JP5586951B2 - 酸化還元法におけるホスフィン酸および/またはホスホン酸の使用 - Google Patents

酸化還元法におけるホスフィン酸および/またはホスホン酸の使用 Download PDF

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Publication number
JP5586951B2
JP5586951B2 JP2009512443A JP2009512443A JP5586951B2 JP 5586951 B2 JP5586951 B2 JP 5586951B2 JP 2009512443 A JP2009512443 A JP 2009512443A JP 2009512443 A JP2009512443 A JP 2009512443A JP 5586951 B2 JP5586951 B2 JP 5586951B2
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JP
Japan
Prior art keywords
electroplating bath
electroplating
salts
acid
alkali metal
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JP2009512443A
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English (en)
Japanese (ja)
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JP2009538982A5 (enExample
JP2009538982A (ja
Inventor
ヒーアゼ,ヴォルフガング
イグナティフ,ニコライ(ミコラ)
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Merck Patent GmbH
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Merck Patent GmbH
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Publication date
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Classifications

    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00Electroplating: Baths therefor
    • C25D3/02Electroplating: Baths therefor from solutions
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D11/00Electrolytic coating by surface reaction, i.e. forming conversion layers
    • C25D11/02Anodisation
    • C25D11/04Anodisation of aluminium or alloys based thereon
    • C25D11/06Anodisation of aluminium or alloys based thereon characterised by the electrolytes used
    • C25D11/10Anodisation of aluminium or alloys based thereon characterised by the electrolytes used containing organic acids
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00Electroplating: Baths therefor
    • C25D3/02Electroplating: Baths therefor from solutions
    • C25D3/04Electroplating: Baths therefor from solutions of chromium
    • C25D3/10Electroplating: Baths therefor from solutions of chromium characterised by the organic bath constituents used
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00Electroplating: Baths therefor
    • C25D3/02Electroplating: Baths therefor from solutions
    • C25D3/22Electroplating: Baths therefor from solutions of zinc

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Electroplating And Plating Baths Therefor (AREA)
  • Electroplating Methods And Accessories (AREA)
JP2009512443A 2006-06-02 2007-05-04 酸化還元法におけるホスフィン酸および/またはホスホン酸の使用 Expired - Fee Related JP5586951B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
DE102006025847A DE102006025847A1 (de) 2006-06-02 2006-06-02 Verwendung von Phosphinsäure in der Galvanotechnik
DE102006025847.9 2006-06-02
PCT/EP2007/003966 WO2007140850A1 (de) 2006-06-02 2007-05-04 Verwendung von phosphinsäuren und/oder phosphonsäuren in redoxprozessen

Publications (3)

Publication Number Publication Date
JP2009538982A JP2009538982A (ja) 2009-11-12
JP2009538982A5 JP2009538982A5 (enExample) 2010-06-24
JP5586951B2 true JP5586951B2 (ja) 2014-09-10

Family

ID=38336886

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2009512443A Expired - Fee Related JP5586951B2 (ja) 2006-06-02 2007-05-04 酸化還元法におけるホスフィン酸および/またはホスホン酸の使用

Country Status (8)

Country Link
US (1) US8282808B2 (enExample)
EP (1) EP2027310A1 (enExample)
JP (1) JP5586951B2 (enExample)
KR (1) KR101367503B1 (enExample)
CN (1) CN101460664B (enExample)
DE (1) DE102006025847A1 (enExample)
TW (1) TWI443230B (enExample)
WO (1) WO2007140850A1 (enExample)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102011102052A1 (de) 2011-05-19 2012-11-22 Anke Gmbh & Co. Kg Netzmittel für elektrolytische Anwendung und dessen Verwendung
EP2789714B1 (en) * 2011-12-07 2018-03-28 Think Laboratory Co., Ltd. Processing unit having condenser, and fully automatic gravure platemaking processing system using same
DE102012022441A1 (de) 2012-11-15 2014-05-28 Merck Patent Gmbh Neue Phosphinsäureamide, deren Herstellung und Verwendung

Family Cites Families (25)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE1004009B (de) * 1953-08-13 1957-03-07 Dehydag Gmbh Galvanische Baeder zur Herstellung von Metallueberzuegen
BE540564A (enExample) 1954-10-28
DE1521066A1 (de) 1963-09-11 1969-08-07 Udylite Corp Bad zur galvanischen Abscheidung von Chromueberzuegen
US3334033A (en) 1964-09-11 1967-08-01 Udylite Corp Chromium plating
US3310480A (en) 1966-04-25 1967-03-21 Udylite Corp Chromium electroplating
US3432408A (en) 1966-08-03 1969-03-11 Udylite Corp Chromium plating electrolyte and method for preventing mist therein
US3745097A (en) * 1969-05-26 1973-07-10 M & T Chemicals Inc Electrodeposition of an iridescent chromium coating
DE2110767C3 (de) 1971-03-06 1974-02-14 Farbwerke Hoechst Ag, Vormals Meister Lucius & Bruening, 6000 Frankfurt Perfluoralkyl-Phosphorverbindungen
DE2233941C3 (de) 1972-07-11 1978-03-02 Cassella Farbwerke Mainkur Ag, 6000 Frankfurt Verwendung von Perfluoralkylphosphorverbindungen als schaumdämpfende Mittel
GB1482747A (en) * 1973-10-10 1977-08-10 Bnf Metals Tech Centre Chromium plating baths
DE2508708C2 (de) * 1975-02-28 1982-07-01 Bayer Ag, 5090 Leverkusen Elektrolytlösungen auf Cr (VI)-Basis zur galvanischen Abscheidung von Chromschichten
JPS5476443A (en) * 1977-11-30 1979-06-19 Dainippon Ink & Chem Inc Fluorine type surfactant mixture suitable for preventing planting mist
US4466865A (en) 1982-01-11 1984-08-21 Omi International Corporation Trivalent chromium electroplating process
JPS61217595A (ja) * 1985-03-22 1986-09-27 Kawasaki Steel Corp めつき鋼板の製造方法
JPS63103099A (ja) 1986-10-17 1988-05-07 Kao Corp 有機高分子複合亜鉛および亜鉛合金めつき皮膜およびその製造方法
DE3723198A1 (de) 1987-07-14 1989-02-16 Bayer Ag Schaumhemmender zusatz in sauren beizen und galvanischen baedern
US5126210A (en) 1989-08-23 1992-06-30 Aluminum Company Of America Anodic phosphonic/phosphinic acid duplex coating on valve metal surface
US5277788A (en) * 1990-10-01 1994-01-11 Aluminum Company Of America Twice-anodized aluminum article having an organo-phosphorus monolayer and process for making the article
JP3111614B2 (ja) * 1992-03-05 2000-11-27 上村工業株式会社 無電解ニッケルめっき浴の再生方法
DE4241478A1 (de) * 1992-12-09 1994-06-16 Bayer Ag Fluorierter Carbonsäureester von Phosphono- und Phosphinocarbonsäuren sowie deren Verwendung
FR2727983B1 (fr) * 1994-12-07 1997-01-24 Atotech France Bain de chromatation et procede pour la finition de surfaces de zinc, d'alliage de zinc, ou de cadmium
DE19828545C1 (de) 1998-06-26 1999-08-12 Cromotec Oberflaechentechnik G Galvanisches Bad, Verfahren zur Erzeugung strukturierter Hartchromschichten und Verwendung
JP2000258923A (ja) * 1999-03-05 2000-09-22 Yokohama Yushi Kogyo Kk 酸化錫導電性パタ−ンを形成させる方法
US20030189193A1 (en) 2002-03-26 2003-10-09 Mininni Robert M. Fluorinated and halogenated phosphinic acids and their active metal derivatives
JP3792216B2 (ja) * 2003-06-30 2006-07-05 古河サーキットフォイル株式会社 薄膜抵抗層の形成方法、薄膜抵抗層付き導電性基材及び抵抗層付き回路基板材料

Also Published As

Publication number Publication date
US20090166212A1 (en) 2009-07-02
CN101460664B (zh) 2013-01-16
DE102006025847A1 (de) 2007-12-06
TWI443230B (zh) 2014-07-01
WO2007140850A1 (de) 2007-12-13
US8282808B2 (en) 2012-10-09
EP2027310A1 (de) 2009-02-25
KR101367503B1 (ko) 2014-02-28
CN101460664A (zh) 2009-06-17
KR20090027691A (ko) 2009-03-17
JP2009538982A (ja) 2009-11-12
TW200806817A (en) 2008-02-01

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