JP5520116B2 - α−(不飽和アルコキシアルキル)アクリレート組成物及びその製造方法 - Google Patents

α−(不飽和アルコキシアルキル)アクリレート組成物及びその製造方法 Download PDF

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JP5520116B2
JP5520116B2 JP2010084284A JP2010084284A JP5520116B2 JP 5520116 B2 JP5520116 B2 JP 5520116B2 JP 2010084284 A JP2010084284 A JP 2010084284A JP 2010084284 A JP2010084284 A JP 2010084284A JP 5520116 B2 JP5520116 B2 JP 5520116B2
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acrylate
allyloxymethyl
antioxidant
unsaturated
composition
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Japanese (ja)
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JP2010254685A5 (enrdf_load_stackoverflow
JP2010254685A (ja
Inventor
周 齊藤
博子 和泉
康寛 三村
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Nippon Shokubai Co Ltd
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Nippon Shokubai Co Ltd
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  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Low-Molecular Organic Synthesis Reactions Using Catalysts (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
JP2010084284A 2009-03-31 2010-03-31 α−(不飽和アルコキシアルキル)アクリレート組成物及びその製造方法 Active JP5520116B2 (ja)

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JP2010084284A JP5520116B2 (ja) 2009-03-31 2010-03-31 α−(不飽和アルコキシアルキル)アクリレート組成物及びその製造方法

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JP2009087219 2009-03-31
JP2009087219 2009-03-31
JP2010084284A JP5520116B2 (ja) 2009-03-31 2010-03-31 α−(不飽和アルコキシアルキル)アクリレート組成物及びその製造方法

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JP2010254685A JP2010254685A (ja) 2010-11-11
JP2010254685A5 JP2010254685A5 (enrdf_load_stackoverflow) 2013-11-14
JP5520116B2 true JP5520116B2 (ja) 2014-06-11

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Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5583378B2 (ja) * 2009-09-29 2014-09-03 株式会社日本触媒 α−(アルコキシアルキル)アクリレートの製造方法
JP5496534B2 (ja) * 2009-03-31 2014-05-21 株式会社日本触媒 α−(不飽和アルコキシアルキル)アクリレートの製造方法
JP5591543B2 (ja) * 2010-01-04 2014-09-17 株式会社日本触媒 反応性希釈剤
JP5977063B2 (ja) * 2012-04-05 2016-08-24 株式会社日本触媒 重合性化合物
JP6125933B2 (ja) * 2012-07-13 2017-05-10 株式会社日本触媒 安定化剤組成物
JP2016160387A (ja) * 2015-03-04 2016-09-05 株式会社クラレ 重合体組成物
JP7699012B2 (ja) * 2020-08-25 2025-06-26 三洋化成工業株式会社 活性エネルギー線硬化性組成物及び硬化物

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE4142909A1 (de) * 1991-12-24 1993-07-01 Basf Ag Oxadimethacryl-verbindungen und verfahren zu ihrer herstellung
DE4142913A1 (de) * 1991-12-24 1993-07-01 Basf Ag Verfahren zur herstellung von oxadimethacrylsaeure
JP3907738B2 (ja) * 1995-03-24 2007-04-18 株式会社日本触媒 アリルエーテル類の製造方法
JP3943180B2 (ja) * 1997-02-18 2007-07-11 株式会社日本触媒 アリルエーテル化合物の製造方法
KR100281903B1 (ko) * 1998-12-24 2001-03-02 윤종용 백본이 환상 구조를가지는 감광성 폴리머 및 이를 포함하는 레지스트 조성물
JP3953712B2 (ja) * 1999-07-12 2007-08-08 三菱レイヨン株式会社 レジスト用樹脂および化学増幅型レジスト組成物
JP2002131900A (ja) * 2000-10-25 2002-05-09 Fuji Photo Film Co Ltd マスク作成用原板
JP2004123819A (ja) * 2002-09-30 2004-04-22 Nippon Shokubai Co Ltd プロトンによる脱離性基を有する樹脂、および感光性樹脂組成物

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