JP5676528B2 - ボンディングパッド構造を有する裏面照射型センサーとその製造方法 - Google Patents
ボンディングパッド構造を有する裏面照射型センサーとその製造方法 Download PDFInfo
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- JP5676528B2 JP5676528B2 JP2012150602A JP2012150602A JP5676528B2 JP 5676528 B2 JP5676528 B2 JP 5676528B2 JP 2012150602 A JP2012150602 A JP 2012150602A JP 2012150602 A JP2012150602 A JP 2012150602A JP 5676528 B2 JP5676528 B2 JP 5676528B2
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Description
200 イメージ感知装置
210 装置基板
212 正面
214 背面
216 接合領域
217 シールド領域
218 感光領域
220 (光)センサー
222 シャロートレンチアイソレーション
230 相互接続構造
232 層間絶縁膜(ILD)層
234、236、238、240 配線間絶縁材料(IMD)層
242 金属層/第一金属層
244、246、248 金属層
250、284 パッシベーション層
260 キャリア基板
262、278、280 厚さ
263 反射防止膜
264、282 バッファ層
270 開口
270a 第一部分(第一トレンチ)
270b 第二部分(第二トレンチ)
272 誘電体メサ
274 ボンディングパッド
276 シールド構造
288 パッド開口
Claims (10)
- 半導体構造であって:
正面と背面を有する装置基板;
前記装置基板の前記正面に設置される相互接続構造;および
前記相互接続構造に接続されるボンディングパッドと、
を含み、
前記ボンディングパッドは:
誘電材料層中の凹部領域;
前記凹部領域間に挿入される前記誘電材料層の誘電体メサ;および
前記凹部領域中、且つ、誘電体メサ上に設置される金属層と、
を含み、
前記凹部領域は前記装置基板におけるシャロートレンチアイソレーション層に延伸していることを特徴とする半導体構造。 - 前記凹部領域は、前記誘電材料層中に形成される第一および第二トレンチを含み;および
前記誘電体メサは、前記第一と第二トレンチ間に挿入されることを特徴とする請求項1に記載の半導体構造。 - 前記凹部領域は、前記誘電材料層中に形成され、前記誘電体メサを囲むトレンチを含むことを特徴とする請求項1に記載の半導体構造。
- 前記金属層は、前記凹部領域内の前記相互接続構造の金属層と接触することを特徴とする請求項1に記載の半導体構造。
- さらに、前記金属層上に設置され、前記誘電体メサ中の一部の前記金属層上に位置するボンディングボールを含むことを特徴とする請求項1に記載の半導体構造。
- さらに、
前記装置基板の前記正面中に設置される裏面照射型センサーを含み、前記裏面照射型センサーは前記装置基板の前記背面から前記感光領域に入射する光線を感知する感光領域;
前記感光領域に隣接し、且つ、遮蔽層を含み、前記遮蔽層は金属を含み、前記装置基板の前記背面上に設置される遮光領域;および
前記ボンディングパッドを含む接合領域、
を含むことを特徴とする請求項1に記載の半導体構造。 - 半導体構造であって:
感光領域と接合領域、および、正面と背面を有する半導体基板;
前記感光領域中の前記半導体基板の前記正面に形成される光センサー;
前記半導体基板の前記正面上に位置し、前記光センサーを前記接合領域中の前記相互接続構造の金属層に結合する相互接続構造;
前記半導体基板と前記キャリア基板間に挟まれた前記相互接続構造を有する前記半導体基板の前記正面に接合されるキャリア基板;
前記半導体基板の前記背面上に位置し、前記接合領域中に形成され、誘電材料層から前記相互接続構造の前記金属層に延伸し、前記金属層上の前記誘電材料層の誘電体メサを定義する開口;および
前記接合領域中の前記半導体基板の前記背面上で、前記開口を部分的に充填し、前記相互接続構造の前記金属層と直接接触して、さらに、前記誘電体メサに延伸する金属層、
を含むことを特徴とする半導体構造。 - さらに、前記金属層上に位置し、前記誘電体メサと垂直に位置合わせするボンディングボールを有し、前記光センサーは裏面照射型イメージセンサーを含むことを特徴とする請求項7の半導体構造。
- 前記開口は、前記誘電材料層中に第一および第二トレンチを含み;
前記誘電体メサは、前記第一および第二トレンチ間に挿入されることを特徴とする請求項7に記載の半導体構造。 - 半導体装置の製造方法であって:
装置基板の正面中に光センサーを形成する工程;
前記装置基板の前記正面上に、前記光センサーに結合する相互接続構造を形成する工程;
キャリア基板を前記装置基板の背面に接合する工程;
前記装置基板の前記背面上で、誘電材料層をエッチングし、誘電材料層を通して延伸する開口を形成し、前記相互接続構造の金属層を露出して、これにより、前記開口により囲まれる前記誘電材料層の誘電体メサを定義する工程; および
前記開口中と前記誘電体メサ上に金属層を形成して、ボンディングパッドを形成し、前記ボンディングパッドが、直接、前記開口中の前記金属層と接触する工程、
を含むことを特徴とする製造方法。
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US13/177,686 | 2011-07-07 | ||
US13/177,686 US8435824B2 (en) | 2011-07-07 | 2011-07-07 | Backside illumination sensor having a bonding pad structure and method of making the same |
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JP2013021323A JP2013021323A (ja) | 2013-01-31 |
JP5676528B2 true JP5676528B2 (ja) | 2015-02-25 |
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JP2012150602A Active JP5676528B2 (ja) | 2011-07-07 | 2012-07-04 | ボンディングパッド構造を有する裏面照射型センサーとその製造方法 |
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US (1) | US8435824B2 (ja) |
JP (1) | JP5676528B2 (ja) |
KR (1) | KR101259724B1 (ja) |
CN (1) | CN102867832B (ja) |
DE (1) | DE102011056178B4 (ja) |
TW (1) | TWI585916B (ja) |
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