JP5532475B2 - 処理銅箔及び未処理銅箔の粗化処理方法並びに銅張積層板 - Google Patents
処理銅箔及び未処理銅箔の粗化処理方法並びに銅張積層板 Download PDFInfo
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- JP5532475B2 JP5532475B2 JP2009258858A JP2009258858A JP5532475B2 JP 5532475 B2 JP5532475 B2 JP 5532475B2 JP 2009258858 A JP2009258858 A JP 2009258858A JP 2009258858 A JP2009258858 A JP 2009258858A JP 5532475 B2 JP5532475 B2 JP 5532475B2
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- copper foil
- copper
- untreated
- treated
- roughened layer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 title claims description 109
- 239000011889 copper foil Substances 0.000 title claims description 91
- 238000000034 method Methods 0.000 title claims description 24
- 238000007788 roughening Methods 0.000 title claims description 13
- 239000010949 copper Substances 0.000 claims description 21
- 229910052802 copper Inorganic materials 0.000 claims description 19
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims description 17
- 239000002390 adhesive tape Substances 0.000 claims description 11
- 238000003672 processing method Methods 0.000 claims description 10
- 229920005989 resin Polymers 0.000 claims description 10
- 239000011347 resin Substances 0.000 claims description 10
- 229910017052 cobalt Inorganic materials 0.000 claims description 9
- 239000010941 cobalt Substances 0.000 claims description 9
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 claims description 9
- 229910052759 nickel Inorganic materials 0.000 claims description 9
- 239000000758 substrate Substances 0.000 claims description 8
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 claims description 7
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical group [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 claims description 7
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 claims description 7
- 229910052732 germanium Inorganic materials 0.000 claims description 7
- GNPVGFCGXDBREM-UHFFFAOYSA-N germanium atom Chemical compound [Ge] GNPVGFCGXDBREM-UHFFFAOYSA-N 0.000 claims description 7
- 229910052698 phosphorus Inorganic materials 0.000 claims description 7
- 239000011574 phosphorus Substances 0.000 claims description 7
- 229910052717 sulfur Inorganic materials 0.000 claims description 7
- 239000011593 sulfur Substances 0.000 claims description 7
- 229910052718 tin Inorganic materials 0.000 claims description 7
- 239000000853 adhesive Substances 0.000 claims description 6
- 230000001070 adhesive effect Effects 0.000 claims description 6
- 230000000149 penetrating effect Effects 0.000 claims description 2
- 230000006835 compression Effects 0.000 claims 1
- 238000007906 compression Methods 0.000 claims 1
- 239000000243 solution Substances 0.000 description 14
- 239000010419 fine particle Substances 0.000 description 13
- 229910000365 copper sulfate Inorganic materials 0.000 description 11
- ARUVKPQLZAKDPS-UHFFFAOYSA-L copper(II) sulfate Chemical compound [Cu+2].[O-][S+2]([O-])([O-])[O-] ARUVKPQLZAKDPS-UHFFFAOYSA-L 0.000 description 11
- 239000007864 aqueous solution Substances 0.000 description 8
- 239000008151 electrolyte solution Substances 0.000 description 8
- 239000000843 powder Substances 0.000 description 7
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 6
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 6
- ZCDOYSPFYFSLEW-UHFFFAOYSA-N chromate(2-) Chemical compound [O-][Cr]([O-])(=O)=O ZCDOYSPFYFSLEW-UHFFFAOYSA-N 0.000 description 6
- 230000008878 coupling Effects 0.000 description 6
- 238000010168 coupling process Methods 0.000 description 6
- 238000005859 coupling reaction Methods 0.000 description 6
- 229910000077 silane Inorganic materials 0.000 description 6
- 230000000052 comparative effect Effects 0.000 description 5
- YBMRDBCBODYGJE-UHFFFAOYSA-N germanium dioxide Chemical compound O=[Ge]=O YBMRDBCBODYGJE-UHFFFAOYSA-N 0.000 description 4
- 238000004519 manufacturing process Methods 0.000 description 4
- 238000005259 measurement Methods 0.000 description 4
- 239000002245 particle Substances 0.000 description 4
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 4
- 229910000990 Ni alloy Inorganic materials 0.000 description 3
- 238000009713 electroplating Methods 0.000 description 3
- 238000010438 heat treatment Methods 0.000 description 3
- 239000000203 mixture Substances 0.000 description 3
- 238000007747 plating Methods 0.000 description 3
- 229920001721 polyimide Polymers 0.000 description 3
- 229920000298 Cellophane Polymers 0.000 description 2
- 239000000654 additive Substances 0.000 description 2
- 230000000996 additive effect Effects 0.000 description 2
- 229910045601 alloy Inorganic materials 0.000 description 2
- 239000000956 alloy Substances 0.000 description 2
- MEYVLGVRTYSQHI-UHFFFAOYSA-L cobalt(2+) sulfate heptahydrate Chemical compound O.O.O.O.O.O.O.[Co+2].[O-]S([O-])(=O)=O MEYVLGVRTYSQHI-UHFFFAOYSA-L 0.000 description 2
- JZCCFEFSEZPSOG-UHFFFAOYSA-L copper(II) sulfate pentahydrate Chemical compound O.O.O.O.O.[Cu+2].[O-]S([O-])(=O)=O JZCCFEFSEZPSOG-UHFFFAOYSA-L 0.000 description 2
- BQJTUDIVKSVBDU-UHFFFAOYSA-L copper;sulfuric acid;sulfate Chemical compound [Cu+2].OS(O)(=O)=O.[O-]S([O-])(=O)=O BQJTUDIVKSVBDU-UHFFFAOYSA-L 0.000 description 2
- 238000000151 deposition Methods 0.000 description 2
- 239000003792 electrolyte Substances 0.000 description 2
- 238000011156 evaluation Methods 0.000 description 2
- 239000011888 foil Substances 0.000 description 2
- 229940119177 germanium dioxide Drugs 0.000 description 2
- 229910052697 platinum Inorganic materials 0.000 description 2
- 238000003825 pressing Methods 0.000 description 2
- 238000012545 processing Methods 0.000 description 2
- 238000010298 pulverizing process Methods 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- WYTZZXDRDKSJID-UHFFFAOYSA-N (3-aminopropyl)triethoxysilane Chemical compound CCO[Si](OCC)(OCC)CCCN WYTZZXDRDKSJID-UHFFFAOYSA-N 0.000 description 1
- GEZAUFNYMZVOFV-UHFFFAOYSA-J 2-[(2-oxo-1,3,2$l^{5},4$l^{2}-dioxaphosphastannetan-2-yl)oxy]-1,3,2$l^{5},4$l^{2}-dioxaphosphastannetane 2-oxide Chemical compound [Sn+2].[Sn+2].[O-]P([O-])(=O)OP([O-])([O-])=O GEZAUFNYMZVOFV-UHFFFAOYSA-J 0.000 description 1
- JHWIEAWILPSRMU-UHFFFAOYSA-N 2-methyl-3-pyrimidin-4-ylpropanoic acid Chemical compound OC(=O)C(C)CC1=CC=NC=N1 JHWIEAWILPSRMU-UHFFFAOYSA-N 0.000 description 1
- 239000004215 Carbon black (E152) Substances 0.000 description 1
- 239000004593 Epoxy Substances 0.000 description 1
- 229920000106 Liquid crystal polymer Polymers 0.000 description 1
- 239000004977 Liquid-crystal polymers (LCPs) Substances 0.000 description 1
- QPCDCPDFJACHGM-UHFFFAOYSA-N N,N-bis{2-[bis(carboxymethyl)amino]ethyl}glycine Chemical compound OC(=O)CN(CC(O)=O)CCN(CC(=O)O)CCN(CC(O)=O)CC(O)=O QPCDCPDFJACHGM-UHFFFAOYSA-N 0.000 description 1
- 229910021586 Nickel(II) chloride Inorganic materials 0.000 description 1
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 1
- 239000004642 Polyimide Substances 0.000 description 1
- 239000004820 Pressure-sensitive adhesive Substances 0.000 description 1
- 241001422033 Thestylus Species 0.000 description 1
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 1
- VDGMIGHRDCJLMN-UHFFFAOYSA-N [Cu].[Co].[Ni] Chemical compound [Cu].[Co].[Ni] VDGMIGHRDCJLMN-UHFFFAOYSA-N 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- GVPFVAHMJGGAJG-UHFFFAOYSA-L cobalt dichloride Chemical compound [Cl-].[Cl-].[Co+2] GVPFVAHMJGGAJG-UHFFFAOYSA-L 0.000 description 1
- ZGDWHDKHJKZZIQ-UHFFFAOYSA-N cobalt nickel Chemical compound [Co].[Ni].[Ni].[Ni] ZGDWHDKHJKZZIQ-UHFFFAOYSA-N 0.000 description 1
- 238000004040 coloring Methods 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 238000010410 dusting Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 239000004744 fabric Substances 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 229930195733 hydrocarbon Natural products 0.000 description 1
- 150000002430 hydrocarbons Chemical class 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 238000000691 measurement method Methods 0.000 description 1
- 229910052750 molybdenum Inorganic materials 0.000 description 1
- QMMRZOWCJAIUJA-UHFFFAOYSA-L nickel dichloride Chemical compound Cl[Ni]Cl QMMRZOWCJAIUJA-UHFFFAOYSA-L 0.000 description 1
- RRIWRJBSCGCBID-UHFFFAOYSA-L nickel sulfate hexahydrate Chemical compound O.O.O.O.O.O.[Ni+2].[O-]S([O-])(=O)=O RRIWRJBSCGCBID-UHFFFAOYSA-L 0.000 description 1
- 229940116202 nickel sulfate hexahydrate Drugs 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- 238000000059 patterning Methods 0.000 description 1
- 229960003330 pentetic acid Drugs 0.000 description 1
- 229920000728 polyester Polymers 0.000 description 1
- 230000001105 regulatory effect Effects 0.000 description 1
- 239000010731 rolling oil Substances 0.000 description 1
- 238000005096 rolling process Methods 0.000 description 1
- KOUDKOMXLMXFKX-UHFFFAOYSA-N sodium oxido(oxo)phosphanium hydrate Chemical compound O.[Na+].[O-][PH+]=O KOUDKOMXLMXFKX-UHFFFAOYSA-N 0.000 description 1
- LHUAYJZGTZYKSW-UHFFFAOYSA-M sodium;1-sulfanylpropane-1-sulfonate Chemical compound [Na+].CCC(S)S([O-])(=O)=O LHUAYJZGTZYKSW-UHFFFAOYSA-M 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 230000003746 surface roughness Effects 0.000 description 1
- 239000011135 tin Substances 0.000 description 1
- NCPXQVVMIXIKTN-UHFFFAOYSA-N trisodium;phosphite Chemical compound [Na+].[Na+].[Na+].[O-]P([O-])[O-] NCPXQVVMIXIKTN-UHFFFAOYSA-N 0.000 description 1
- 229910052720 vanadium Inorganic materials 0.000 description 1
- 230000002747 voluntary effect Effects 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
Images
Landscapes
- Electroplating Methods And Accessories (AREA)
- Laminated Bodies (AREA)
- Parts Printed On Printed Circuit Boards (AREA)
- Electroplating And Plating Baths Therefor (AREA)
Description
JISZ1522に規定される粘着力が3.88N/cmであって幅12mmの透明粘着テープ(ニチバン株式会社製・品番:CT405A-24)を用意した。
2 未処理銅箔
3 粗化処理層
Claims (3)
- 未処理銅箔と前記未処理銅箔表面に析出した銅とコバルト又は銅とニッケルを含有する粗化処理層とを備えた処理銅箔であって、前記粗化処理層は硫黄、ゲルマニウム、リン及びすずから選択される少なくとも一種を含有し、JISG4401-2006に規定されるSK2で作成された刃先角度22°±2°、厚み0.38mmの刃を備えたカッターナイフで前記粗化処理層を貫通する引き傷を1mm間隔で直交するように縦横11本並べることによって1mm×1mmの升目100個からなる碁盤目を形成し、碁盤目を覆うように配置したJISZ1522に規定される粘着力が3.88N/cmの粘着テープを圧力192kpaで30秒間圧着した後、粘着テープを180°方向に引っ張って引き剥がした際に未処理銅箔から剥がれ落ちる升目の数が30以下であり前記粗化処理層表面がJISZ8729に定義される表色系L ※ ・a ※ ・b ※ がL ※ <30、a ※ <5、b ※ <5であることを特徴とする処理銅箔。
- 請求項1記載の処理銅箔を樹脂基板上に加熱圧着させたことを特徴とする銅張積層板。
- 請求項1記載の処理銅箔の処理方法。
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
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JP2009258858A JP5532475B2 (ja) | 2009-11-12 | 2009-11-12 | 処理銅箔及び未処理銅箔の粗化処理方法並びに銅張積層板 |
CN201010534070.7A CN102061494B (zh) | 2009-11-12 | 2010-11-02 | 处理铜箔和未处理铜箔的粗糙化处理方法及敷铜箔叠层板 |
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JP2009258858A JP5532475B2 (ja) | 2009-11-12 | 2009-11-12 | 処理銅箔及び未処理銅箔の粗化処理方法並びに銅張積層板 |
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JP2011105960A JP2011105960A (ja) | 2011-06-02 |
JP5532475B2 true JP5532475B2 (ja) | 2014-06-25 |
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Families Citing this family (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP5563849B2 (ja) * | 2010-03-02 | 2014-07-30 | 福田金属箔粉工業株式会社 | 処理銅箔 |
CN103733399B (zh) * | 2011-07-29 | 2016-03-02 | 株式会社Uacj | 集电体以及使用该集电体的电极结构体、非水电解质电池、双电层电容器、锂离子电容器或蓄电部件 |
CN102732862B (zh) * | 2012-07-18 | 2013-11-13 | 哈尔滨工业大学 | 铜箔上置换镀Ni-S合金阻挡层的方法及该阻挡层的化学钝化方法 |
CN103384448A (zh) * | 2013-06-27 | 2013-11-06 | 清华大学 | 印刷电路板及表面处理方法 |
CN109137013A (zh) * | 2018-07-13 | 2019-01-04 | 铜陵市华创新材料有限公司 | 一种电解铜箔表面电沉积zn-ni-p-la合金工艺 |
US11753735B2 (en) | 2018-09-06 | 2023-09-12 | Proterial, Ltd. | Nickel-coated copper foil and method for manufacturing the same |
CN109208040B (zh) * | 2018-11-02 | 2021-03-30 | 山东金盛源电子材料有限公司 | 一种用于制备低粗糙度电解铜箔的复合添加剂 |
Family Cites Families (7)
Publication number | Priority date | Publication date | Assignee | Title |
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JPH0328389A (ja) * | 1989-06-23 | 1991-02-06 | Meiko Denshi Kogyo Kk | 銅張積層板用銅箔層、その製造方法およびそれに用いるめっき浴 |
JP3201850B2 (ja) * | 1992-11-26 | 2001-08-27 | 株式会社日鉱マテリアルズ | 印刷回路用銅箔及びその製造方法 |
JP2920083B2 (ja) * | 1995-02-23 | 1999-07-19 | 日鉱グールド・フォイル株式会社 | 印刷回路用銅箔及びその製造方法 |
JP2004263300A (ja) * | 2003-02-12 | 2004-09-24 | Furukawa Techno Research Kk | ファインパターンプリント配線用銅箔とその製造方法 |
JP4316413B2 (ja) * | 2004-04-05 | 2009-08-19 | 日鉱金属株式会社 | 粗化処理面を備えた銅合金箔及び銅合金箔の粗化処理方法 |
JP2006210689A (ja) * | 2005-01-28 | 2006-08-10 | Fukuda Metal Foil & Powder Co Ltd | 高周波プリント配線板用銅箔及びその製造方法 |
JP4681936B2 (ja) * | 2005-05-20 | 2011-05-11 | 福田金属箔粉工業株式会社 | プラズマディスプレイ電磁波シールドフィルター用銅箔 |
-
2009
- 2009-11-12 JP JP2009258858A patent/JP5532475B2/ja active Active
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- 2010-11-02 CN CN201010534070.7A patent/CN102061494B/zh active Active
Also Published As
Publication number | Publication date |
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CN102061494B (zh) | 2016-03-16 |
JP2011105960A (ja) | 2011-06-02 |
CN102061494A (zh) | 2011-05-18 |
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