JP5607994B2 - 半導体集積回路装置およびその製造方法 - Google Patents
半導体集積回路装置およびその製造方法 Download PDFInfo
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- JP5607994B2 JP5607994B2 JP2010136029A JP2010136029A JP5607994B2 JP 5607994 B2 JP5607994 B2 JP 5607994B2 JP 2010136029 A JP2010136029 A JP 2010136029A JP 2010136029 A JP2010136029 A JP 2010136029A JP 5607994 B2 JP5607994 B2 JP 5607994B2
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- pad
- rewiring
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- integrated circuit
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Description
(a)デバイス面を有する半導体基板、
(b)前記デバイス面に形成された複数の半導体素子、および前記複数の半導体素子間を接続する複数層の配線、
(c)前記デバイス面の上部を覆う保護膜、
(d)前記複数層の配線のうちの最上層の配線の一部によって構成され、前記保護膜に形成されたパッド開口から露出する第1パッド、
(e)前記保護膜の上部に形成され、前記パッド開口を通じて前記第1パッドに電気的に接続された再配線、
(f)前記再配線の上面の少なくとも一部、および前記再配線の側面の少なくとも一部を覆うように一体形成された第2パッド。
(a)複数の半導体素子、および前記複数の半導体素子間を接続する複数層の配線が形成された半導体ウエハのデバイス面の上部を保護膜で被覆する工程、
(b)前記保護膜をエッチングしてパッド開口を形成し、前記複数層の配線のうちの最上層の配線の一部を前記パッド開口から露出させることによって、第1パッドを形成する工程、
(c)前記第1パッドの上面を含む前記デバイス面上に金属シード膜を形成する工程、
(d)前記金属シード膜上に、前記第1パッドが内側に含まれる第1開口を有する第1フォトレジスト膜パターンを形成する工程、
(e)前記第1開口の内側の前記金属シード膜の上面に、電解メッキにより再配線を形成する工程、
(f)前記デバイス面上に、前記再配線の上面の少なくとも一部、および前記再配線の側面の少なくとも一部が内側に含まれる第2開口を有する第2フォトレジスト膜パターンを形成する工程、
(g)前記第2開口の内側の前記再配線の上面および側面に、電解メッキにより第2パッドを一体に形成する工程、
(h)前記工程(g)の後、前記第1および第2フォトレジスト膜パターンを除去する工程。
(i)前記工程(h)の後、前記第1フォトレジスト膜パターンで覆われていた領域の前記金属シード膜を除去する工程。
半導体集積回路装置の外部接続端子を構成する第1再配線と、前記外部接続端子を構成せずに配線同士を互いに電気的に接続する第2再配線とを含み、
前記第1再配線には第2パッドが設けられ、前記第2再配線には前記第2パッドが設けられていない。
第1の線幅を有するA再配線と、前記第1の線幅よりも広い第2の線幅を有するB再配線とを含み、
前記B再配線は、前記半導体集積回路装置の外部接続端子と電気的に接続され、
前記B再配線は、複数のパッド開口を通じて複数の第1パッドに電気的に接続され、
前記複数のパッド開口の数は、前記B再配線に接続される前記外部接続端子の数よりも多い。
1A 半導体チップ
1P 半導体基板
2 p型ウエル
3 素子分離溝
3a 素子分離絶縁膜
4 層間絶縁膜
5 第1層Al配線
6 層間絶縁膜
7 第2層Al配線
8 層間絶縁膜
9 第3層Al配線
9a パッド(Alパッド)
10 表面保護膜
10a パッド開口
11 ポリイミド樹脂膜
11a パッド開口
12 シード膜(金属シード膜)
13、16 フォトレジスト膜パターン
14、17 開口
15、15C、15d、15S、15G 再配線
15a Cu膜
15b Ni膜
18、18a、18d パッド
19a Ni膜
19b Au膜
20 ワイヤ(ボンディングワイヤ)
22 グラインダ
23 バックグラインドテープ
25D ダイパッド部
25L リード
26 樹脂(封止樹脂)
27 半田ボール
ni ゲート絶縁膜
ng ゲート電極
ns ソース
nd ドレイン
p1、p2、p3 プラグ
Qn nチャネル型MISトランジスタ
Claims (17)
- (a)複数の半導体素子、および前記複数の半導体素子間を接続する複数層の配線が形成された半導体ウエハのデバイス面の上部を保護膜で被覆する工程、
(b)前記保護膜をエッチングしてパッド開口を形成し、前記複数層の配線のうちの最上層の配線の一部を前記パッド開口から露出させることによって、第1パッドを形成する工程、
(c)前記第1パッドの上面を含む前記デバイス面上に金属シード膜を形成する工程、
(d)前記金属シード膜上に、前記第1パッドが内側に含まれる第1開口を有する第1フォトレジスト膜パターンを形成する工程、
(e)前記第1開口の内側の前記金属シード膜の上面に、電解メッキにより、第1領域及び第2領域を有する再配線を形成する工程、
(f)前記デバイス面上に、前記再配線の前記第2領域の上面、および前記再配線の前記第2領域の側面が内側に含まれる第2開口を有する第2フォトレジスト膜パターンを形成する工程、
(g)前記第2開口の内側の前記再配線の前記第2領域の上面および側面に、電解メッキにより、第2パッドを一体に形成する工程、
(h)前記工程(g)の後、前記第1および第2フォトレジスト膜パターンを除去する工程、
(i)前記工程(h)の後、前記第1フォトレジスト膜パターンで覆われていた領域の前記金属シード膜を除去する工程、
(j)前記第2パッドに、外部接続端子を接続する工程、
(k)前記再配線、前記第2パッドおよび前記外部接続端子を覆う封止樹脂を形成する工程、
を有し、
前記再配線は第1銅膜と、前記第1銅膜上に形成された第1ニッケル膜を含み、
前記第2パッドは第1金膜を含み、
前記第1領域の前記第1ニッケル膜は前記第2パッドから露出しており、
前記第1領域の前記第1ニッケル膜は前記封止樹脂と接していることを特徴とする半導体集積回路装置の製造方法。 - 前記第2パッドは、さらに、前記第1ニッケル膜と前記第1金膜の間に形成された第2ニッケル膜を有することを特徴とする請求項1記載の半導体集積回路装置の製造方法。
- 前記工程(i)における前記金属シード膜の除去は、ウェットエッチングによって行われることを特徴とする請求項2記載の半導体集積回路装置の製造方法。
- 前記工程(i)と(j)との間に、さらに、
(l)前記デバイス面上に保護テープを貼り付ける工程、
(m)前記工程(l)の後、前記半導体ウエハの裏面を研削することにより、前記半導体ウエハを薄型化する工程、
(n)前記工程(m)の後、前記デバイス面上から前記保護テープを除去する工程、
(o)前記工程(n)の後、前記半導体ウエハを半導体チップに分割する工程、
を含み、
前記工程(l)における前記保護テープは、前記第1領域の前記第1ニッケル膜および前記第2領域上の前記第2パッドと接しており、
前記工程(n)後に、前記第2領域の前記第1ニッケル膜上に前記第2パッドが残されていることを特徴とする請求項1記載の半導体集積回路装置の製造方法。 - 前記外部接続端子は、銅を主要な成分とする金属ワイヤからなることを特徴とする請求項1記載の半導体集積回路装置の製造方法。
- (a)デバイス面を有する半導体基板、
(b)前記デバイス面に形成された複数の半導体素子、および前記複数の半導体素子間を接続する複数層の配線、
(c)前記デバイス面の上部を覆う保護膜、
(d)前記複数層の配線のうちの最上層の配線の一部によって構成され、前記保護膜に形成されたパッド開口から露出する第1パッド、
(e)前記保護膜の上部に形成され、前記パッド開口を通じて前記第1パッドに電気的に接続され、且つ、第1領域及び第2領域を有する再配線、
(f)前記再配線の前記第2領域の上面、および前記再配線の前記第2領域の側面を覆うように一体形成された第2パッド、
(g)前記第2パッドに接続された外部接続端子、
を有し、
前記再配線は第1銅膜と、前記第1銅膜上に形成された第1ニッケル膜を含み、
前記第2パッドは第1金膜を含み、
前記第1領域の前記第1ニッケル膜は前記第2パッドから露出しており、
前記再配線、前記第2パッドおよび前記外部接続端子は封止樹脂で覆われており、
前記第1領域の前記第1ニッケル膜は前記封止樹脂と接していることを特徴とする半導体集積回路装置。 - 前記第2パッドは、更に、前記第1ニッケル膜と前記第1金膜の間に形成された第2ニッケル膜を有することを特徴とする請求項6記載の半導体集積回路装置。
- 前記外部接続端子は、前記第2パッドに接続された金属ワイヤからなることを特徴とする請求項6記載の半導体集積回路装置。
- 前記金属ワイヤは、銅を主要な成分とする金属からなることを特徴とする請求項8記載の半導体集積回路装置。
- 前記再配線は、前記第2パッドを介して前記外部接続端子と接続する第1再配線と、前記配線同士を互いに電気的に接続する第2再配線とを含み、
前記第1再配線には、第2パッドが設けられ、前記第2再配線には、前記第2パッドが設けられていないことを特徴とする請求項6記載の半導体集積回路装置。 - 前記再配線は、第1の線幅を有する第3再配線と、前記第1の線幅よりも広い第2の線幅を有する第4再配線とを含み、
前記第4再配線は、前記第2パッドを介して前記外部接続端子に電気的に接続され、かつ、複数の前記パッド開口を通じて複数の前記第1パッドに電気的に接続されており、
複数の前記パッド開口の数は、前記第4再配線に接続される外部接続端子の数よりも多いことを特徴とする請求項6記載の半導体集積回路装置。 - 前記複数層の配線は、電源用配線と信号用配線とを有し、前記第4再配線は、前記電源用配線に電気的に接続されていることを特徴とする請求項11記載の半導体集積回路装置。
- 前記第4再配線の一部は、放熱板を兼ねていることを特徴とする請求項12記載の半導体集積回路装置。
- 前記第3および第4再配線の膜厚は、前記複数層の配線の膜厚よりも大きいことを特徴とする請求項11記載の半導体集積回路装置。
- 前記第3再配線は、1個の前記パッド開口を通じて1個の前記第1パッドに電気的に接続されていることを特徴とする請求項11記載の半導体集積回路装置。
- 前記第3再配線は、主として前記デバイス面の外周側に配置されており、前記第4再配線は、主として前記デバイス面の中央側に配置されていることを特徴とする請求項11記載の半導体集積回路装置。
- 前記封止樹脂は、エポキシ樹脂からなることを特徴とする請求項6記載の半導体集積回路装置。
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