JP2009538982A5 - - Google Patents
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- Publication number
- JP2009538982A5 JP2009538982A5 JP2009512443A JP2009512443A JP2009538982A5 JP 2009538982 A5 JP2009538982 A5 JP 2009538982A5 JP 2009512443 A JP2009512443 A JP 2009512443A JP 2009512443 A JP2009512443 A JP 2009512443A JP 2009538982 A5 JP2009538982 A5 JP 2009538982A5
- Authority
- JP
- Japan
- Prior art keywords
- sulfuric acid
- ions
- soluble salts
- electroplating bath
- bath according
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical class OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 claims 4
- QAOWNCQODCNURD-UHFFFAOYSA-L Sulfate Chemical compound [O-]S([O-])(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-L 0.000 claims 1
- 238000009713 electroplating Methods 0.000 claims 1
- 150000002500 ions Chemical class 0.000 claims 1
- 150000003839 salts Chemical class 0.000 claims 1
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE102006025847.9 | 2006-06-02 | ||
| DE102006025847A DE102006025847A1 (de) | 2006-06-02 | 2006-06-02 | Verwendung von Phosphinsäure in der Galvanotechnik |
| PCT/EP2007/003966 WO2007140850A1 (de) | 2006-06-02 | 2007-05-04 | Verwendung von phosphinsäuren und/oder phosphonsäuren in redoxprozessen |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2009538982A JP2009538982A (ja) | 2009-11-12 |
| JP2009538982A5 true JP2009538982A5 (enExample) | 2010-06-24 |
| JP5586951B2 JP5586951B2 (ja) | 2014-09-10 |
Family
ID=38336886
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2009512443A Expired - Fee Related JP5586951B2 (ja) | 2006-06-02 | 2007-05-04 | 酸化還元法におけるホスフィン酸および／またはホスホン酸の使用 |
Country Status (8)
| Country | Link |
|---|---|
| US (1) | US8282808B2 (enExample) |
| EP (1) | EP2027310A1 (enExample) |
| JP (1) | JP5586951B2 (enExample) |
| KR (1) | KR101367503B1 (enExample) |
| CN (1) | CN101460664B (enExample) |
| DE (1) | DE102006025847A1 (enExample) |
| TW (1) | TWI443230B (enExample) |
| WO (1) | WO2007140850A1 (enExample) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE102011102052A1 (de) | 2011-05-19 | 2012-11-22 | Anke Gmbh & Co. Kg | Netzmittel für elektrolytische Anwendung und dessen Verwendung |
| JPWO2013084929A1 (ja) * | 2011-12-07 | 2015-04-27 | 株式会社シンク・ラボラトリー | 凝縮器付処理ユニット及びそれを用いた全自動グラビア製版処理システム |
| DE102012022441A1 (de) | 2012-11-15 | 2014-05-28 | Merck Patent Gmbh | Neue Phosphinsäureamide, deren Herstellung und Verwendung |
Family Cites Families (25)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE1004009B (de) * | 1953-08-13 | 1957-03-07 | Dehydag Gmbh | Galvanische Baeder zur Herstellung von Metallueberzuegen |
| BE540564A (enExample) | 1954-10-28 | |||
| DE1521066A1 (de) | 1963-09-11 | 1969-08-07 | Udylite Corp | Bad zur galvanischen Abscheidung von Chromueberzuegen |
| US3334033A (en) | 1964-09-11 | 1967-08-01 | Udylite Corp | Chromium plating |
| US3310480A (en) | 1966-04-25 | 1967-03-21 | Udylite Corp | Chromium electroplating |
| US3432408A (en) | 1966-08-03 | 1969-03-11 | Udylite Corp | Chromium plating electrolyte and method for preventing mist therein |
| US3745097A (en) * | 1969-05-26 | 1973-07-10 | M & T Chemicals Inc | Electrodeposition of an iridescent chromium coating |
| DE2110767C3 (de) | 1971-03-06 | 1974-02-14 | Farbwerke Hoechst Ag, Vormals Meister Lucius & Bruening, 6000 Frankfurt | Perfluoralkyl-Phosphorverbindungen |
| DE2233941C3 (de) | 1972-07-11 | 1978-03-02 | Cassella Farbwerke Mainkur Ag, 6000 Frankfurt | Verwendung von Perfluoralkylphosphorverbindungen als schaumdämpfende Mittel |
| GB1482747A (en) * | 1973-10-10 | 1977-08-10 | Bnf Metals Tech Centre | Chromium plating baths |
| DE2508708C2 (de) * | 1975-02-28 | 1982-07-01 | Bayer Ag, 5090 Leverkusen | Elektrolytlösungen auf Cr (VI)-Basis zur galvanischen Abscheidung von Chromschichten |
| JPS5476443A (en) * | 1977-11-30 | 1979-06-19 | Dainippon Ink & Chem Inc | Fluorine type surfactant mixture suitable for preventing planting mist |
| US4466865A (en) | 1982-01-11 | 1984-08-21 | Omi International Corporation | Trivalent chromium electroplating process |
| JPS61217595A (ja) * | 1985-03-22 | 1986-09-27 | Kawasaki Steel Corp | めつき鋼板の製造方法 |
| JPS63103099A (ja) | 1986-10-17 | 1988-05-07 | Kao Corp | 有機高分子複合亜鉛および亜鉛合金めつき皮膜およびその製造方法 |
| DE3723198A1 (de) | 1987-07-14 | 1989-02-16 | Bayer Ag | Schaumhemmender zusatz in sauren beizen und galvanischen baedern |
| US5126210A (en) | 1989-08-23 | 1992-06-30 | Aluminum Company Of America | Anodic phosphonic/phosphinic acid duplex coating on valve metal surface |
| US5277788A (en) * | 1990-10-01 | 1994-01-11 | Aluminum Company Of America | Twice-anodized aluminum article having an organo-phosphorus monolayer and process for making the article |
| JP3111614B2 (ja) * | 1992-03-05 | 2000-11-27 | 上村工業株式会社 | 無電解ニッケルめっき浴の再生方法 |
| DE4241478A1 (de) | 1992-12-09 | 1994-06-16 | Bayer Ag | Fluorierter Carbonsäureester von Phosphono- und Phosphinocarbonsäuren sowie deren Verwendung |
| FR2727983B1 (fr) * | 1994-12-07 | 1997-01-24 | Atotech France | Bain de chromatation et procede pour la finition de surfaces de zinc, d'alliage de zinc, ou de cadmium |
| DE19828545C1 (de) | 1998-06-26 | 1999-08-12 | Cromotec Oberflaechentechnik G | Galvanisches Bad, Verfahren zur Erzeugung strukturierter Hartchromschichten und Verwendung |
| JP2000258923A (ja) * | 1999-03-05 | 2000-09-22 | Yokohama Yushi Kogyo Kk | 酸化錫導電性パタ−ンを形成させる方法 |
| AU2002341575A1 (en) | 2002-03-26 | 2003-10-13 | Photon-X, Inc. | Halogenated phosphinic acids and their active metal derivatives |
| JP3792216B2 (ja) * | 2003-06-30 | 2006-07-05 | 古河サーキットフォイル株式会社 | 薄膜抵抗層の形成方法、薄膜抵抗層付き導電性基材及び抵抗層付き回路基板材料 |
-
2006
- 2006-06-02 DE DE102006025847A patent/DE102006025847A1/de not_active Withdrawn
-
2007
- 2007-05-04 KR KR1020087032128A patent/KR101367503B1/ko not_active Expired - Fee Related
- 2007-05-04 WO PCT/EP2007/003966 patent/WO2007140850A1/de not_active Ceased
- 2007-05-04 JP JP2009512443A patent/JP5586951B2/ja not_active Expired - Fee Related
- 2007-05-04 US US12/303,006 patent/US8282808B2/en not_active Expired - Fee Related
- 2007-05-04 CN CN2007800204191A patent/CN101460664B/zh not_active Expired - Fee Related
- 2007-05-04 EP EP07724891A patent/EP2027310A1/de not_active Withdrawn
- 2007-06-01 TW TW096119790A patent/TWI443230B/zh not_active IP Right Cessation
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