method for manufacturing a piezoelectric film |
US13/037,600 US9034418B2 (en) | 2010-03-02 | 2011-03-01 | Method for manufacturing piezoelectric film |
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-
2011
- 2011-01-26 JP JP2011014618A patent/JP5716897B2/ja active Active
- 2011-02-25 EP EP20110156110 patent/EP2363903B1/en not_active Not-in-force
- 2011-03-01 CN CN201110050753XA patent/CN102194992B/zh not_active Expired - Fee Related
- 2011-03-01 US US13/037,600 patent/US9034418B2/en not_active Expired - Fee Related
Also Published As
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EP2363903B1 (en) | 2014-07-02 |
EP2363903A2 (en) | 2011-09-07 |
US20110217454A1 (en) | 2011-09-08 |
JP2011205063A (ja) | 2011-10-13 |
CN102194992A (zh) | 2011-09-21 |
CN102194992B (zh) | 2013-12-25 |
EP2363903A3 (en) | 2012-12-12 |
US9034418B2 (en) | 2015-05-19 |
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