JP5653453B2 - 一体化された過渡過電圧保護を有するボンドパッド - Google Patents

一体化された過渡過電圧保護を有するボンドパッド Download PDF

Info

Publication number
JP5653453B2
JP5653453B2 JP2012548064A JP2012548064A JP5653453B2 JP 5653453 B2 JP5653453 B2 JP 5653453B2 JP 2012548064 A JP2012548064 A JP 2012548064A JP 2012548064 A JP2012548064 A JP 2012548064A JP 5653453 B2 JP5653453 B2 JP 5653453B2
Authority
JP
Japan
Prior art keywords
region
metal layer
bus
shallow
deep
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
JP2012548064A
Other languages
English (en)
Japanese (ja)
Other versions
JP2013517617A5 (enExample
JP2013517617A (ja
Inventor
ハビヤー サルセード,
ハビヤー サルセード,
アレン ライター,
アレン ライター,
Original Assignee
アナログ デバイシス, インコーポレイテッド
アナログ デバイシス, インコーポレイテッド
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by アナログ デバイシス, インコーポレイテッド, アナログ デバイシス, インコーポレイテッド filed Critical アナログ デバイシス, インコーポレイテッド
Publication of JP2013517617A publication Critical patent/JP2013517617A/ja
Publication of JP2013517617A5 publication Critical patent/JP2013517617A5/ja
Application granted granted Critical
Publication of JP5653453B2 publication Critical patent/JP5653453B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Classifications

    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D89/00Aspects of integrated devices not covered by groups H10D84/00 - H10D88/00
    • H10D89/60Integrated devices comprising arrangements for electrical or thermal protection, e.g. protection circuits against electrostatic discharge [ESD]
    • H10D89/601Integrated devices comprising arrangements for electrical or thermal protection, e.g. protection circuits against electrostatic discharge [ESD] for devices having insulated gate electrodes, e.g. for IGFETs or IGBTs
    • H10D89/711Integrated devices comprising arrangements for electrical or thermal protection, e.g. protection circuits against electrostatic discharge [ESD] for devices having insulated gate electrodes, e.g. for IGFETs or IGBTs using bipolar transistors as protective elements
    • H10D89/713Integrated devices comprising arrangements for electrical or thermal protection, e.g. protection circuits against electrostatic discharge [ESD] for devices having insulated gate electrodes, e.g. for IGFETs or IGBTs using bipolar transistors as protective elements including a PNP transistor and a NPN transistor, wherein each of said transistors has its base region coupled to the collector region of the other transistor, e.g. silicon controlled rectifier [SCR] devices
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L24/00Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
    • H01L24/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L24/02Bonding areas ; Manufacturing methods related thereto
    • H01L24/04Structure, shape, material or disposition of the bonding areas prior to the connecting process
    • H01L24/05Structure, shape, material or disposition of the bonding areas prior to the connecting process of an individual bonding area
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D8/00Diodes
    • H10D8/80PNPN diodes, e.g. Shockley diodes or break-over diodes
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/02Bonding areas; Manufacturing methods related thereto
    • H01L2224/04Structure, shape, material or disposition of the bonding areas prior to the connecting process
    • H01L2224/05Structure, shape, material or disposition of the bonding areas prior to the connecting process of an individual bonding area
    • H01L2224/05001Internal layers
    • H01L2224/05075Plural internal layers
    • H01L2224/0508Plural internal layers being stacked
    • H01L2224/05085Plural internal layers being stacked with additional elements, e.g. vias arrays, interposed between the stacked layers
    • H01L2224/05089Disposition of the additional element
    • H01L2224/05093Disposition of the additional element of a plurality of vias
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/02Bonding areas; Manufacturing methods related thereto
    • H01L2224/04Structure, shape, material or disposition of the bonding areas prior to the connecting process
    • H01L2224/05Structure, shape, material or disposition of the bonding areas prior to the connecting process of an individual bonding area
    • H01L2224/0554External layer
    • H01L2224/0555Shape
    • H01L2224/05552Shape in top view
    • H01L2224/05554Shape in top view being square
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/02Bonding areas; Manufacturing methods related thereto
    • H01L2224/04Structure, shape, material or disposition of the bonding areas prior to the connecting process
    • H01L2224/05Structure, shape, material or disposition of the bonding areas prior to the connecting process of an individual bonding area
    • H01L2224/0554External layer
    • H01L2224/0555Shape
    • H01L2224/05556Shape in side view
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/0001Technical content checked by a classifier
    • H01L2924/00014Technical content checked by a classifier the subject-matter covered by the group, the symbol of which is combined with the symbol of this group, being disclosed without further technical details
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/01Chemical elements
    • H01L2924/01005Boron [B]
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/01Chemical elements
    • H01L2924/01011Sodium [Na]
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/01Chemical elements
    • H01L2924/01013Aluminum [Al]
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/01Chemical elements
    • H01L2924/01014Silicon [Si]
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/01Chemical elements
    • H01L2924/01015Phosphorus [P]
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/01Chemical elements
    • H01L2924/01019Potassium [K]
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/01Chemical elements
    • H01L2924/01023Vanadium [V]
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/01Chemical elements
    • H01L2924/01029Copper [Cu]
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/01Chemical elements
    • H01L2924/01033Arsenic [As]
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/01Chemical elements
    • H01L2924/01088Radium [Ra]
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/10Details of semiconductor or other solid state devices to be connected
    • H01L2924/11Device type
    • H01L2924/13Discrete devices, e.g. 3 terminal devices
    • H01L2924/1301Thyristor
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/10Details of semiconductor or other solid state devices to be connected
    • H01L2924/11Device type
    • H01L2924/13Discrete devices, e.g. 3 terminal devices
    • H01L2924/1304Transistor
    • H01L2924/1305Bipolar Junction Transistor [BJT]
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/10Details of semiconductor or other solid state devices to be connected
    • H01L2924/11Device type
    • H01L2924/13Discrete devices, e.g. 3 terminal devices
    • H01L2924/1304Transistor
    • H01L2924/1306Field-effect transistor [FET]
    • H01L2924/13091Metal-Oxide-Semiconductor Field-Effect Transistor [MOSFET]
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/10Details of semiconductor or other solid state devices to be connected
    • H01L2924/11Device type
    • H01L2924/14Integrated circuits
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/19Details of hybrid assemblies other than the semiconductor or other solid state devices to be connected
    • H01L2924/1901Structure
    • H01L2924/1904Component type
    • H01L2924/19043Component type being a resistor
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/30Technical effects
    • H01L2924/301Electrical effects
    • H01L2924/30105Capacitance
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/30Technical effects
    • H01L2924/301Electrical effects
    • H01L2924/3025Electromagnetic shielding
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D18/00Thyristors
    • H10D18/251Lateral thyristors
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D62/00Semiconductor bodies, or regions thereof, of devices having potential barriers
    • H10D62/10Shapes, relative sizes or dispositions of the regions of the semiconductor bodies; Shapes of the semiconductor bodies
    • H10D62/113Isolations within a component, i.e. internal isolations
    • H10D62/115Dielectric isolations, e.g. air gaps
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D62/00Semiconductor bodies, or regions thereof, of devices having potential barriers
    • H10D62/10Shapes, relative sizes or dispositions of the regions of the semiconductor bodies; Shapes of the semiconductor bodies
    • H10D62/113Isolations within a component, i.e. internal isolations
    • H10D62/115Dielectric isolations, e.g. air gaps
    • H10D62/116Dielectric isolations, e.g. air gaps adjoining the input or output regions of field-effect devices, e.g. adjoining source or drain regions
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D62/00Semiconductor bodies, or regions thereof, of devices having potential barriers
    • H10D62/10Shapes, relative sizes or dispositions of the regions of the semiconductor bodies; Shapes of the semiconductor bodies
    • H10D62/124Shapes, relative sizes or dispositions of the regions of semiconductor bodies or of junctions between the regions
    • H10D62/126Top-view geometrical layouts of the regions or the junctions
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D84/00Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers
    • H10D84/101Integrated devices comprising main components and built-in components, e.g. IGBT having built-in freewheel diode
    • H10D84/131Thyristors having built-in components
    • H10D84/138Thyristors having built-in components the built-in components being FETs

Landscapes

  • Engineering & Computer Science (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Semiconductor Integrated Circuits (AREA)
  • Metal-Oxide And Bipolar Metal-Oxide Semiconductor Integrated Circuits (AREA)
  • Insulated Gate Type Field-Effect Transistor (AREA)
  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
JP2012548064A 2010-01-12 2011-01-03 一体化された過渡過電圧保護を有するボンドパッド Active JP5653453B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US12/686,003 2010-01-12
US12/686,003 US8222698B2 (en) 2009-06-29 2010-01-12 Bond pad with integrated transient over-voltage protection
PCT/US2011/020036 WO2011087925A1 (en) 2010-01-12 2011-01-03 Bond pad with integrated transient over-voltage protection

Publications (3)

Publication Number Publication Date
JP2013517617A JP2013517617A (ja) 2013-05-16
JP2013517617A5 JP2013517617A5 (enExample) 2013-06-27
JP5653453B2 true JP5653453B2 (ja) 2015-01-14

Family

ID=43709169

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2012548064A Active JP5653453B2 (ja) 2010-01-12 2011-01-03 一体化された過渡過電圧保護を有するボンドパッド

Country Status (4)

Country Link
US (1) US8222698B2 (enExample)
JP (1) JP5653453B2 (enExample)
CN (1) CN102714205B (enExample)
WO (1) WO2011087925A1 (enExample)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2957049B2 (ja) 1991-12-05 1999-10-04 有限会社吉野精機 絞り溝加工用ローラー
JP3060290B2 (ja) 1996-04-30 2000-07-10 株式会社カネミツ 板金製プーリとその製造方法

Families Citing this family (57)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9520486B2 (en) 2009-11-04 2016-12-13 Analog Devices, Inc. Electrostatic protection device
US8432651B2 (en) 2010-06-09 2013-04-30 Analog Devices, Inc. Apparatus and method for electronic systems reliability
US8368116B2 (en) 2010-06-09 2013-02-05 Analog Devices, Inc. Apparatus and method for protecting electronic circuits
US8665571B2 (en) 2011-05-18 2014-03-04 Analog Devices, Inc. Apparatus and method for integrated circuit protection
EP2405466B1 (en) * 2010-07-05 2014-04-23 ams AG Symmetric LDMOS transistor and method of production
US8416543B2 (en) 2010-07-08 2013-04-09 Analog Devices, Inc. Apparatus and method for electronic circuit protection
US8553380B2 (en) 2010-07-08 2013-10-08 Analog Devices, Inc. Apparatus and method for electronic circuit protection
US10199482B2 (en) 2010-11-29 2019-02-05 Analog Devices, Inc. Apparatus for electrostatic discharge protection
JP5703790B2 (ja) * 2011-01-31 2015-04-22 富士通セミコンダクター株式会社 半導体装置及びその製造方法
US8466489B2 (en) 2011-02-04 2013-06-18 Analog Devices, Inc. Apparatus and method for transient electrical overstress protection
US8592860B2 (en) 2011-02-11 2013-11-26 Analog Devices, Inc. Apparatus and method for protection of electronic circuits operating under high stress conditions
US8680620B2 (en) 2011-08-04 2014-03-25 Analog Devices, Inc. Bi-directional blocking voltage protection devices and methods of forming the same
US8947841B2 (en) 2012-02-13 2015-02-03 Analog Devices, Inc. Protection systems for integrated circuits and methods of forming the same
US8829570B2 (en) 2012-03-09 2014-09-09 Analog Devices, Inc. Switching device for heterojunction integrated circuits and methods of forming the same
US8946822B2 (en) 2012-03-19 2015-02-03 Analog Devices, Inc. Apparatus and method for protection of precision mixed-signal electronic circuits
US8691655B2 (en) * 2012-05-15 2014-04-08 Taiwan Semiconductor Manufacturing Company, Ltd. Method of semiconductor integrated circuit fabrication
US8610251B1 (en) 2012-06-01 2013-12-17 Analog Devices, Inc. Low voltage protection devices for precision transceivers and methods of forming the same
US8637899B2 (en) 2012-06-08 2014-01-28 Analog Devices, Inc. Method and apparatus for protection and high voltage isolation of low voltage communication interface terminals
US8796729B2 (en) 2012-11-20 2014-08-05 Analog Devices, Inc. Junction-isolated blocking voltage devices with integrated protection structures and methods of forming the same
US8860080B2 (en) 2012-12-19 2014-10-14 Analog Devices, Inc. Interface protection device with integrated supply clamp and method of forming the same
US9123540B2 (en) 2013-01-30 2015-09-01 Analog Devices, Inc. Apparatus for high speed signal processing interface
US9006781B2 (en) 2012-12-19 2015-04-14 Analog Devices, Inc. Devices for monolithic data conversion interface protection and methods of forming the same
US9275991B2 (en) 2013-02-13 2016-03-01 Analog Devices, Inc. Apparatus for transceiver signal isolation and voltage clamp
US9147677B2 (en) 2013-05-16 2015-09-29 Analog Devices Global Dual-tub junction-isolated voltage clamp devices for protecting low voltage circuitry connected between high voltage interface pins and methods of forming the same
US9171832B2 (en) 2013-05-24 2015-10-27 Analog Devices, Inc. Analog switch with high bipolar blocking voltage in low voltage CMOS process
CN104752423B (zh) 2013-12-31 2018-08-21 中芯国际集成电路制造(上海)有限公司 一种半导体器件及其制造方法和电子装置
US9318564B2 (en) * 2014-05-19 2016-04-19 Qualcomm Incorporated High density static random access memory array having advanced metal patterning
US9484739B2 (en) 2014-09-25 2016-11-01 Analog Devices Global Overvoltage protection device and method
US9478608B2 (en) 2014-11-18 2016-10-25 Analog Devices, Inc. Apparatus and methods for transceiver interface overvoltage clamping
US10068894B2 (en) 2015-01-12 2018-09-04 Analog Devices, Inc. Low leakage bidirectional clamps and methods of forming the same
US10181719B2 (en) 2015-03-16 2019-01-15 Analog Devices Global Overvoltage blocking protection device
US9673187B2 (en) 2015-04-07 2017-06-06 Analog Devices, Inc. High speed interface protection apparatus
US10158029B2 (en) 2016-02-23 2018-12-18 Analog Devices, Inc. Apparatus and methods for robust overstress protection in compound semiconductor circuit applications
US10199369B2 (en) 2016-03-04 2019-02-05 Analog Devices, Inc. Apparatus and methods for actively-controlled transient overstress protection with false condition shutdown
CN105789332B (zh) * 2016-04-25 2019-02-26 矽力杰半导体技术(杭州)有限公司 整流器件、整流器件的制造方法及esd保护器件
US9831233B2 (en) 2016-04-29 2017-11-28 Analog Devices Global Apparatuses for communication systems transceiver interfaces
US10177566B2 (en) 2016-06-21 2019-01-08 Analog Devices, Inc. Apparatus and methods for actively-controlled trigger and latch release thyristor
US10734806B2 (en) 2016-07-21 2020-08-04 Analog Devices, Inc. High voltage clamps with transient activation and activation release control
US10861845B2 (en) 2016-12-06 2020-12-08 Analog Devices, Inc. Active interface resistance modulation switch
US10319714B2 (en) 2017-01-24 2019-06-11 Analog Devices, Inc. Drain-extended metal-oxide-semiconductor bipolar switch for electrical overstress protection
US10404059B2 (en) 2017-02-09 2019-09-03 Analog Devices, Inc. Distributed switches to suppress transient electrical overstress-induced latch-up
US10249609B2 (en) 2017-08-10 2019-04-02 Analog Devices, Inc. Apparatuses for communication systems transceiver interfaces
US10608431B2 (en) 2017-10-26 2020-03-31 Analog Devices, Inc. Silicon controlled rectifier dynamic triggering and shutdown via control signal amplification
US10581423B1 (en) 2018-08-17 2020-03-03 Analog Devices Global Unlimited Company Fault tolerant low leakage switch
US11094688B2 (en) 2018-08-23 2021-08-17 Analog Devices International Unlimited Company Isolation architecture
US10700056B2 (en) 2018-09-07 2020-06-30 Analog Devices, Inc. Apparatus for automotive and communication systems transceiver interfaces
US11387648B2 (en) 2019-01-10 2022-07-12 Analog Devices International Unlimited Company Electrical overstress protection with low leakage current for high voltage tolerant high speed interfaces
US11004849B2 (en) 2019-03-06 2021-05-11 Analog Devices, Inc. Distributed electrical overstress protection for large density and high data rate communication applications
US11469717B2 (en) 2019-05-03 2022-10-11 Analog Devices International Unlimited Company Microwave amplifiers tolerant to electrical overstress
DE102020111863A1 (de) 2019-05-03 2020-11-05 Analog Devices International Unlimited Company Gegen elektrische Überlastung tolerante Mikrowellenverstärker
CN119855223A (zh) 2019-09-09 2025-04-18 亚德诺半导体国际无限责任公司 配置用于栅极电介质监控的半导体器件
US12032014B2 (en) 2019-09-09 2024-07-09 Analog Devices International Unlimited Company Semiconductor device configured for gate dielectric monitoring
US11302687B2 (en) 2019-10-30 2022-04-12 Globalfoundries Singapore Pte. Ltd. Semiconductor device and method of forming the same
US11552190B2 (en) 2019-12-12 2023-01-10 Analog Devices International Unlimited Company High voltage double-diffused metal oxide semiconductor transistor with isolated parasitic bipolar junction transistor region
US11558018B2 (en) 2020-01-29 2023-01-17 Nxp Usa, Inc. Integrated circuits containing vertically-integrated capacitor-avalanche diode structures
US11595036B2 (en) 2020-04-30 2023-02-28 Analog Devices, Inc. FinFET thyristors for protecting high-speed communication interfaces
US12477836B2 (en) 2023-12-08 2025-11-18 Analog Devices, Inc. Low capacitance silicon controlled rectifier topology for overvoltage protection

Family Cites Families (26)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5008A (en) * 1847-03-13 Machinery for cleaning
US4626882A (en) 1984-07-18 1986-12-02 International Business Machines Corporation Twin diode overvoltage protection structure
TW299495B (en) 1996-05-03 1997-03-01 Winbond Electronics Corp Electrostatic discharge protection circuit
US5663860A (en) 1996-06-28 1997-09-02 Harris Corporation High voltage protection circuits
US6137140A (en) 1997-11-26 2000-10-24 Texas Instruments Incorporated Integrated SCR-LDMOS power device
US6236087B1 (en) 1998-11-02 2001-05-22 Analog Devices, Inc. SCR cell for electrical overstress protection of electronic circuits
US6512662B1 (en) 1999-11-30 2003-01-28 Illinois Institute Of Technology Single structure all-direction ESD protection for integrated circuits
JP4357127B2 (ja) * 2000-03-03 2009-11-04 株式会社東芝 半導体装置
JP2001339047A (ja) * 2000-05-29 2001-12-07 Matsushita Electric Ind Co Ltd 半導体装置
JP4065104B2 (ja) 2000-12-25 2008-03-19 三洋電機株式会社 半導体集積回路装置およびその製造方法
TW511269B (en) 2001-03-05 2002-11-21 Taiwan Semiconductor Mfg Silicon-controlled rectifier device having deep well region structure and its application on electrostatic discharge protection circuit
US6667870B1 (en) 2001-12-12 2003-12-23 Natiional Semiconductor Corporation Fully distributed slave ESD clamps formed under the bond pads
US6909149B2 (en) 2003-04-16 2005-06-21 Sarnoff Corporation Low voltage silicon controlled rectifier (SCR) for electrostatic discharge (ESD) protection of silicon-on-insulator technologies
US7038280B2 (en) 2003-10-28 2006-05-02 Analog Devices, Inc. Integrated circuit bond pad structures and methods of making
US7067883B2 (en) 2003-10-31 2006-06-27 Lattice Semiconductor Corporation Lateral high-voltage junction device
TWI223432B (en) 2003-12-18 2004-11-01 Univ Nat Chiao Tung Double-triggered silicon controller rectifier and relevant circuitry
US7202114B2 (en) 2004-01-13 2007-04-10 Intersil Americas Inc. On-chip structure for electrostatic discharge (ESD) protection
CN100377321C (zh) 2004-06-28 2008-03-26 中芯国际集成电路制造(上海)有限公司 用于高电压操作的金属氧化物半导体器件及其制造方法
KR100638456B1 (ko) 2004-12-30 2006-10-24 매그나칩 반도체 유한회사 이에스디 보호회로 및 그 제조방법
JP4682622B2 (ja) * 2005-01-11 2011-05-11 セイコーエプソン株式会社 半導体装置
US7414287B2 (en) 2005-02-21 2008-08-19 Texas Instruments Incorporated System and method for making a LDMOS device with electrostatic discharge protection
JP4995455B2 (ja) * 2005-11-30 2012-08-08 ルネサスエレクトロニクス株式会社 半導体装置
US7345341B2 (en) 2006-02-09 2008-03-18 Taiwan Semiconductor Manufacturing Co., Ltd. High voltage semiconductor devices and methods for fabricating the same
US7605431B2 (en) 2006-09-20 2009-10-20 Himax Technologies Limited Electrostatic discharge protection apparatus for semiconductor devices
JP2009071173A (ja) * 2007-09-14 2009-04-02 Panasonic Corp 半導体装置
US7868387B2 (en) 2008-06-13 2011-01-11 Analog Devices, Inc. Low leakage protection device

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2957049B2 (ja) 1991-12-05 1999-10-04 有限会社吉野精機 絞り溝加工用ローラー
JP3060290B2 (ja) 1996-04-30 2000-07-10 株式会社カネミツ 板金製プーリとその製造方法

Also Published As

Publication number Publication date
WO2011087925A1 (en) 2011-07-21
US20100327343A1 (en) 2010-12-30
CN102714205A (zh) 2012-10-03
US8222698B2 (en) 2012-07-17
CN102714205B (zh) 2015-12-16
JP2013517617A (ja) 2013-05-16

Similar Documents

Publication Publication Date Title
JP5653453B2 (ja) 一体化された過渡過電圧保護を有するボンドパッド
US8044457B2 (en) Transient over-voltage clamp
JP7462653B2 (ja) 高電圧許容型高速インターフェースのための低漏れ電流による電気的過負荷保護
US8637899B2 (en) Method and apparatus for protection and high voltage isolation of low voltage communication interface terminals
JP5333857B2 (ja) トレンチ絶縁を用いたラッチアップ現象のない垂直方向tvsダイオードアレイ構造
CN103839941B (zh) 具有集成保护结构的结隔离阻断电压装置及其形成方法
US9431389B2 (en) ESD transistor for high voltage and ESD protection circuit thereof
US8154049B2 (en) ESD protection apparatus and electrical circuit including same
CN100459130C (zh) 半导体结构及其应用、尤其是限制过电压的应用
US6624487B1 (en) Drain-extended MOS ESD protection structure
JP5801609B2 (ja) 保護回路素子
US20040027745A1 (en) Drain-extended MOS ESD protection structure
CN116207095B (zh) 瞬态电压抑制装置
CN106030808B (zh) 分段式npn垂直双极晶体管
WO2012119788A1 (en) Integrated circuit including silicon controlled rectifier
JP3573674B2 (ja) 半導体集積回路の入出力保護装置とその保護方法
KR19990030300A (ko) 정전 방전으로부터 보호하기 위한 구조물을 가진 집적 반도체회로
CN114695341A (zh) 具有高保持电压的低电容瞬态电压抑制器
US10249610B1 (en) IGBT coupled to a reverse bias device in series
CN112652618B (zh) 使用齐纳二极管对感测igbt的静电放电处理
KR102539366B1 (ko) 제너 다이오드를 사용하는 감지 igbt에 대한 정전기 방전 처리
JP3479012B2 (ja) 静電保護回路及び半導体装置
JP3314760B2 (ja) 静電保護素子、静電保護回路及び半導体装置
KR20030051388A (ko) 폴리실리콘 유계 스냅백 장치
KR20070058165A (ko) 반도체 장치의 정전 방전 보호 소자

Legal Events

Date Code Title Description
A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20130321

A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20130321

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20140522

A977 Report on retrieval

Free format text: JAPANESE INTERMEDIATE CODE: A971007

Effective date: 20140522

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20140821

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20141106

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20141118

R150 Certificate of patent or registration of utility model

Ref document number: 5653453

Country of ref document: JP

Free format text: JAPANESE INTERMEDIATE CODE: R150

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

RD04 Notification of resignation of power of attorney

Free format text: JAPANESE INTERMEDIATE CODE: R3D04

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250