JP5595694B2 - 半導体装置 - Google Patents
半導体装置 Download PDFInfo
- Publication number
- JP5595694B2 JP5595694B2 JP2009198116A JP2009198116A JP5595694B2 JP 5595694 B2 JP5595694 B2 JP 5595694B2 JP 2009198116 A JP2009198116 A JP 2009198116A JP 2009198116 A JP2009198116 A JP 2009198116A JP 5595694 B2 JP5595694 B2 JP 5595694B2
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- wiring
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- connection point
- bending
- bending point
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- 239000004065 semiconductor Substances 0.000 title claims description 136
- 238000005452 bending Methods 0.000 claims description 112
- 230000000630 rising effect Effects 0.000 claims description 40
- 230000007423 decrease Effects 0.000 claims description 4
- 239000002184 metal Substances 0.000 description 100
- 238000007789 sealing Methods 0.000 description 26
- 229910001111 Fine metal Inorganic materials 0.000 description 25
- 239000011347 resin Substances 0.000 description 17
- 229920005989 resin Polymers 0.000 description 17
- 238000012986 modification Methods 0.000 description 12
- 230000004048 modification Effects 0.000 description 12
- 239000000463 material Substances 0.000 description 8
- 238000002347 injection Methods 0.000 description 7
- 239000007924 injection Substances 0.000 description 7
- 238000000034 method Methods 0.000 description 4
- 238000004088 simulation Methods 0.000 description 4
- 238000010586 diagram Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000007306 functionalization reaction Methods 0.000 description 1
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Description
本発明の第1の実施形態に係る半導体装置について、図1を参照しながら説明する。
以下、本発明の第1の実施形態の第1の変形例に係る半導体装置について、図4を参照しながら説明をする。
以下、本発明の第1の実施形態の第2の変形例に係る半導体装置について、図5を参照しながら説明をする。
以下、本発明の第2の実施形態に係る半導体装置について、図6を参照しながら説明をする。
以下、本発明の第2の実施形態の第1の変形例に係る半導体装置について、図7を参照しながら説明をする。
以下、本発明の第3の実施形態に係る半導体装置について、図8を参照しながら説明をする。
2 アイランド
3 リードフレーム
4A ダイボンド材
4B ダイボンド材
5A 半導体チップ
5B 半導体チップ
6A 電極
6B 電極
6C 電極
7A 第1ボンド点(接続点)
7B 第1ボンド点(接続点)
7C 第1ボンド点(接続点)
8 第1の金属細線(配線)
8a ネック立ち上がり部分
8b 第1屈曲点
8c 傾斜部
8d 第2屈曲点
8e 傾斜部
8f 傾斜部
8g 第3屈曲点
8h 傾斜部
9 第2の金属細線(配線)
9a ネック立ち上がり部分
9b 第1屈曲点
9c 傾斜部
9d 第2屈曲点
9e 傾斜部
9f 傾斜部
9g 中間屈曲点
9h 傾斜部
10 第3の金属細線(配線)
10a ネック立ち上がり部分
10b 第1屈曲点
10c 傾斜部
10d 第2屈曲点
10e 傾斜部
11A 第2ボンド点(接続点)
11B 第2ボンド点(接続点)
11C 第2ボンド点(接続点)
Claims (14)
- アイランド及びインナーリードを有するリードフレームと、
前記アイランドの上に固着された半導体チップと、
前記半導体チップの上に形成された第1の電極及び第2の電極と、
前記各電極と前記インナーリードとを接続し、且つそれぞれ複数の屈曲点を有する第1の配線及び第2の配線とを備え、
前記第1の配線は、前記第1の電極との接続点である、第1の配線の第1接続点から前記電極の上方に立ち上がる第1のネック立ち上がり部分を有し、前記第1のネック立ち上がり部分の上端にある第1の配線の第1屈曲点から第1の配線の第2屈曲点に向かって高くなる傾斜を持ち、前記第1の配線の第2屈曲点は、前記第1の配線のうち最も高い屈曲点であり、
前記第2の配線は、前記第2の電極との接続点である、第2の配線の第1接続点から前記電極の上方に立ち上がる第2のネック立ち上がり部分を有し、前記第2のネック立ち上がり部分の上端にある第2の配線の第1屈曲点から第2の配線の第2屈曲点に向かって低くなる傾斜を持ち、前記第2の配線の第2屈曲点は、前記第2の配線のうち最も低い屈曲点であり、
前記第1の配線は、前記インナーリードの上面との接続点である、第1の配線の第2接続点を有し、前記第2の配線は、前記インナーリードの上面と接続点である、第2の配線の第2接続点を有することを特徴とする半導体装置。 - 前記第1の配線は、前記第1の配線の第2屈曲点から、前記第1の配線の第2接続点に向かって低くなる傾斜を持つことを特徴とする請求項1に記載の半導体装置。
- 前記第1の配線の第2屈曲点は、前記第1の配線の第1接続点と前記第1の配線の第2接続点との距離の50%よりも前記半導体チップに近い位置に設けられ、
前記第2の配線の第2屈曲点は、前記第2の配線の第1接続点と前記第2の配線の第2接続点との距離の50%よりも前記半導体チップに近い位置に設けられていることを特徴とする請求項1又は2に記載の半導体装置。 - 前記第1の配線の第2屈曲点と、前記第1の配線の第2接続点との間に、第1の配線の第3屈曲点が設けられていることを特徴とする請求項1に記載の半導体装置。
- 前記第2の配線の第1屈曲点と前記第2の配線の第2屈曲点との間に、第2の配線の中間屈曲点が設けられており、
前記第1の配線の第2屈曲点と前記第1の配線の第3屈曲点との間の傾斜角は、前記第2の配線の中間屈曲点と前記第2の配線の第2屈曲点との間の傾斜角よりも小さいことを特徴とする請求項4に記載の半導体装置。 - 前記第1の配線の第1接続点の高さは、前記第1の配線の第2接続点の高さと同一か又は高く設定されており、
前記第2の配線の第1接続点の高さは、前記第2の配線の第2接続点の高さと同一か又は高く設定されており、
前記第1の配線の第2屈曲点から前記第1の配線の第2接続点との間の傾斜角は、前記第2の配線の第2屈曲点から前記第2の配線の第2接続点との間の傾斜角よりも大きいことを特徴とする請求項2又は3に記載の半導体装置。 - 前記第1の配線の第1接続点の高さは、前記第1の配線の第2接続点の高さよりも低く設定されており、
前記第2の配線の第1接続点の高さは、前記第2の配線の第2接続点の高さよりも低く設定されており、
前記第1の配線の第2屈曲点から前記第1の配線の第2接続点に向かって低くなり、前記第2の配線の第2屈曲点から前記第2の配線の第2接続点に向かって高くなることを特徴とする請求項2乃至5のいずれか1項に記載の半導体装置。 - 前記複数の配線のうち、前記第1の配線と前記第2の配線との少なくとも1組は、互いに隣接して設けられていることを特徴とする請求項1乃至7のいずれか1項に記載の半導体装置。
- 前記第1の配線の前記第1のネック立ち上がり部分は、前記第2の配線の前記第2のネック立ち上がり部分と比べ、その上端の高さが高いか又は同一であることを特徴とする請求項1乃至8のいずれか1項に記載の半導体装置。
- 前記半導体チップは、前記アイランドの上に複数設けられ、第1の半導体チップと第2の半導体チップとを含み、
前記第1の配線は第1の半導体チップと、前記第2の配線は第2の半導体チップと接続されていることを特徴とする請求項1乃至9のいずれか1項に記載の半導体装置。 - 前記半導体チップの上に形成された第3の電極と、
前記第1の配線の上方に位置する第3の配線とをさらに備え、
前記第3の配線は、前記第3の電極との接続点である、第3の配線の第1接続点から上方に立ち上がる第3のネック立ち上がり部分を有し、前記第3のネック立ち上がり部分の上端にある第1屈曲点から第3の配線の第2屈曲点に向かって高くなり、
前記第3の配線の第2屈曲点は、前記第3の配線の第1接続点と、前記第3の配線と前記インナーリードの上面との接続点である、第3の配線の第2接続点との距離の50%部分の位置よりも、前記半導体チップに近い位置に設けられ、且つ最も高い屈曲点であり、且つ前記第1の配線の第2屈曲点よりも前記インナーリード側に位置することを特徴とする請求項1に記載の半導体装置。 - 前記半導体チップと前記インナーリードとの間に配置された、前記第1の配線、前記第2の配線、前記第3の配線はそれぞれ、互いの屈曲形状が異なることを特徴とする請求項11に記載の半導体装置。
- 前記半導体チップは、前記アイランドの上に複数設けられ、第1の半導体チップと第2の半導体チップとを含み、
前記第1の配線は第1の半導体チップと、前記第3の配線は第2の半導体チップと接続されていることを特徴とする請求項11又は12に記載の半導体装置。 - 前記第1及び第2の半導体チップは、前記アイランドの同じ側に搭載されていることを特徴とする請求項10又は13に記載の半導体装置。
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