JP5656851B2 - 低分子量のヒドリドシランの精製法 - Google Patents
低分子量のヒドリドシランの精製法 Download PDFInfo
- Publication number
- JP5656851B2 JP5656851B2 JP2011533657A JP2011533657A JP5656851B2 JP 5656851 B2 JP5656851 B2 JP 5656851B2 JP 2011533657 A JP2011533657 A JP 2011533657A JP 2011533657 A JP2011533657 A JP 2011533657A JP 5656851 B2 JP5656851 B2 JP 5656851B2
- Authority
- JP
- Japan
- Prior art keywords
- membrane
- group
- hydridosilane
- separation step
- membrane separation
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 238000000034 method Methods 0.000 title claims description 76
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical class [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 title claims description 54
- 238000000746 purification Methods 0.000 title description 14
- 239000012528 membrane Substances 0.000 claims description 107
- 238000000926 separation method Methods 0.000 claims description 37
- -1 aromatic cyano compound Chemical class 0.000 claims description 27
- 230000008569 process Effects 0.000 claims description 23
- 239000012535 impurity Substances 0.000 claims description 22
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Natural products CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 claims description 20
- 239000003054 catalyst Substances 0.000 claims description 20
- 239000003446 ligand Substances 0.000 claims description 16
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical group [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 15
- 229910052751 metal Inorganic materials 0.000 claims description 15
- 239000002184 metal Substances 0.000 claims description 15
- 239000012466 permeate Substances 0.000 claims description 14
- 239000002904 solvent Substances 0.000 claims description 14
- 239000002815 homogeneous catalyst Substances 0.000 claims description 12
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 11
- 239000004642 Polyimide Substances 0.000 claims description 10
- 229910052759 nickel Inorganic materials 0.000 claims description 10
- 229920001721 polyimide Polymers 0.000 claims description 10
- 125000003118 aryl group Chemical group 0.000 claims description 9
- 125000004429 atom Chemical group 0.000 claims description 9
- 238000001728 nano-filtration Methods 0.000 claims description 9
- 125000000217 alkyl group Chemical group 0.000 claims description 8
- 230000015572 biosynthetic process Effects 0.000 claims description 8
- 229920002239 polyacrylonitrile Polymers 0.000 claims description 8
- 239000004205 dimethyl polysiloxane Substances 0.000 claims description 7
- 239000001257 hydrogen Substances 0.000 claims description 7
- 229910052739 hydrogen Inorganic materials 0.000 claims description 7
- 238000004519 manufacturing process Methods 0.000 claims description 7
- 229920000435 poly(dimethylsiloxane) Polymers 0.000 claims description 7
- 229920000548 poly(silane) polymer Polymers 0.000 claims description 7
- 229920000642 polymer Polymers 0.000 claims description 7
- 239000004696 Poly ether ether ketone Substances 0.000 claims description 6
- 150000001875 compounds Chemical class 0.000 claims description 6
- 229920002530 polyetherether ketone Polymers 0.000 claims description 6
- 229910052703 rhodium Inorganic materials 0.000 claims description 6
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims description 5
- 229910052741 iridium Inorganic materials 0.000 claims description 5
- 229910052762 osmium Inorganic materials 0.000 claims description 5
- 229910052763 palladium Inorganic materials 0.000 claims description 5
- 230000000737 periodic effect Effects 0.000 claims description 5
- 229910052697 platinum Inorganic materials 0.000 claims description 5
- 229910052702 rhenium Inorganic materials 0.000 claims description 5
- 229910052707 ruthenium Inorganic materials 0.000 claims description 5
- 239000002033 PVDF binder Substances 0.000 claims description 4
- 239000004952 Polyamide Substances 0.000 claims description 4
- 239000004693 Polybenzimidazole Substances 0.000 claims description 4
- 229920002614 Polyether block amide Polymers 0.000 claims description 4
- 239000004697 Polyetherimide Substances 0.000 claims description 4
- 229920002367 Polyisobutene Polymers 0.000 claims description 4
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 claims description 4
- 229910002091 carbon monoxide Inorganic materials 0.000 claims description 4
- 229920002301 cellulose acetate Polymers 0.000 claims description 4
- 239000000919 ceramic Substances 0.000 claims description 4
- 125000000058 cyclopentadienyl group Chemical group C1(=CC=CC1)* 0.000 claims description 4
- ZSWFCLXCOIISFI-UHFFFAOYSA-N endo-cyclopentadiene Natural products C1C=CC=C1 ZSWFCLXCOIISFI-UHFFFAOYSA-N 0.000 claims description 4
- 229910052747 lanthanoid Inorganic materials 0.000 claims description 4
- 150000002602 lanthanoids Chemical class 0.000 claims description 4
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 claims description 4
- 230000003204 osmotic effect Effects 0.000 claims description 4
- 229920002492 poly(sulfone) Polymers 0.000 claims description 4
- 229920002647 polyamide Polymers 0.000 claims description 4
- 229920002480 polybenzimidazole Polymers 0.000 claims description 4
- 229920001601 polyetherimide Polymers 0.000 claims description 4
- 229920002981 polyvinylidene fluoride Polymers 0.000 claims description 4
- 238000003786 synthesis reaction Methods 0.000 claims description 4
- BGHCVCJVXZWKCC-UHFFFAOYSA-N tetradecane Chemical compound CCCCCCCCCCCCCC BGHCVCJVXZWKCC-UHFFFAOYSA-N 0.000 claims description 4
- 229910052684 Cerium Inorganic materials 0.000 claims description 3
- 229910052692 Dysprosium Inorganic materials 0.000 claims description 3
- 229910052691 Erbium Inorganic materials 0.000 claims description 3
- 229910052693 Europium Inorganic materials 0.000 claims description 3
- 229910052688 Gadolinium Inorganic materials 0.000 claims description 3
- 229910052689 Holmium Inorganic materials 0.000 claims description 3
- 229910052765 Lutetium Inorganic materials 0.000 claims description 3
- 229910052779 Neodymium Inorganic materials 0.000 claims description 3
- 239000004372 Polyvinyl alcohol Substances 0.000 claims description 3
- 229910052777 Praseodymium Inorganic materials 0.000 claims description 3
- 229910052772 Samarium Inorganic materials 0.000 claims description 3
- 229910052771 Terbium Inorganic materials 0.000 claims description 3
- 229910052775 Thulium Inorganic materials 0.000 claims description 3
- 229910052769 Ytterbium Inorganic materials 0.000 claims description 3
- 150000001336 alkenes Chemical class 0.000 claims description 3
- 229910052736 halogen Inorganic materials 0.000 claims description 3
- 229910052742 iron Inorganic materials 0.000 claims description 3
- 229920002451 polyvinyl alcohol Polymers 0.000 claims description 3
- 238000001223 reverse osmosis Methods 0.000 claims description 3
- 150000003623 transition metal compounds Chemical class 0.000 claims description 3
- 238000000108 ultra-filtration Methods 0.000 claims description 3
- NLHHRLWOUZZQLW-UHFFFAOYSA-N Acrylonitrile Chemical compound C=CC#N NLHHRLWOUZZQLW-UHFFFAOYSA-N 0.000 claims description 2
- 229920003171 Poly (ethylene oxide) Polymers 0.000 claims description 2
- 229920012266 Poly(ether sulfone) PES Polymers 0.000 claims description 2
- 229910000831 Steel Inorganic materials 0.000 claims description 2
- 150000003973 alkyl amines Chemical class 0.000 claims description 2
- 125000005157 alkyl carboxy group Chemical group 0.000 claims description 2
- 150000001343 alkyl silanes Chemical class 0.000 claims description 2
- 125000004414 alkyl thio group Chemical group 0.000 claims description 2
- 150000001408 amides Chemical class 0.000 claims description 2
- 150000004982 aromatic amines Chemical class 0.000 claims description 2
- 125000005110 aryl thio group Chemical group 0.000 claims description 2
- 125000004104 aryloxy group Chemical group 0.000 claims description 2
- 229920002678 cellulose Polymers 0.000 claims description 2
- 239000001913 cellulose Substances 0.000 claims description 2
- VOZRXNHHFUQHIL-UHFFFAOYSA-N glycidyl methacrylate Chemical compound CC(=C)C(=O)OCC1CO1 VOZRXNHHFUQHIL-UHFFFAOYSA-N 0.000 claims description 2
- 150000002367 halogens Chemical group 0.000 claims description 2
- 229910052750 molybdenum Inorganic materials 0.000 claims description 2
- 239000012454 non-polar solvent Substances 0.000 claims description 2
- JRZJOMJEPLMPRA-UHFFFAOYSA-N olefin Natural products CCCCCCCC=C JRZJOMJEPLMPRA-UHFFFAOYSA-N 0.000 claims description 2
- 230000035515 penetration Effects 0.000 claims description 2
- 239000002798 polar solvent Substances 0.000 claims description 2
- 229920000058 polyacrylate Polymers 0.000 claims description 2
- 229920002312 polyamide-imide Polymers 0.000 claims description 2
- 239000004417 polycarbonate Substances 0.000 claims description 2
- 229920000515 polycarbonate Polymers 0.000 claims description 2
- 229920001296 polysiloxane Polymers 0.000 claims description 2
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 claims description 2
- 125000006850 spacer group Chemical group 0.000 claims description 2
- 239000010959 steel Substances 0.000 claims description 2
- 230000002194 synthesizing effect Effects 0.000 claims description 2
- 229910052721 tungsten Inorganic materials 0.000 claims description 2
- 239000004721 Polyphenylene oxide Substances 0.000 claims 2
- 125000002877 alkyl aryl group Chemical group 0.000 claims 2
- 229920006380 polyphenylene oxide Polymers 0.000 claims 2
- 150000002431 hydrogen Chemical class 0.000 claims 1
- 125000003944 tolyl group Chemical group 0.000 claims 1
- XYFCBTPGUUZFHI-UHFFFAOYSA-N Phosphine Chemical compound P XYFCBTPGUUZFHI-UHFFFAOYSA-N 0.000 description 14
- PXHVJJICTQNCMI-UHFFFAOYSA-N nickel Substances [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 12
- 239000011541 reaction mixture Substances 0.000 description 12
- 229910000073 phosphorus hydride Inorganic materials 0.000 description 10
- 239000007789 gas Substances 0.000 description 9
- 125000005842 heteroatom Chemical group 0.000 description 7
- 239000000203 mixture Substances 0.000 description 7
- 238000006243 chemical reaction Methods 0.000 description 6
- 239000000376 reactant Substances 0.000 description 6
- 150000001335 aliphatic alkanes Chemical class 0.000 description 5
- 239000010703 silicon Substances 0.000 description 5
- 229910052710 silicon Inorganic materials 0.000 description 5
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 4
- 230000001681 protective effect Effects 0.000 description 4
- 239000010948 rhodium Substances 0.000 description 4
- 150000004756 silanes Chemical class 0.000 description 4
- RRKODOZNUZCUBN-CCAGOZQPSA-N (1z,3z)-cycloocta-1,3-diene Chemical compound C1CC\C=C/C=C\C1 RRKODOZNUZCUBN-CCAGOZQPSA-N 0.000 description 3
- ROFVEXUMMXZLPA-UHFFFAOYSA-N Bipyridyl Chemical group N1=CC=CC=C1C1=CC=CC=N1 ROFVEXUMMXZLPA-UHFFFAOYSA-N 0.000 description 3
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 3
- 238000010586 diagram Methods 0.000 description 3
- 230000014759 maintenance of location Effects 0.000 description 3
- 229910052698 phosphorus Inorganic materials 0.000 description 3
- 239000011574 phosphorus Substances 0.000 description 3
- 239000000047 product Substances 0.000 description 3
- 229910000067 stibane Inorganic materials 0.000 description 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- 229910052783 alkali metal Inorganic materials 0.000 description 2
- 150000001340 alkali metals Chemical class 0.000 description 2
- 229910052786 argon Inorganic materials 0.000 description 2
- 230000008901 benefit Effects 0.000 description 2
- 239000006227 byproduct Substances 0.000 description 2
- 239000007795 chemical reaction product Substances 0.000 description 2
- 238000005695 dehalogenation reaction Methods 0.000 description 2
- 238000004821 distillation Methods 0.000 description 2
- 150000002170 ethers Chemical class 0.000 description 2
- 239000010408 film Substances 0.000 description 2
- 125000000623 heterocyclic group Chemical group 0.000 description 2
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 2
- 238000006068 polycondensation reaction Methods 0.000 description 2
- 239000002243 precursor Substances 0.000 description 2
- 239000012264 purified product Substances 0.000 description 2
- 238000004064 recycling Methods 0.000 description 2
- 238000003849 solvent resist ant nanofiltration Methods 0.000 description 2
- 238000001179 sorption measurement Methods 0.000 description 2
- 239000010409 thin film Substances 0.000 description 2
- 229910052723 transition metal Inorganic materials 0.000 description 2
- 150000003624 transition metals Chemical class 0.000 description 2
- RIOQSEWOXXDEQQ-UHFFFAOYSA-N triphenylphosphine Chemical compound C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1 RIOQSEWOXXDEQQ-UHFFFAOYSA-N 0.000 description 2
- SHWZFQPXYGHRKT-FDGPNNRMSA-N (z)-4-hydroxypent-3-en-2-one;nickel Chemical compound [Ni].C\C(O)=C\C(C)=O.C\C(O)=C\C(C)=O SHWZFQPXYGHRKT-FDGPNNRMSA-N 0.000 description 1
- BWLBGMIXKSTLSX-UHFFFAOYSA-N 2-hydroxyisobutyric acid Chemical compound CC(C)(O)C(O)=O BWLBGMIXKSTLSX-UHFFFAOYSA-N 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 description 1
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical class CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 1
- 229910021536 Zeolite Inorganic materials 0.000 description 1
- 239000006096 absorbing agent Substances 0.000 description 1
- 239000003463 adsorbent Substances 0.000 description 1
- 150000001345 alkine derivatives Chemical class 0.000 description 1
- 150000008064 anhydrides Chemical class 0.000 description 1
- 150000001491 aromatic compounds Chemical class 0.000 description 1
- 150000008378 aryl ethers Chemical class 0.000 description 1
- RWCCWEUUXYIKHB-UHFFFAOYSA-N benzophenone Chemical compound C=1C=CC=CC=1C(=O)C1=CC=CC=C1 RWCCWEUUXYIKHB-UHFFFAOYSA-N 0.000 description 1
- 239000012965 benzophenone Substances 0.000 description 1
- 125000002619 bicyclic group Chemical group 0.000 description 1
- MUALRAIOVNYAIW-UHFFFAOYSA-N binap Chemical group C1=CC=CC=C1P(C=1C(=C2C=CC=CC2=CC=1)C=1C2=CC=CC=C2C=CC=1P(C=1C=CC=CC=1)C=1C=CC=CC=1)C1=CC=CC=C1 MUALRAIOVNYAIW-UHFFFAOYSA-N 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 238000006555 catalytic reaction Methods 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 125000004122 cyclic group Chemical group 0.000 description 1
- 238000000354 decomposition reaction Methods 0.000 description 1
- 230000018044 dehydration Effects 0.000 description 1
- 238000006297 dehydration reaction Methods 0.000 description 1
- HNPSIPDUKPIQMN-UHFFFAOYSA-N dioxosilane;oxo(oxoalumanyloxy)alumane Chemical compound O=[Si]=O.O=[Al]O[Al]=O HNPSIPDUKPIQMN-UHFFFAOYSA-N 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 150000002148 esters Chemical class 0.000 description 1
- 238000004817 gas chromatography Methods 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- GCOJIFYUTTYXOF-UHFFFAOYSA-N hexasilinane Chemical compound [SiH2]1[SiH2][SiH2][SiH2][SiH2][SiH2]1 GCOJIFYUTTYXOF-UHFFFAOYSA-N 0.000 description 1
- 229930195733 hydrocarbon Natural products 0.000 description 1
- 238000011065 in-situ storage Methods 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 150000002576 ketones Chemical class 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 239000007791 liquid phase Substances 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- LYGJENNIWJXYER-UHFFFAOYSA-N nitromethane Chemical class C[N+]([O-])=O LYGJENNIWJXYER-UHFFFAOYSA-N 0.000 description 1
- 150000002894 organic compounds Chemical class 0.000 description 1
- 238000006053 organic reaction Methods 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- CVLHDNLPWKYNNR-UHFFFAOYSA-N pentasilolane Chemical compound [SiH2]1[SiH2][SiH2][SiH2][SiH2]1 CVLHDNLPWKYNNR-UHFFFAOYSA-N 0.000 description 1
- DOBUHXUCKMAKSP-UHFFFAOYSA-N pentasilolanylsilane Chemical compound [SiH3][SiH]1[SiH2][SiH2][SiH2][SiH2]1 DOBUHXUCKMAKSP-UHFFFAOYSA-N 0.000 description 1
- OJMIONKXNSYLSR-UHFFFAOYSA-N phosphorous acid Chemical compound OP(O)O OJMIONKXNSYLSR-UHFFFAOYSA-N 0.000 description 1
- 125000003367 polycyclic group Chemical group 0.000 description 1
- 229920005597 polymer membrane Polymers 0.000 description 1
- 150000008442 polyphenolic compounds Chemical class 0.000 description 1
- 235000013824 polyphenols Nutrition 0.000 description 1
- 229920005619 polysilyne Polymers 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- RUOJZAUFBMNUDX-UHFFFAOYSA-N propylene carbonate Chemical compound CC1COC(=O)O1 RUOJZAUFBMNUDX-UHFFFAOYSA-N 0.000 description 1
- 229910052761 rare earth metal Inorganic materials 0.000 description 1
- 230000035484 reaction time Effects 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- MHOVAHRLVXNVSD-UHFFFAOYSA-N rhodium atom Chemical compound [Rh] MHOVAHRLVXNVSD-UHFFFAOYSA-N 0.000 description 1
- SVOOVMQUISJERI-UHFFFAOYSA-K rhodium(3+);triacetate Chemical class [Rh+3].CC([O-])=O.CC([O-])=O.CC([O-])=O SVOOVMQUISJERI-UHFFFAOYSA-K 0.000 description 1
- 229910052706 scandium Inorganic materials 0.000 description 1
- SIXSYDAISGFNSX-UHFFFAOYSA-N scandium atom Chemical compound [Sc] SIXSYDAISGFNSX-UHFFFAOYSA-N 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 229910000077 silane Inorganic materials 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 235000012239 silicon dioxide Nutrition 0.000 description 1
- XJKVPKYVPCWHFO-UHFFFAOYSA-N silicon;hydrate Chemical compound O.[Si] XJKVPKYVPCWHFO-UHFFFAOYSA-N 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 150000003512 tertiary amines Chemical class 0.000 description 1
- CZDYPVPMEAXLPK-UHFFFAOYSA-N tetramethylsilane Chemical group C[Si](C)(C)C CZDYPVPMEAXLPK-UHFFFAOYSA-N 0.000 description 1
- 229910052727 yttrium Inorganic materials 0.000 description 1
- VWQVUPCCIRVNHF-UHFFFAOYSA-N yttrium atom Chemical compound [Y] VWQVUPCCIRVNHF-UHFFFAOYSA-N 0.000 description 1
- 239000010457 zeolite Substances 0.000 description 1
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/04—Hydrides of silicon
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/04—Hydrides of silicon
- C01B33/046—Purification
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D61/00—Processes of separation using semi-permeable membranes, e.g. dialysis, osmosis or ultrafiltration; Apparatus, accessories or auxiliary operations specially adapted therefor
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P20/00—Technologies relating to chemical industry
- Y02P20/50—Improvements relating to the production of bulk chemicals
- Y02P20/582—Recycling of unreacted starting or intermediate materials
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Inorganic Chemistry (AREA)
- Separation Using Semi-Permeable Membranes (AREA)
- Silicon Compounds (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
- Catalysts (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE102008043422A DE102008043422B3 (de) | 2008-11-03 | 2008-11-03 | Verfahren zur Aufreinigung niedermolekularer Hydridosilane |
| DE102008043422.1 | 2008-11-03 | ||
| PCT/EP2009/063135 WO2010060676A1 (de) | 2008-11-03 | 2009-10-09 | Verfahren zur aufreinigung niedermolekularer hydridosilane |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2012507455A JP2012507455A (ja) | 2012-03-29 |
| JP2012507455A5 JP2012507455A5 (enExample) | 2014-07-31 |
| JP5656851B2 true JP5656851B2 (ja) | 2015-01-21 |
Family
ID=41396957
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2011533657A Expired - Fee Related JP5656851B2 (ja) | 2008-11-03 | 2009-10-09 | 低分子量のヒドリドシランの精製法 |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US8889009B2 (enExample) |
| EP (1) | EP2342163B1 (enExample) |
| JP (1) | JP5656851B2 (enExample) |
| CN (1) | CN102203008B (enExample) |
| DE (1) | DE102008043422B3 (enExample) |
| TW (1) | TWI458681B (enExample) |
| WO (1) | WO2010060676A1 (enExample) |
Families Citing this family (32)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE102007054885A1 (de) * | 2007-11-15 | 2009-05-20 | Evonik Degussa Gmbh | Verfahren zur Fraktionierung oxidischer Nanopartikel durch Querstrom-Membranfiltration |
| DE102009001225A1 (de) | 2009-02-27 | 2010-09-02 | Evonik Oxeno Gmbh | Verfahren zur Anreicherung eines Homogenkatalysators aus einem Prozessstrom |
| DE102009001230A1 (de) | 2009-02-27 | 2010-09-02 | Evonik Oxeno Gmbh | Verfahren zur Abtrennung und teilweiser Rückführung von Übergangsmetallen bzw. deren katalytisch wirksamen Komplexverbindungen aus Prozessströmen |
| DE102009002758A1 (de) | 2009-04-30 | 2010-11-11 | Evonik Degussa Gmbh | Bandgap Tailoring von Solarzellen aus Flüssigsilan mittels Germanium-Zugabe |
| DE102009048087A1 (de) | 2009-10-02 | 2011-04-07 | Evonik Degussa Gmbh | Verfahren zur Herstellung höherer Hydridosilane |
| DE102009053806A1 (de) | 2009-11-18 | 2011-05-19 | Evonik Degussa Gmbh | Verfahren zur Herstellung von Siliciumschichten |
| DE102009053804B3 (de) | 2009-11-18 | 2011-03-17 | Evonik Degussa Gmbh | Verfahren zur Herstellung von Hydridosilanen |
| DE102009047351A1 (de) | 2009-12-01 | 2011-06-09 | Evonik Goldschmidt Gmbh | Komposit-Siliconmembranen mit hoher Trennwirkung |
| DE102010002405A1 (de) | 2010-02-26 | 2011-09-01 | Evonik Degussa Gmbh | Verfahren zur Oligomerisierung von Hydridosilanen, die mit dem Verfahren herstellbaren Oligomerisate und ihre Verwendung |
| DE102010040231A1 (de) | 2010-09-03 | 2012-03-08 | Evonik Degussa Gmbh | p-Dotierte Siliciumschichten |
| DE102010041842A1 (de) | 2010-10-01 | 2012-04-05 | Evonik Degussa Gmbh | Verfahren zur Herstellung höherer Hydridosilanverbindungen |
| DE102010062984A1 (de) | 2010-12-14 | 2012-06-14 | Evonik Degussa Gmbh | Verfahren zur Herstellung höherer Halogen- und Hydridosilane |
| DE102010063823A1 (de) | 2010-12-22 | 2012-06-28 | Evonik Degussa Gmbh | Verfahren zur Herstellung von Hydridosilanen |
| US12350627B2 (en) | 2013-02-28 | 2025-07-08 | Aqua Membranes, Inc. | Permeate flow patterns |
| CN106348303A (zh) * | 2015-07-14 | 2017-01-25 | 天津大学 | 化学分解法提纯硅烷的方法 |
| IL265376B2 (en) | 2016-09-20 | 2024-08-01 | Aqua Membranes Llc | Permeate flow patterns |
| KR20190052711A (ko) * | 2016-10-27 | 2019-05-16 | 쇼와 덴코 가부시키가이샤 | 올리고실란의 제조 방법 및 올리고실란의 제조 장치 |
| US11040311B2 (en) | 2016-11-19 | 2021-06-22 | Aqua Membranes Inc. | Interference patterns for spiral wound elements |
| CN106362438B (zh) * | 2016-11-22 | 2019-02-15 | 新奥生态环境治理有限公司 | 油水分离膜及其应用 |
| WO2018190937A1 (en) | 2017-04-12 | 2018-10-18 | Aqua Membranes Llc | Graded spacers for filtration wound elements |
| WO2018195367A1 (en) | 2017-04-20 | 2018-10-25 | Aqua Membranes Llc | Mixing-promoting spacer patterns for spiral-wound elements |
| WO2018194911A1 (en) | 2017-04-20 | 2018-10-25 | Aqua Membranes Llc | Non-nesting, non-deforming patterns for spiral-wound elements |
| CN111344053A (zh) | 2017-10-13 | 2020-06-26 | 阿夸曼布拉尼斯公司 | 螺旋缠绕元件的桥支撑件和减少的进给间隔件 |
| CN108031301B (zh) * | 2017-12-28 | 2020-12-11 | 三明学院 | Maps改性二氧化硅填充pim-1复合膜及其制备方法 |
| CN110357109B (zh) * | 2018-04-11 | 2022-12-30 | 台湾特品化学股份有限公司 | 硅丙烷合成及过滤纯化的系统 |
| CN108889128A (zh) * | 2018-07-26 | 2018-11-27 | 四川美富特水务有限责任公司 | 一种聚酰胺复合反渗透膜的制备方法 |
| US11401166B2 (en) * | 2018-10-11 | 2022-08-02 | L'Air Liaquide, Société Anonyme pour l'Etude et l'Exploitation des Procédés Georges Claude | Process for producing isomer enriched higher silanes |
| JP7667081B2 (ja) | 2019-01-27 | 2025-04-22 | アクア メンブレインズ，インコーポレイテッド | 複合膜 |
| CN112213403A (zh) * | 2019-07-11 | 2021-01-12 | 东泰高科装备科技有限公司 | 一种砷烷在线检测装置和检测方法 |
| US12303838B2 (en) | 2019-08-06 | 2025-05-20 | Aqua Membranes, Inc. | Preferred flow paths for spiral-wound elements |
| WO2021207256A1 (en) | 2020-04-07 | 2021-10-14 | Aqua Membranes Inc. | Independent spacers and methods |
| WO2023129904A2 (en) | 2021-12-28 | 2023-07-06 | Aqua Membranes, Inc. | Spiral element construction yielding enhanced capacity |
Family Cites Families (74)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB2077710B (en) * | 1980-06-11 | 1983-10-12 | Nat Res Dev | Synthesising a polysilane |
| CH676676A5 (enExample) * | 1987-08-28 | 1991-02-28 | Bucher Guyer Ag Masch | |
| JPH01184513A (ja) * | 1988-01-20 | 1989-07-24 | Natl Space Dev Agency Japan<Nasda> | 自力式圧力調節弁の圧力調整装置 |
| DE3820294C1 (enExample) | 1988-06-15 | 1989-10-05 | Th. Goldschmidt Ag, 4300 Essen, De | |
| US4941893B1 (en) * | 1989-09-19 | 1996-07-30 | Advanced Silicon Materials Inc | Gas separation by semi-permeable membranes |
| DE3933420C1 (enExample) | 1989-10-06 | 1991-03-07 | Th. Goldschmidt Ag, 4300 Essen, De | |
| US4965386A (en) * | 1990-03-26 | 1990-10-23 | E. I. Du Pont De Nemours And Company | Hydrosilation, and dehydrocondensation of silicon hydrides, catalyzed by scandium, yttrium and rare earth metal compounds |
| DE4009889C1 (enExample) | 1990-03-28 | 1991-06-13 | Th. Goldschmidt Ag, 4300 Essen, De | |
| US5260402A (en) | 1990-06-21 | 1993-11-09 | Th. Goldschmidt Ag | Curable organopolysiloxanes with oxyalkylene ether groups linked through SiOC groups, their synthesis and use |
| US5252766A (en) * | 1990-09-14 | 1993-10-12 | Director-General Of Agency Of Industrial Science | Method for producing polysilanes |
| FR2710044B1 (fr) * | 1993-09-17 | 1995-10-13 | Air Liquide | Procédé de séparation d'un hydrure gazeux ou d'un mélange d'hydrures gazeux à l'aide d'une membrane. |
| US6027705A (en) * | 1998-01-08 | 2000-02-22 | Showa Denko K.K. | Method for producing a higher silane |
| KR100338136B1 (ko) | 1998-03-03 | 2002-05-24 | 울프 크라스텐센, 스트라쎄 로텐베르그 | 오르가노폴리실록산 및 오르가노폴리실록산의 제조방법 |
| DE19836246A1 (de) | 1998-08-11 | 2000-02-24 | Goldschmidt Ag Th | Strahlenhärtbare Beschichtungsmassen |
| EP1035126A3 (en) * | 1999-03-11 | 2002-05-29 | Crompton Corporation | Promoted hydrosilation reactions |
| WO2000059014A1 (fr) * | 1999-03-30 | 2000-10-05 | Seiko Epson Corporation | cROCEDE PRODUCTION D'UN FILM DE SILICIUM ET COMPOSITION D'ENCRE POUR IMPRIMANTE A JET D'ENCRE |
| US6331329B1 (en) * | 1999-05-17 | 2001-12-18 | University Of Massachusetts | Surface modification using hydridosilanes to prepare monolayers |
| JP4369153B2 (ja) | 2002-05-16 | 2009-11-18 | 株式会社神鋼環境ソリューション | 膜分離装置及び膜分離方法 |
| CN1496990A (zh) * | 2002-10-07 | 2004-05-19 | 通用电气公司 | 制备含环氧乙烷有机硅组合物的方法 |
| DE10248111A1 (de) | 2002-10-15 | 2004-04-29 | Goldschmidt Ag | Verwendung von Photoinitiatoren vom Typ Hydroxyalkylphenon in strahlenhärtbaren Organopolysiloxanen für die Herstellung von abhäsiven Beschichtungen |
| DE10341137A1 (de) | 2003-09-06 | 2005-03-31 | Goldschmidt Ag | Verwendung von hydroxyfunktionellen Polyalkylorganosiloxanen als Lösungsmittel für kationische Photoinitiatoren für die Verwendung in strahlenhärtbaren Siliconen |
| DE10359764A1 (de) | 2003-12-19 | 2005-07-14 | Goldschmidt Ag | Polysiloxane mit über SiOC-Gruppen gebundenen (Meth)acrylsäureestergruppen, Verfahren zu deren Herstellung sowie deren Verwendung als strahlenhärtbare abhäsive Beschichtung |
| DE102005001041A1 (de) | 2005-01-07 | 2006-07-20 | Goldschmidt Gmbh | Neuartige Siloxanblockcopolymere |
| DE102005001039B4 (de) | 2005-01-07 | 2017-11-09 | Evonik Degussa Gmbh | Verfahren zur Herstellung von Äquilibrierungsprodukten von Organosiloxanen und die so erhältlichen Organopolysiloxane |
| US7910371B2 (en) | 2005-01-20 | 2011-03-22 | Nalco Company | Method of monitoring treating agent residuals in water treatment processes |
| DE102005004706A1 (de) | 2005-02-02 | 2006-08-10 | Goldschmidt Gmbh | UV-Licht absorbierende quaternäre Polysiloxane |
| DE102005043742A1 (de) | 2005-09-14 | 2007-03-22 | Goldschmidt Gmbh | Verwendung von Epoxy-funktionellen Silanen als Haftungsadditiv für kationisch strahlenhärtende Silikontrennbeschichtungen |
| DE102005046250B4 (de) | 2005-09-27 | 2020-10-08 | Evonik Operations Gmbh | Anlage zur Abtrennung von organischen Übergangsmetallkomplexkatalysatoren |
| DE102005051939A1 (de) | 2005-10-29 | 2007-05-03 | Goldschmidt Gmbh | Verfahren zur Herstellung von organisch modifizierten Polyorganosiloxanen |
| DE102005056246A1 (de) | 2005-11-25 | 2007-06-06 | Goldschmidt Gmbh | Gepfropfte Polyether-Copolymerisate und deren Verwendung zur Stabilisierung von Schaumstoffen |
| US20070131611A1 (en) | 2005-12-13 | 2007-06-14 | General Electric Company | Membrane-based article and associated method |
| DE102005061782A1 (de) | 2005-12-23 | 2007-06-28 | Goldschmidt Gmbh | Silikonhaltige Pfropfmischpolymere auf Basis styroloxidbasierter Silikonpolyether |
| DE102006003618A1 (de) * | 2006-01-26 | 2007-08-02 | Oxeno Olefinchemie Gmbh | Verfahren zur Abtrennung von Metall-Komplexkatalysatoren aus Telomerisationsgemischen |
| DE102006005100A1 (de) | 2006-02-04 | 2007-08-09 | Goldschmidt Gmbh | Verfahren zur Herstellung organomodifizierter Siloxane |
| DE102006008387A1 (de) | 2006-02-21 | 2007-08-30 | Goldschmidt Gmbh | Verfahren zur Herstellung von siloxanhaltigen Trennbeschichtungen |
| DE102006027339A1 (de) | 2006-06-13 | 2007-12-20 | Goldschmidt Gmbh | Kationisch strahlenhärtende Controlled Release Beschichtungsmassen |
| DE102007023763A1 (de) | 2006-08-10 | 2008-02-14 | Evonik Degussa Gmbh | Anlage, Reaktor und Verfahren zur kontinuierlichen industriellen Herstellung von Polyetheralkylalkoxysilanen |
| DE102007023759A1 (de) | 2006-08-10 | 2008-02-14 | Evonik Degussa Gmbh | Anlage und Verfahren zur kontinuierlichen industriellen Herstellung von Fluoralkylchlorsilan |
| DE102007023760A1 (de) | 2006-08-10 | 2008-02-14 | Evonik Degussa Gmbh | Anlage, Reaktor und Verfahren zur kontinuierlichen industriellen Herstellung von 3-Methacryloxypropylalkoxysilanen |
| DE102007023762A1 (de) | 2006-08-10 | 2008-02-14 | Evonik Degussa Gmbh | Anlage und Verfahren zur kontinuierlichen industriellen Herstellung von 3-Glycidyloxypropylalkoxysilanen |
| DE102006041088A1 (de) | 2006-09-01 | 2008-03-06 | Evonik Goldschmidt Gmbh | Siliconhaltige, blockweise aufgebaute Pfropfmischpolymere |
| DE102006041089A1 (de) | 2006-09-01 | 2008-03-06 | Evonik Goldschmidt Gmbh | Verwendung von gepfropften Polyethersiloxanmischpolymeren zur Verbesserung der Kältestabilität von Entschäumern in wässrigen Dispersionen |
| DE102006041971A1 (de) | 2006-09-07 | 2008-03-27 | Evonik Goldschmidt Gmbh | Verwendung von partikulären Emulgatoren in abhäsiven siloxanhaltigen Beschichtungsmassen |
| DE102007005508A1 (de) | 2007-02-03 | 2008-08-07 | Evonik Goldschmidt Gmbh | Verfahren zur Reduktion des Trennwert-Anstiegs bei der Herstellung von No-Label-Look-Etiketten |
| DE102007007185A1 (de) | 2007-02-09 | 2008-08-14 | Evonik Degussa Gmbh | Verfahren zur Herstellung von Glycidyloxyalkyltrialkoxysilanen |
| TW200835548A (en) | 2007-02-16 | 2008-09-01 | Bp Corp North America Inc | Separation process using aromatic-selective polymeric membranes |
| DE102007014107A1 (de) | 2007-03-21 | 2008-09-25 | Evonik Degussa Gmbh | Aufarbeitung borhaltiger Chlorsilanströme |
| DE102007041028A1 (de) | 2007-08-29 | 2009-03-05 | Evonik Goldschmidt Gmbh | Verwendung estermodifizierter Organopolysiloxane zur Herstellung kosmetischer oder pharmazeutischer Kompositionen |
| DE102007044148A1 (de) | 2007-09-15 | 2009-03-26 | Evonik Goldschmidt Gmbh | Neuartige siloxanhaltige Blockcopolymere, Verfahren zu deren Herstellung und deren Verwendung für Schmiermittel |
| DE102007054885A1 (de) | 2007-11-15 | 2009-05-20 | Evonik Degussa Gmbh | Verfahren zur Fraktionierung oxidischer Nanopartikel durch Querstrom-Membranfiltration |
| DE102008000243A1 (de) | 2008-02-06 | 2009-08-13 | Evonik Goldschmidt Gmbh | Neuartige Kompatibilisierungsmittel zur Verbesserung der Lagerstabilität von Polyolmischungen |
| DE102008000287A1 (de) | 2008-02-13 | 2009-08-20 | Evonik Goldschmidt Gmbh | Reaktives, flüssiges Keramikbindemittel |
| DE102008001786A1 (de) | 2008-05-15 | 2009-11-26 | Evonik Goldschmidt Gmbh | Verwendung organomodifizierter Siloxanblockcopolymere als Pflegewirkstoff zur Pflege von menschlichen oder tierischen Körperteilen |
| DE102008001788A1 (de) | 2008-05-15 | 2009-11-26 | Evonik Goldschmidt Gmbh | Verwendung organomodifizierter Siloxanblockcopolymere zur Herstellung kosmetischer oder pharmazeutischer Zusammensetzungen |
| DE102008040986A1 (de) | 2008-08-05 | 2010-02-11 | Evonik Goldschmidt Gmbh | Hydrophobierung von Bauelementen aus Mineralfasern |
| DE102008041601A1 (de) | 2008-08-27 | 2010-03-04 | Evonik Goldschmidt Gmbh | Verfahren zur Herstellung verzweigter SiH-funtioneller Polysiloxane und deren Verwendung zur Herstellung flüssiger, SiC- oder SiOC-verknüpfter, verzweigter organomodifizierter Polysiloxane |
| DE102008041870A1 (de) | 2008-09-08 | 2010-03-11 | Evonik Degussa Gmbh | Reaktor mit Titansilikat-Rezyklierung |
| DE102008042381A1 (de) | 2008-09-26 | 2010-04-01 | Evonik Goldschmidt Gmbh | Emulgator-Systeme für kosmetische und pharmazeutische Öl-in-Wasser-Emulsionen |
| AU2009304193B2 (en) | 2008-10-17 | 2014-08-28 | Evonik Operations Gmbh | Agrochemical oil compositions comprising alkylpolysiloxane adjuvants of high silicone character |
| DE102009001225A1 (de) | 2009-02-27 | 2010-09-02 | Evonik Oxeno Gmbh | Verfahren zur Anreicherung eines Homogenkatalysators aus einem Prozessstrom |
| DE102009001230A1 (de) | 2009-02-27 | 2010-09-02 | Evonik Oxeno Gmbh | Verfahren zur Abtrennung und teilweiser Rückführung von Übergangsmetallen bzw. deren katalytisch wirksamen Komplexverbindungen aus Prozessströmen |
| DE102009015211A1 (de) | 2009-03-31 | 2010-10-14 | Evonik Goldschmidt Gmbh | Selbstvernetzende Polysiloxane in Beschichtungen von Enzymimmobilisaten |
| DE102009002415A1 (de) | 2009-04-16 | 2010-10-21 | Evonik Goldschmidt Gmbh | Emulgator enthaltend glycerinmodifizierte Organopolysiloxane |
| DE102009002758A1 (de) | 2009-04-30 | 2010-11-11 | Evonik Degussa Gmbh | Bandgap Tailoring von Solarzellen aus Flüssigsilan mittels Germanium-Zugabe |
| DE102009003275A1 (de) | 2009-05-20 | 2010-11-25 | Evonik Goldschmidt Gmbh | Verzweigte Polydimethylsiloxan-Polyoxyalkylen Copolymere, ein Verfahren zu ihrer Herstellung und ihre Verwendung als Anti-Vernebelungsadditiv in UV-härtenden Silikonen |
| DE102009028636A1 (de) | 2009-08-19 | 2011-02-24 | Evonik Goldschmidt Gmbh | Neuartige Urethangruppen enthaltende silylierte Präpolymere und Verfahren zu deren Herstellung |
| DE102009028640A1 (de) | 2009-08-19 | 2011-02-24 | Evonik Goldschmidt Gmbh | Härtbare Masse enthaltend Urethangruppen aufweisende silylierte Polymere und deren Verwendung in Dicht- und Klebstoffen, Binde- und/oder Oberflächenmodifizierungsmitteln |
| DE102009053804B3 (de) | 2009-11-18 | 2011-03-17 | Evonik Degussa Gmbh | Verfahren zur Herstellung von Hydridosilanen |
| DE102010000979A1 (de) | 2010-01-18 | 2011-07-21 | Evonik Degussa GmbH, 45128 | Verwendung eines druckbetriebenen keramischen Wärmetauschers als integraler Bestandteil einer Anlage zur Umsetzung von Siliciumtetrachlorid zu Trichlorsilan |
| DE102010000981A1 (de) | 2010-01-18 | 2011-07-21 | Evonik Degussa GmbH, 45128 | Closed loop-Verfahren zur Herstellung von Trichlorsilan aus metallurgischem Silicium |
| DE102010002180A1 (de) | 2010-02-22 | 2011-08-25 | Evonik Goldschmidt GmbH, 45127 | Stickstoffhaltige silizium-organische Pfropfmischpolymere |
| DE102010002178A1 (de) | 2010-02-22 | 2011-08-25 | Evonik Goldschmidt GmbH, 45127 | Verfahren zur Herstellung von Amin-Amid-funktionellen Siloxanen |
| DE102010031087A1 (de) | 2010-07-08 | 2012-01-12 | Evonik Goldschmidt Gmbh | Neuartige polyestermodifizierte Organopolysiloxane |
| DE102010040231A1 (de) | 2010-09-03 | 2012-03-08 | Evonik Degussa Gmbh | p-Dotierte Siliciumschichten |
-
2008
- 2008-11-03 DE DE102008043422A patent/DE102008043422B3/de not_active Expired - Fee Related
-
2009
- 2009-10-09 US US13/123,827 patent/US8889009B2/en not_active Expired - Fee Related
- 2009-10-09 JP JP2011533657A patent/JP5656851B2/ja not_active Expired - Fee Related
- 2009-10-09 EP EP09736896A patent/EP2342163B1/de not_active Not-in-force
- 2009-10-09 WO PCT/EP2009/063135 patent/WO2010060676A1/de not_active Ceased
- 2009-10-09 CN CN2009801435493A patent/CN102203008B/zh not_active Expired - Fee Related
- 2009-10-30 TW TW098136964A patent/TWI458681B/zh not_active IP Right Cessation
Also Published As
| Publication number | Publication date |
|---|---|
| TW201034951A (en) | 2010-10-01 |
| DE102008043422B3 (de) | 2010-01-07 |
| JP2012507455A (ja) | 2012-03-29 |
| EP2342163B1 (de) | 2012-09-05 |
| CN102203008A (zh) | 2011-09-28 |
| TWI458681B (zh) | 2014-11-01 |
| CN102203008B (zh) | 2013-10-02 |
| EP2342163A1 (de) | 2011-07-13 |
| US20110268642A1 (en) | 2011-11-03 |
| US8889009B2 (en) | 2014-11-18 |
| WO2010060676A1 (de) | 2010-06-03 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JP5656851B2 (ja) | 低分子量のヒドリドシランの精製法 | |
| CN102333593B (zh) | 从工艺流富集均相催化剂的方法 | |
| Cacho-Bailo et al. | ZIF-8 continuous membrane on porous polysulfone for hydrogen separation | |
| Lin | Metal organic framework membranes for separation applications | |
| US6854602B2 (en) | Hydrogen-selective silica-based membrane | |
| KR101920716B1 (ko) | 기체 분리막 및 그 제조방법 | |
| CN102946980B (zh) | 一种用于溶剂纳滤和渗透汽化的亲有机物质的聚倍半硅氧烷膜 | |
| CN103288610B (zh) | 用于工业加氢甲酰基化异丁烯并分离产物混合物的方法和装置 | |
| Guo et al. | ZIF-8 coated polyvinylidenefluoride (PVDF) hollow fiber for highly efficient separation of small dye molecules | |
| CN105983346B (zh) | Sapo-34分子筛膜渗透汽化与汽相渗透分离气液/液体混合物的方法 | |
| Anggarini et al. | Microporous nickel-coordinated aminosilica membranes for improved pervaporation performance of methanol/toluene separation | |
| EP1648954A2 (en) | Microporous polymer material | |
| Lo et al. | Pseudopolymorphic seeding for the rational synthesis of hybrid membranes with a zeolitic imidazolate framework for enhanced molecular separation performance | |
| Huang et al. | Steam-stable hydrophobic ITQ-29 molecular sieve membrane with H 2 selectivity prepared by secondary growth using Kryptofix 222 as SDA | |
| KR101295830B1 (ko) | 분리막을 사용하는 알콕시실란들의 회수 방법 | |
| EP3275527B1 (en) | Gas-permeable membrane, use of a composition for forming such membrane and process for producing it | |
| Li et al. | Preparation and gas permeability of ZIF-7 membranes prepared via two-step crystallization technique | |
| Lee et al. | Inorganic membranes for gas separation | |
| CN120532315A (zh) | 一种新型Zr-MOF膜的制备方法及有机物分离应用 | |
| JP2005319432A (ja) | 気体分離膜 | |
| TW201237029A (en) | Process for purifying dialkyl carbonate |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20120718 |
|
| A977 | Report on retrieval |
Free format text: JAPANESE INTERMEDIATE CODE: A971007 Effective date: 20131129 |
|
| A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20131216 |
|
| A601 | Written request for extension of time |
Free format text: JAPANESE INTERMEDIATE CODE: A601 Effective date: 20140312 |
|
| A602 | Written permission of extension of time |
Free format text: JAPANESE INTERMEDIATE CODE: A602 Effective date: 20140319 |
|
| A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20140612 |
|
| A524 | Written submission of copy of amendment under article 19 pct |
Free format text: JAPANESE INTERMEDIATE CODE: A524 Effective date: 20140612 |
|
| TRDD | Decision of grant or rejection written | ||
| A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20141104 |
|
| A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20141125 |
|
| R150 | Certificate of patent or registration of utility model |
Ref document number: 5656851 Country of ref document: JP Free format text: JAPANESE INTERMEDIATE CODE: R150 |
|
| LAPS | Cancellation because of no payment of annual fees |