JP5611964B2 - デジタル製造システム用の支持材 - Google Patents
デジタル製造システム用の支持材 Download PDFInfo
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- 238000004519 manufacturing process Methods 0.000 title claims description 26
- 229920001577 copolymer Polymers 0.000 claims description 115
- 239000000178 monomer Substances 0.000 claims description 79
- 239000007864 aqueous solution Substances 0.000 claims description 33
- 238000000151 deposition Methods 0.000 claims description 32
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 claims description 25
- 238000000034 method Methods 0.000 claims description 21
- 239000004593 Epoxy Substances 0.000 claims description 18
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 claims description 18
- 150000002148 esters Chemical class 0.000 claims description 16
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 claims description 15
- 239000002994 raw material Substances 0.000 claims description 12
- 150000001733 carboxylic acid esters Chemical group 0.000 claims description 11
- VOZRXNHHFUQHIL-UHFFFAOYSA-N glycidyl methacrylate Chemical compound CC(=C)C(=O)OCC1CO1 VOZRXNHHFUQHIL-UHFFFAOYSA-N 0.000 claims description 10
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 claims description 9
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- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 claims description 3
- NIXOWILDQLNWCW-UHFFFAOYSA-N 2-Propenoic acid Natural products OC(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 claims description 3
- 125000005250 alkyl acrylate group Chemical group 0.000 claims description 3
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- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 15
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- VGGSQFUCUMXWEO-UHFFFAOYSA-N Ethene Chemical compound C=C VGGSQFUCUMXWEO-UHFFFAOYSA-N 0.000 description 9
- 239000005977 Ethylene Substances 0.000 description 9
- 239000004676 acrylonitrile butadiene styrene Substances 0.000 description 9
- 125000000217 alkyl group Chemical group 0.000 description 9
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- CQEYYJKEWSMYFG-UHFFFAOYSA-N butyl acrylate Chemical compound CCCCOC(=O)C=C CQEYYJKEWSMYFG-UHFFFAOYSA-N 0.000 description 8
- -1 polyethylenes Polymers 0.000 description 8
- XECAHXYUAAWDEL-UHFFFAOYSA-N acrylonitrile butadiene styrene Chemical compound C=CC=C.C=CC#N.C=CC1=CC=CC=C1 XECAHXYUAAWDEL-UHFFFAOYSA-N 0.000 description 7
- 229920000122 acrylonitrile butadiene styrene Polymers 0.000 description 7
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- 125000004435 hydrogen atom Chemical class [H]* 0.000 description 4
- 229920000642 polymer Polymers 0.000 description 4
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- PEDCQBHIVMGVHV-UHFFFAOYSA-N Glycerine Chemical compound OCC(O)CO PEDCQBHIVMGVHV-UHFFFAOYSA-N 0.000 description 3
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- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 3
- VTYYLEPIZMXCLO-UHFFFAOYSA-L Calcium carbonate Chemical compound [Ca+2].[O-]C([O-])=O VTYYLEPIZMXCLO-UHFFFAOYSA-L 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- 239000003125 aqueous solvent Substances 0.000 description 2
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 2
- 238000005452 bending Methods 0.000 description 2
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- 229910052760 oxygen Inorganic materials 0.000 description 2
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- 150000003839 salts Chemical class 0.000 description 2
- 238000003860 storage Methods 0.000 description 2
- 239000012815 thermoplastic material Substances 0.000 description 2
- 239000005995 Aluminium silicate Substances 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- 229920000049 Carbon (fiber) Polymers 0.000 description 1
- 229920003139 Eudragit® L 100 Polymers 0.000 description 1
- 229920003134 Eudragit® polymer Polymers 0.000 description 1
- VVQNEPGJFQJSBK-UHFFFAOYSA-N Methyl methacrylate Chemical compound COC(=O)C(C)=C VVQNEPGJFQJSBK-UHFFFAOYSA-N 0.000 description 1
- 229910019142 PO4 Inorganic materials 0.000 description 1
- 239000004743 Polypropylene Substances 0.000 description 1
- 230000001133 acceleration Effects 0.000 description 1
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- WNLRTRBMVRJNCN-UHFFFAOYSA-N adipic acid Chemical class OC(=O)CCCCC(O)=O WNLRTRBMVRJNCN-UHFFFAOYSA-N 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 235000012211 aluminium silicate Nutrition 0.000 description 1
- 150000001491 aromatic compounds Chemical class 0.000 description 1
- 238000000429 assembly Methods 0.000 description 1
- 230000000712 assembly Effects 0.000 description 1
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 description 1
- 229910000019 calcium carbonate Inorganic materials 0.000 description 1
- QXJJQWWVWRCVQT-UHFFFAOYSA-K calcium;sodium;phosphate Chemical compound [Na+].[Ca+2].[O-]P([O-])([O-])=O QXJJQWWVWRCVQT-UHFFFAOYSA-K 0.000 description 1
- 239000006229 carbon black Substances 0.000 description 1
- 239000004917 carbon fiber Substances 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 239000003153 chemical reaction reagent Substances 0.000 description 1
- 150000001860 citric acid derivatives Chemical class 0.000 description 1
- 239000003086 colorant Substances 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
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- 239000012153 distilled water Substances 0.000 description 1
- 230000009977 dual effect Effects 0.000 description 1
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- 238000010438 heat treatment Methods 0.000 description 1
- NLYAJNPCOHFWQQ-UHFFFAOYSA-N kaolin Chemical compound O.O.O=[Al]O[Si](=O)O[Si](=O)O[Al]=O NLYAJNPCOHFWQQ-UHFFFAOYSA-N 0.000 description 1
- ZLNQQNXFFQJAID-UHFFFAOYSA-L magnesium carbonate Chemical compound [Mg+2].[O-]C([O-])=O ZLNQQNXFFQJAID-UHFFFAOYSA-L 0.000 description 1
- 239000001095 magnesium carbonate Substances 0.000 description 1
- 229910000021 magnesium carbonate Inorganic materials 0.000 description 1
- 230000007246 mechanism Effects 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 229920003145 methacrylic acid copolymer Polymers 0.000 description 1
- 239000010445 mica Substances 0.000 description 1
- 229910052618 mica group Inorganic materials 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
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- 230000000737 periodic effect Effects 0.000 description 1
- 235000021317 phosphate Nutrition 0.000 description 1
- 125000005498 phthalate group Chemical class 0.000 description 1
- 229920001522 polyglycol ester Polymers 0.000 description 1
- 229920000098 polyolefin Polymers 0.000 description 1
- 229920001155 polypropylene Polymers 0.000 description 1
- 238000005086 pumping Methods 0.000 description 1
- 229920013730 reactive polymer Polymers 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 239000006254 rheological additive Substances 0.000 description 1
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 description 1
- 229910010271 silicon carbide Inorganic materials 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 238000007711 solidification Methods 0.000 description 1
- 230000008023 solidification Effects 0.000 description 1
- 239000003381 stabilizer Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 239000000454 talc Substances 0.000 description 1
- 229910052623 talc Inorganic materials 0.000 description 1
- 238000011144 upstream manufacturing Methods 0.000 description 1
- 239000010456 wollastonite Substances 0.000 description 1
- 229910052882 wollastonite Inorganic materials 0.000 description 1
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L25/00—Compositions of, homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an aromatic carbocyclic ring; Compositions of derivatives of such polymers
- C08L25/02—Homopolymers or copolymers of hydrocarbons
- C08L25/04—Homopolymers or copolymers of styrene
- C08L25/08—Copolymers of styrene
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C64/00—Additive manufacturing, i.e. manufacturing of three-dimensional [3D] objects by additive deposition, additive agglomeration or additive layering, e.g. by 3D printing, stereolithography or selective laser sintering
- B29C64/40—Structures for supporting 3D objects during manufacture and intended to be sacrificed after completion thereof
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C67/00—Shaping techniques not covered by groups B29C39/00 - B29C65/00, B29C70/00 or B29C73/00
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B33—ADDITIVE MANUFACTURING TECHNOLOGY
- B33Y—ADDITIVE MANUFACTURING, i.e. MANUFACTURING OF THREE-DIMENSIONAL [3-D] OBJECTS BY ADDITIVE DEPOSITION, ADDITIVE AGGLOMERATION OR ADDITIVE LAYERING, e.g. BY 3-D PRINTING, STEREOLITHOGRAPHY OR SELECTIVE LASER SINTERING
- B33Y70/00—Materials specially adapted for additive manufacturing
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L33/00—Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides or nitriles thereof; Compositions of derivatives of such polymers
- C08L33/02—Homopolymers or copolymers of acids; Metal or ammonium salts thereof
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L33/00—Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides or nitriles thereof; Compositions of derivatives of such polymers
- C08L33/04—Homopolymers or copolymers of esters
- C08L33/14—Homopolymers or copolymers of esters of esters containing halogen, nitrogen, sulfur, or oxygen atoms in addition to the carboxy oxygen
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B33—ADDITIVE MANUFACTURING TECHNOLOGY
- B33Y—ADDITIVE MANUFACTURING, i.e. MANUFACTURING OF THREE-DIMENSIONAL [3-D] OBJECTS BY ADDITIVE DEPOSITION, ADDITIVE AGGLOMERATION OR ADDITIVE LAYERING, e.g. BY 3-D PRINTING, STEREOLITHOGRAPHY OR SELECTIVE LASER SINTERING
- B33Y10/00—Processes of additive manufacturing
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L33/00—Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides or nitriles thereof; Compositions of derivatives of such polymers
- C08L33/04—Homopolymers or copolymers of esters
- C08L33/06—Homopolymers or copolymers of esters of esters containing only carbon, hydrogen and oxygen, which oxygen atoms are present only as part of the carboxyl radical
- C08L33/062—Copolymers with monomers not covered by C08L33/06
- C08L33/068—Copolymers with monomers not covered by C08L33/06 containing glycidyl groups
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Description
本発明は、三次元(3D)モデルを構築するためのデジタル製造システムに関する。具体的には、本発明は、押出しによるデジタル製造システムなどのデジタル製造システムと共に使用するための支持材に関する。
〔概要〕
開示の一態様は、デジタル製造システムと共に使用するための支持材の原料に向けられている。支持材の原料は、カルボキシ基を含む第1のモノマー単位とフェニル基を含む第2のモノマー単位とを有するコポリマーを含む。この支持材の原料は同様に、ポリマー衝撃改質剤(a polymeric impact modifier)をも含んでいる。
本開示は、その範囲内に入る数多くの修正および変形が当業者にとって明白であることから例示としてのみ意図されている以下の実施例の中で、さらに詳細に記述される。別段の指摘のないかぎり、以下の実施例において報告されている全ての部分、百分率および比率は重量を基準としており、実施例中で使用される全ての試薬は、以下に記載する化学薬品供給業者から得られるか、または入手可能であり、そうでなければ、従来の技術により合成してよい。
実施例1〜9および比較例AおよびBの支持材を調製し、溶融堆積モデリングシステム内で性能分析した。以下の試験において3Dモデルおよび支持体構造を構築するために使用された溶融堆積モデリングシステムは、ミネソタ州エデンプレーリー(Eden Prairie,MN)にあるStratasys,Inc.から「FDM400mc」溶融堆積モデリングシステムという商品名で市販されていたものである。
実施例1〜9および比較例AおよびBの支持材のためのフィラメントを各々溶融堆積モデリングシステムに補給して、さまざまな試験用3Dモデル用の支持体構造を構築したが、ここで3Dモデルは、ミネソタ州エデンプレーリー(Eden Prairie,MN)にあるStratasys,Inc.から市販されているABS−M30モデリング材料から構築された。各々の支持材は、システムの押出しヘッドから押出されて、3Dモデルに良好に接着する支持体構造を形成することができた。実施例1〜6の支持材について、液化装置は300℃の最高温度を有する温度プロファイルを示し、構築チャンバは95℃に維持された。実施例7〜9の支持材について、液化装置は300℃の最高温度を有する温度プロファイルを示し、構築チャンバは85℃に維持された。これに比べて、比較例Aの支持材のための液化装置最高温度は285℃であり、構築チャンバは95℃に維持された。これに相応して、比較例Bの支持材のための液化装置最高温度は、330℃であり、構築チャンバは110℃に維持された。
実施例1〜9および比較例Bの支持材のフィラメントを、単純結節が形成されるように曲げ、フィラメントの端部を引張って結節の寸法を削減することによって、これらのフィラメントの各々について強度および可撓性を測定した。上述の通り、強度および可撓性は、供給スプール上に巻回されている間および/または押出しによるデジタル製造システムを通して補給されている間のフィラメントの破断の危険性を削減するために有益である。実施例1〜9の支持材のフィラメントは各々、破断無く約2インチより小さい単純結節を達成することができる。2インチの単純結節は、押出しによるデジタル製造システムを通してフィラメントを破断無く補給しうることを保証するための適切な標準であった。
上述の構築試験に加えて、同様に、長い運転期間にわたるフィラメントの実戦使用を判定するために、実施例1〜9の支持材のフィラメントを数千フィート、溶融堆積モデリングシステムを通して補給した。実施例1〜9の支持材のフィラメントは各々、システムの詰まりも破断も無くシステムを通した補給および押出しが可能であった。
実施例1〜9および比較例AおよびBの支持材のフィラメントを同様にシステムからパターン状に押出して、押出しヘッドが鋭いコーナーのまわりを移動する時の堆積精度を測定した。構築作業中、押出しヘッドは水平x−y平面内を動き回ってモデリング材料および支持材を堆積させる。しかしながら、押出しヘッドが向きを変える必要のあるコーナー(例えば90度のコーナー)に達した時点で、押出しヘッドはコーナーに向かって走行しながら典型的に減速し、このコーナーを通過した後加速する。コーナーでの方向転換の間、モデリング材料および支持材の押出し速度が、望ましくは、押出しヘッドの減速および加速にしたがって調整されることにより、コーナーにおいて良好な堆積パターンを提供することが望ましい。
実施例1〜9および比較例AおよびBの支持材の各々から支持体構造を構築し、撹拌したアルカリ性溶液中に置いて支持体構造の溶解速度を測定した。支持体構造は各々、多重柱体の1インチ立方構造を示し、こうして隙間空隙(interstitial voids)を提供して露出表面積を増大させた。アルカリ性水溶液は、約11〜約13の範囲のpHを達成するため蒸留水中に溶解させた水酸化ナトリウムを含み、約70℃の温度に維持された。構築した各々の支持体構造をアルカリ性溶液中に置き、支持体構造を実質的に溶解させかつ/または分散させるのに必要な時間を測定した。表5は、実施例1〜9および比較例AおよびBの支持材について結果として得られた溶解時間を示している。
実施例10〜15の支持材も同様に調製し、上述の溶融堆積モデリングシステム内での性能について分析した。実施例10〜12の支持材は各々、一次コポリマー、衝撃改質剤および追加材料を含み、ここで追加材料は、所与の支持材のガラス遷移温度を上昇させるために取込まれた。各支持材について、衝撃改質剤と一次コポリマーとが完全に混合されるまで混ぜ合わされ、次に追加材料が完全に混合されるまで混ぜ合わせられた。その後、各々の支持材をフィラメントストランドの形に延伸し、後続する分析および溶融堆積モデリングシステム内での使用のためにスプール上に巻きつけた。
Claims (15)
- デジタル製造システムと共に使用するための支持材の原料において、
−・ それぞれがカルボキシル基を含む複数のカルボキシルモノマー単位と;
・ それぞれがフェニル基を含む複数のフェニルモノマー単位と;
・ それぞれがカルボン酸エステル基を含む複数の第1エステルモノマー単位と;
を含む第1のコポリマーと、
− それぞれがエポキシ末端基を有する複数のエポキシモノマー単位を含む第2のコポリマーと、
を含み、
当該支持材の原料は、水溶液中で可溶であり、前記デジタル製造システムが受け取るように構成されたフィラメント構造を有している、支持材の原料。 - 前記第1のコポリマーの前記複数のカルボキシモノマー単位の少なくとも一部は、アクリル酸、メタクリル酸、およびこれらの組み合わせからなる群から選択される1つ以上の酸性化合物に由来するものであり、
前記第1のコポリマーの前記複数のフェニルモノマー単位の少なくとも一部は、スチレンに由来するものであり、
前記第1のコポリマーの前記第1エステルモノマー単位の少なくとも一部は、1つ以上のアクリル酸アルキルモノマーに由来するものである、
請求項1に記載の支持材の原料。 - 前記複数のエポキシモノマー単位前記エポキシ末端基の少なくとも一部は、エポキシを末端基とするカルボン酸エステル基を含む、
請求項1または2に記載の支持材の原料。 - 前記第2のコポリマーの前記複数のエポキシモノマー単位の少なくとも一部は、メタクリル酸グリシジルに由来するものである、
請求項3に記載の支持材の原料。 - 前記カルボキシル基の少なくとも一部は、分岐配置されたカルボキシル基であり、前記フェニル基の少なくとも一部は、分岐配置されたフェニル基であり、前記カルボン酸エステル基の少なくとも一部は、分岐配置されたカルボン酸エステル基である、
請求項1から4の何れか1項に記載の支持材の原料。 - 前記第1のコポリマーは、当該支持材の原料の全重量に基づいて80重量%〜90重量%の範囲内にあり、前記第2のコポリマーは、当該支持材の原料の全重量に基づいて10重量%〜20重量%の範囲内にある、
請求項1から5の何れか1項に記載の支持材の原料。 - 前記第2のコポリマーがさらに、それぞれがカルボン酸エステル基を有する複数のエステルモノマーを含む、請求項1から6の何れか1項に記載の支持材の原料。
- 当該支持材の原料が溶解している前記水溶液は、アルカリ性水溶液を含む、請求項1から7の何れか1項に記載の支持材の原料。
- デジタル製造システムを用いて三次元モデルを構築するための方法において、
− 支持体構造を形成するためにデジタル製造システムのプラットフォーム上で層ベースの添加技術を用いて支持材を堆積させるステップであって、
支持材が第1のコポリマーと第2コポリマーとを含み、
前記第1のコポリマーが、それぞれがカルボキシル基を含む複数のカルボキシルモノマー単位と、それぞれがフェニル基を含む複数のフェニルモノマー単位と、それぞれがカルボン酸エステル基を含む複数の第1エステルモノマー単位とを含み、
前記第2のコポリマーが、それぞれがエポキシ末端基を有する複数のエポキシモノマー単位を含んでいる、ステップと;
− 前記3次元モデルを形成するために前記デジタル製造システムの前記プラットフォーム上で前記層ベースの添加技術を用いてモデリング材料を堆積させるステップであって、前記三次元モデルが、前記支持体構造により支持された少なくとも1つの突出領域を含んでいるステップと;
− 水溶液を用いて前記三次元モデルから前記支持体構造を実質的に除去するステップと;
を含む方法。 - 前記水溶液を用いて前記三次元モデルから前記支持体構造を実質的に除去するステップが、前記支持体構造と前記三次元モデルとを前記水溶液の浴槽中に浸漬させるステップを含む、請求項9に記載の方法。
- 前記水溶液がアルカリ性水溶液を含む、請求項9または10に記載の方法。
- 前記プラットフォームは、前記デジタル製造システムの構築チャンバ内に保持されており、
約85℃〜約110℃の温度に前記構築チャンバを維持するステップをさらに含む、請求項9から11の何れか1項に記載の方法。 - 前記第2のコポリマーがさらに、それぞれがカルボン酸エステル基を含む複数のカルボン酸エステルモノマー単位を含む、請求項9から12の何れか1項に記載の方法。
- 前記複数のエポキシモノマー単位のエポキシ末端基の少なくとも一部が、エポキシを末端基とするカルボン酸エステル基を含む、請求項9から13の何れか1項に記載の方法。
- 前記第1のコポリマーの前記複数のカルボキシルモノマー単位の少なくとも一部は、
アクリル酸、メタクリル酸、およびこれらの組み合わせからなる群から選択される1つ以上の酸性化合物に由来するものであり、
前記第1のコポリマーの前記複数のフェニルモノマー単位の少なくとも一部は、スチレンに由来するものであり、
前記第1のコポリマーの前記第1エステルモノマー単位の少なくとも一部は、1つ以上のアクリル酸アルキルモノマーに由来するものである、請求項9から14の何れか1項に記載の方法。
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CN102186918A (zh) | 2011-09-14 |
CN102186918B (zh) | 2014-06-18 |
HK1158671A1 (en) | 2012-07-20 |
JP2012509777A (ja) | 2012-04-26 |
US20100096072A1 (en) | 2010-04-22 |
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WO2010045147A2 (en) | 2010-04-22 |
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